ATA70596A - Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sind - Google Patents
Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sindInfo
- Publication number
- ATA70596A ATA70596A AT0070596A AT70596A ATA70596A AT A70596 A ATA70596 A AT A70596A AT 0070596 A AT0070596 A AT 0070596A AT 70596 A AT70596 A AT 70596A AT A70596 A ATA70596 A AT A70596A
- Authority
- AT
- Austria
- Prior art keywords
- benzotriazole
- absorbers
- coating materials
- materials stabilized
- stabilized
- Prior art date
Links
- 239000006096 absorbing agent Substances 0.000 title 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 title 1
- 239000012964 benzotriazole Substances 0.000 title 1
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 239000000463 material Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
- B41M5/5227—Macromolecular coatings characterised by organic non-macromolecular additives, e.g. UV-absorbers, plasticisers, surfactants
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G03C1/8155—Organic compounds therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Ink Jet (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/424,843 US5574166A (en) | 1995-04-19 | 1995-04-19 | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ATA70596A true ATA70596A (de) | 1999-05-15 |
| AT405936B AT405936B (de) | 1999-12-27 |
Family
ID=23684097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT0070596A AT405936B (de) | 1995-04-19 | 1996-04-18 | Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sind |
Country Status (18)
| Country | Link |
|---|---|
| US (4) | US5574166A (de) |
| EP (1) | EP0738718A1 (de) |
| JP (2) | JP3309153B2 (de) |
| KR (2) | KR100426626B1 (de) |
| CN (2) | CN1059899C (de) |
| AT (1) | AT405936B (de) |
| AU (2) | AU707202B2 (de) |
| BE (1) | BE1010550A3 (de) |
| BR (2) | BR9601992A (de) |
| CA (2) | CA2174411C (de) |
| DE (1) | DE19615000A1 (de) |
| ES (1) | ES2130930B1 (de) |
| FR (1) | FR2733239B1 (de) |
| GB (1) | GB2299957B (de) |
| IT (1) | IT1283615B1 (de) |
| NL (1) | NL1002904C2 (de) |
| SE (1) | SE509606C2 (de) |
| TW (1) | TW419497B (de) |
Families Citing this family (90)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5574166A (en) * | 1995-04-19 | 1996-11-12 | Ciba-Geigy Corporation | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
| US6166218A (en) | 1996-11-07 | 2000-12-26 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
| DE19748658B4 (de) * | 1996-11-07 | 2015-08-20 | Ciba Holding Inc. | Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit |
| US5977219A (en) * | 1997-10-30 | 1999-11-02 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
| KR100540154B1 (ko) | 1997-04-15 | 2005-12-29 | 시바 스폐셜티 케미칼스 홀딩 인코포레이티드 | 저-분진 안정화제의 제조방법 |
| DE19723779A1 (de) * | 1997-06-06 | 1998-12-10 | Agfa Gevaert Ag | Inkjet-System |
| WO2000049462A1 (fr) * | 1999-02-19 | 2000-08-24 | Asahi Kasei Kogyo Kabushiki Kaisha | Composition de resine photosensible stable |
| US6383716B1 (en) | 1997-08-22 | 2002-05-07 | Asahi Kasei Kabushiki Kaisha | Stable photosensitive resin composition |
| JP3448851B2 (ja) * | 1997-11-28 | 2003-09-22 | タキロン株式会社 | 添加剤含有樹脂成形品及びその製造方法 |
| US5948150A (en) * | 1998-05-05 | 1999-09-07 | Hewlett-Packard Company | Composition to improve colorfastness of a printed image |
| AU5856099A (en) * | 1998-09-09 | 2000-03-27 | Ciba Specialty Chemicals Holding Inc. | Photostable chromophore system |
| EP1046670B1 (de) * | 1999-04-23 | 2003-07-09 | Nippon Mitsubishi Oil Corporation | UV-absorbierende Harzzusammensetzung |
| US6245915B1 (en) | 1999-05-03 | 2001-06-12 | Ciba Specialty Chemicals Corporation | Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety |
| EP1175467B1 (de) * | 1999-05-03 | 2006-06-14 | Ciba SC Holding AG | Stabilisierte klebzusammensetzung mit hochlöslichen, rotverschobenen, photostabilen benzotriazolen uv-absorbente und daraus gewonnene laminerte gegenstände |
| US6187845B1 (en) * | 1999-05-03 | 2001-02-13 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
| US6268415B1 (en) | 1999-05-03 | 2001-07-31 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
| EP1068866A3 (de) * | 1999-07-12 | 2004-03-17 | Ciba SC Holding AG | Verwendung von Mischungen aus Mikropigmenten zur Bräunungsverhinderung und Aufhellung der Haut und Haare |
| DE60126476T8 (de) * | 2000-02-01 | 2008-03-27 | Ciba Specialty Chemicals Holding Inc. | Verfahren zum inhaltschutz mit dauerhaften uv-absorber |
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| US6392056B1 (en) * | 2000-08-03 | 2002-05-21 | Ciba Specialty Chemical Corporation | 2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith |
| US6649770B1 (en) | 2000-11-27 | 2003-11-18 | Ciba Specialty Chemicals Corporation | Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof |
| US6387992B1 (en) | 2000-11-27 | 2002-05-14 | Ciba Specialty Chemicals Corporation | Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith |
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| US20250251531A1 (en) | 2022-04-21 | 2025-08-07 | Covestro (Netherlands) B.V. | Low-volatility radiation curable compositions for coating optical fibers |
| CN119173576A (zh) | 2022-04-29 | 2024-12-20 | 英力士苯领集团股份公司 | 具有低uv吸收剂含量且良好抗uv性能的丙烯腈-苯乙烯-丙烯酸酯(asa)共聚物组合物 |
| KR20250004823A (ko) | 2022-04-29 | 2025-01-08 | 이네오스 스티롤루션 그룹 게엠베하 | Uv 저항성이 개선된 아크릴로니트릴 스티렌 아크릴레이트 코폴리머 조성물 |
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| NL124488C (de) | 1961-06-16 | |||
| CH410968A (de) * | 1961-06-16 | 1966-04-15 | Geigy Ag J R | Verfahren zur Herstellung von substituierten 2-(2'-Hydroxyphenyl)-benztriazolverbindungen |
| JPS4967378A (de) * | 1972-11-02 | 1974-06-29 | ||
| JPS565279B2 (de) * | 1974-08-15 | 1981-02-04 | ||
| US4355071A (en) * | 1978-05-03 | 1982-10-19 | E. I. Dupont De Nemours And Company | Clear coat/color coat finish containing ultraviolet light stabilizer |
| US4278589A (en) * | 1978-06-26 | 1981-07-14 | Ciba-Geigy Corporation | 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole and stabilized compositions |
| EP0006564B1 (de) * | 1978-06-26 | 1981-12-30 | Ciba-Geigy Ag | 2-(2-Hydroxy-3.5-disubstituiertes-phenyl)-2H-benzotriazol und damit stabilisierte Mischungen |
| US4283327A (en) * | 1979-01-25 | 1981-08-11 | Ciba-Geigy Corporation | 2-(2-Hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole stabilized compositions |
| US4315848A (en) * | 1979-05-10 | 1982-02-16 | Ciba-Geigy Corporation | 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions |
| US4347180A (en) * | 1979-05-16 | 1982-08-31 | Ciba-Geigy Corporation | High caustic coupling process for preparing substituted 2-nitro-2'-hydroxyazobenzenes |
| EP0036117B1 (de) * | 1980-03-14 | 1986-02-05 | Spezial-Papiermaschinenfabrik August Alfred Krupp GmbH & Co | Druckempfindliches Aufzeichnungsmaterial |
| US4559293A (en) * | 1983-04-08 | 1985-12-17 | Kimoto & Co., Ltd. | Photosensitive recording material developable with aqueous neutral salt solution |
| DE3328771A1 (de) * | 1983-08-10 | 1985-02-28 | Basf Ag, 6700 Ludwigshafen | Verfahren zur kontinuierlichen herstellung von sauerstoff enthaltenden verbindungen |
| US4587346A (en) * | 1985-01-22 | 1986-05-06 | Ciba-Geigy Corporation | Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures |
| US4675352A (en) * | 1985-01-22 | 1987-06-23 | Ciba-Geigy Corporation | Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures |
| US4760148A (en) * | 1985-09-03 | 1988-07-26 | Ciba-Geigy Corporation | 5-aralkyl substituted 2H-benzotriazoles and stabilized compositions |
| JPS62262777A (ja) * | 1986-05-09 | 1987-11-14 | Kansai Paint Co Ltd | 防食塗膜形成法 |
