SE509606C2 - Beläggningar och registreringsmaterial stabiliserade med bensotriazolbaserade UV-absorberande medel - Google Patents
Beläggningar och registreringsmaterial stabiliserade med bensotriazolbaserade UV-absorberande medelInfo
- Publication number
- SE509606C2 SE509606C2 SE9601345A SE9601345A SE509606C2 SE 509606 C2 SE509606 C2 SE 509606C2 SE 9601345 A SE9601345 A SE 9601345A SE 9601345 A SE9601345 A SE 9601345A SE 509606 C2 SE509606 C2 SE 509606C2
- Authority
- SE
- Sweden
- Prior art keywords
- tert
- butyl
- benzotriazole
- composition according
- coating
- Prior art date
Links
- 239000006096 absorbing agent Substances 0.000 title claims abstract description 46
- 239000012964 benzotriazole Substances 0.000 title claims abstract description 39
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 title claims abstract description 29
- 238000000576 coating method Methods 0.000 title claims description 82
- 239000000463 material Substances 0.000 title claims description 27
- -1 tert-octyl Chemical group 0.000 claims abstract description 62
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 5
- 239000011248 coating agent Substances 0.000 claims description 58
- 239000000203 mixture Substances 0.000 claims description 37
- 239000007787 solid Substances 0.000 claims description 30
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 29
- 239000002245 particle Substances 0.000 claims description 19
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- 239000011230 binding agent Substances 0.000 claims description 13
- 239000001257 hydrogen Substances 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 150000001412 amines Chemical class 0.000 claims description 10
- 239000004611 light stabiliser Substances 0.000 claims description 10
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- 150000002431 hydrogen Chemical class 0.000 claims description 7
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- 230000001070 adhesive effect Effects 0.000 claims description 6
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- 238000004070 electrodeposition Methods 0.000 claims description 5
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- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000012860 organic pigment Substances 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 239000002981 blocking agent Substances 0.000 claims 1
- 239000003480 eluent Substances 0.000 claims 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 abstract description 3
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Chemical group CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 abstract description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 abstract description 2
- 150000001875 compounds Chemical class 0.000 description 77
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- 229940126062 Compound A Drugs 0.000 description 16
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
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- 238000000034 method Methods 0.000 description 15
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- 150000002148 esters Chemical class 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
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- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 6
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- 230000000087 stabilizing effect Effects 0.000 description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 6
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- 239000007983 Tris buffer Substances 0.000 description 5
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- JNGZXGGOCLZBFB-IVCQMTBJSA-N compound E Chemical compound N([C@@H](C)C(=O)N[C@@H]1C(N(C)C2=CC=CC=C2C(C=2C=CC=CC=2)=N1)=O)C(=O)CC1=CC(F)=CC(F)=C1 JNGZXGGOCLZBFB-IVCQMTBJSA-N 0.000 description 5
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- OLFNXLXEGXRUOI-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-bis(2-phenylpropan-2-yl)phenol Chemical compound C=1C(N2N=C3C=CC=CC3=N2)=C(O)C(C(C)(C)C=2C=CC=CC=2)=CC=1C(C)(C)C1=CC=CC=C1 OLFNXLXEGXRUOI-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 229920000180 alkyd Polymers 0.000 description 4
- OSIVCXJNIBEGCL-UHFFFAOYSA-N bis(2,2,6,6-tetramethyl-1-octoxypiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(OCCCCCCCC)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(OCCCCCCCC)C(C)(C)C1 OSIVCXJNIBEGCL-UHFFFAOYSA-N 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 4
