ATA70596A - Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sind - Google Patents

Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sind

Info

Publication number
ATA70596A
ATA70596A AT0070596A AT70596A ATA70596A AT A70596 A ATA70596 A AT A70596A AT 0070596 A AT0070596 A AT 0070596A AT 70596 A AT70596 A AT 70596A AT A70596 A ATA70596 A AT A70596A
Authority
AT
Austria
Prior art keywords
benzotriazole
absorbers
coating materials
materials stabilized
stabilized
Prior art date
Application number
AT0070596A
Other languages
English (en)
Other versions
AT405936B (de
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of ATA70596A publication Critical patent/ATA70596A/de
Application granted granted Critical
Publication of AT405936B publication Critical patent/AT405936B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
    • B41M5/52—Macromolecular coatings
    • B41M5/5227—Macromolecular coatings characterised by organic non-macromolecular additives, e.g. UV-absorbers, plasticisers, surfactants
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155—Organic compounds therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Ink Jet (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
AT0070596A 1995-04-19 1996-04-18 Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sind AT405936B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/424,843 US5574166A (en) 1995-04-19 1995-04-19 Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole

Publications (2)

Publication Number Publication Date
ATA70596A true ATA70596A (de) 1999-05-15
AT405936B AT405936B (de) 1999-12-27

Family

ID=23684097

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0070596A AT405936B (de) 1995-04-19 1996-04-18 Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sind

Country Status (18)

Country Link
US (4) US5574166A (de)
EP (1) EP0738718A1 (de)
JP (2) JP3309153B2 (de)
KR (2) KR100426626B1 (de)
CN (2) CN1066181C (de)
AT (1) AT405936B (de)
AU (2) AU707202B2 (de)
BE (1) BE1010550A3 (de)
BR (2) BR9601991A (de)
CA (2) CA2174411C (de)
DE (1) DE19615000A1 (de)
ES (1) ES2130930B1 (de)
FR (1) FR2733239B1 (de)
GB (1) GB2299957B (de)
IT (1) IT1283615B1 (de)
NL (1) NL1002904C2 (de)
SE (1) SE509606C2 (de)
TW (1) TW419497B (de)