| US5096977A (en) * | 1987-08-12 | 1992-03-17 | Atochem North America, Inc. | Process for preparing polymer bound UV stabilizers |
| US4973701A (en) * | 1988-04-11 | 1990-11-27 | Ciba-Geigy Corporation | Liquid substituted 2H-benzotriazole mixtures, stabilized compositions and processes for preparing the liquid mixtures |
| US5095062A (en) * | 1988-04-11 | 1992-03-10 | Ciba-Geigy Corporation | Stabilized compositions containing liquid substituted 2H-benzotriazole mixtures |
| US5240975A (en) * | 1988-04-11 | 1993-08-31 | Ciba-Geigy Corporation | Liquid substituted 2H-benzotriazole mixtures, stabilized compositions |
| US5045396A (en) * | 1988-11-23 | 1991-09-03 | Ppg Industries, Inc. | UV resistant primer |
| US5199979A (en) * | 1988-11-25 | 1993-04-06 | Ppg Industries, Inc. | UV resistant, abrasion resistant coatings |
| DE58907949D1 (de) * | 1988-12-14 | 1994-07-28 | Ciba Geigy Ag | Aufzeichnungsmaterial für Tintenstrahldruck. |
| US5098477A (en) * | 1988-12-14 | 1992-03-24 | Ciba-Geigy Corporation | Inks, particularly for ink printing |
| EP0520938B1 (de) * | 1991-06-03 | 1997-09-24 | Ciba SC Holding AG | UV-Absorber enthaltendes photographisches Material |
| US5354794A (en) * | 1993-02-03 | 1994-10-11 | Ciba-Geigy Corporation | Electro coat/base coat/clear coat finishes stabilized with S-triazine UV absorbers |
| DE4404081A1 (de) * | 1994-02-09 | 1995-08-10 | Basf Ag | UV-stabilisierte Polyoxymethylenformmassen |
| EP0698637A3 (de) * | 1994-08-22 | 1996-07-10 | Ciba Geigy Ag | Mit ausgewählten 5-substituierten Benzotriazol-UV-Absorbern stabilisierte Polyurethane |
| US5574166A (en) * | 1995-04-19 | 1996-11-12 | Ciba-Geigy Corporation | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
-
1995
- 1995-04-19 US US08/424,843 patent/US5574166A/en not_active Expired - Lifetime
- 1995-06-06 US US08/466,850 patent/US5563242A/en not_active Expired - Lifetime
- 1995-06-06 US US08/466,851 patent/US5554760A/en not_active Expired - Lifetime
-
1996
- 1996-04-05 US US08/628,433 patent/US5607987A/en not_active Expired - Lifetime
- 1996-04-10 EP EP96810220A patent/EP0738718A1/de not_active Withdrawn
- 1996-04-10 GB GB9607427A patent/GB2299957B/en not_active Expired - Lifetime
- 1996-04-10 SE SE9601345A patent/SE509606C2/sv not_active IP Right Cessation
- 1996-04-16 DE DE19615000A patent/DE19615000A1/de not_active Ceased
- 1996-04-17 CA CA002174411A patent/CA2174411C/en not_active Expired - Fee Related
- 1996-04-17 KR KR1019960012131A patent/KR100426626B1/ko not_active Expired - Lifetime
- 1996-04-17 BE BE9600333A patent/BE1010550A3/fr not_active IP Right Cessation
- 1996-04-17 CA CA002174412A patent/CA2174412A1/en not_active Abandoned
- 1996-04-17 AU AU50731/96A patent/AU707202B2/en not_active Ceased
- 1996-04-18 AT AT0070596A patent/AT405936B/de not_active IP Right Cessation
- 1996-04-18 CN CN96105141A patent/CN1059899C/zh not_active Expired - Lifetime
- 1996-04-18 AU AU50784/96A patent/AU706957B2/en not_active Ceased
- 1996-04-18 ES ES009600874A patent/ES2130930B1/es not_active Expired - Fee Related
- 1996-04-18 KR KR1019960012170A patent/KR100378233B1/ko not_active Expired - Lifetime
- 1996-04-18 IT IT96MI000751A patent/IT1283615B1/it active IP Right Grant
- 1996-04-18 FR FR9604847A patent/FR2733239B1/fr not_active Expired - Lifetime
- 1996-04-18 CN CN96105137A patent/CN1066181C/zh not_active Expired - Lifetime
- 1996-04-19 NL NL1002904A patent/NL1002904C2/nl not_active IP Right Cessation
- 1996-04-19 BR BR9601992A patent/BR9601992A/pt not_active IP Right Cessation
- 1996-04-19 JP JP12246696A patent/JP3309153B2/ja not_active Expired - Lifetime
- 1996-04-19 BR BR9601991A patent/BR9601991A/pt not_active IP Right Cessation
- 1996-04-19 JP JP8122465A patent/JPH08291151A/ja active Pending
- 1996-05-14 TW TW085105661A patent/TW419497B/zh not_active IP Right Cessation
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