BR6805097D0 - Composicao sensivel a radiacao - Google Patents

Composicao sensivel a radiacao

Info

Publication number
BR6805097D0
BR6805097D0 BR205097/68A BR20509768A BR6805097D0 BR 6805097 D0 BR6805097 D0 BR 6805097D0 BR 205097/68 A BR205097/68 A BR 205097/68A BR 20509768 A BR20509768 A BR 20509768A BR 6805097 D0 BR6805097 D0 BR 6805097D0
Authority
BR
Brazil
Prior art keywords
radiation
sensitive composition
sensitive
composition
Prior art date
Application number
BR205097/68A
Other languages
English (en)
Inventor
D Borden
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of BR6805097D0 publication Critical patent/BR6805097D0/pt

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0042Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02Boron compounds
    • C07F5/027Organoboranes and organoborohydrides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/54Quaternary phosphonium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66Arsenic compounds
    • C07F9/70Organo-arsenic compounds
    • C07F9/74Aromatic compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B44/00Azo dyes containing onium groups
    • C09B44/10Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system
    • C09B44/12Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system having one nitrogen atom as the only ring hetero atom
    • C09B44/126Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system having one nitrogen atom as the only ring hetero atom in a six-membered ring, e.g. pyrridinium, quinolinium
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/54Diazonium salts or diazo anhydrides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/127Spectral sensitizer containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904Monomer or polymer contains initiating group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BR205097/68A 1967-12-26 1968-12-23 Composicao sensivel a radiacao BR6805097D0 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69316867A 1967-12-26 1967-12-26

Publications (1)

Publication Number Publication Date
BR6805097D0 true BR6805097D0 (pt) 1973-01-11

Family

ID=24783601

Family Applications (1)

Application Number Title Priority Date Filing Date
BR205097/68A BR6805097D0 (pt) 1967-12-26 1968-12-23 Composicao sensivel a radiacao

Country Status (8)

Country Link
US (1) US3567453A (pt)
BE (1) BE726207A (pt)
BR (1) BR6805097D0 (pt)
CH (1) CH512085A (pt)
DE (1) DE1815868A1 (pt)
ES (1) ES361827A1 (pt)
FR (1) FR1602445A (pt)
GB (1) GB1246298A (pt)