Families Citing this family (91)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5574166A (en) * 1995-04-19 1996-11-12 Ciba-Geigy Corporation Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole
US6166218A (en) 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
FR2755444B1 (fr) * 1996-11-07 2004-10-08 Ciba Sc Holding Ag Composition de revetement comprenant un compose stabilisant ledit compose et son utilisation
US5977219A (en) * 1997-10-30 1999-11-02 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
EP0975421B1 (de) 1997-04-15 2014-06-18 Basf Se Verfahren zur herstellung von wenig staubenden stabilisatoren
DE19723779A1 (de) * 1997-06-06 1998-12-10 Agfa Gevaert Ag Inkjet-System
US6383716B1 (en) 1997-08-22 2002-05-07 Asahi Kasei Kabushiki Kaisha Stable photosensitive resin composition
WO2000049462A1 (fr) * 1999-02-19 2000-08-24 Asahi Kasei Kogyo Kabushiki Kaisha Composition de resine photosensible stable
JP3448851B2 (ja) * 1997-11-28 2003-09-22 タキロン株式会社 添加剤含有樹脂成形品及びその製造方法
US5948150A (en) * 1998-05-05 1999-09-07 Hewlett-Packard Company Composition to improve colorfastness of a printed image
AU5856099A (en) * 1998-09-09 2000-03-27 Ciba Specialty Chemicals Holding Inc. Photostable chromophore system
EP1046670B1 (de) * 1999-04-23 2003-07-09 Nippon Mitsubishi Oil Corporation UV-absorbierende Harzzusammensetzung
US6187845B1 (en) * 1999-05-03 2001-02-13 Ciba Specialty Chemicals Corporation Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom
US6268415B1 (en) 1999-05-03 2001-07-31 Ciba Specialty Chemicals Corporation Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom
US6245915B1 (en) 1999-05-03 2001-06-12 Ciba Specialty Chemicals Corporation Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety
DE60028755T2 (de) * 1999-05-03 2007-06-14 Ciba Speciality Chemicals Holding Inc. Stabilisierte klebzusammensetzung mit hochlöslichen, rotverschobenen, photostabilen benzotriazolen uv-absorbente und daraus gewonnene laminerte gegenstände
AU774383B2 (en) * 1999-07-12 2004-06-24 Ciba Specialty Chemicals Holding Inc. Use of mixtures of micropigments for preventing tanning and for lightening skin and hair
CA2396221C (en) * 2000-02-01 2010-03-23 Ciba Specialty Chemicals Holding Inc. Method of content protection with durable uv absorbers
US6392056B1 (en) 2000-08-03 2002-05-21 Ciba Specialty Chemical Corporation 2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith
US6451887B1 (en) * 2000-08-03 2002-09-17 Ciba Specialty Chemicals Corporation Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith
US6387992B1 (en) 2000-11-27 2002-05-14 Ciba Specialty Chemicals Corporation Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith
US6649770B1 (en) 2000-11-27 2003-11-18 Ciba Specialty Chemicals Corporation Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof
NZ527246A (en) * 2001-01-16 2004-12-24 Ciba Sc Holding Ag Water soluble hindered amine based ink-jet ink and recording material
JP4993421B2 (ja) * 2001-06-07 2012-08-08 株式会社Ａｄｅｋａ 合成樹脂組成物
EP1476503A1 (de) * 2002-02-19 2004-11-17 Ciba SC Holding AG Hydroxyphenylbenzotriazol uv-absorber enthaltende behälter oder filme zum schutz des inhalts vor den schädlichen wirkungen von uv-strahlung
US20050209252A1 (en) * 2002-03-29 2005-09-22 Che-Ming Teng Cancer treatment
EP2265092B1 (de) 2002-06-06 2018-03-14 UDC Ireland Limited Elektrolumineszierende Vorrichtung
DE10228186A1 (de) * 2002-06-24 2004-01-22 Merck Patent Gmbh UV-stabilisierte Partikel