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- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-Tetramethylpiperidine Substances CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 3
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- WUPCFMITFBVJMS-UHFFFAOYSA-N tetrakis(1,2,2,6,6-pentamethylpiperidin-4-yl) butane-1,2,3,4-tetracarboxylate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CC(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)C(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)CC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 WUPCFMITFBVJMS-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical class C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- OOZBTDPWFHJVEK-UHFFFAOYSA-N tris(2-nonylphenyl) phosphate Chemical class CCCCCCCCCC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC OOZBTDPWFHJVEK-UHFFFAOYSA-N 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- BOXSVZNGTQTENJ-UHFFFAOYSA-L zinc dibutyldithiocarbamate Chemical compound [Zn+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC BOXSVZNGTQTENJ-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
- B41M5/5227—Macromolecular coatings characterised by organic non-macromolecular additives, e.g. UV-absorbers, plasticisers, surfactants
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G03C1/8155—Organic compounds therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Wood Science & Technology (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Ink Jet (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/424,843 US5574166A (en) | 1995-04-19 | 1995-04-19 | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| SE9601345D0 SE9601345D0 (sv) | 1996-04-10 |
| SE9601345L SE9601345L (sv) | 1996-10-20 |
| SE509606C2 true SE509606C2 (sv) | 1999-02-15 |
Family
ID=23684097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE9601345A SE509606C2 (sv) | 1995-04-19 | 1996-04-10 | Beläggningar och registreringsmaterial stabiliserade med bensotriazolbaserade UV-absorberande medel |
Country Status (18)
| Country | Link |
|---|---|
| US (4) | US5574166A (de) |
| EP (1) | EP0738718A1 (de) |
| JP (2) | JP3309153B2 (de) |
| KR (2) | KR100426626B1 (de) |
| CN (2) | CN1066181C (de) |
| AT (1) | AT405936B (de) |
| AU (2) | AU707202B2 (de) |
| BE (1) | BE1010550A3 (de) |
| BR (2) | BR9601991A (de) |
| CA (2) | CA2174411C (de) |
| DE (1) | DE19615000A1 (de) |
| ES (1) | ES2130930B1 (de) |
| FR (1) | FR2733239B1 (de) |
| GB (1) | GB2299957B (de) |
| IT (1) | IT1283615B1 (de) |
| NL (1) | NL1002904C2 (de) |
| SE (1) | SE509606C2 (de) |
| TW (1) | TW419497B (de) |
Families Citing this family (90)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5574166A (en) * | 1995-04-19 | 1996-11-12 | Ciba-Geigy Corporation | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
| CH693032A5 (de) * | 1996-11-07 | 2003-01-31 | Ciba Sc Holding Ag | Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit. |
| US6166218A (en) | 1996-11-07 | 2000-12-26 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
| US5977219A (en) * | 1997-10-30 | 1999-11-02 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
| BR9808874B1 (pt) | 1997-04-15 | 2010-07-13 | processo para a preparação de um estabilizador com formação de pó reduzida. | |
| DE19723779A1 (de) * | 1997-06-06 | 1998-12-10 | Agfa Gevaert Ag | Inkjet-System |
| US6383716B1 (en) | 1997-08-22 | 2002-05-07 | Asahi Kasei Kabushiki Kaisha | Stable photosensitive resin composition |
| JP3448851B2 (ja) * | 1997-11-28 | 2003-09-22 | タキロン株式会社 | 添加剤含有樹脂成形品及びその製造方法 |
| US5948150A (en) * | 1998-05-05 | 1999-09-07 | Hewlett-Packard Company | Composition to improve colorfastness of a printed image |
| AU5856099A (en) * | 1998-09-09 | 2000-03-27 | Ciba Specialty Chemicals Holding Inc. | Photostable chromophore system |
| AU738331B2 (en) * | 1999-02-19 | 2001-09-13 | Asahi Kasei Kabushiki Kaisha | Stable photosensitive resin composition |
| EP1046670B1 (de) * | 1999-04-23 | 2003-07-09 | Nippon Mitsubishi Oil Corporation | UV-absorbierende Harzzusammensetzung |
| DE60028755T2 (de) * | 1999-05-03 | 2007-06-14 | Ciba Speciality Chemicals Holding Inc. | Stabilisierte klebzusammensetzung mit hochlöslichen, rotverschobenen, photostabilen benzotriazolen uv-absorbente und daraus gewonnene laminerte gegenstände |
| US6187845B1 (en) * | 1999-05-03 | 2001-02-13 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
| US6268415B1 (en) | 1999-05-03 | 2001-07-31 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