Families Citing this family (150)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887379A (en) * 1972-03-30 1975-06-03 Ibm Photoresist azide sensitizer composition
US4105450A (en) * 1973-07-27 1978-08-08 Fuji Photo Film Co., Ltd. Spectrally sensitized positive light-sensitive o-quinone diazide containing composition
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
CA1051705A (en) * 1974-04-15 1979-04-03 Thap Dominh High gain transition metal complex imaging
US4195998A (en) * 1974-04-15 1980-04-01 Eastman Kodak Company CO(III) Complex containing radiation sensitive element with diazo recording layer
US4201588A (en) * 1974-04-15 1980-05-06 Eastman Kodak Company Radiation sensitive co(III)complex photoreduction element with image recording layer
US4324852A (en) * 1974-04-15 1982-04-13 Eastman Kodak Company Transition metal photoreduction systems and processes
US4175973A (en) * 1974-05-02 1979-11-27 General Electric Company Curable compositions
GB1518141A (en) * 1974-05-02 1978-07-19 Gen Electric Polymerizable compositions
US4175963A (en) * 1974-05-02 1979-11-27 General Electric Company Method of exposing and curing an epoxy composition containing an aromatic onium salt
US4069056A (en) * 1974-05-02 1978-01-17 General Electric Company Photopolymerizable composition containing group Va aromatic onium salts
US4058400A (en) * 1974-05-02 1977-11-15 General Electric Company Cationically polymerizable compositions containing group VIa onium salts
US4264703A (en) * 1974-05-02 1981-04-28 General Electric Company Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts
GB1512981A (en) * 1974-05-02 1978-06-01 Gen Electric Curable epoxide compositions
US4058401A (en) * 1974-05-02 1977-11-15 General Electric Company Photocurable compositions containing group via aromatic onium salts
US4378277A (en) * 1974-05-08 1983-03-29 Minnesota Mining & Manufacturing Company Photopolymerizable epoxy-containing compositions
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
US4045221A (en) * 1975-09-08 1977-08-30 Eastman Kodak Company Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex
US4171221A (en) * 1975-09-08 1979-10-16 Eastman Kodak Company High gain Co(III)complex imaging
US4307177A (en) * 1975-12-09 1981-12-22 General Electric Company Method of using polymerizable compositions containing onium salts
US4062686A (en) * 1976-04-21 1977-12-13 Eastman Kodak Company Sensitizers for photocrosslinkable polymers
US4147552A (en) * 1976-05-21 1979-04-03 Eastman Kodak Company Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
US4486529A (en) * 1976-06-10 1984-12-04 American Hoechst Corporation Dialo printing plate made from laser
US4314019A (en) * 1976-09-07 1982-02-02 Eastman Kodak Company Transition metal photoreduction systems and processes
JPS5934293B2 (ja) * 1977-04-20 1984-08-21 王子製紙株式会社 感光性組成物
FR2400221A1 (fr) * 1977-08-09 1979-03-09 Kodak Pathe Compose de diazonium photosensible utile, en particulier, pour preparer des planches d'impression lithographique, procede de preparation de ce compose et plaque presensibilisee avec ce compose
US4243737A (en) * 1977-11-25 1981-01-06 Eastman Kodak Company Image forming composition and elements with Co(III) complex, conjugated π bonding compounds and photoreductant
DE2754403A1 (de) * 1977-12-07 1979-06-13 Basf Ag Methinfarbstoffe
JPS5536838A (en) * 1978-09-08 1980-03-14 Tokyo Ohka Kogyo Co Ltd Novel light absorber and photoresist composition containing this
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch
US4248959A (en) * 1978-12-07 1981-02-03 American Hoechst Corporation Preparation of diazo printing plates using laser exposure
JPS6046422B2 (ja) * 1978-12-07 1985-10-16 東京応化工業株式会社 新規なフオトレジスト組成物
JPS566236A (en) * 1979-06-28 1981-01-22 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
JPS569740A (en) * 1979-07-05 1981-01-31 Fuji Photo Film Co Ltd Image forming method
US4343891A (en) * 1980-05-23 1982-08-10 Minnesota Mining And Manufacturing Company Fixing of tetra (hydrocarbyl) borate salt imaging systems
US4307182A (en) * 1980-05-23 1981-12-22 Minnesota Mining And Manufacturing Company Imaging systems with tetra(aliphatic) borate salts
US4365019A (en) * 1981-08-06 1982-12-21 Eastman Kodak Company Positive-working resist quinone diazide containing composition and imaging method having improved development rates
JPS58502169A (ja) * 1981-12-21 1983-12-15 インステイテユ−ト ヒミイ アカデミイ ナウク エスエスエスア−ル フォト−及び電子線レジスト
US4511642A (en) * 1982-02-17 1985-04-16 Nippon Telegraph And Telephone Public Corp. Photo-fixing heat-sensitive recording media with photosensitive diazonium salt, coupler, and organic boron salt
US4447521A (en) * 1982-10-25 1984-05-08 Minnesota Mining And Manufacturing Company Fixing of tetra(hydrocarbyl)borate salt imaging systems
US4464458A (en) * 1982-12-30 1984-08-07 International Business Machines Corporation Process for forming resist masks utilizing O-quinone diazide and pyrene
GB8305134D0 (en) * 1983-02-24 1983-03-30 Minnesota Mining & Mfg Radiationsensitive elements
US4522911A (en) * 1983-06-28 1985-06-11 International Business Machines Corporation Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
GB8333901D0 (en) * 1983-12-20 1984-02-01 Minnesota Mining & Mfg Radiationsensitive compositions
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US4601969A (en) * 1985-03-28 1986-07-22 International Business Machines Corporation High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution
DE3650107T2 (de) * 1985-11-20 1995-05-24 Mead Corp Ionische Farbstoffe.
US5151520A (en) * 1985-11-20 1992-09-29 The Mead Corporation Cationic dye-triarylmonoalkylorate anion complexes
US4772541A (en) * 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
US4937159A (en) * 1985-11-20 1990-06-26 The Mead Corporation Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers
US4800149A (en) * 1986-10-10 1989-01-24 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US4874450A (en) * 1987-01-29 1989-10-17 The Mead Corporation Laminating transparent or translucent materials using ionic dye-counter ion complexes
US4751102A (en) * 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
US4788124A (en) * 1987-08-19 1988-11-29 The Mead Corporation Thermal recording method and material
JP2571115B2 (ja) * 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
US5212042A (en) * 1989-08-22 1993-05-18 Fuji Photo Film Co., Ltd. Positive type light-sensitive composition
US5176984A (en) * 1989-10-25 1993-01-05 The Mead Corporation Photohardenable compositions containing a borate salt
US5100755A (en) * 1989-12-27 1992-03-31 The Mead Corporation Dye-benzyltriaryl borate photoinitiators and photohardenable composition containing these photoinitiators
WO1992002504A1 (en) * 1990-07-31 1992-02-20 Eastman Kodak Company N-substituted pyridiniumborates
US5500453A (en) * 1992-02-07 1996-03-19 Toyo Ink Manufacturing Co., Ltd. (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition
EP0555058B1 (en) * 1992-02-07 1997-05-07 Toyo Ink Manufacturing Co., Ltd. (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
TW466256B (en) * 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
TW467933B (en) * 1995-11-24 2001-12-11 Ciba Sc Holding Ag Photopolymerizable compositions comprising borate photoinitiators from monoboranes and the use thereof
AU717137B2 (en) * 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
JPH1081838A (ja) * 1996-07-16 1998-03-31 Showa Denko Kk 光硬化性材料及びその硬化方法
US7285422B1 (en) 1997-01-23 2007-10-23 Sequenom, Inc. Systems and methods for preparing and analyzing low volume analyte array elements
IT1294790B1 (it) * 1997-07-15 1999-04-15 Isoclima Spa Dispositivo elettrocromico per l'attenuazione o il filtraggio della luce
FR2782320B1 (fr) * 1998-08-11 2003-08-15 Rhodia Chimie Sa Nouveaux amorceurs de polymerisation et/ou de reticulation activables sous faisceau d'electrons
US6590009B1 (en) 1998-08-11 2003-07-08 Rhodia Chimie Polymerization and/or crosslinking method under electron beam and/or gamma radiation
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
WO2001046367A1 (en) 1999-12-22 2001-06-28 Reckitt Benckiser (Uk) Limited Photocatalytic compositions and methods
WO2002055199A2 (en) 2000-10-30 2002-07-18 Sequenom Inc Method and apparatus for delivery of submicroliter volumes onto a substrate
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
US7939644B2 (en) * 2003-08-21 2011-05-10 Merck Patent Gmbh Cyanoborate, fluoroalkylphosphate, fluoroalkylborate or imide dyes
EP2292700B1 (de) * 2003-08-21 2011-11-02 Merck Patent GmbH Cyanoborat-Farbstoffe
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
JP4396443B2 (ja) 2004-08-18 2010-01-13 コニカミノルタエムジー株式会社 感光性平版印刷版の製造方法及び使用方法
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
WO2006061981A1 (ja) 2004-12-09 2006-06-15 Konica Minolta Medical & Graphic, Inc. 光硬化性インクを用いた画像形成方法及びインクジェット記録装置、また、光硬化性インクを用いたインクセット、インクジェット記録方法及びインクジェット記録装置
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4474317B2 (ja) 2005-03-31 2010-06-02 富士フイルム株式会社 平版印刷版の作製方法
JP2006335826A (ja) 2005-05-31 2006-12-14 Fujifilm Holdings Corp インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法
US20090110832A1 (en) 2005-11-01 2009-04-30 Konica Minolta Medical & Graphic, Inc. Planographic printing plate material, planographic printing plate, planographic printing plate preparing process and printing process employing planographic printing plate
ES2289905B1 (es) * 2005-11-24 2009-04-01 Exotech, S.L. Composicion que comprende un compuesto fotoactivo y un coiniciador y su uso como fotoiniciador.
JP5276264B2 (ja) 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
JP2008163081A (ja) 2006-12-27 2008-07-17 Fujifilm Corp レーザー分解性樹脂組成物およびそれを用いるパターン形成材料ならびにレーザー彫刻型フレキソ印刷版原版
US8541063B2 (en) 2007-02-06 2013-09-24 Fujifilm Corporation Undercoat solution, ink-jet recording method and ink-jet recording device
US8240808B2 (en) 2007-02-07 2012-08-14 Fujifilm Corporation Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method
JPWO2008096618A1 (ja) 2007-02-09 2010-05-20 コニカミノルタエムジー株式会社 インクジェットヘッド、インクジェットプリンタ、インクジェット記録方法
JP5227521B2 (ja) 2007-02-26 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、インクセット
JP5224699B2 (ja) 2007-03-01 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
JP5306681B2 (ja) 2007-03-30 2013-10-02 富士フイルム株式会社 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法
JP5243072B2 (ja) 2007-03-30 2013-07-24 富士フイルム株式会社 インク組成物、並びに、それを用いた画像記録方法及び画像記録物
US20090180931A1 (en) 2007-09-17 2009-07-16 Sequenom, Inc. Integrated robotic sample transfer device
JP5227560B2 (ja) 2007-09-28 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5265165B2 (ja) 2007-09-28 2013-08-14 富士フイルム株式会社 塗布装置及びこれを用いるインクジェット記録装置
JP4898618B2 (ja) 2007-09-28 2012-03-21 富士フイルム株式会社 インクジェット記録方法
US8361702B2 (en) 2007-11-08 2013-01-29 Fujifilm Corporation Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate
JP5500831B2 (ja) 2008-01-25 2014-05-21 富士フイルム株式会社 レリーフ印刷版の作製方法及びレーザー彫刻用印刷版原版
JP5241252B2 (ja) 2008-01-29 2013-07-17 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
JP5254632B2 (ja) 2008-02-07 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物
US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
JP5137618B2 (ja) 2008-02-28 2013-02-06 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
EP2095970A1 (en) 2008-02-29 2009-09-02 Fujifilm Corporation Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate
EP2098367A1 (en) * 2008-03-05 2009-09-09 Eastman Kodak Company Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates
JP5583329B2 (ja) 2008-03-11 2014-09-03 富士フイルム株式会社 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体
JP4914862B2 (ja) 2008-03-26 2012-04-11 富士フイルム株式会社 インクジェット記録方法、及び、インクジェット記録装置
JP5322575B2 (ja) 2008-03-28 2013-10-23 富士フイルム株式会社 レーザー彫刻用樹脂組成物、画像形成材料、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版、及びレリーフ印刷版の製造方法
JP5305793B2 (ja) 2008-03-31 2013-10-02 富士フイルム株式会社 レリーフ印刷版及びレリーフ印刷版の製造方法
JP5414367B2 (ja) 2008-06-02 2014-02-12 富士フイルム株式会社 顔料分散物及びそれを用いたインク組成物
US8454152B2 (en) 2008-06-23 2013-06-04 Konica Minolta Holdings, Inc. Ink jet recording device and ink jet recording method
JP5383133B2 (ja) 2008-09-19 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット記録方法及び印刷物成形体の製造方法
JP2010077228A (ja) 2008-09-25 2010-04-08 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
US8888262B2 (en) 2008-11-07 2014-11-18 Konica Minolta Holdings, Inc. Actinic energy radiation curable inkjet ink and inkjet recording method
JP2010115791A (ja) 2008-11-11 2010-05-27 Konica Minolta Ij Technologies Inc 画像形成装置
JP2010180330A (ja) 2009-02-05 2010-08-19 Fujifilm Corp 非水系インク、インクセット、画像記録方法、画像記録装置、および記録物
JP5350827B2 (ja) 2009-02-09 2013-11-27 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349095B2 (ja) 2009-03-17 2013-11-20 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349097B2 (ja) 2009-03-19 2013-11-20 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5383289B2 (ja) 2009-03-31 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット用であるインク組成物、インクジェット記録方法、およびインクジェット法による印刷物
JP5572026B2 (ja) 2009-09-18 2014-08-13 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5530141B2 (ja) 2009-09-29 2014-06-25 富士フイルム株式会社 インク組成物及びインクジェット記録方法
JP5692494B2 (ja) 2010-03-16 2015-04-01 セイコーエプソン株式会社 インク組成物および記録方法
CN102336081A (zh) 2010-05-19 2012-02-01 富士胶片株式会社 印刷方法、套印物的制作方法、层压加工方法、发光二极管固化性涂布组合物及墨液组合物
EP2607433B1 (en) 2010-08-19 2020-11-11 Konica Minolta Holdings, Inc. Active ray-curable ink and active ray-curable inkjet recording method
JP5761202B2 (ja) 2010-12-10 2015-08-12 コニカミノルタ株式会社 インクジェット記録装置
US9243007B2 (en) 2011-03-30 2016-01-26 Asahi Kasei Chemicals Corporation Organopolysiloxane, method for producing the same, and curable resin composition containing the organopolysiloxane
EP2703173A4 (en) 2011-04-27 2014-10-01 Konica Minolta Inc INK JET PRINTING DEVICE
US9527310B2 (en) 2012-03-01 2016-12-27 Konica Minolta, Inc. Inkjet printing method
EP2644664B1 (en) 2012-03-29 2015-07-29 Fujifilm Corporation Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article
JP6013461B2 (ja) 2012-05-01 2016-10-25 コニカミノルタ株式会社 画像形成装置
JP5980702B2 (ja) 2013-03-07 2016-08-31 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法
US9457569B2 (en) 2013-03-29 2016-10-04 Konica Minolta, Inc. Image formation device
JP5939644B2 (ja) 2013-08-30 2016-06-22 富士フイルム株式会社 画像形成方法、インモールド成型品の製造方法、及び、インクセット
JP7105786B2 (ja) 2017-01-31 2022-07-25 フリント グループ ジャーマニー ゲーエムベーハー 低官能化され部分ケン化されたポリ酢酸ビニルを含む放射線硬化性混合物
CN110678332B (zh) 2017-03-27 2021-11-26 富林特集团德国有限公司 制造图形凸纹结构的方法
US11822246B2 (en) 2017-10-10 2023-11-21 Flint Group Germany Gmbh Relief precursor having low cupping and fluting
EP4027200A1 (de) 2017-12-08 2022-07-13 Flint Group Germany GmbH Verfahren zur kennzeichnung eines reliefvorläufers zur herstellung einer reliefstruktur
NL2020109B1 (en) 2017-12-18 2019-06-25 Xeikon Prepress Nv Method for fixing and treating a flexible plate on a drum, and flexible plate for use therein
WO2019206906A1 (en) 2018-04-26 2019-10-31 Xeikon Prepress N.V. Apparatus and method for treating and transporting a relief printing plate precursor
EP3629089A1 (en) 2018-09-26 2020-04-01 Flint Group Germany GmbH Method for thermally developing relief precursors
NL2027003B1 (en) 2020-11-27 2022-07-04 Flint Group Germany Gmbh Photosensitive composition
NL2027002B1 (en) 2020-11-27 2022-07-04 Flint Group Germany Gmbh Photosensitive composition
NL2028208B1 (en) 2021-05-12 2022-11-30 Flint Group Germany Gmbh Flexographic printing element precursor with high melt flow index
NL2028207B1 (en) 2021-05-12 2022-11-30 Flint Group Germany Gmbh A relief precursor with vegetable oils as plasticizers suitable for printing plates