KR100950626B1 (ko) * 2002-06-24 2010-04-01 메르크 파텐트 게엠베하 Ｕｖ-안정화 입자
DE10243438A1 (de) * 2002-09-18 2004-03-25 Merck Patent Gmbh Oberflächenmodifizierte Effektpigmente
JP2006510773A (ja) * 2002-12-20 2006-03-30 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド インクジェット及び記録材料
EP1587887A1 (de) * 2003-01-29 2005-10-26 Ciba SC Holding AG Tintenstrahltinte undaufnahmematerial
KR101114272B1 (ko) 2003-02-26 2012-03-28 시바 홀딩 인크 수 혼화성의 입체적으로 속박된 하이드록시 치환된 알콕시아민
US7153588B2 (en) * 2003-05-30 2006-12-26 3M Innovative Properties Company UV resistant naphthalate polyester articles
US6974850B2 (en) * 2003-05-30 2005-12-13 3M Innovative Properties Company Outdoor weatherable photopolymerizable coatings
JP4018674B2 (ja) * 2003-08-04 2007-12-05 キヤノン株式会社 インク用被記録媒体の製造方法
WO2005032835A1 (en) 2003-10-03 2005-04-14 Fuji Photo Film B.V. Recording medium
WO2005032833A1 (en) 2003-10-03 2005-04-14 Fuji Photo Film B.V. Recording medium
DE10358092A1 (de) * 2003-12-10 2005-07-14 Merck Patent Gmbh Oberflächenmodifizierte Partikel
US20060083940A1 (en) * 2004-04-30 2006-04-20 Solomon Bekele Ultraviolet light absorbing composition
US20060008588A1 (en) * 2004-07-12 2006-01-12 Marc Chilla Process for the production of multi-layer coatings
US7595011B2 (en) 2004-07-12 2009-09-29 Ciba Specialty Chemicals Corporation Stabilized electrochromic media
US7968151B2 (en) * 2004-07-12 2011-06-28 E. I. Du Pont De Nemours And Company Process for the production of multi-layer coatings
US20060068116A1 (en) * 2004-09-27 2006-03-30 Marc Chilla Process for the production of multi-layer coatings in light metallic color shades
US8865262B2 (en) * 2004-09-27 2014-10-21 Axalta Coating Systems Ip Co., Llc Process for producing multi-layer coatings in light metallic color shades
WO2006034980A1 (en) * 2004-09-30 2006-04-06 Ciba Specialty Chemicals Holding Inc. Method for replenishing or introducing light stabilizers
US20060122293A1 (en) * 2004-12-03 2006-06-08 Rick Wilk Ultraviolet light absorber stabilizer combination
US20060134334A1 (en) * 2004-12-22 2006-06-22 Marc Chilla Process for the production of primer surfacer-free multi-layer coatings
US20060177639A1 (en) * 2005-02-04 2006-08-10 Elzen Kerstin T Process for the production of primer surfacer-free multi-layer coatings
US7910211B2 (en) * 2005-06-20 2011-03-22 E.I. Du Pont De Nemours And Company Process for the production of multi-layer coatings
US20070071901A1 (en) * 2005-09-29 2007-03-29 Giannoula Avgenaki Process for the production of multi-layer coatings
JP4821597B2 (ja) * 2006-01-06 2011-11-24 住友化学株式会社 多層光拡散板
TWI434073B (zh) * 2006-01-06 2014-04-11 Sumitomo Chemical Co 多層光擴散板
US20070238814A1 (en) * 2006-04-10 2007-10-11 Basf Corporation Method of making coating compositions
US20070260012A1 (en) * 2006-05-05 2007-11-08 Algrim Danald J HAPs free coating composition and film thereof
KR100836571B1 (ko) 2006-12-29 2008-06-10 제일모직주식회사 반도체 소자 밀봉용 에폭시 수지 조성물　및 이를 이용한반도체 소자
TW200829637A (en) * 2007-01-03 2008-07-16 Double Bond Chemical Ind Co Ltd Liquid containing 2-(-hydroxyl-3-α-cumylphenyl-5-tertiery-octylphenyl) -2-hydrogen-benzotriazole
WO2009003930A1 (en) 2007-06-29 2009-01-08 Basell Poliolefine Italia S.R.L. An irradiated polyolefin composition comprising a non - phenolic stabilizer
US20090047092A1 (en) * 2007-08-15 2009-02-19 Ppg Industries Ohio, Inc. Coated fasteners
US20100056680A1 (en) * 2008-08-29 2010-03-04 Sumitomo Chemical Company, Limited Amorphous compound and stabilizer for polymers containing the amorphous compound
