BR9601991A - Composição de filme de polímero e composição estabilizada - Google Patents
Composição de filme de polímero e composição estabilizadaInfo
- Publication number
- BR9601991A BR9601991A BR9601991A BR9601991A BR9601991A BR 9601991 A BR9601991 A BR 9601991A BR 9601991 A BR9601991 A BR 9601991A BR 9601991 A BR9601991 A BR 9601991A BR 9601991 A BR9601991 A BR 9601991A
- Authority
- BR
- Brazil
- Prior art keywords
- composition
- polymer film
- stabilized
- film composition
- stabilized composition
- Prior art date
Links
- 229920006254 polymer film Polymers 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
- B41M5/5227—Macromolecular coatings characterised by organic non-macromolecular additives, e.g. UV-absorbers, plasticisers, surfactants
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G03C1/8155—Organic compounds therefor
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/424,843 US5574166A (en) | 1995-04-19 | 1995-04-19 | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9601991A true BR9601991A (pt) | 1998-04-07 |
Family
ID=23684097
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR9601992A BR9601992A (pt) | 1995-04-19 | 1996-04-19 | 2-(2-hidróxi 3-alfa-cumil-5-t-octilfenil)-2h-benzotriazóis em forma cristalina e amorfa processo para sua preparação composto composição estabilizada contra os efeitos prejudiciais da luz actínica processos para estabilizar e para proteger uma material orgânico contra a degradação induzida por radiação actínica |
BR9601991A BR9601991A (pt) | 1995-04-19 | 1996-04-19 | Composição de filme de polímero e composição estabilizada |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR9601992A BR9601992A (pt) | 1995-04-19 | 1996-04-19 | 2-(2-hidróxi 3-alfa-cumil-5-t-octilfenil)-2h-benzotriazóis em forma cristalina e amorfa processo para sua preparação composto composição estabilizada contra os efeitos prejudiciais da luz actínica processos para estabilizar e para proteger uma material orgânico contra a degradação induzida por radiação actínica |
Country Status (18)
Country | Link |
---|---|
US (4) | US5574166A (pt) |
EP (1) | EP0738718A1 (pt) |
JP (2) | JP3309153B2 (pt) |
KR (2) | KR100426626B1 (pt) |
CN (2) | CN1066181C (pt) |
AT (1) | AT405936B (pt) |
AU (2) | AU707202B2 (pt) |
BE (1) | BE1010550A3 (pt) |
BR (2) | BR9601992A (pt) |
CA (2) | CA2174411C (pt) |
DE (1) | DE19615000A1 (pt) |
ES (1) | ES2130930B1 (pt) |
FR (1) | FR2733239B1 (pt) |
GB (1) | GB2299957B (pt) |
IT (1) | IT1283615B1 (pt) |
NL (1) | NL1002904C2 (pt) |
SE (1) | SE509606C2 (pt) |
TW (1) | TW419497B (pt) |
Families Citing this family (90)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5574166A (en) * | 1995-04-19 | 1996-11-12 | Ciba-Geigy Corporation | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
CH693032A5 (de) * | 1996-11-07 | 2003-01-31 | Ciba Sc Holding Ag | Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit. |
US5977219A (en) * | 1997-10-30 | 1999-11-02 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
US6166218A (en) | 1996-11-07 | 2000-12-26 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
EP1264822A3 (en) | 1997-04-15 | 2003-01-29 | Ciba SC Holding AG | Stabiliser modification |
DE19723779A1 (de) * | 1997-06-06 | 1998-12-10 | Agfa Gevaert Ag | Inkjet-System |
US6383716B1 (en) | 1997-08-22 | 2002-05-07 | Asahi Kasei Kabushiki Kaisha | Stable photosensitive resin composition |
JP3448851B2 (ja) * | 1997-11-28 | 2003-09-22 | タキロン株式会社 | 添加剤含有樹脂成形品及びその製造方法 |
US5948150A (en) * | 1998-05-05 | 1999-09-07 | Hewlett-Packard Company | Composition to improve colorfastness of a printed image |
WO2000014126A1 (de) * | 1998-09-09 | 2000-03-16 | Ciba Specialty Chemicals Holding Inc. | Photostabiles chromophor-system |
EP1099982B1 (en) * | 1999-02-19 | 2009-04-29 | Asahi Kasei Chemicals Corporation | Stable photosensitive resin composition |
DE60003748T2 (de) * | 1999-04-23 | 2004-03-18 | Nippon Mitsubishi Oil Corp. | UV-absorbierende Harzzusammensetzung |
