FR2958300B1 - Dispositif pour controler des caracteristiques physiques d'un bain d'electrodeposition metallique. - Google Patents

Dispositif pour controler des caracteristiques physiques d'un bain d'electrodeposition metallique.

Info

Publication number
FR2958300B1
FR2958300B1 FR1052373A FR1052373A FR2958300B1 FR 2958300 B1 FR2958300 B1 FR 2958300B1 FR 1052373 A FR1052373 A FR 1052373A FR 1052373 A FR1052373 A FR 1052373A FR 2958300 B1 FR2958300 B1 FR 2958300B1
Authority
FR
France
Prior art keywords
physical characteristics
electrodeposition bath
controlling physical
metal electrodeposition
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1052373A
Other languages
English (en)
Other versions
FR2958300A1 (fr
Inventor
Frederic Lagrange
Herve Molet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Safran Aircraft Engines SAS
Original Assignee
SNECMA SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1052373A priority Critical patent/FR2958300B1/fr
Application filed by SNECMA SAS filed Critical SNECMA SAS
Priority to US13/637,854 priority patent/US20130008797A1/en
Priority to RU2012145547/02A priority patent/RU2553161C2/ru
Priority to BR112012024387A priority patent/BR112012024387A2/pt
Priority to JP2013501914A priority patent/JP5764650B2/ja
Priority to CN201180016583.1A priority patent/CN102822393B/zh
Priority to PCT/FR2011/050715 priority patent/WO2011121240A1/fr
Priority to EP11717696.6A priority patent/EP2553148B1/fr
Priority to CA2794579A priority patent/CA2794579A1/fr
Publication of FR2958300A1 publication Critical patent/FR2958300A1/fr
Application granted granted Critical
Publication of FR2958300B1 publication Critical patent/FR2958300B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
FR1052373A 2010-03-31 2010-03-31 Dispositif pour controler des caracteristiques physiques d'un bain d'electrodeposition metallique. Active FR2958300B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR1052373A FR2958300B1 (fr) 2010-03-31 2010-03-31 Dispositif pour controler des caracteristiques physiques d'un bain d'electrodeposition metallique.
RU2012145547/02A RU2553161C2 (ru) 2010-03-31 2011-03-30 Способ и устройство для контроля эффективности ванны металлического электроосаждения
BR112012024387A BR112012024387A2 (pt) 2010-03-31 2011-03-30 dispositivo e processo para controlar a eficácia de um banho de eletrodeposição metálico
JP2013501914A JP5764650B2 (ja) 2010-03-31 2011-03-30 金属電着浴の効率を制御するための装置および方法
US13/637,854 US20130008797A1 (en) 2010-03-31 2011-03-30 Device and process for controlling the efficiency of a metal electrodeposition bath
CN201180016583.1A CN102822393B (zh) 2010-03-31 2011-03-30 用于控制金属电镀镀液效率的装置和方法
PCT/FR2011/050715 WO2011121240A1 (fr) 2010-03-31 2011-03-30 Dispositif et procede pour controler l'efficacite d'un bain d'electrodeposition metallique
EP11717696.6A EP2553148B1 (fr) 2010-03-31 2011-03-30 Dispositif et procédé pour contrôler l'efficacité d'un bain d'électrodéposition métallique
CA2794579A CA2794579A1 (fr) 2010-03-31 2011-03-30 Dispositif et procede pour controler l'efficacite d'un bain d'electrodeposition metallique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1052373A FR2958300B1 (fr) 2010-03-31 2010-03-31 Dispositif pour controler des caracteristiques physiques d'un bain d'electrodeposition metallique.

Publications (2)

Publication Number Publication Date
FR2958300A1 FR2958300A1 (fr) 2011-10-07
FR2958300B1 true FR2958300B1 (fr) 2012-05-04

Family

ID=42751439

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1052373A Active FR2958300B1 (fr) 2010-03-31 2010-03-31 Dispositif pour controler des caracteristiques physiques d'un bain d'electrodeposition metallique.

Country Status (9)

Country Link
US (1) US20130008797A1 (fr)
EP (1) EP2553148B1 (fr)
JP (1) JP5764650B2 (fr)
CN (1) CN102822393B (fr)
BR (1) BR112012024387A2 (fr)
CA (1) CA2794579A1 (fr)
FR (1) FR2958300B1 (fr)
RU (1) RU2553161C2 (fr)
WO (1) WO2011121240A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020012144A (ja) * 2018-07-17 2020-01-23 株式会社ファシリティ 電解処理装置

Family Cites Families (30)