US7847103B2 (en) * 2008-10-04 2010-12-07 Chia-Hu Chang Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole
CN102264825B (zh) 2008-12-22 2014-07-02 巴斯夫欧洲公司 改善耐刮性的方法及相关产品和用途
EP2451746B1 (de) 2009-07-07 2019-02-27 Basf Se Zusammensetzung enthaltend kalium-cesium-wolfram-bronze-partikel und verwendung dieser partikel
FR2955038B1 (fr) * 2010-01-11 2012-05-11 Commissariat Energie Atomique Nanoparticules anti-uv
US20120329885A1 (en) * 2011-06-23 2012-12-27 Chia-Hu Chang Ultraviolet light absorbing compounds based on benzyl substituted 2-(2- hydroxyphenyl) benzotriazoles
JP5879170B2 (ja) * 2012-03-26 2016-03-08 積水化学工業株式会社 熱硬化性フラン樹脂組成物及びこれを用いたフラン樹脂積層体
WO2014066358A1 (en) 2012-10-23 2014-05-01 Basf Se Ethylenically unsaturated oligomers containing polymer stabilizer groups
KR20180056817A (ko) * 2013-03-16 2018-05-29 피알시-데소토 인터내쇼날, 인코포레이티드 부식 억제제로서의 아졸 화합물
KR102294024B1 (ko) 2013-09-27 2021-08-27 바스프 에스이 건축 재료를 위한 폴리올레핀 조성물
WO2015077635A2 (en) 2013-11-22 2015-05-28 Polnox Corporation Macromolecular antioxidants based on dual type moiety per molecule: structures methods of making and using the same
TWI685524B (zh) 2013-12-17 2020-02-21 美商畢克美國股份有限公司 預先脫層之層狀材料
AU2016294860B2 (en) 2015-07-20 2021-01-28 Basf Se Flame retardant polyolefin articles
CN105694099B (zh) * 2016-03-09 2017-03-15 天津利安隆新材料股份有限公司 一种用于聚合物的添加剂
WO2018220605A1 (en) 2017-06-02 2018-12-06 Dsm Ip Assets Bv Thermally resistant radiation curable coatings for optical fiber
US11319246B2 (en) 2017-11-03 2022-05-03 Covestro (Netherlands) B.V. Water-blocking systems including fibers coated with liquid radiation curable SAP compositions
BR112020024462A2 (pt) 2018-06-01 2021-03-16 Dsm Ip Assets B.V. Composições curáveis por radiação para revestir fibra óptica através de oligômeros alternativos e os revestimentos produzidos a partir das mesmas
CN112771108B (zh) 2018-08-22 2023-05-05 巴斯夫欧洲公司 稳定的滚塑聚烯烃
JP7504865B2 (ja) 2018-08-30 2024-06-24 コベストロ （ネザーランズ） ビー．ヴィー． 光ファイバーをコーティングするための放射線硬化性組成物
JP2022509797A (ja) 2018-12-03 2022-01-24 コベストロ （ネザーランズ） ビー．ヴィー． 光ファイバーをコーティングするための充填放射線硬化性組成物およびそれから製造されるコーティング
WO2020190833A1 (en) 2019-03-18 2020-09-24 Basf Se Uv curable compositions for dirt pick-up resistance
WO2020239563A1 (en) 2019-05-24 2020-12-03 Dsm Ip Assets B.V. Radiation curable compositions for coating optical fiber with enhanced high-speed processability
CN114144386B (zh) 2019-05-24 2023-11-17 科思创(荷兰)有限公司 具有增强的高速可加工性的用于涂覆光纤的辐射可固化组合物
EP3976877B1 (de) 2019-05-31 2023-07-05 The Procter & Gamble Company Verfahren zur herstellung eines ablenkelementes
US20220282064A1 (en) 2019-07-30 2022-09-08 Basf Se Stabilizer composition
CN114207063B (zh) 2019-07-31 2023-07-25 科思创(荷兰)有限公司 具有多功能长臂低聚物的涂覆光纤用辐射固化组合物
WO2021202623A1 (en) 2020-04-03 2021-10-07 Dsm Ip Assets B.V. Self-healing optical fibers and the compositions used to create the same
KR20220164527A (ko) 2020-04-03 2022-12-13 코베스트로 (네덜란드) 비.브이. 다층 광학 디바이스
JP2025521371A (ja) 2022-04-21 2025-07-09 コベストロ （ネザーランズ） ビー．ヴィー． 光ファイバを被覆するための低揮発性放射線硬化性組成物
WO2023209007A1 (en) 2022-04-29 2023-11-02 Ineos Styrolution Group Gmbh Acrylonitrile styrene acrylate (asa) copolymer composition having good uv resistance with reduced uv absorber content
US20250346751A1 (en) 2022-04-29 2025-11-13 Ineos Styrolution Group Gmbh Acrylonitrile styrene acrylate copolymer composition with improved uv resistance
CN120966325B (zh) * 2025-09-25 2026-02-27 佛山市顺德区天地彩粉末涂料实业有限公司 一种耐候耐腐蚀复合粉末涂料及其制备方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE630550A (de) 1961-06-16