| US6245915B1 (en) | 1999-05-03 | 2001-06-12 | Ciba Specialty Chemicals Corporation | Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety |
| AU774383B2 (en) * | 1999-07-12 | 2004-06-24 | Ciba Specialty Chemicals Holding Inc. | Use of mixtures of micropigments for preventing tanning and for lightening skin and hair |
| CN1180008C (zh) * | 2000-02-01 | 2004-12-15 | 西巴特殊化学品控股有限公司 | 采用耐久性紫外线吸收剂的内容物保护方法 |
| US6392056B1 (en) * | 2000-08-03 | 2002-05-21 | Ciba Specialty Chemical Corporation | 2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith |
| US6451887B1 (en) * | 2000-08-03 | 2002-09-17 | Ciba Specialty Chemicals Corporation | Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith |
| US6387992B1 (en) | 2000-11-27 | 2002-05-14 | Ciba Specialty Chemicals Corporation | Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith |
| US6649770B1 (en) | 2000-11-27 | 2003-11-18 | Ciba Specialty Chemicals Corporation | Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof |
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| JP7618588B2 (ja) | 2019-05-24 | 2025-01-21 | コベストロ （ネザーランズ） ビー．ヴィー． | 強化された高速加工性を備えた光ファイバーをコーティングするための放射線硬化性組成物 |
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| US20220282064A1 (en) | 2019-07-30 | 2022-09-08 | Basf Se | Stabilizer composition |
| WO2021021971A1 (en) | 2019-07-31 | 2021-02-04 | Dsm Ip Assets B.V. | Radiation curable compositions with multi-functional long-armed oligomers for coating optical fibers |
| WO2021202623A1 (en) | 2020-04-03 | 2021-10-07 | Dsm Ip Assets B.V. | Self-healing optical fibers and the compositions used to create the same |
| JP2023520784A (ja) | 2020-04-03 | 2023-05-19 | コベストロ （ネザーランズ） ビー．ヴィー． | 多層光学デバイス |
| EP4511336A1 (de) | 2022-04-21 | 2025-02-26 | Covestro (Netherlands) B.V. | Strahlungshärtbare zusammensetzungen zur beschichtung von optischen fasern |
| EP4514892A1 (de) | 2022-04-29 | 2025-03-05 | INEOS Styrolution Group GmbH | Acrylnitril-styrol-acrylat (asa)-copolymer-zusammensetzung mit guter uv-beständigkeit und reduziertem uv-absorbergehalt |
| EP4514891A1 (de) | 2022-04-29 | 2025-03-05 | INEOS Styrolution Group GmbH | Acrylnitril-styrol-acrylat-copolymer-zusammensetzung mit verbesserter uv-beständigkeit |
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-
1995
- 1995-04-19 US US08/424,843 patent/US5574166A/en not_active Expired - Lifetime
- 1995-06-06 US US08/466,851 patent/US5554760A/en not_active Expired - Lifetime
- 1995-06-06 US US08/466,850 patent/US5563242A/en not_active Expired - Lifetime
-
1996
- 1996-04-05 US US08/628,433 patent/US5607987A/en not_active Expired - Lifetime
- 1996-04-10 GB GB9607427A patent/GB2299957B/en not_active Expired - Lifetime
- 1996-04-10 SE SE9601345A patent/SE509606C2/sv not_active IP Right Cessation
- 1996-04-10 EP EP96810220A patent/EP0738718A1/de not_active Withdrawn
- 1996-04-16 DE DE19615000A patent/DE19615000A1/de not_active Ceased
- 1996-04-17 AU AU50731/96A patent/AU707202B2/en not_active Ceased
- 1996-04-17 BE BE9600333A patent/BE1010550A3/fr not_active IP Right Cessation
- 1996-04-17 KR KR1019960012131A patent/KR100426626B1/ko not_active Expired - Lifetime
- 1996-04-17 CA CA002174411A patent/CA2174411C/en not_active Expired - Fee Related
- 1996-04-17 CA CA002174412A patent/CA2174412A1/en not_active Abandoned
- 1996-04-18 AU AU50784/96A patent/AU706957B2/en not_active Ceased
- 1996-04-18 AT AT0070596A patent/AT405936B/de not_active IP Right Cessation
- 1996-04-18 KR KR1019960012170A patent/KR100378233B1/ko not_active Expired - Lifetime
- 1996-04-18 IT IT96MI000751A patent/IT1283615B1/it active IP Right Grant
- 1996-04-18 CN CN96105137A patent/CN1066181C/zh not_active Expired - Lifetime
- 1996-04-18 ES ES009600874A patent/ES2130930B1/es not_active Expired - Fee Related
- 1996-04-18 FR FR9604847A patent/FR2733239B1/fr not_active Expired - Lifetime
- 1996-04-18 CN CN96105141A patent/CN1059899C/zh not_active Expired - Lifetime
- 1996-04-19 BR BR9601991A patent/BR9601991A/pt not_active IP Right Cessation
- 1996-04-19 JP JP12246696A patent/JP3309153B2/ja not_active Expired - Lifetime
- 1996-04-19 BR BR9601992A patent/BR9601992A/pt not_active IP Right Cessation
- 1996-04-19 JP JP8122465A patent/JPH08291151A/ja active Pending
- 1996-04-19 NL NL1002904A patent/NL1002904C2/nl not_active IP Right Cessation
- 1996-05-14 TW TW085105661A patent/TW419497B/zh not_active IP Right Cessation
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| NUG | Patent has lapsed |