BR112015010179A2 - electrolytic cell for generation of non-separated anodic and cathodic products; method of manufacturing an electrolytic cell; mixed oxidant solution manufacturing process of varying composition; and device - Google Patents

electrolytic cell for generation of non-separated anodic and cathodic products; method of manufacturing an electrolytic cell; mixed oxidant solution manufacturing process of varying composition; and device

Info

Publication number
BR112015010179A2
BR112015010179A2 BR112015010179A BR112015010179A BR112015010179A2 BR 112015010179 A2 BR112015010179 A2 BR 112015010179A2 BR 112015010179 A BR112015010179 A BR 112015010179A BR 112015010179 A BR112015010179 A BR 112015010179A BR 112015010179 A2 BR112015010179 A2 BR 112015010179A2
Authority
BR
Brazil
Prior art keywords
electrolytic cell
generation
manufacturing process
oxidant solution
anodic
Prior art date
Application number
BR112015010179A
Other languages
Portuguese (pt)
Other versions
BR112015010179B1 (en
Inventor
Francesco Gullá Andrea
Original Assignee
Industrie De Nora Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Industrie De Nora Spa filed Critical Industrie De Nora Spa
Publication of BR112015010179A2 publication Critical patent/BR112015010179A2/en
Publication of BR112015010179B1 publication Critical patent/BR112015010179B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/13—Ozone
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/26—Chlorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/28—Per-compounds
    • C25B1/30—Peroxides
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Inert Electrodes (AREA)
  • Secondary Cells (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

resumo célula eletrolítica para geração de produtos anódicos e catódicos não separados; método de fabricação de uma célula eletrolítica; processo de fabricação de soluções de oxidante misturado de composição variável; e dispositivo a invenção se refere a uma célula eletrolítica equipada com microeletrodos para a geração de produtos separados e o método para obtê-los. a célula e os microeletrodos da presente invenção são obtidos com o uso de uma tecnologia para a produção de sistemas microeletromecânicos (mems). os microeletrodos anódicos e catódicos têm um revestimento eletrocatalítico e são mutuamente intercalados a um espaço intereletródico inferior a 300 micrômetros. 1/1abstract electrolytic cell for generation of non-separated anodic and cathodic products; method of manufacturing an electrolytic cell; mixed oxidant solution manufacturing process of varying composition; and device the invention relates to an electrolytic cell equipped with microelectrodes for generating separate products and the method for obtaining them. The cell and microelectrodes of the present invention are obtained using a technology for producing microelectromechanical systems (mems). the anodic and cathodic microelectrodes have an electrocatalytic coating and are mutually interleaved to an interelectrodic space of less than 300 micrometers. 1/1

BR112015010179-8A 2012-11-09 2013-11-08 ELECTROLYTIC CELL FOR THE GENERATION OF NON-SEPARATED ANODIC AND CATHODE PRODUCTS; METHOD OF MANUFACTURING AN ELECTROLYTIC CELL; PROCESS OF MANUFACTURING MIXED OXIDANT SOLUTIONS OF VARIABLE COMPOSITION; AND DEVICE BR112015010179B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IT001909A ITMI20121909A1 (en) 2012-11-09 2012-11-09 ELECTROLYTIC CELL WITH MICRO ELECTRODE
ITMI2012A001909 2012-11-09
PCT/EP2013/073356 WO2014072458A1 (en) 2012-11-09 2013-11-08 Electrolytic cell equipped with microelectrodes

Publications (2)

Publication Number Publication Date
BR112015010179A2 true BR112015010179A2 (en) 2017-07-11
BR112015010179B1 BR112015010179B1 (en) 2021-06-22

Family

ID=47522793

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015010179-8A BR112015010179B1 (en) 2012-11-09 2013-11-08 ELECTROLYTIC CELL FOR THE GENERATION OF NON-SEPARATED ANODIC AND CATHODE PRODUCTS; METHOD OF MANUFACTURING AN ELECTROLYTIC CELL; PROCESS OF MANUFACTURING MIXED OXIDANT SOLUTIONS OF VARIABLE COMPOSITION; AND DEVICE

Country Status (19)

Country Link
US (2) US11421332B2 (en)
EP (1) EP2917385B1 (en)
JP (1) JP6441225B2 (en)
KR (1) KR102161431B1 (en)
CN (1) CN104769161B (en)
AR (1) AR093389A1 (en)
AU (1) AU2013343480B2 (en)
BR (1) BR112015010179B1 (en)
CA (1) CA2885291C (en)
ES (1) ES2606682T3 (en)
HK (1) HK1207891A1 (en)
IL (1) IL237860A (en)
IT (1) ITMI20121909A1 (en)
MX (1) MX362479B (en)
RU (1) RU2632901C2 (en)
SG (1) SG11201502043XA (en)
TW (1) TWI595117B (en)
WO (1) WO2014072458A1 (en)
ZA (1) ZA201502733B (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7237000B2 (en) 2016-12-09 2023-03-10 マニュファクチュアリング システムズ リミテッド Apparatus and method for controlled electrochemical surface modification
KR20200128408A (en) 2018-02-28 2020-11-12 매뉴팩터링 시스템즈 리미티드 Catalysis apparatus and method
JP7170061B2 (en) * 2018-11-19 2022-11-11 旭化成株式会社 Hydrogen production method
CN116370684A (en) * 2023-04-11 2023-07-04 菱王电梯有限公司 De-deodorizing system, manned elevator system and control method thereof

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US5403680A (en) * 1988-08-30 1995-04-04 Osaka Gas Company, Ltd. Photolithographic and electron beam lithographic fabrication of micron and submicron three-dimensional arrays of electronically conductive polymers
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Also Published As

Publication number Publication date
ES2606682T3 (en) 2017-03-27
CA2885291C (en) 2020-08-25
CN104769161B (en) 2017-05-10
ZA201502733B (en) 2016-11-30
AR093389A1 (en) 2015-06-03
EP2917385A1 (en) 2015-09-16
US11421332B2 (en) 2022-08-23
EP2917385B1 (en) 2016-09-07
US20220356589A1 (en) 2022-11-10
KR20150084928A (en) 2015-07-22
IL237860A (en) 2016-12-29
MX2015005608A (en) 2015-09-04
HK1207891A1 (en) 2016-02-12
RU2015120786A (en) 2016-12-27
JP6441225B2 (en) 2018-12-19
MX362479B (en) 2019-01-18
SG11201502043XA (en) 2015-05-28
AU2013343480B2 (en) 2017-07-20
RU2632901C2 (en) 2017-10-11
CN104769161A (en) 2015-07-08
CA2885291A1 (en) 2014-05-15
TW201418523A (en) 2014-05-16
US20150308003A1 (en) 2015-10-29
JP2016502600A (en) 2016-01-28
WO2014072458A1 (en) 2014-05-15
KR102161431B1 (en) 2020-10-07
AU2013343480A1 (en) 2015-04-09
ITMI20121909A1 (en) 2014-05-10
TWI595117B (en) 2017-08-11
BR112015010179B1 (en) 2021-06-22

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Legal Events

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B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06I Publication of requirement cancelled [chapter 6.9 patent gazette]

Free format text: ANULADA A PUBLICACAO CODIGO 6.6.1 NA RPI NO 2462 DE 13/03/2018 POR TER SIDO INDEVIDA.

B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 08/11/2013, OBSERVADAS AS CONDICOES LEGAIS.