BR9601991A - Composição de filme de polímero e composição estabilizada - Google Patents

Composição de filme de polímero e composição estabilizada

Info

Publication number
BR9601991A
BR9601991A BR9601991A BR9601991A BR9601991A BR 9601991 A BR9601991 A BR 9601991A BR 9601991 A BR9601991 A BR 9601991A BR 9601991 A BR9601991 A BR 9601991A BR 9601991 A BR9601991 A BR 9601991A
Authority
BR
Brazil
Prior art keywords
composition
polymer film
stabilized
film composition
stabilized composition
Prior art date
Application number
BR9601991A
Other languages
English (en)
Inventor
Ramanathan Ravichandran
Mark S Holt
Volker Hartmut Von Ahn
Joseph Edmund Babiarz
Roland Arthur Edwin Winter
David G Leppard
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of BR9601991A publication Critical patent/BR9601991A/pt

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/46Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/50Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
    • B41M5/52Macromolecular coatings
    • B41M5/5227Macromolecular coatings characterised by organic non-macromolecular additives, e.g. UV-absorbers, plasticisers, surfactants
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D249/00Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18Benzotriazoles
    • C07D249/20Benzotriazoles with aryl radicals directly attached in position 2
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • C08K5/3475Five-membered rings condensed with carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/38Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155Organic compounds therefor
BR9601991A 1995-04-19 1996-04-19 Composição de filme de polímero e composição estabilizada BR9601991A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/424,843 US5574166A (en) 1995-04-19 1995-04-19 Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole

Publications (1)

Publication Number Publication Date
BR9601991A true BR9601991A (pt) 1998-04-07

Family

ID=23684097

Family Applications (2)

Application Number Title Priority Date Filing Date
BR9601992A BR9601992A (pt) 1995-04-19 1996-04-19 2-(2-hidróxi 3-alfa-cumil-5-t-octilfenil)-2h-benzotriazóis em forma cristalina e amorfa processo para sua preparação composto composição estabilizada contra os efeitos prejudiciais da luz actínica processos para estabilizar e para proteger uma material orgânico contra a degradação induzida por radiação actínica
BR9601991A BR9601991A (pt) 1995-04-19 1996-04-19 Composição de filme de polímero e composição estabilizada

Family Applications Before (1)

Application Number Title Priority Date Filing Date
BR9601992A BR9601992A (pt) 1995-04-19 1996-04-19 2-(2-hidróxi 3-alfa-cumil-5-t-octilfenil)-2h-benzotriazóis em forma cristalina e amorfa processo para sua preparação composto composição estabilizada contra os efeitos prejudiciais da luz actínica processos para estabilizar e para proteger uma material orgânico contra a degradação induzida por radiação actínica

Country Status (18)

Country Link
US (4) US5574166A (pt)
EP (1) EP0738718A1 (pt)
JP (2) JP3309153B2 (pt)
KR (2) KR100426626B1 (pt)
CN (2) CN1066181C (pt)
AT (1) AT405936B (pt)
AU (2) AU707202B2 (pt)
BE (1) BE1010550A3 (pt)
BR (2) BR9601992A (pt)
CA (2) CA2174411C (pt)
DE (1) DE19615000A1 (pt)
ES (1) ES2130930B1 (pt)
FR (1) FR2733239B1 (pt)
GB (1) GB2299957B (pt)
IT (1) IT1283615B1 (pt)
NL (1) NL1002904C2 (pt)
SE (1) SE509606C2 (pt)
TW (1) TW419497B (pt)

Families Citing this family (90)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5574166A (en) * 1995-04-19 1996-11-12 Ciba-Geigy Corporation Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole
CH693032A5 (de) * 1996-11-07 2003-01-31 Ciba Sc Holding Ag Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit.
US5977219A (en) * 1997-10-30 1999-11-02 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
US6166218A (en) 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
EP1264822A3 (en) 1997-04-15 2003-01-29 Ciba SC Holding AG Stabiliser modification
DE19723779A1 (de) * 1997-06-06 1998-12-10 Agfa Gevaert Ag Inkjet-System
US6383716B1 (en) 1997-08-22 2002-05-07 Asahi Kasei Kabushiki Kaisha Stable photosensitive resin composition
JP3448851B2 (ja) * 1997-11-28 2003-09-22 タキロン株式会社 添加剤含有樹脂成形品及びその製造方法
US5948150A (en) * 1998-05-05 1999-09-07 Hewlett-Packard Company Composition to improve colorfastness of a printed image
WO2000014126A1 (de) * 1998-09-09 2000-03-16 Ciba Specialty Chemicals Holding Inc. Photostabiles chromophor-system
EP1099982B1 (en) * 1999-02-19 2009-04-29 Asahi Kasei Chemicals Corporation Stable photosensitive resin composition
DE60003748T2 (de) * 1999-04-23 2004-03-18 Nippon Mitsubishi Oil Corp. UV-absorbierende Harzzusammensetzung
US6245915B1 (en) 1999-05-03 2001-06-12 Ciba Specialty Chemicals Corporation Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety
BR0010228A (pt) * 1999-05-03 2002-02-13 Ciba Sc Holding Ag Composições adesivas estabilizadas contendo absorvedores de uv de benzotriazol fotoestáveis, deslocados para o vermelho, altamente solúveis e artigos laminados derivados das mesmas
US6187845B1 (en) * 1999-05-03 2001-02-13 Ciba Specialty Chemicals Corporation Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom
US6268415B1 (en) 1999-05-03 2001-07-31 Ciba Specialty Chemicals Corporation Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom
AU774383B2 (en) * 1999-07-12 2004-06-24 Ciba Specialty Chemicals Holding Inc. Use of mixtures of micropigments for preventing tanning and for lightening skin and hair
EP1252226B1 (en) * 2000-02-01 2007-02-07 Ciba SC Holding AG Method of content protection with durable uv absorbers
US6451887B1 (en) * 2000-08-03 2002-09-17 Ciba Specialty Chemicals Corporation Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith
US6392056B1 (en) 2000-08-03 2002-05-21 Ciba Specialty Chemical Corporation 2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith
US6649770B1 (en) * 2000-11-27 2003-11-18 Ciba Specialty Chemicals Corporation Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof
US6387992B1 (en) 2000-11-27 2002-05-14 Ciba Specialty Chemicals Corporation Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith
JP4380989B2 (ja) * 2001-01-16 2009-12-09 チバ ホールディング インコーポレーテッド インクジェットインク及び記録材料
JP4993421B2 (ja) * 2001-06-07 2012-08-08 株式会社Adeka 合成樹脂組成物
KR20040096558A (ko) * 2002-02-19 2004-11-16 시바 스폐셜티 케미칼스 홀딩 인코포레이티드 자외선 방사선 효과로 부터 내용물을 보호하기 위한히드록시페닐벤조트리아졸 자외선 흡수제를 포함하는 용기또는 필름
US20050209252A1 (en) * 2002-03-29 2005-09-22 Che-Ming Teng Cancer treatment
AU2003238442A1 (en) 2002-06-06 2003-12-22 Siba Spelcialty Chemicals Holding Inc. Electroluminescent device
DE10228186A1 (de) * 2002-06-24 2004-01-22 Merck Patent Gmbh UV-stabilisierte Partikel
KR100950626B1 (ko) * 2002-06-24 2010-04-01 메르크 파텐트 게엠베하 Uv-안정화 입자
DE10243438A1 (de) * 2002-09-18 2004-03-25 Merck Patent Gmbh Oberflächenmodifizierte Effektpigmente
AU2003299218A1 (en) * 2002-12-20 2004-07-14 Ciba Specialty Chemicals Holding Inc. Ink-jet ink and recording material
WO2004067652A1 (en) * 2003-01-29 2004-08-12 Ciba Specialty Chemicals Holding Inc. Ink-jet ink and recording material
WO2004076419A1 (en) 2003-02-26 2004-09-10 Ciba Specialty Chemicals Holding Inc. Water compatible sterically hindered alkoxyamines and hydroxy substituted alkoxyamines
US6974850B2 (en) * 2003-05-30 2005-12-13 3M Innovative Properties Company Outdoor weatherable photopolymerizable coatings
US7153588B2 (en) * 2003-05-30 2006-12-26 3M Innovative Properties Company UV resistant naphthalate polyester articles
JP4018674B2 (ja) * 2003-08-04 2007-12-05 キヤノン株式会社 インク用被記録媒体の製造方法
WO2005032835A1 (en) 2003-10-03 2005-04-14 Fuji Photo Film B.V. Recording medium
WO2005032833A1 (en) 2003-10-03 2005-04-14 Fuji Photo Film B.V. Recording medium
DE10358092A1 (de) * 2003-12-10 2005-07-14 Merck Patent Gmbh Oberflächenmodifizierte Partikel
US20060083940A1 (en) * 2004-04-30 2006-04-20 Solomon Bekele Ultraviolet light absorbing composition
US7968151B2 (en) * 2004-07-12 2011-06-28 E. I. Du Pont De Nemours And Company Process for the production of multi-layer coatings
US20060008588A1 (en) * 2004-07-12 2006-01-12 Marc Chilla Process for the production of multi-layer coatings
US7595011B2 (en) 2004-07-12 2009-09-29 Ciba Specialty Chemicals Corporation Stabilized electrochromic media
US20060068116A1 (en) * 2004-09-27 2006-03-30 Marc Chilla Process for the production of multi-layer coatings in light metallic color shades
US8865262B2 (en) * 2004-09-27 2014-10-21 Axalta Coating Systems Ip Co., Llc Process for producing multi-layer coatings in light metallic color shades
EP1794220A1 (en) * 2004-09-30 2007-06-13 Ciba Specialty Chemicals Holding Inc. Method for replenishing or introducing light stabilizers
US20060122293A1 (en) * 2004-12-03 2006-06-08 Rick Wilk Ultraviolet light absorber stabilizer combination
US20060134334A1 (en) * 2004-12-22 2006-06-22 Marc Chilla Process for the production of primer surfacer-free multi-layer coatings
US20060177639A1 (en) * 2005-02-04 2006-08-10 Elzen Kerstin T Process for the production of primer surfacer-free multi-layer coatings
US7910211B2 (en) * 2005-06-20 2011-03-22 E.I. Du Pont De Nemours And Company Process for the production of multi-layer coatings
US20070071901A1 (en) * 2005-09-29 2007-03-29 Giannoula Avgenaki Process for the production of multi-layer coatings
JP4821597B2 (ja) * 2006-01-06 2011-11-24 住友化学株式会社 多層光拡散板
TWI434073B (zh) * 2006-01-06 2014-04-11 Sumitomo Chemical Co 多層光擴散板
US20070238814A1 (en) * 2006-04-10 2007-10-11 Basf Corporation Method of making coating compositions
US20070260012A1 (en) * 2006-05-05 2007-11-08 Algrim Danald J HAPs free coating composition and film thereof
KR100836571B1 (ko) 2006-12-29 2008-06-10 제일모직주식회사 반도체 소자 밀봉용 에폭시 수지 조성물 및 이를 이용한반도체 소자
TW200829637A (en) * 2007-01-03 2008-07-16 Double Bond Chemical Ind Co Ltd Liquid containing 2-(-hydroxyl-3-α-cumylphenyl-5-tertiery-octylphenyl) -2-hydrogen-benzotriazole
JP5419871B2 (ja) 2007-06-29 2014-02-19 バーゼル・ポリオレフィン・イタリア・ソチエタ・ア・レスポンサビリタ・リミタータ 非フェノール系安定剤を含む照射ポリオレフィン組成物
US20090047092A1 (en) * 2007-08-15 2009-02-19 Ppg Industries Ohio, Inc. Coated fasteners
US20100056680A1 (en) * 2008-08-29 2010-03-04 Sumitomo Chemical Company, Limited Amorphous compound and stabilizer for polymers containing the amorphous compound
US7847103B2 (en) * 2008-10-04 2010-12-07 Chia-Hu Chang Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole
EP2379639B1 (en) 2008-12-22 2014-07-09 Basf Se Use of a friction reducing agent
JP6317880B2 (ja) 2009-07-07 2018-04-25 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se カリウム・セシウム・タングステンブロンズ粒子
FR2955038B1 (fr) * 2010-01-11 2012-05-11 Commissariat Energie Atomique Nanoparticules anti-uv
US20120329885A1 (en) * 2011-06-23 2012-12-27 Chia-Hu Chang Ultraviolet light absorbing compounds based on benzyl substituted 2-(2- hydroxyphenyl) benzotriazoles
JP5879170B2 (ja) * 2012-03-26 2016-03-08 積水化学工業株式会社 熱硬化性フラン樹脂組成物及びこれを用いたフラン樹脂積層体
EP2912017A4 (en) 2012-10-23 2016-07-20 Basf Se ETHYLENE UNSATURATED OLIGOMERS CONTAINING POLYMER STABILIZING GROUPS
EP4039851A1 (en) * 2013-03-16 2022-08-10 PRC-Desoto International, Inc. Azole compounds as corrosion inhibitors
KR102294024B1 (ko) 2013-09-27 2021-08-27 바스프 에스이 건축 재료를 위한 폴리올레핀 조성물
US10294423B2 (en) 2013-11-22 2019-05-21 Polnox Corporation Macromolecular antioxidants based on dual type moiety per molecule: structures, methods of making and using the same
TWI685524B (zh) 2013-12-17 2020-02-21 美商畢克美國股份有限公司 預先脫層之層狀材料
AU2016294860B2 (en) 2015-07-20 2021-01-28 Basf Se Flame retardant polyolefin articles
CN105694099B (zh) * 2016-03-09 2017-03-15 天津利安隆新材料股份有限公司 一种用于聚合物的添加剂
EP3630693A1 (en) 2017-06-02 2020-04-08 DSM IP Assets B.V. Thermally resistant radiation curable coatings for optical fiber
JP7364239B2 (ja) 2017-11-03 2023-10-18 コベストロ (ネザーランズ) ビー.ブイ. 液体放射線硬化性sap組成物でコーティングされたファイバーを含む水遮断システム
US11952453B2 (en) 2018-06-01 2024-04-09 Covestro (Netherlands) B.V Radiation curable compositions for coating optical fiber and the coatings produced therefrom
PL3841166T3 (pl) 2018-08-22 2022-09-26 Basf Se Stabilizowana poliolefina formowana rotacyjnie
JP2022506003A (ja) 2018-08-30 2022-01-17 コベストロ (ネザーランズ) ビー.ヴィー. 光ファイバーをコーティングするための放射線硬化性組成物
CN113165971A (zh) 2018-12-03 2021-07-23 Ms控股有限公司 用于涂布光纤的填充式可辐射固化组合物以及由其产生的涂层
WO2020190833A1 (en) 2019-03-18 2020-09-24 Basf Se Uv curable compositions for dirt pick-up resistance
WO2020239564A1 (en) 2019-05-24 2020-12-03 Dsm Ip Assets B.V. Radiaton curable compositions for coating optical fiber with enhanced high-speed processability
JP2022533793A (ja) 2019-05-24 2022-07-25 コベストロ (ネザーランズ) ビー.ヴィー. 強化された高速加工性を備えた光ファイバーをコーティングするための放射線硬化性組成物
CA3137929A1 (en) 2019-05-31 2020-12-03 The Procter & Gamble Company Methods of making a deflection member
US20220282064A1 (en) 2019-07-30 2022-09-08 Basf Se Stabilizer composition
US11530163B2 (en) 2019-07-31 2022-12-20 Covestro (Netherlands) B.V. Radiation curable compositions with multi-functional long-armed oligomers for coating optical fibers
EP4126542A1 (en) 2020-04-03 2023-02-08 Covestro (Netherlands) B.V. Multi-layered optical devices
EP4127794A1 (en) 2020-04-03 2023-02-08 Covestro (Netherlands) B.V. Self-healing optical fibers and the compositions used to create the same
WO2023205224A2 (en) 2022-04-21 2023-10-26 Covestro (Netherlands) B.V. Low-volatility radiation curable compositions for coating optical fibers
WO2023209007A1 (en) 2022-04-29 2023-11-02 Ineos Styrolution Group Gmbh Acrylonitrile styrene acrylate (asa) copolymer composition having good uv resistance with reduced uv absorber content
WO2023209004A1 (en) 2022-04-29 2023-11-02 Ineos Styrolution Group Gmbh Acrylonitrile styrene acrylate copolymer composition with improved uv resistance

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH494060A (de) * 1961-06-16 1970-07-31 Geigy Ag J R Verwendung von 2-(2'-Hydrophenyl)-benztriazolverbindungen als Lichtschutzmittel
JPS4967378A (pt) * 1972-11-02 1974-06-29
JPS565279B2 (pt) * 1974-08-15 1981-02-04
US4355071A (en) * 1978-05-03 1982-10-19 E. I. Dupont De Nemours And Company Clear coat/color coat finish containing ultraviolet light stabilizer
EP0006564B1 (de) * 1978-06-26 1981-12-30 Ciba-Geigy Ag 2-(2-Hydroxy-3.5-disubstituiertes-phenyl)-2H-benzotriazol und damit stabilisierte Mischungen
US4278589A (en) * 1978-06-26 1981-07-14 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole and stabilized compositions
US4283327A (en) * 1979-01-25 1981-08-11 Ciba-Geigy Corporation 2-(2-Hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole stabilized compositions
US4315848A (en) * 1979-05-10 1982-02-16 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions
US4347180A (en) * 1979-05-16 1982-08-31 Ciba-Geigy Corporation High caustic coupling process for preparing substituted 2-nitro-2'-hydroxyazobenzenes
EP0036117B1 (de) * 1980-03-14 1986-02-05 Spezial-Papiermaschinenfabrik August Alfred Krupp GmbH & Co Druckempfindliches Aufzeichnungsmaterial
US4559293A (en) * 1983-04-08 1985-12-17 Kimoto & Co., Ltd. Photosensitive recording material developable with aqueous neutral salt solution
DE3328771A1 (de) * 1983-08-10 1985-02-28 Basf Ag, 6700 Ludwigshafen Verfahren zur kontinuierlichen herstellung von sauerstoff enthaltenden verbindungen
US4675352A (en) * 1985-01-22 1987-06-23 Ciba-Geigy Corporation Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures
US4587346A (en) * 1985-01-22 1986-05-06 Ciba-Geigy Corporation Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures
US4760148A (en) * 1985-09-03 1988-07-26 Ciba-Geigy Corporation 5-aralkyl substituted 2H-benzotriazoles and stabilized compositions
JPS62262777A (ja) * 1986-05-09 1987-11-14 Kansai Paint Co Ltd 防食塗膜形成法
US5096977A (en) * 1987-08-12 1992-03-17 Atochem North America, Inc. Process for preparing polymer bound UV stabilizers
US4973701A (en) * 1988-04-11 1990-11-27 Ciba-Geigy Corporation Liquid substituted 2H-benzotriazole mixtures, stabilized compositions and processes for preparing the liquid mixtures
US5095062A (en) * 1988-04-11 1992-03-10 Ciba-Geigy Corporation Stabilized compositions containing liquid substituted 2H-benzotriazole mixtures
US5240975A (en) * 1988-04-11 1993-08-31 Ciba-Geigy Corporation Liquid substituted 2H-benzotriazole mixtures, stabilized compositions
US5199979A (en) * 1988-11-25 1993-04-06 Ppg Industries, Inc. UV resistant, abrasion resistant coatings
US5045396A (en) * 1988-11-23 1991-09-03 Ppg Industries, Inc. UV resistant primer
EP0373573B1 (de) * 1988-12-14 1994-06-22 Ciba-Geigy Ag Aufzeichnungsmaterial für Tintenstrahldruck
US5098477A (en) * 1988-12-14 1992-03-24 Ciba-Geigy Corporation Inks, particularly for ink printing
EP0520938B1 (de) * 1991-06-03 1997-09-24 Ciba SC Holding AG UV-Absorber enthaltendes photographisches Material
US5354794A (en) * 1993-02-03 1994-10-11 Ciba-Geigy Corporation Electro coat/base coat/clear coat finishes stabilized with S-triazine UV absorbers
DE4404081A1 (de) * 1994-02-09 1995-08-10 Basf Ag UV-stabilisierte Polyoxymethylenformmassen
EP0698637A3 (en) * 1994-08-22 1996-07-10 Ciba Geigy Ag Polyurethanes stabilized with selected UV absorbers of 5-substituted benzotriazole
US5574166A (en) * 1995-04-19 1996-11-12 Ciba-Geigy Corporation Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole

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ES2130930A1 (es) 1999-07-01
US5607987A (en) 1997-03-04
EP0738718A1 (en) 1996-10-23
SE509606C2 (sv) 1999-02-15
JP3309153B2 (ja) 2002-07-29
KR100378233B1 (ko) 2003-06-12
AT405936B (de) 1999-12-27
CA2174412A1 (en) 1996-10-20
CN1140168A (zh) 1997-01-15
DE19615000A1 (de) 1996-10-24
KR100426626B1 (ko) 2004-07-12
JPH08290112A (ja) 1996-11-05
CA2174411C (en) 2007-02-20
CN1059899C (zh) 2000-12-27
ATA70596A (de) 1999-05-15
AU706957B2 (en) 1999-07-01
AU5078496A (en) 1996-10-31
SE9601345D0 (sv) 1996-04-10
ITMI960751A0 (pt) 1996-04-18
US5563242A (en) 1996-10-08
AU707202B2 (en) 1999-07-08
SE9601345L (sv) 1996-10-20
AU5073196A (en) 1996-10-31
NL1002904A1 (nl) 1996-10-22
FR2733239B1 (fr) 2004-10-01
IT1283615B1 (it) 1998-04-22
ES2130930B1 (es) 2000-03-01
FR2733239A1 (fr) 1996-10-25
CN1066181C (zh) 2001-05-23
GB2299957B (en) 1997-11-12
NL1002904C2 (nl) 1998-04-10
US5554760A (en) 1996-09-10
JPH08291151A (ja) 1996-11-05
KR960037748A (ko) 1996-11-19
GB2299957A (en) 1996-10-23
US5574166A (en) 1996-11-12
BE1010550A3 (fr) 1998-10-06
ITMI960751A1 (it) 1997-10-18
BR9601992A (pt) 1998-10-06
TW419497B (en) 2001-01-21
CA2174411A1 (en) 1996-10-20
KR960037664A (ko) 1996-11-19
GB9607427D0 (en) 1996-06-12
CN1140187A (zh) 1997-01-15

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