FR2782320B1 - Nouveaux amorceurs de polymerisation et/ou de reticulation activables sous faisceau d'electrons - Google Patents

Nouveaux amorceurs de polymerisation et/ou de reticulation activables sous faisceau d'electrons

Info

Publication number
FR2782320B1
FR2782320B1 FR9810297A FR9810297A FR2782320B1 FR 2782320 B1 FR2782320 B1 FR 2782320B1 FR 9810297 A FR9810297 A FR 9810297A FR 9810297 A FR9810297 A FR 9810297A FR 2782320 B1 FR2782320 B1 FR 2782320B1
Authority
FR
France
Prior art keywords
cross
electron beam
under electron
new polymerization
link primers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9810297A
Other languages
English (en)
Other versions
FR2782320A1 (fr
Inventor
Christian Priou
Jean Marc Frances
Didier Dhaler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhodia Chimie SAS
Original Assignee
Rhodia Chimie SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR9810297A priority Critical patent/FR2782320B1/fr
Application filed by Rhodia Chimie SAS filed Critical Rhodia Chimie SAS
Priority to AT99936669T priority patent/ATE226600T1/de
Priority to DK99936669T priority patent/DK1114067T3/da
Priority to PCT/FR1999/001911 priority patent/WO2000009572A1/fr
Priority to US09/762,663 priority patent/US6590009B1/en
Priority to DE69903656T priority patent/DE69903656T2/de
Priority to ES99936669T priority patent/ES2183593T3/es
Priority to PT99936669T priority patent/PT1114067E/pt
Priority to CA002339899A priority patent/CA2339899A1/fr
Priority to JP2000565015A priority patent/JP2002522601A/ja
Priority to EP99936669A priority patent/EP1114067B1/fr
Priority to AU51683/99A priority patent/AU761698B2/en
Publication of FR2782320A1 publication Critical patent/FR2782320A1/fr
Application granted granted Critical
Publication of FR2782320B1 publication Critical patent/FR2782320B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C07F5/027—Organoboranes and organoborohydrides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Paints Or Removers (AREA)
FR9810297A 1998-08-11 1998-08-11 Nouveaux amorceurs de polymerisation et/ou de reticulation activables sous faisceau d'electrons Expired - Fee Related FR2782320B1 (fr)

Priority Applications (12)

Application Number Priority Date Filing Date Title
FR9810297A FR2782320B1 (fr) 1998-08-11 1998-08-11 Nouveaux amorceurs de polymerisation et/ou de reticulation activables sous faisceau d'electrons
CA002339899A CA2339899A1 (fr) 1998-08-11 1999-08-02 Procede de polymerisation et/ou de reticulation sous faisceau d'electrons et/ou rayons gamma
PCT/FR1999/001911 WO2000009572A1 (fr) 1998-08-11 1999-08-02 Procede de polymerisation et/ou de reticulation sous faisceau d'electrons et/ou rayons gamma
US09/762,663 US6590009B1 (en) 1998-08-11 1999-08-02 Polymerization and/or crosslinking method under electron beam and/or gamma radiation
DE69903656T DE69903656T2 (de) 1998-08-11 1999-08-02 Polymerisations- und/oder vernetzungsverfahren durch elektronenstrahlen und/oder gamma-strahlung
ES99936669T ES2183593T3 (es) 1998-08-11 1999-08-02 Procedimiento de polimeracion y/o reticulacion por haz de electrones y/o rayos gamma.
AT99936669T ATE226600T1 (de) 1998-08-11 1999-08-02 Polymerisations- und/oder vernetzungsverfahren durch elektronenstrahlen und/oder gamma-strahlung
DK99936669T DK1114067T3 (da) 1998-08-11 1999-08-02 Fremgangsmåde til polymeristation og/eller tværbinding under elektronstråle og/eller gammastråler
JP2000565015A JP2002522601A (ja) 1998-08-11 1999-08-02 電子ビーム及び／又はγ放射線下での重合及び／又は架橋方法
EP99936669A EP1114067B1 (fr) 1998-08-11 1999-08-02 Procede de polymerisation et/ou de reticulation sous faisceau d'electrons et/ou rayons gamma
AU51683/99A AU761698B2 (en) 1998-08-11 1999-08-02 Polymerisation and/or crosslinking method under electron beam and/or gamma radiation
PT99936669T PT1114067E (pt) 1998-08-11 1999-08-02 Processo de polimerizacao e/ou de reticulacao sob um feixe de electroes e/ou de raios gama

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9810297A FR2782320B1 (fr) 1998-08-11 1998-08-11 Nouveaux amorceurs de polymerisation et/ou de reticulation activables sous faisceau d'electrons

Publications (2)

Publication Number Publication Date
FR2782320A1 FR2782320A1 (fr) 2000-02-18
FR2782320B1 true FR2782320B1 (fr) 2003-08-15

Family

ID=9529596

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9810297A Expired - Fee Related FR2782320B1 (fr) 1998-08-11 1998-08-11 Nouveaux amorceurs de polymerisation et/ou de reticulation activables sous faisceau d'electrons

Country Status (1)

Country Link
FR (1) FR2782320B1 (fr)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物

Also Published As

Publication number Publication date
FR2782320A1 (fr) 2000-02-18

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Effective date: 20090430