ATA70596A - Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sind - Google Patents
Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sindInfo
- Publication number
- ATA70596A ATA70596A AT0070596A AT70596A ATA70596A AT A70596 A ATA70596 A AT A70596A AT 0070596 A AT0070596 A AT 0070596A AT 70596 A AT70596 A AT 70596A AT A70596 A ATA70596 A AT A70596A
- Authority
- AT
- Austria
- Prior art keywords
- benzotriazole
- absorbers
- coating materials
- materials stabilized
- stabilized
- Prior art date
Links
- 239000006096 absorbing agent Substances 0.000 title 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 title 1
- 239000012964 benzotriazole Substances 0.000 title 1
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 239000000463 material Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
- B41M5/5227—Macromolecular coatings characterised by organic non-macromolecular additives, e.g. UV-absorbers, plasticisers, surfactants
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G03C1/8155—Organic compounds therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Wood Science & Technology (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Ink Jet (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/424,843 US5574166A (en) | 1995-04-19 | 1995-04-19 | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ATA70596A true ATA70596A (de) | 1999-05-15 |
| AT405936B AT405936B (de) | 1999-12-27 |
Family
ID=23684097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT0070596A AT405936B (de) | 1995-04-19 | 1996-04-18 | Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sind |
Country Status (18)
| Country | Link |
|---|---|
| US (4) | US5574166A (de) |
| EP (1) | EP0738718A1 (de) |
| JP (2) | JPH08291151A (de) |
| KR (2) | KR100426626B1 (de) |
| CN (2) | CN1066181C (de) |
| AT (1) | AT405936B (de) |
| AU (2) | AU707202B2 (de) |
| BE (1) | BE1010550A3 (de) |
| BR (2) | BR9601991A (de) |
| CA (2) | CA2174411C (de) |
| DE (1) | DE19615000A1 (de) |
| ES (1) | ES2130930B1 (de) |
| FR (1) | FR2733239B1 (de) |
| GB (1) | GB2299957B (de) |
| IT (1) | IT1283615B1 (de) |
| NL (1) | NL1002904C2 (de) |
| SE (1) | SE509606C2 (de) |
| TW (1) | TW419497B (de) |
Families Citing this family (90)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5574166A (en) * | 1995-04-19 | 1996-11-12 | Ciba-Geigy Corporation | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
| US5977219A (en) * | 1997-10-30 | 1999-11-02 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
| US6166218A (en) | 1996-11-07 | 2000-12-26 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
| CH693032A5 (de) * | 1996-11-07 | 2003-01-31 | Ciba Sc Holding Ag | Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit. |
| JP2001526711A (ja) | 1997-04-15 | 2001-12-18 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 低粉塵性安定剤の製造方法 |
| DE19723779A1 (de) * | 1997-06-06 | 1998-12-10 | Agfa Gevaert Ag | Inkjet-System |
| US6383716B1 (en) | 1997-08-22 | 2002-05-07 | Asahi Kasei Kabushiki Kaisha | Stable photosensitive resin composition |
| JP3448851B2 (ja) * | 1997-11-28 | 2003-09-22 | タキロン株式会社 | 添加剤含有樹脂成形品及びその製造方法 |
| US5948150A (en) * | 1998-05-05 | 1999-09-07 | Hewlett-Packard Company | Composition to improve colorfastness of a printed image |
| WO2000014126A1 (de) * | 1998-09-09 | 2000-03-16 | Ciba Specialty Chemicals Holding Inc. | Photostabiles chromophor-system |
| EP1099982B1 (de) * | 1999-02-19 | 2009-04-29 | Asahi Kasei Chemicals Corporation | Stabile lichtempfindliche harzzusammensetzung |
| EP1046670B1 (de) * | 1999-04-23 | 2003-07-09 | Nippon Mitsubishi Oil Corporation | UV-absorbierende Harzzusammensetzung |
| AU767875B2 (en) * | 1999-05-03 | 2003-11-27 | Ciba Specialty Chemicals Holding Inc. | Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
| US6268415B1 (en) | 1999-05-03 | 2001-07-31 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
| US6187845B1 (en) * | 1999-05-03 | 2001-02-13 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
| US6245915B1 (en) | 1999-05-03 | 2001-06-12 | Ciba Specialty Chemicals Corporation | Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety |
| EP1068866A3 (de) * | 1999-07-12 | 2004-03-17 | Ciba SC Holding AG | Verwendung von Mischungen aus Mikropigmenten zur Bräunungsverhinderung und Aufhellung der Haut und Haare |
| RU2266306C2 (ru) * | 2000-02-01 | 2005-12-20 | Циба Спешиалти Кемикэлз Холдинг Инк. | Способ защиты содержимого стойкими поглотителями уф-лучей |
| US6451887B1 (en) * | 2000-08-03 | 2002-09-17 | Ciba Specialty Chemicals Corporation | Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith |
| US6392056B1 (en) * | 2000-08-03 | 2002-05-21 | Ciba Specialty Chemical Corporation | 2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith |
| US6649770B1 (en) * | 2000-11-27 | 2003-11-18 | Ciba Specialty Chemicals Corporation | Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof |
| US6387992B1 (en) | 2000-11-27 | 2002-05-14 | Ciba Specialty Chemicals Corporation | Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith |
| JP4380989B2 (ja) * | 2001-01-16 | 2009-12-09 | チバ ホールディング インコーポレーテッド | インクジェットインク及び記録材料 |
| JP4993421B2 (ja) * | 2001-06-07 | 2012-08-08 | 株式会社Adeka | 合成樹脂組成物 |
| KR20040096558A (ko) * | 2002-02-19 | 2004-11-16 | 시바 스폐셜티 케미칼스 홀딩 인코포레이티드 | 자외선 방사선 효과로 부터 내용물을 보호하기 위한히드록시페닐벤조트리아졸 자외선 흡수제를 포함하는 용기또는 필름 |
| US20050209252A1 (en) * | 2002-03-29 | 2005-09-22 | Che-Ming Teng | Cancer treatment |
| WO2003105538A1 (en) | 2002-06-06 | 2003-12-18 | Siba Spelcialty Chemicals Holding Inc. | Electroluminescent device |
| KR100950626B1 (ko) * | 2002-06-24 | 2010-04-01 | 메르크 파텐트 게엠베하 | Uv-안정화 입자 |
| DE10228186A1 (de) * | 2002-06-24 | 2004-01-22 | Merck Patent Gmbh | UV-stabilisierte Partikel |
| DE10243438A1 (de) * | 2002-09-18 | 2004-03-25 | Merck Patent Gmbh | Oberflächenmodifizierte Effektpigmente |
| MXPA05006548A (es) * | 2002-12-20 | 2005-08-16 | Ciba Sc Holding Ag | Tinta y material de grabacion para la inyeccion de tinta. |
| EP1587887A1 (de) * | 2003-01-29 | 2005-10-26 | Ciba SC Holding AG | Tintenstrahltinte undaufnahmematerial |
| WO2004076419A1 (en) | 2003-02-26 | 2004-09-10 | Ciba Specialty Chemicals Holding Inc. | Water compatible sterically hindered alkoxyamines and hydroxy substituted alkoxyamines |
| US7153588B2 (en) * | 2003-05-30 | 2006-12-26 | 3M Innovative Properties Company | UV resistant naphthalate polyester articles |
| US6974850B2 (en) * | 2003-05-30 | 2005-12-13 | 3M Innovative Properties Company | Outdoor weatherable photopolymerizable coatings |
| JP4018674B2 (ja) | 2003-08-04 | 2007-12-05 | キヤノン株式会社 | インク用被記録媒体の製造方法 |
| WO2005032833A1 (en) | 2003-10-03 | 2005-04-14 | Fuji Photo Film B.V. | Recording medium |
| WO2005032835A1 (en) | 2003-10-03 | 2005-04-14 | Fuji Photo Film B.V. | Recording medium |
| DE10358092A1 (de) * | 2003-12-10 | 2005-07-14 | Merck Patent Gmbh | Oberflächenmodifizierte Partikel |
| US20060083940A1 (en) * | 2004-04-30 | 2006-04-20 | Solomon Bekele | Ultraviolet light absorbing composition |
| US7968151B2 (en) * | 2004-07-12 | 2011-06-28 | E. I. Du Pont De Nemours And Company | Process for the production of multi-layer coatings |
| US7595011B2 (en) | 2004-07-12 | 2009-09-29 | Ciba Specialty Chemicals Corporation | Stabilized electrochromic media |
| US20060008588A1 (en) * | 2004-07-12 | 2006-01-12 | Marc Chilla | Process for the production of multi-layer coatings |
| US20060068116A1 (en) * | 2004-09-27 | 2006-03-30 | Marc Chilla | Process for the production of multi-layer coatings in light metallic color shades |
| US8865262B2 (en) * | 2004-09-27 | 2014-10-21 | Axalta Coating Systems Ip Co., Llc | Process for producing multi-layer coatings in light metallic color shades |
| EP1794220A1 (de) * | 2004-09-30 | 2007-06-13 | Ciba Specialty Chemicals Holding Inc. | Verfahren zum nachfüllen oder einführen von lichtstabilisatoren |
| US20060122293A1 (en) * | 2004-12-03 | 2006-06-08 | Rick Wilk | Ultraviolet light absorber stabilizer combination |
| US20060134334A1 (en) * | 2004-12-22 | 2006-06-22 | Marc Chilla | Process for the production of primer surfacer-free multi-layer coatings |
| US20060177639A1 (en) * | 2005-02-04 | 2006-08-10 | Elzen Kerstin T | Process for the production of primer surfacer-free multi-layer coatings |
| US7910211B2 (en) * | 2005-06-20 | 2011-03-22 | E.I. Du Pont De Nemours And Company | Process for the production of multi-layer coatings |
| US20070071901A1 (en) * | 2005-09-29 | 2007-03-29 | Giannoula Avgenaki | Process for the production of multi-layer coatings |
| TWI434073B (zh) * | 2006-01-06 | 2014-04-11 | Sumitomo Chemical Co | 多層光擴散板 |
| JP4821597B2 (ja) * | 2006-01-06 | 2011-11-24 | 住友化学株式会社 | 多層光拡散板 |
| US20070238814A1 (en) * | 2006-04-10 | 2007-10-11 | Basf Corporation | Method of making coating compositions |
| US20070260012A1 (en) * | 2006-05-05 | 2007-11-08 | Algrim Danald J | HAPs free coating composition and film thereof |
| KR100836571B1 (ko) | 2006-12-29 | 2008-06-10 | 제일모직주식회사 | 반도체 소자 밀봉용 에폭시 수지 조성물 및 이를 이용한반도체 소자 |
| TW200829637A (en) * | 2007-01-03 | 2008-07-16 | Double Bond Chemical Ind Co Ltd | Liquid containing 2-(-hydroxyl-3-α-cumylphenyl-5-tertiery-octylphenyl) -2-hydrogen-benzotriazole |
| EP2167570A1 (de) | 2007-06-29 | 2010-03-31 | Basell Poliolefine Italia S.R.L. | Bestrahlte polyolefinzusammensetzung mit nicht-phenolischem stabilisator |
| US20090047092A1 (en) * | 2007-08-15 | 2009-02-19 | Ppg Industries Ohio, Inc. | Coated fasteners |
| US20100056680A1 (en) * | 2008-08-29 | 2010-03-04 | Sumitomo Chemical Company, Limited | Amorphous compound and stabilizer for polymers containing the amorphous compound |
| US7847103B2 (en) * | 2008-10-04 | 2010-12-07 | Chia-Hu Chang | Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole |
| CN102264825B (zh) | 2008-12-22 | 2014-07-02 | 巴斯夫欧洲公司 | 改善耐刮性的方法及相关产品和用途 |
| CN102471090B (zh) | 2009-07-07 | 2015-11-25 | 巴斯夫欧洲公司 | 钾铯钨青铜颗粒 |
| FR2955038B1 (fr) * | 2010-01-11 | 2012-05-11 | Commissariat Energie Atomique | Nanoparticules anti-uv |
| US20120329885A1 (en) * | 2011-06-23 | 2012-12-27 | Chia-Hu Chang | Ultraviolet light absorbing compounds based on benzyl substituted 2-(2- hydroxyphenyl) benzotriazoles |
| JP5879170B2 (ja) * | 2012-03-26 | 2016-03-08 | 積水化学工業株式会社 | 熱硬化性フラン樹脂組成物及びこれを用いたフラン樹脂積層体 |
| WO2014066358A1 (en) | 2012-10-23 | 2014-05-01 | Basf Se | Ethylenically unsaturated oligomers containing polymer stabilizer groups |
| HK1213953A1 (zh) * | 2013-03-16 | 2016-07-15 | Prc-迪索托国际公司 | 作為緩蝕劑的唑類化合物 |
| US10428204B2 (en) | 2013-09-27 | 2019-10-01 | Basf Se | Polyolefin compositions for building materials |
| WO2015077635A2 (en) | 2013-11-22 | 2015-05-28 | Polnox Corporation | Macromolecular antioxidants based on dual type moiety per molecule: structures methods of making and using the same |
| TWI685524B (zh) | 2013-12-17 | 2020-02-21 | 美商畢克美國股份有限公司 | 預先脫層之層狀材料 |
| JP6771538B2 (ja) | 2015-07-20 | 2020-10-21 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 難燃性ポリオレフィン物品 |
| CN105694099B (zh) * | 2016-03-09 | 2017-03-15 | 天津利安隆新材料股份有限公司 | 一种用于聚合物的添加剂 |
| US10884182B2 (en) | 2017-06-02 | 2021-01-05 | Dsm Ip Assets B.V. | Thermally resistant radiation curable coatings for optical fiber |
| US11319246B2 (en) | 2017-11-03 | 2022-05-03 | Covestro (Netherlands) B.V. | Water-blocking systems including fibers coated with liquid radiation curable SAP compositions |
| CN112437761B (zh) | 2018-06-01 | 2023-01-20 | 科思创(荷兰)有限公司 | 用于涂覆光纤的辐射可固化组合物及由其生产的涂层 |
| CN112771108B (zh) | 2018-08-22 | 2023-05-05 | 巴斯夫欧洲公司 | 稳定的滚塑聚烯烃 |
| CN112512988B (zh) | 2018-08-30 | 2023-01-13 | 科思创(荷兰)有限公司 | 用于涂布光纤的可辐射固化组合物 |
| EP3867207A1 (de) | 2018-12-03 | 2021-08-25 | Ms Holding B.V. | Gefüllte strahlungshärtbare zusammensetzungen zur beschichtung von optischen fasern und daraus hergestellte beschichtungen |
| US20230220239A1 (en) | 2019-03-18 | 2023-07-13 | Basf Se | Uv curable compositions for dirt pick-up resistance |
| EP3976544A1 (de) | 2019-05-24 | 2022-04-06 | Covestro (Netherlands) B.V. | Strahlenhärtbare zusammensetzungen zur beschichtung von optischen fasern mit verbesserter hochgeschwindigkeitsverarbeitbarkeit |
| JP7618588B2 (ja) | 2019-05-24 | 2025-01-21 | コベストロ (ネザーランズ) ビー.ヴィー. | 強化された高速加工性を備えた光ファイバーをコーティングするための放射線硬化性組成物 |
| WO2020243748A1 (en) | 2019-05-31 | 2020-12-03 | The Procter & Gamble Company | Methods of making a deflection member |
| US20220282064A1 (en) | 2019-07-30 | 2022-09-08 | Basf Se | Stabilizer composition |
| WO2021021971A1 (en) | 2019-07-31 | 2021-02-04 | Dsm Ip Assets B.V. | Radiation curable compositions with multi-functional long-armed oligomers for coating optical fibers |
| WO2021202638A1 (en) | 2020-04-03 | 2021-10-07 | Dsm Ip Assets B.V. | Multi-layered optical devices |
| CN115427853A (zh) | 2020-04-03 | 2022-12-02 | 科思创(荷兰)有限公司 | 自我修复光纤和用于制造其的组合物 |
| JP2025514927A (ja) | 2022-04-21 | 2025-05-13 | コベストロ (ネザーランズ) ビー.ヴィー. | 光ファイバを被覆するための低揮発性放射線硬化性組成物 |
| KR20250004002A (ko) | 2022-04-29 | 2025-01-07 | 이네오스 스티롤루션 그룹 게엠베하 | 감소된 uv 흡수제 함량으로 우수한 uv 저항성을 갖는 아크릴로니트릴 스티렌 아크릴레이트(asa) 공중합체 조성물 |
| US20250346751A1 (en) | 2022-04-29 | 2025-11-13 | Ineos Styrolution Group Gmbh | Acrylonitrile styrene acrylate copolymer composition with improved uv resistance |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH494060A (de) * | 1961-06-16 | 1970-07-31 | Geigy Ag J R | Verwendung von 2-(2'-Hydrophenyl)-benztriazolverbindungen als Lichtschutzmittel |
| BE630550A (de) | 1961-06-16 | |||
| JPS4967378A (de) * | 1972-11-02 | 1974-06-29 | ||
| JPS565279B2 (de) * | 1974-08-15 | 1981-02-04 | ||
| US4355071A (en) * | 1978-05-03 | 1982-10-19 | E. I. Dupont De Nemours And Company | Clear coat/color coat finish containing ultraviolet light stabilizer |
| US4278589A (en) * | 1978-06-26 | 1981-07-14 | Ciba-Geigy Corporation | 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole and stabilized compositions |
| EP0006564B1 (de) * | 1978-06-26 | 1981-12-30 | Ciba-Geigy Ag | 2-(2-Hydroxy-3.5-disubstituiertes-phenyl)-2H-benzotriazol und damit stabilisierte Mischungen |
| US4283327A (en) * | 1979-01-25 | 1981-08-11 | Ciba-Geigy Corporation | 2-(2-Hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole stabilized compositions |
| US4315848A (en) * | 1979-05-10 | 1982-02-16 | Ciba-Geigy Corporation | 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions |
| US4347180A (en) * | 1979-05-16 | 1982-08-31 | Ciba-Geigy Corporation | High caustic coupling process for preparing substituted 2-nitro-2'-hydroxyazobenzenes |
| EP0036117B1 (de) * | 1980-03-14 | 1986-02-05 | Spezial-Papiermaschinenfabrik August Alfred Krupp GmbH & Co | Druckempfindliches Aufzeichnungsmaterial |
| US4559293A (en) * | 1983-04-08 | 1985-12-17 | Kimoto & Co., Ltd. | Photosensitive recording material developable with aqueous neutral salt solution |
| DE3328771A1 (de) * | 1983-08-10 | 1985-02-28 | Basf Ag, 6700 Ludwigshafen | Verfahren zur kontinuierlichen herstellung von sauerstoff enthaltenden verbindungen |
| US4675352A (en) * | 1985-01-22 | 1987-06-23 | Ciba-Geigy Corporation | Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures |
| US4587346A (en) * | 1985-01-22 | 1986-05-06 | Ciba-Geigy Corporation | Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures |
| US4760148A (en) * | 1985-09-03 | 1988-07-26 | Ciba-Geigy Corporation | 5-aralkyl substituted 2H-benzotriazoles and stabilized compositions |
| JPS62262777A (ja) * | 1986-05-09 | 1987-11-14 | Kansai Paint Co Ltd | 防食塗膜形成法 |
| US5096977A (en) * | 1987-08-12 | 1992-03-17 | Atochem North America, Inc. | Process for preparing polymer bound UV stabilizers |
| US5240975A (en) * | 1988-04-11 | 1993-08-31 | Ciba-Geigy Corporation | Liquid substituted 2H-benzotriazole mixtures, stabilized compositions |
| US5095062A (en) * | 1988-04-11 | 1992-03-10 | Ciba-Geigy Corporation | Stabilized compositions containing liquid substituted 2H-benzotriazole mixtures |
| US4973701A (en) * | 1988-04-11 | 1990-11-27 | Ciba-Geigy Corporation | Liquid substituted 2H-benzotriazole mixtures, stabilized compositions and processes for preparing the liquid mixtures |
| US5199979A (en) * | 1988-11-25 | 1993-04-06 | Ppg Industries, Inc. | UV resistant, abrasion resistant coatings |
| US5045396A (en) * | 1988-11-23 | 1991-09-03 | Ppg Industries, Inc. | UV resistant primer |
| DE58907949D1 (de) * | 1988-12-14 | 1994-07-28 | Ciba Geigy Ag | Aufzeichnungsmaterial für Tintenstrahldruck. |
| US5098477A (en) * | 1988-12-14 | 1992-03-24 | Ciba-Geigy Corporation | Inks, particularly for ink printing |
| EP0520938B1 (de) * | 1991-06-03 | 1997-09-24 | Ciba SC Holding AG | UV-Absorber enthaltendes photographisches Material |
| US5354794A (en) * | 1993-02-03 | 1994-10-11 | Ciba-Geigy Corporation | Electro coat/base coat/clear coat finishes stabilized with S-triazine UV absorbers |
| DE4404081A1 (de) * | 1994-02-09 | 1995-08-10 | Basf Ag | UV-stabilisierte Polyoxymethylenformmassen |
| EP0698637A3 (de) * | 1994-08-22 | 1996-07-10 | Ciba Geigy Ag | Mit ausgewählten 5-substituierten Benzotriazol-UV-Absorbern stabilisierte Polyurethane |
| US5574166A (en) * | 1995-04-19 | 1996-11-12 | Ciba-Geigy Corporation | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
-
1995
- 1995-04-19 US US08/424,843 patent/US5574166A/en not_active Expired - Lifetime
- 1995-06-06 US US08/466,850 patent/US5563242A/en not_active Expired - Lifetime
- 1995-06-06 US US08/466,851 patent/US5554760A/en not_active Expired - Lifetime
-
1996
- 1996-04-05 US US08/628,433 patent/US5607987A/en not_active Expired - Lifetime
- 1996-04-10 GB GB9607427A patent/GB2299957B/en not_active Expired - Lifetime
- 1996-04-10 SE SE9601345A patent/SE509606C2/sv not_active IP Right Cessation
- 1996-04-10 EP EP96810220A patent/EP0738718A1/de not_active Withdrawn
- 1996-04-16 DE DE19615000A patent/DE19615000A1/de not_active Ceased
- 1996-04-17 KR KR1019960012131A patent/KR100426626B1/ko not_active Expired - Lifetime
- 1996-04-17 CA CA002174411A patent/CA2174411C/en not_active Expired - Fee Related
- 1996-04-17 AU AU50731/96A patent/AU707202B2/en not_active Ceased
- 1996-04-17 BE BE9600333A patent/BE1010550A3/fr not_active IP Right Cessation
- 1996-04-17 CA CA002174412A patent/CA2174412A1/en not_active Abandoned
- 1996-04-18 IT IT96MI000751A patent/IT1283615B1/it active IP Right Grant
- 1996-04-18 KR KR1019960012170A patent/KR100378233B1/ko not_active Expired - Lifetime
- 1996-04-18 FR FR9604847A patent/FR2733239B1/fr not_active Expired - Lifetime
- 1996-04-18 CN CN96105137A patent/CN1066181C/zh not_active Expired - Lifetime
- 1996-04-18 AT AT0070596A patent/AT405936B/de not_active IP Right Cessation
- 1996-04-18 ES ES009600874A patent/ES2130930B1/es not_active Expired - Fee Related
- 1996-04-18 AU AU50784/96A patent/AU706957B2/en not_active Ceased
- 1996-04-18 CN CN96105141A patent/CN1059899C/zh not_active Expired - Lifetime
- 1996-04-19 BR BR9601991A patent/BR9601991A/pt not_active IP Right Cessation
- 1996-04-19 JP JP8122465A patent/JPH08291151A/ja active Pending
- 1996-04-19 BR BR9601992A patent/BR9601992A/pt not_active IP Right Cessation
- 1996-04-19 JP JP12246696A patent/JP3309153B2/ja not_active Expired - Lifetime
- 1996-04-19 NL NL1002904A patent/NL1002904C2/nl not_active IP Right Cessation
- 1996-05-14 TW TW085105661A patent/TW419497B/zh not_active IP Right Cessation
Also Published As
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATA70596A (de) | Überzugsmaterialien, die mit benzotriazol-uv-absorbern stabilisiert sind | |
| NL194945B (nl) | UV-absorptiemiddelen. | |
| BR9604649B1 (pt) | artigo fotocrÈmico. | |
| FI973024A7 (fi) | Yhdisteitä, joilla on vaikutuksia serotoniiniin liittyviin järjestelmi in | |
| DE69425100D1 (de) | Dynamisches neuronales Netzwerk | |
| FI931096A7 (fi) | Rullmaskin foer rullning av en bana, saerskilt en pappersbana | |
| FI950715A0 (fi) | Ytmikromekanisk, symmetrisk tryckskillnadsgivare | |
| ITTO940231A0 (it) | Luce dinamica per applicazioni cromoterapeutiche. | |
| DE69620028D1 (de) | Reversible, nichtkovalentgebundene oberflächenbeschichtung | |
| DK0721522T3 (da) | Iriserende stoffer. | |
| EP0677456A4 (de) | Beschichtungsbehälter. | |
| NL1000095C2 (nl) | Rolhor. | |
| FR2700484B1 (fr) | Installation de peinture. | |
| DK0874814T3 (da) | 25-hydroxy-16-en-26,27-bishomo-cholecalciferoler | |
| EP0585794A3 (de) | Beschichtungsvorrichtung. | |
| DE69206024D1 (de) | Beschichtungsküvette. | |
| NL192688B (nl) | Inbraakwerend profielsamenstel. | |
| DE69616393D1 (de) | Ultraviolett-Licht-Absorber | |
| GB2311143B (en) | Recording materials stabilized with benzotriazole uv absorbers | |
| NL1000216C2 (nl) | Portaal. | |
| ES1032948Y (es) | Aplique. | |
| KR960026553U (ko) | 크레파스 케이스 | |
| ES1029711Y (es) | Trueno pirotecnico. | |
| KR960029742U (ko) | 캐패시터를 구비한 패키지 | |
| FI952589A0 (fi) | Ramkonstruktion foer en arbetsmaskin, saosom en truck |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ELJ | Ceased due to non-payment of the annual fee |