Also Published As

Publication number Publication date
GB1246298A (en) 1971-09-15
US3567453A (en) 1971-03-02
ES361827A1 (es) 1970-11-01
FR1602445A (pt) 1970-11-23
BE726207A (pt) 1969-05-29
DE1815868A1 (de) 1969-11-06
CH512085A (fr) 1971-08-31

Similar Documents

Publication Publication Date Title
BR6805097D0 (pt) Composicao sensivel a radiacao
SE347299C (sv) Kromateringskomposition
BE762071Q (fr) Tetrahydroquinoleines substituees
CH449194A (fr) Macchina lavastoviglie
CH477887A (de) Schibob
DE1756201B2 (de) Foerderer
AT289422B (de) Evaporimeter
IT1056722B (it) Composti eterocielici
DK126177B (da) Etsemaskine
AT273680B (de) Skibob
DK138172C (da) Haengemappe
AT285075B (de) Schleudergieszkokille
DD61181A1 (de) Mehrspindelfräskopf
DD62630A1 (de) Hochspannungsheizelement
FR1522898A (fr) Mécanisme batteur-séparateur
BR6804653D0 (pt) Uma composicao herbicida
FI41083C (fi) Fungisidal komposition
FR1512680A (fr) Bidon
FR1524325A (fr) Mécanisme compteur
FR1530171A (fr) Râteau
FI42164C (fi) Brandrepstalja
FI42454C (fi) Kolkommutator
FI44250C (fi) Återkopplad omkodare
FI44178C (fi) Ogräsgifter
AT288241B (de) Hobok