US6245915B1 (en) | 1999-05-03 | 2001-06-12 | Ciba Specialty Chemicals Corporation | Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety |
BR0010228A (pt) * | 1999-05-03 | 2002-02-13 | Ciba Sc Holding Ag | Composições adesivas estabilizadas contendo absorvedores de uv de benzotriazol fotoestáveis, deslocados para o vermelho, altamente solúveis e artigos laminados derivados das mesmas |
US6187845B1 (en) * | 1999-05-03 | 2001-02-13 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
US6268415B1 (en) | 1999-05-03 | 2001-07-31 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
AU774383B2 (en) * | 1999-07-12 | 2004-06-24 | Ciba Specialty Chemicals Holding Inc. | Use of mixtures of micropigments for preventing tanning and for lightening skin and hair |
EP1252226B1 (en) * | 2000-02-01 | 2007-02-07 | Ciba SC Holding AG | Method of content protection with durable uv absorbers |
US6451887B1 (en) * | 2000-08-03 | 2002-09-17 | Ciba Specialty Chemicals Corporation | Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith |
US6392056B1 (en) | 2000-08-03 | 2002-05-21 | Ciba Specialty Chemical Corporation | 2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith |
US6649770B1 (en) * | 2000-11-27 | 2003-11-18 | Ciba Specialty Chemicals Corporation | Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof |
US6387992B1 (en) | 2000-11-27 | 2002-05-14 | Ciba Specialty Chemicals Corporation | Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith |
JP4380989B2 (ja) * | 2001-01-16 | 2009-12-09 | チバ ホールディング インコーポレーテッド | インクジェットインク及び記録材料 |
JP4993421B2 (ja) * | 2001-06-07 | 2012-08-08 | 株式会社Adeka | 合成樹脂組成物 |
KR20040096558A (ko) * | 2002-02-19 | 2004-11-16 | 시바 스폐셜티 케미칼스 홀딩 인코포레이티드 | 자외선 방사선 효과로 부터 내용물을 보호하기 위한히드록시페닐벤조트리아졸 자외선 흡수제를 포함하는 용기또는 필름 |
US20050209252A1 (en) * | 2002-03-29 | 2005-09-22 | Che-Ming Teng | Cancer treatment |
AU2003238442A1 (en) | 2002-06-06 | 2003-12-22 | Siba Spelcialty Chemicals Holding Inc. | Electroluminescent device |
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WO2004076419A1 (en) | 2003-02-26 | 2004-09-10 | Ciba Specialty Chemicals Holding Inc. | Water compatible sterically hindered alkoxyamines and hydroxy substituted alkoxyamines |
US6974850B2 (en) * | 2003-05-30 | 2005-12-13 | 3M Innovative Properties Company | Outdoor weatherable photopolymerizable coatings |
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US4315848A (en) * | 1979-05-10 | 1982-02-16 | Ciba-Geigy Corporation | 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions |
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EP0036117B1 (de) * | 1980-03-14 | 1986-02-05 | Spezial-Papiermaschinenfabrik August Alfred Krupp GmbH & Co | Druckempfindliches Aufzeichnungsmaterial |
US4559293A (en) * | 1983-04-08 | 1985-12-17 | Kimoto & Co., Ltd. | Photosensitive recording material developable with aqueous neutral salt solution |
DE3328771A1 (de) * | 1983-08-10 | 1985-02-28 | Basf Ag, 6700 Ludwigshafen | Verfahren zur kontinuierlichen herstellung von sauerstoff enthaltenden verbindungen |
US4675352A (en) * | 1985-01-22 | 1987-06-23 | Ciba-Geigy Corporation | Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures |
US4587346A (en) * | 1985-01-22 | 1986-05-06 | Ciba-Geigy Corporation | Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures |
US4760148A (en) * | 1985-09-03 | 1988-07-26 | Ciba-Geigy Corporation | 5-aralkyl substituted 2H-benzotriazoles and stabilized compositions |
JPS62262777A (ja) * | 1986-05-09 | 1987-11-14 | Kansai Paint Co Ltd | 防食塗膜形成法 |
US5096977A (en) * | 1987-08-12 | 1992-03-17 | Atochem North America, Inc. | Process for preparing polymer bound UV stabilizers |
US4973701A (en) * | 1988-04-11 | 1990-11-27 | Ciba-Geigy Corporation | Liquid substituted 2H-benzotriazole mixtures, stabilized compositions and processes for preparing the liquid mixtures |