* Cited by examiner, † Cited by third party
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US2149344A (en) * 1935-03-22 1939-03-07 Du Pont Apparatus and process for the study of plating solutions
FR863312A (fr) * 1939-02-20 1941-03-29 Procédé et appareil pour le dépôt électrolytique d'alliages d'étain
SU127339A1 (ru) * 1953-04-02 1959-11-30 М.А. Гинцбург Линейный ускоритель элементарных частиц и ионов
US3132080A (en) * 1960-10-26 1964-05-05 Thompson Ramo Wooldridge Inc Electroplating method and apparatus
US3470082A (en) * 1965-09-22 1969-09-30 Louis W Raymond Electroplating method and system
DE2537256C3 (de) * 1975-08-21 1979-05-17 Siemens Ag, 1000 Berlin Und 8000 Muenchen Vorrichtung zum galvanischen Abscheiden von Aluminium
JPS5954568U (ja) * 1982-09-30 1984-04-10 富士通株式会社 電着めつき装置
SU1108130A1 (ru) * 1983-04-15 1984-08-15 Предприятие П/Я Г-4733 Устройство дл контрол травильной способности растворов
US4721551A (en) * 1986-11-06 1988-01-26 The Regents Of The University Of California Iridium treatment of neuro-stimulating electrodes
JPS63138246A (ja) * 1986-11-29 1988-06-10 Oki Electric Ind Co Ltd メツキ液撹拌状態試験方法
GB8821005D0 (en) * 1988-09-07 1988-10-05 Johnson Matthey Plc Improvements in plating
JPH0737680B2 (ja) * 1990-07-09 1995-04-26 株式会社アルメックス 給電方法
JPH04114566A (ja) * 1990-09-04 1992-04-15 Sharp Corp テレビドアホン装置
JPH04114566U (ja) * 1991-03-20 1992-10-08 アイシン精機株式会社 メツキ処理装置
JPH0741998A (ja) * 1993-07-29 1995-02-10 Kawasaki Steel Corp 鉄系電気めっき方法
US7153410B2 (en) * 2000-08-30 2006-12-26 Micron Technology, Inc. Methods and apparatus for electrochemical-mechanical processing of microelectronic workpieces
US6582570B2 (en) * 2001-02-06 2003-06-24 Danny Wu Electroplating apparatus for wheel disk
US20040168925A1 (en) * 2002-10-09 2004-09-02 Uziel Landau Electrochemical system for analyzing performance and properties of electrolytic solutions
JP2004149872A (ja) * 2002-10-31 2004-05-27 Renesas Technology Corp メッキ処理装置およびメッキ処理方法
DE10323638B4 (de) * 2003-05-26 2006-11-23 Robert Bosch Gmbh Verfahren und Vorrichtung zur Entwicklung einer elektrochemischen Messanordnung
DE102004056158B3 (de) * 2004-11-17 2006-03-30 Siemens Ag Verfahren zum Überwachen eines elektrochemischen Behandlungsprozesses und für dieses Verfahren geeignete Elektrodenanordnung
US20060289299A1 (en) * 2005-06-22 2006-12-28 3M Innovative Properties Company Multi-channel current probe
WO2007049209A2 (fr) * 2005-10-24 2007-05-03 Nxp B.V. Appareil de reajustement de mouvement a champ vectoriel de mouvement
JP2007262433A (ja) * 2006-03-27 2007-10-11 Teikoku Ion Kk クロムめっき用ハイブリッド電極、それを用いたクロムメッキ方法及びクロムめっき装置
JP5110269B2 (ja) * 2007-08-09 2012-12-26 上村工業株式会社 電気銅めっき方法
JP4942580B2 (ja) * 2007-08-20 2012-05-30 株式会社荏原製作所 アノードホルダ用通電ベルトおよびアノードホルダ
JP5293276B2 (ja) * 2008-03-11 2013-09-18 上村工業株式会社 連続電気銅めっき方法
US8062496B2 (en) * 2008-04-18 2011-11-22 Integran Technologies Inc. Electroplating method and apparatus
US8366884B2 (en) * 2008-04-30 2013-02-05 Alcatel Lucent Plating apparatus with direct electrolyte distribution system
US7776741B2 (en) * 2008-08-18 2010-08-17 Novellus Systems, Inc. Process for through silicon via filing

Also Published As

Publication number Publication date
CN102822393A (zh) 2012-12-12
FR2958300A1 (fr) 2011-10-07
EP2553148A1 (fr) 2013-02-06
JP5764650B2 (ja) 2015-08-19
BR112012024387A2 (pt) 2016-05-24
RU2553161C2 (ru) 2015-06-10
RU2012145547A (ru) 2014-05-10
CN102822393B (zh) 2015-06-10
WO2011121240A1 (fr) 2011-10-06
US20130008797A1 (en) 2013-01-10
EP2553148B1 (fr) 2014-01-08
CA2794579A1 (fr) 2011-10-06
JP2013524011A (ja) 2013-06-17

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