BR112015010179A2 - célula eletrolítica para geração de produtos anódicos e catódicos não separados; método de fabricação de uma célula eletrolítica; processo de fabricação de soluções de oxidante misturado de composição variável; e dispositivo - Google Patents

célula eletrolítica para geração de produtos anódicos e catódicos não separados; método de fabricação de uma célula eletrolítica; processo de fabricação de soluções de oxidante misturado de composição variável; e dispositivo

Info

Publication number
BR112015010179A2
BR112015010179A2 BR112015010179A BR112015010179A BR112015010179A2 BR 112015010179 A2 BR112015010179 A2 BR 112015010179A2 BR 112015010179 A BR112015010179 A BR 112015010179A BR 112015010179 A BR112015010179 A BR 112015010179A BR 112015010179 A2 BR112015010179 A2 BR 112015010179A2
Authority
BR
Brazil
Prior art keywords
electrolytic cell
generation
manufacturing process
oxidant solution
anodic
Prior art date
Application number
BR112015010179A
Other languages
English (en)
Other versions
BR112015010179B1 (pt
Inventor
Francesco Gullá Andrea
Original Assignee
Industrie De Nora Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Industrie De Nora Spa filed Critical Industrie De Nora Spa
Publication of BR112015010179A2 publication Critical patent/BR112015010179A2/pt
Publication of BR112015010179B1 publication Critical patent/BR112015010179B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/13—Ozone
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/26—Chlorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/28—Per-compounds
    • C25B1/30—Peroxides
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Inert Electrodes (AREA)
  • Secondary Cells (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

resumo célula eletrolítica para geração de produtos anódicos e catódicos não separados; método de fabricação de uma célula eletrolítica; processo de fabricação de soluções de oxidante misturado de composição variável; e dispositivo a invenção se refere a uma célula eletrolítica equipada com microeletrodos para a geração de produtos separados e o método para obtê-los. a célula e os microeletrodos da presente invenção são obtidos com o uso de uma tecnologia para a produção de sistemas microeletromecânicos (mems). os microeletrodos anódicos e catódicos têm um revestimento eletrocatalítico e são mutuamente intercalados a um espaço intereletródico inferior a 300 micrômetros. 1/1
BR112015010179-8A 2012-11-09 2013-11-08 Célula eletrolítica para geração de produtos anódicos e catódicos não separados; método de fabricação de uma célula eletrolítica; processo de fabricação de soluções de oxidante misturado de composição variável; e dispositivo BR112015010179B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IT001909A ITMI20121909A1 (it) 2012-11-09 2012-11-09 Cella elettrolitica dotata di microelettrodi
ITMI2012A001909 2012-11-09
PCT/EP2013/073356 WO2014072458A1 (en) 2012-11-09 2013-11-08 Electrolytic cell equipped with microelectrodes

Publications (2)

Publication Number Publication Date
BR112015010179A2 true BR112015010179A2 (pt) 2017-07-11
BR112015010179B1 BR112015010179B1 (pt) 2021-06-22

Family

ID=47522793

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015010179-8A BR112015010179B1 (pt) 2012-11-09 2013-11-08 Célula eletrolítica para geração de produtos anódicos e catódicos não separados; método de fabricação de uma célula eletrolítica; processo de fabricação de soluções de oxidante misturado de composição variável; e dispositivo

Country Status (19)

Country Link
US (2) US11421332B2 (pt)
EP (1) EP2917385B1 (pt)
JP (1) JP6441225B2 (pt)
KR (1) KR102161431B1 (pt)
CN (1) CN104769161B (pt)
AR (1) AR093389A1 (pt)
AU (1) AU2013343480B2 (pt)
BR (1) BR112015010179B1 (pt)
CA (1) CA2885291C (pt)
ES (1) ES2606682T3 (pt)
HK (1) HK1207891A1 (pt)
IL (1) IL237860A (pt)
IT (1) ITMI20121909A1 (pt)
MX (1) MX362479B (pt)
RU (1) RU2632901C2 (pt)
SG (1) SG11201502043XA (pt)
TW (1) TWI595117B (pt)
WO (1) WO2014072458A1 (pt)
ZA (1) ZA201502733B (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL266939B2 (en) 2016-12-09 2023-10-01 Mfg Systems Limited Device and methods for controlled electrochemical surface modification
US11976370B2 (en) 2018-02-28 2024-05-07 Manufacturing Systems Limited Apparatus and method of catalysis
EP3885472A4 (en) * 2018-11-19 2022-01-05 Asahi Kasei Kabushiki Kaisha METHOD FOR PRODUCING HYDROGEN
CN116370684A (zh) * 2023-04-11 2023-07-04 菱王电梯有限公司 消杀除味系统、载人电梯系统及其控制方法

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Also Published As

Publication number Publication date
WO2014072458A1 (en) 2014-05-15
KR102161431B1 (ko) 2020-10-07
ITMI20121909A1 (it) 2014-05-10
TWI595117B (zh) 2017-08-11
CN104769161B (zh) 2017-05-10
AU2013343480B2 (en) 2017-07-20
AR093389A1 (es) 2015-06-03
RU2015120786A (ru) 2016-12-27
JP2016502600A (ja) 2016-01-28
ZA201502733B (en) 2016-11-30
KR20150084928A (ko) 2015-07-22
JP6441225B2 (ja) 2018-12-19
HK1207891A1 (en) 2016-02-12
MX362479B (es) 2019-01-18
US11421332B2 (en) 2022-08-23
EP2917385B1 (en) 2016-09-07
AU2013343480A1 (en) 2015-04-09
TW201418523A (zh) 2014-05-16
US20150308003A1 (en) 2015-10-29
ES2606682T3 (es) 2017-03-27
IL237860A (en) 2016-12-29
CN104769161A (zh) 2015-07-08
RU2632901C2 (ru) 2017-10-11
CA2885291A1 (en) 2014-05-15
BR112015010179B1 (pt) 2021-06-22
CA2885291C (en) 2020-08-25
SG11201502043XA (en) 2015-05-28
MX2015005608A (es) 2015-09-04
EP2917385A1 (en) 2015-09-16
US20220356589A1 (en) 2022-11-10

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B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
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Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 08/11/2013, OBSERVADAS AS CONDICOES LEGAIS.