US5095062A (en) * | 1988-04-11 | 1992-03-10 | Ciba-Geigy Corporation | Stabilized compositions containing liquid substituted 2H-benzotriazole mixtures |
US5240975A (en) * | 1988-04-11 | 1993-08-31 | Ciba-Geigy Corporation | Liquid substituted 2H-benzotriazole mixtures, stabilized compositions |
US5199979A (en) * | 1988-11-25 | 1993-04-06 | Ppg Industries, Inc. | UV resistant, abrasion resistant coatings |
US5045396A (en) * | 1988-11-23 | 1991-09-03 | Ppg Industries, Inc. | UV resistant primer |
EP0373573B1 (de) * | 1988-12-14 | 1994-06-22 | Ciba-Geigy Ag | Aufzeichnungsmaterial für Tintenstrahldruck |
US5098477A (en) * | 1988-12-14 | 1992-03-24 | Ciba-Geigy Corporation | Inks, particularly for ink printing |
EP0520938B1 (de) * | 1991-06-03 | 1997-09-24 | Ciba SC Holding AG | UV-Absorber enthaltendes photographisches Material |
US5354794A (en) * | 1993-02-03 | 1994-10-11 | Ciba-Geigy Corporation | Electro coat/base coat/clear coat finishes stabilized with S-triazine UV absorbers |
DE4404081A1 (de) * | 1994-02-09 | 1995-08-10 | Basf Ag | UV-stabilisierte Polyoxymethylenformmassen |
EP0698637A3 (en) * | 1994-08-22 | 1996-07-10 | Ciba Geigy Ag | Polyurethanes stabilized with selected UV absorbers of 5-substituted benzotriazole |
US5574166A (en) * | 1995-04-19 | 1996-11-12 | Ciba-Geigy Corporation | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
-
1995
- 1995-04-19 US US08/424,843 patent/US5574166A/en not_active Expired - Lifetime
- 1995-06-06 US US08/466,850 patent/US5563242A/en not_active Expired - Lifetime
- 1995-06-06 US US08/466,851 patent/US5554760A/en not_active Expired - Lifetime
-
1996
- 1996-04-05 US US08/628,433 patent/US5607987A/en not_active Expired - Lifetime
- 1996-04-10 SE SE9601345A patent/SE509606C2/sv not_active IP Right Cessation
- 1996-04-10 GB GB9607427A patent/GB2299957B/en not_active Expired - Lifetime
- 1996-04-10 EP EP96810220A patent/EP0738718A1/en not_active Withdrawn
- 1996-04-16 DE DE19615000A patent/DE19615000A1/de not_active Ceased
- 1996-04-17 BE BE9600333A patent/BE1010550A3/fr not_active IP Right Cessation
- 1996-04-17 KR KR1019960012131A patent/KR100426626B1/ko not_active IP Right Cessation
- 1996-04-17 CA CA002174411A patent/CA2174411C/en not_active Expired - Fee Related
- 1996-04-17 AU AU50731/96A patent/AU707202B2/en not_active Ceased
- 1996-04-17 CA CA002174412A patent/CA2174412A1/en not_active Abandoned
- 1996-04-18 CN CN96105137A patent/CN1066181C/zh not_active Expired - Lifetime
- 1996-04-18 FR FR9604847A patent/FR2733239B1/fr not_active Expired - Lifetime
- 1996-04-18 ES ES009600874A patent/ES2130930B1/es not_active Expired - Fee Related
- 1996-04-18 AT AT0070596A patent/AT405936B/de not_active IP Right Cessation
- 1996-04-18 KR KR1019960012170A patent/KR100378233B1/ko not_active IP Right Cessation
- 1996-04-18 CN CN96105141A patent/CN1059899C/zh not_active Expired - Lifetime
- 1996-04-18 IT IT96MI000751A patent/IT1283615B1/it active IP Right Grant
- 1996-04-18 AU AU50784/96A patent/AU706957B2/en not_active Ceased
- 1996-04-19 NL NL1002904A patent/NL1002904C2/nl not_active IP Right Cessation
- 1996-04-19 BR BR9601992A patent/BR9601992A/pt not_active IP Right Cessation
- 1996-04-19 JP JP12246696A patent/JP3309153B2/ja not_active Expired - Lifetime
- 1996-04-19 JP JP8122465A patent/JPH08291151A/ja active Pending
- 1996-04-19 BR BR9601991A patent/BR9601991A/pt not_active IP Right Cessation
- 1996-05-14 TW TW085105661A patent/TW419497B/zh not_active IP Right Cessation
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PC | Transfer |
Free format text: CIBA SC HOLDING AG (CH) |
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TC | Change of name | ||
FB34 | Technical and formal requirements: requirement - article 34 of industrial property law | ||
FB36 | Technical and formal requirements: requirement - article 36 of industrial property law | ||
FF | Decision: intention to grant | ||
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Free format text: PATENTE EXTINTA EM 19/04/2016 |