BR112014018083A8 - Método para a fabricação de um transdutor capacitivo micro-usinado, em particular um cmut e transdutor capacitivo micro-usinado, em particular um cmut - Google Patents

Método para a fabricação de um transdutor capacitivo micro-usinado, em particular um cmut e transdutor capacitivo micro-usinado, em particular um cmut

Info

Publication number
BR112014018083A8
BR112014018083A8 BR112014018083A BR112014018083A BR112014018083A8 BR 112014018083 A8 BR112014018083 A8 BR 112014018083A8 BR 112014018083 A BR112014018083 A BR 112014018083A BR 112014018083 A BR112014018083 A BR 112014018083A BR 112014018083 A8 BR112014018083 A8 BR 112014018083A8
Authority
BR
Brazil
Prior art keywords
cmut
micro
capacitive transducer
machining
layer
Prior art date
Application number
BR112014018083A
Other languages
English (en)
Portuguese (pt)
Other versions
BR112014018083A2 (enExample
Inventor
Hendrik Klootwijk Johan
Marcelis Bout
Dirksen Peter
Karakaya Koray
Mulder Marcel
Mauczok Ruediger
Original Assignee
Koninklijke Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Nv filed Critical Koninklijke Philips Nv
Publication of BR112014018083A2 publication Critical patent/BR112014018083A2/pt
Publication of BR112014018083A8 publication Critical patent/BR112014018083A8/pt

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N1/00—Electrostatic generators or motors using a solid moving electrostatic charge carrier
    • H02N1/002—Electrostatic motors
    • H02N1/006—Electrostatic motors of the gap-closing type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/0292—Electrostatic transducers, e.g. electret-type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/00158—Diaphragms, membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349—Creating layers of material on a substrate
    • B81C1/00373—Selective deposition, e.g. printing or microcontact printing
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N1/00—Electrostatic generators or motors using a solid moving electrostatic charge carrier
    • H02N1/06—Influence generators
    • H02N1/08—Influence generators with conductive charge carrier, i.e. capacitor machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0127—Diaphragms, i.e. structures separating two media that can control the passage from one medium to another; Membranes, i.e. diaphragms with filtering function

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Transducers For Ultrasonic Waves (AREA)
  • Pressure Sensors (AREA)
  • Micromachines (AREA)
  • Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
BR112014018083A 2012-01-27 2013-01-18 Método para a fabricação de um transdutor capacitivo micro-usinado, em particular um cmut e transdutor capacitivo micro-usinado, em particular um cmut BR112014018083A8 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261591344P 2012-01-27 2012-01-27
PCT/IB2013/050481 WO2013111040A1 (en) 2012-01-27 2013-01-18 Capacitive micro-machined transducer and method of manufacturing the same

Publications (2)

Publication Number Publication Date
BR112014018083A2 BR112014018083A2 (enExample) 2017-06-20
BR112014018083A8 true BR112014018083A8 (pt) 2017-07-11

Family

ID=47780106

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112014018083A BR112014018083A8 (pt) 2012-01-27 2013-01-18 Método para a fabricação de um transdutor capacitivo micro-usinado, em particular um cmut e transdutor capacitivo micro-usinado, em particular um cmut

Country Status (8)

Country Link
US (2) US9231496B2 (enExample)
EP (1) EP2806982B1 (enExample)
JP (1) JP6209537B2 (enExample)
CN (1) CN104066521B (enExample)
BR (1) BR112014018083A8 (enExample)
MX (1) MX2014008859A (enExample)
RU (1) RU2618731C2 (enExample)
WO (1) WO2013111040A1 (enExample)

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WO2015043989A1 (en) * 2013-09-24 2015-04-02 Koninklijke Philips N.V. Cmut device manufacturing method, cmut device and apparatus
JP6381195B2 (ja) 2013-10-22 2018-08-29 キヤノン株式会社 静電容量型トランスデューサ及びその作製方法
EP3316791B1 (en) 2015-07-02 2020-08-05 Koninklijke Philips N.V. Multi-mode capacitive micromachined ultrasound transducer and associated devices and systems
CN107799386B (zh) * 2016-09-06 2020-04-28 中芯国际集成电路制造(北京)有限公司 半导体装置及其制造方法
CN107092880B (zh) * 2017-04-14 2023-06-20 杭州士兰微电子股份有限公司 超声波指纹传感器及其制造方法
CA3098911A1 (en) * 2018-05-03 2019-11-07 Butterfly Network, Inc. Pressure port for ultrasonic transducer on cmos sensor
US12350710B2 (en) 2018-11-16 2025-07-08 Vermon S.A. Capacitive micromachined ultrasonic transducer and method of manufacturing the same
EP4021649A1 (en) * 2019-08-30 2022-07-06 Vermon S.A. Cmut transducer
US11988640B2 (en) * 2020-03-11 2024-05-21 Bfly Operations, Inc. Bottom electrode material stack for micromachined ultrasonic transducer devices
CN113873404A (zh) * 2021-09-29 2021-12-31 瑞声声学科技(深圳)有限公司 一种振膜及其制备方法、mems麦克风
TWI819775B (zh) * 2021-10-13 2023-10-21 台亞半導體股份有限公司 矽化物電容式微機電結構及其製造方法

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EP1761104A4 (en) * 2004-06-03 2016-12-28 Olympus Corp ULTRASONIC VIBRATOR OF THE ELECTROSTATIC CAPABILITY TYPE, METHOD OF MANUFACTURE, AND ELECTROSTATIC CAPACITY-TYPE ULTRASONIC PROBE
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ITRM20050093A1 (it) 2005-03-04 2006-09-05 Consiglio Nazionale Ricerche Procedimento micromeccanico superficiale di fabbricazione di trasduttori ultracustici capacitivi microlavorati e relativo trasduttore ultracustico capacitivo microlavorato.
JP4724505B2 (ja) * 2005-09-09 2011-07-13 株式会社日立製作所 超音波探触子およびその製造方法
US7902018B2 (en) * 2006-09-26 2011-03-08 Applied Materials, Inc. Fluorine plasma treatment of high-k gate stack for defect passivation
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RU2618731C2 (ru) * 2012-01-27 2017-05-11 Конинклейке Филипс Н.В. Емкостной преобразователь, полученный микрообработкой, и способ его изготовления
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Also Published As

Publication number Publication date
CN104066521A (zh) 2014-09-24
MX2014008859A (es) 2014-10-06
WO2013111040A1 (en) 2013-08-01
EP2806982A1 (en) 2014-12-03
US9231496B2 (en) 2016-01-05
US10008958B2 (en) 2018-06-26
CN104066521B (zh) 2017-07-11
EP2806982B1 (en) 2020-03-11
RU2618731C2 (ru) 2017-05-11
BR112014018083A2 (enExample) 2017-06-20
RU2014134810A (ru) 2016-03-20
JP6209537B2 (ja) 2017-10-04
US20140375168A1 (en) 2014-12-25
US20150162852A1 (en) 2015-06-11
JP2015508625A (ja) 2015-03-19

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Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 7A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2549 DE 12-11-2019 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.