CH410968A (de) * 1961-06-16 1966-04-15 Geigy Ag J R Verfahren zur Herstellung von substituierten 2-(2'-Hydroxyphenyl)-benztriazolverbindungen
JPS4967378A (de) * 1972-11-02 1974-06-29
JPS565279B2 (de) * 1974-08-15 1981-02-04
US4355071A (en) * 1978-05-03 1982-10-19 E. I. Dupont De Nemours And Company Clear coat/color coat finish containing ultraviolet light stabilizer
EP0006564B1 (de) * 1978-06-26 1981-12-30 Ciba-Geigy Ag 2-(2-Hydroxy-3.5-disubstituiertes-phenyl)-2H-benzotriazol und damit stabilisierte Mischungen
US4278589A (en) * 1978-06-26 1981-07-14 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole and stabilized compositions
US4283327A (en) * 1979-01-25 1981-08-11 Ciba-Geigy Corporation 2-(2-Hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole stabilized compositions
US4315848A (en) * 1979-05-10 1982-02-16 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions
US4347180A (en) * 1979-05-16 1982-08-31 Ciba-Geigy Corporation High caustic coupling process for preparing substituted 2-nitro-2'-hydroxyazobenzenes
EP0036117B1 (de) * 1980-03-14 1986-02-05 Spezial-Papiermaschinenfabrik August Alfred Krupp GmbH & Co Druckempfindliches Aufzeichnungsmaterial
US4559293A (en) * 1983-04-08 1985-12-17 Kimoto & Co., Ltd. Photosensitive recording material developable with aqueous neutral salt solution
DE3328771A1 (de) * 1983-08-10 1985-02-28 Basf Ag, 6700 Ludwigshafen Verfahren zur kontinuierlichen herstellung von sauerstoff enthaltenden verbindungen
US4675352A (en) * 1985-01-22 1987-06-23 Ciba-Geigy Corporation Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures
US4587346A (en) * 1985-01-22 1986-05-06 Ciba-Geigy Corporation Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures
US4760148A (en) * 1985-09-03 1988-07-26 Ciba-Geigy Corporation 5-aralkyl substituted 2H-benzotriazoles and stabilized compositions
JPS62262777A (ja) * 1986-05-09 1987-11-14 Kansai Paint Co Ltd 防食塗膜形成法
US5096977A (en) * 1987-08-12 1992-03-17 Atochem North America, Inc. Process for preparing polymer bound UV stabilizers
US5240975A (en) * 1988-04-11 1993-08-31 Ciba-Geigy Corporation Liquid substituted 2H-benzotriazole mixtures, stabilized compositions
US5095062A (en) * 1988-04-11 1992-03-10 Ciba-Geigy Corporation Stabilized compositions containing liquid substituted 2H-benzotriazole mixtures
US4973701A (en) * 1988-04-11 1990-11-27 Ciba-Geigy Corporation Liquid substituted 2H-benzotriazole mixtures, stabilized compositions and processes for preparing the liquid mixtures
US5045396A (en) * 1988-11-23 1991-09-03 Ppg Industries, Inc. UV resistant primer
US5199979A (en) * 1988-11-25 1993-04-06 Ppg Industries, Inc. UV resistant, abrasion resistant coatings
US5098477A (en) * 1988-12-14 1992-03-24 Ciba-Geigy Corporation Inks, particularly for ink printing
DE58907949D1 (de) * 1988-12-14 1994-07-28 Ciba Geigy Ag Aufzeichnungsmaterial für Tintenstrahldruck.
EP0520938B1 (de) * 1991-06-03 1997-09-24 Ciba SC Holding AG UV-Absorber enthaltendes photographisches Material
US5354794A (en) * 1993-02-03 1994-10-11 Ciba-Geigy Corporation Electro coat/base coat/clear coat finishes stabilized with S-triazine UV absorbers
DE4404081A1 (de) * 1994-02-09 1995-08-10 Basf Ag UV-stabilisierte Polyoxymethylenformmassen
EP0698637A3 (de) * 1994-08-22 1996-07-10 Ciba Geigy Ag Mit ausgewählten 5-substituierten Benzotriazol-UV-Absorbern stabilisierte Polyurethane
US5574166A (en) * 1995-04-19 1996-11-12 Ciba-Geigy Corporation Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole

Also Published As

Publication number Publication date
JPH08290112A (ja) 1996-11-05
CN1066181C (zh) 2001-05-23
CA2174412A1 (en) 1996-10-20
US5607987A (en) 1997-03-04
NL1002904A1 (nl) 1996-10-22
ES2130930B1 (es) 2000-03-01
EP0738718A1 (de) 1996-10-23
CN1140168A (zh) 1997-01-15
SE9601345D0 (sv) 1996-04-10
KR100426626B1 (ko) 2004-07-12
BR9601991A (pt) 1998-04-07
SE509606C2 (sv) 1999-02-15
KR100378233B1 (ko) 2003-06-12
SE9601345L (sv) 1996-10-20
ES2130930A1 (es) 1999-07-01
BE1010550A3 (fr) 1998-10-06
CA2174411A1 (en) 1996-10-20
CN1140187A (zh) 1997-01-15
GB2299957A (en) 1996-10-23
KR960037748A (ko) 1996-11-19
IT1283615B1 (it) 1998-04-22
NL1002904C2 (nl) 1998-04-10
GB2299957B (en) 1997-11-12
AT405936B (de) 1999-12-27
TW419497B (en) 2001-01-21
AU706957B2 (en) 1999-07-01
US5574166A (en) 1996-11-12
US5554760A (en) 1996-09-10
DE19615000A1 (de) 1996-10-24
ITMI960751A1 (it) 1997-10-18
FR2733239A1 (fr) 1996-10-25
JPH08291151A (ja) 1996-11-05
AU5073196A (en) 1996-10-31
CN1059899C (zh) 2000-12-27
ITMI960751A0 (de) 1996-04-18
AU707202B2 (en) 1999-07-08
BR9601992A (pt) 1998-10-06
CA2174411C (en) 2007-02-20
US5563242A (en) 1996-10-08
AU5078496A (en) 1996-10-31
JP3309153B2 (ja) 2002-07-29
GB9607427D0 (en) 1996-06-12
KR960037664A (ko) 1996-11-19
FR2733239B1 (fr) 2004-10-01

Similar Documents

Publication Publication Date Title
ATA70596A (de) Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sind
NL194945B (nl) UV-absorptiemiddelen.
BR9604649B1 (pt) artigo fotocrÈmico.
FI973024A7 (fi) Yhdisteitä, joilla on vaikutuksia serotoniiniin liittyviin järjestelmi in
FR2701818B1 (fr) Applicateur.
DE69636353D1 (de) Datenübetragungsvorrichtung.
DE69425100D1 (de) Dynamisches neuronales Netzwerk
FI931096A7 (fi) Rullmaskin foer rullning av en bana, saerskilt en pappersbana
FI950715A0 (fi) Ytmikromekanisk, symmetrisk tryckskillnadsgivare
EP0683062A4 (de) Applikator.
ITTO940231A0 (it) Luce dinamica per applicazioni cromoterapeutiche.
DE69620028D1 (de) Reversible, nichtkovalentgebundene oberflächenbeschichtung
DK0721522T3 (da) Iriserende stoffer.
EP0677456A4 (de) Beschichtungsbehälter.
FR2700484B1 (fr) Installation de peinture.
DK0874814T3 (da) 25-hydroxy-16-en-26,27-bishomo-cholecalciferoler
DE59602829D1 (de) Verschlusskappe
EP0585794A3 (de) Beschichtungsvorrichtung.
ES1032571Y (es) Gafa,
DE69206024D1 (de) Beschichtungsküvette.
DE69616393D1 (de) Ultraviolett-Licht-Absorber
GB2311143B (en) Recording materials stabilized with benzotriazole uv absorbers
NL1000216C2 (nl) Portaal.
ES1032948Y (es) Aplique.
KR960026553U (ko) 크레파스 케이스

Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee