BR112012024387A2 - dispositivo e processo para controlar a eficácia de um banho de eletrodeposição metálico - Google Patents
dispositivo e processo para controlar a eficácia de um banho de eletrodeposição metálicoInfo
- Publication number
- BR112012024387A2 BR112012024387A2 BR112012024387A BR112012024387A BR112012024387A2 BR 112012024387 A2 BR112012024387 A2 BR 112012024387A2 BR 112012024387 A BR112012024387 A BR 112012024387A BR 112012024387 A BR112012024387 A BR 112012024387A BR 112012024387 A2 BR112012024387 A2 BR 112012024387A2
- Authority
- BR
- Brazil
- Prior art keywords
- effectiveness
- controlling
- cathode
- electroplating bath
- specimens
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1052373A FR2958300B1 (fr) | 2010-03-31 | 2010-03-31 | Dispositif pour controler des caracteristiques physiques d'un bain d'electrodeposition metallique. |
PCT/FR2011/050715 WO2011121240A1 (fr) | 2010-03-31 | 2011-03-30 | Dispositif et procede pour controler l'efficacite d'un bain d'electrodeposition metallique |
Publications (1)
Publication Number | Publication Date |
---|---|
BR112012024387A2 true BR112012024387A2 (pt) | 2016-05-24 |
Family
ID=42751439
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112012024387A BR112012024387A2 (pt) | 2010-03-31 | 2011-03-30 | dispositivo e processo para controlar a eficácia de um banho de eletrodeposição metálico |
Country Status (9)
Country | Link |
---|---|
US (1) | US20130008797A1 (fr) |
EP (1) | EP2553148B1 (fr) |
JP (1) | JP5764650B2 (fr) |
CN (1) | CN102822393B (fr) |
BR (1) | BR112012024387A2 (fr) |
CA (1) | CA2794579A1 (fr) |
FR (1) | FR2958300B1 (fr) |
RU (1) | RU2553161C2 (fr) |
WO (1) | WO2011121240A1 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020012144A (ja) * | 2018-07-17 | 2020-01-23 | 株式会社ファシリティ | 電解処理装置 |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2149344A (en) | 1935-03-22 | 1939-03-07 | Du Pont | Apparatus and process for the study of plating solutions |
FR863312A (fr) * | 1939-02-20 | 1941-03-29 | Procédé et appareil pour le dépôt électrolytique d'alliages d'étain | |
SU127339A1 (ru) * | 1953-04-02 | 1959-11-30 | М.А. Гинцбург | Линейный ускоритель элементарных частиц и ионов |
US3132080A (en) * | 1960-10-26 | 1964-05-05 | Thompson Ramo Wooldridge Inc | Electroplating method and apparatus |
US3470082A (en) * | 1965-09-22 | 1969-09-30 | Louis W Raymond | Electroplating method and system |
DE2537256C3 (de) * | 1975-08-21 | 1979-05-17 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Vorrichtung zum galvanischen Abscheiden von Aluminium |
JPS5954568U (ja) * | 1982-09-30 | 1984-04-10 | 富士通株式会社 | 電着めつき装置 |
SU1108130A1 (ru) * | 1983-04-15 | 1984-08-15 | Предприятие П/Я Г-4733 | Устройство дл контрол травильной способности растворов |
US4721551A (en) * | 1986-11-06 | 1988-01-26 | The Regents Of The University Of California | Iridium treatment of neuro-stimulating electrodes |
JPS63138246A (ja) * | 1986-11-29 | 1988-06-10 | Oki Electric Ind Co Ltd | メツキ液撹拌状態試験方法 |
GB8821005D0 (en) * | 1988-09-07 | 1988-10-05 | Johnson Matthey Plc | Improvements in plating |
JPH0737680B2 (ja) * | 1990-07-09 | 1995-04-26 | 株式会社アルメックス | 給電方法 |
JPH04114566A (ja) * | 1990-09-04 | 1992-04-15 | Sharp Corp | テレビドアホン装置 |
JPH04114566U (ja) * | 1991-03-20 | 1992-10-08 | アイシン精機株式会社 | メツキ処理装置 |
JPH0741998A (ja) * | 1993-07-29 | 1995-02-10 | Kawasaki Steel Corp | 鉄系電気めっき方法 |
US7153410B2 (en) * | 2000-08-30 | 2006-12-26 | Micron Technology, Inc. | Methods and apparatus for electrochemical-mechanical processing of microelectronic workpieces |
US6582570B2 (en) * | 2001-02-06 | 2003-06-24 | Danny Wu | Electroplating apparatus for wheel disk |
US20040168925A1 (en) * | 2002-10-09 | 2004-09-02 | Uziel Landau | Electrochemical system for analyzing performance and properties of electrolytic solutions |
JP2004149872A (ja) * | 2002-10-31 | 2004-05-27 | Renesas Technology Corp | メッキ処理装置およびメッキ処理方法 |
DE10323638B4 (de) * | 2003-05-26 | 2006-11-23 | Robert Bosch Gmbh | Verfahren und Vorrichtung zur Entwicklung einer elektrochemischen Messanordnung |
DE102004056158B3 (de) * | 2004-11-17 | 2006-03-30 | Siemens Ag | Verfahren zum Überwachen eines elektrochemischen Behandlungsprozesses und für dieses Verfahren geeignete Elektrodenanordnung |
US20060289299A1 (en) * | 2005-06-22 | 2006-12-28 | 3M Innovative Properties Company | Multi-channel current probe |
EP1943832A2 (fr) * | 2005-10-24 | 2008-07-16 | Nxp B.V. | Appareil de reajustement de mouvement a champ vectoriel de mouvement |
JP2007262433A (ja) * | 2006-03-27 | 2007-10-11 | Teikoku Ion Kk | クロムめっき用ハイブリッド電極、それを用いたクロムメッキ方法及びクロムめっき装置 |
JP5110269B2 (ja) * | 2007-08-09 | 2012-12-26 | 上村工業株式会社 | 電気銅めっき方法 |
JP4942580B2 (ja) * | 2007-08-20 | 2012-05-30 | 株式会社荏原製作所 | アノードホルダ用通電ベルトおよびアノードホルダ |
JP5293276B2 (ja) * | 2008-03-11 | 2013-09-18 | 上村工業株式会社 | 連続電気銅めっき方法 |
US8062496B2 (en) * | 2008-04-18 | 2011-11-22 | Integran Technologies Inc. | Electroplating method and apparatus |
US8366884B2 (en) * | 2008-04-30 | 2013-02-05 | Alcatel Lucent | Plating apparatus with direct electrolyte distribution system |
US7776741B2 (en) * | 2008-08-18 | 2010-08-17 | Novellus Systems, Inc. | Process for through silicon via filing |
-
2010
- 2010-03-31 FR FR1052373A patent/FR2958300B1/fr active Active
-
2011
- 2011-03-30 CN CN201180016583.1A patent/CN102822393B/zh active Active
- 2011-03-30 RU RU2012145547/02A patent/RU2553161C2/ru active
- 2011-03-30 US US13/637,854 patent/US20130008797A1/en not_active Abandoned
- 2011-03-30 JP JP2013501914A patent/JP5764650B2/ja active Active
- 2011-03-30 BR BR112012024387A patent/BR112012024387A2/pt not_active IP Right Cessation
- 2011-03-30 WO PCT/FR2011/050715 patent/WO2011121240A1/fr active Application Filing
- 2011-03-30 CA CA2794579A patent/CA2794579A1/fr not_active Abandoned
- 2011-03-30 EP EP11717696.6A patent/EP2553148B1/fr active Active
Also Published As
Publication number | Publication date |
---|---|
RU2012145547A (ru) | 2014-05-10 |
EP2553148A1 (fr) | 2013-02-06 |
JP2013524011A (ja) | 2013-06-17 |
JP5764650B2 (ja) | 2015-08-19 |
RU2553161C2 (ru) | 2015-06-10 |
CA2794579A1 (fr) | 2011-10-06 |
WO2011121240A1 (fr) | 2011-10-06 |
CN102822393A (zh) | 2012-12-12 |
EP2553148B1 (fr) | 2014-01-08 |
FR2958300B1 (fr) | 2012-05-04 |
FR2958300A1 (fr) | 2011-10-07 |
US20130008797A1 (en) | 2013-01-10 |
CN102822393B (zh) | 2015-06-10 |
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Legal Events
Date | Code | Title | Description |
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B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 8A ANUIDADE. |
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B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2508 DE 29-01-2019 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |