BR102012029201A2 - Aparelho para realizar um processo de deposição de vapor químico por plasma. - Google Patents
Aparelho para realizar um processo de deposição de vapor químico por plasma. Download PDFInfo
- Publication number
- BR102012029201A2 BR102012029201A2 BR102012029201-7A BR102012029201A BR102012029201A2 BR 102012029201 A2 BR102012029201 A2 BR 102012029201A2 BR 102012029201 A BR102012029201 A BR 102012029201A BR 102012029201 A2 BR102012029201 A2 BR 102012029201A2
- Authority
- BR
- Brazil
- Prior art keywords
- cylindrical
- cavity
- resonator
- resonant cavity
- cylindrical axis
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 13
- 238000005229 chemical vapour deposition Methods 0.000 title abstract description 8
- 239000000126 substance Substances 0.000 claims abstract description 3
- 238000000151 deposition Methods 0.000 claims 1
- 238000005019 vapor deposition process Methods 0.000 abstract 1
- 230000021615 conjugation Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
- C03B37/01823—Plasma deposition burners or heating means
- C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32229—Waveguides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32247—Resonators
- H01J37/32256—Tuning means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2007809A NL2007809C2 (en) | 2011-11-17 | 2011-11-17 | An apparatus for performing a plasma chemical vapour deposition process. |
| NL2007809 | 2011-11-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR102012029201A2 true BR102012029201A2 (pt) | 2018-02-27 |
Family
ID=47191584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR102012029201-7A BR102012029201A2 (pt) | 2011-11-17 | 2012-11-14 | Aparelho para realizar um processo de deposição de vapor químico por plasma. |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US9376753B2 (https=) |
| EP (1) | EP2594660B1 (https=) |
| JP (1) | JP6227240B2 (https=) |
| CN (1) | CN103122455B (https=) |
| BR (1) | BR102012029201A2 (https=) |
| DK (1) | DK2594660T3 (https=) |
| NL (1) | NL2007809C2 (https=) |
| PL (1) | PL2594660T3 (https=) |
| RU (1) | RU2625664C2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105244251B (zh) * | 2015-11-03 | 2017-11-17 | 长飞光纤光缆股份有限公司 | 一种大功率等离子体微波谐振腔 |
| NL2017575B1 (en) | 2016-10-04 | 2018-04-13 | Draka Comteq Bv | A method and an apparatus for performing a plasma chemical vapour deposition process and a method |
| CN106987827B (zh) * | 2017-04-14 | 2019-03-29 | 太原理工大学 | 等离子体化学气相沉积微波谐振腔及装置 |
| CN110459853A (zh) * | 2019-08-21 | 2019-11-15 | 上海至纯洁净系统科技股份有限公司 | 一种适用于pcvd工艺的分体式易调谐微波谐振腔 |
| NL2028245B1 (en) * | 2021-05-19 | 2022-12-05 | Draka Comteq Bv | A plasma chemical vapor deposition apparatus |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4125389A (en) | 1977-02-10 | 1978-11-14 | Northern Telecom Limited | Method for manufacturing an optical fibre with plasma activated deposition in a tube |
| JPS62290054A (ja) * | 1986-06-09 | 1987-12-16 | Mitsubishi Electric Corp | マイクロ波によるガスのイオン化方法およびイオン源装置 |
| JPH02107778A (ja) * | 1988-10-18 | 1990-04-19 | Canon Inc | 偏波制御マイクロ波プラズマ処理装置 |
| US5037666A (en) * | 1989-08-03 | 1991-08-06 | Uha Mikakuto Precision Engineering Research Institute Co., Ltd. | High-speed film forming method by microwave plasma chemical vapor deposition (CVD) under high pressure |
| JPH06140186A (ja) * | 1992-10-22 | 1994-05-20 | Mitsubishi Heavy Ind Ltd | プラズマ製造方法 |
| DE19600223A1 (de) | 1996-01-05 | 1997-07-17 | Ralf Dr Dipl Phys Spitzl | Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen |
| US6715441B2 (en) | 1997-12-31 | 2004-04-06 | Plasma Optical Fibre B.V. | PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| ATE234947T1 (de) * | 1997-12-31 | 2003-04-15 | Draka Fibre Technology Bv | Pcvd-vorrichtung und verfahren zur herstellung einer optischen faser, eines vorform-stabes und eines mantelrohres und die damit hergestellte optische faser |
| DE19847848C1 (de) * | 1998-10-16 | 2000-05-11 | R3 T Gmbh Rapid Reactive Radic | Vorrichtung und Erzeugung angeregter/ionisierter Teilchen in einem Plasma |
| JP3625197B2 (ja) * | 2001-01-18 | 2005-03-02 | 東京エレクトロン株式会社 | プラズマ装置およびプラズマ生成方法 |
| US6951798B2 (en) * | 2001-06-08 | 2005-10-04 | Wisconsin Alumni Research Foundation | Method of bonding a stack of layers by electromagnetic induction heating |
| US7650853B2 (en) * | 2001-12-04 | 2010-01-26 | Draka Fibre Technology B.V. | Device for applying electromagnetic microwave radiation in a plasma cavity |
| US20030152700A1 (en) * | 2002-02-11 | 2003-08-14 | Board Of Trustees Operating Michigan State University | Process for synthesizing uniform nanocrystalline films |
| NL1025155C2 (nl) * | 2003-12-30 | 2005-07-04 | Draka Fibre Technology Bv | Inrichting voor het uitvoeren van PCVD, alsmede werkwijze voor het vervaardigen van een voorvorm. |
| JP4852997B2 (ja) * | 2005-11-25 | 2012-01-11 | 東京エレクトロン株式会社 | マイクロ波導入装置及びプラズマ処理装置 |
| KR100861412B1 (ko) | 2006-06-13 | 2008-10-07 | 조영상 | 다결정 실리콘 잉곳 제조장치 |
| NL1032015C2 (nl) * | 2006-06-16 | 2008-01-08 | Draka Comteq Bv | Inrichting voor het uitvoeren van een plasma chemische dampdepositie (PCVD) en werkwijze ter vervaardiging van een optische vezel. |
| FR2903622B1 (fr) * | 2006-07-17 | 2008-10-03 | Sidel Participations | Dispositif pour le depot d'un revetement sur une face interne d'un recipient |
| NL1033783C2 (nl) | 2007-05-01 | 2008-11-06 | Draka Comteq Bv | Inrichting voor het uitvoeren van een plasma chemische dampdepositie alsmede werkwijze ter vervaardiging van een optische voorvorm. |
| US20120186747A1 (en) * | 2011-01-26 | 2012-07-26 | Obama Shinji | Plasma processing apparatus |
-
2011
- 2011-11-17 NL NL2007809A patent/NL2007809C2/en not_active IP Right Cessation
-
2012
- 2012-10-12 RU RU2012143706A patent/RU2625664C2/ru active
- 2012-11-09 US US13/672,706 patent/US9376753B2/en active Active
- 2012-11-14 EP EP12192493.0A patent/EP2594660B1/en active Active
- 2012-11-14 DK DK12192493.0T patent/DK2594660T3/da active
- 2012-11-14 PL PL12192493T patent/PL2594660T3/pl unknown
- 2012-11-14 BR BR102012029201-7A patent/BR102012029201A2/pt not_active Application Discontinuation
- 2012-11-16 CN CN201210480714.8A patent/CN103122455B/zh active Active
- 2012-11-19 JP JP2012253248A patent/JP6227240B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN103122455B (zh) | 2017-05-24 |
| NL2007809C2 (en) | 2013-05-21 |
| JP2013108179A (ja) | 2013-06-06 |
| US9376753B2 (en) | 2016-06-28 |
| EP2594660A1 (en) | 2013-05-22 |
| EP2594660B1 (en) | 2020-06-17 |
| PL2594660T3 (pl) | 2020-11-16 |
| CN103122455A (zh) | 2013-05-29 |
| RU2012143706A (ru) | 2014-04-20 |
| RU2625664C2 (ru) | 2017-07-18 |
| JP6227240B2 (ja) | 2017-11-08 |
| DK2594660T3 (da) | 2020-09-07 |
| US20130125817A1 (en) | 2013-05-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| BR102012029201A2 (pt) | Aparelho para realizar um processo de deposição de vapor químico por plasma. | |
| KR101229843B1 (ko) | 플라즈마 처리 장치 | |
| JP6076337B2 (ja) | プラズマチャンバのための伝送線ｒｆアプリケータ | |
| US6401653B1 (en) | Microwave plasma generator | |
| US7048802B2 (en) | CVD reactor with graphite-foam insulated, tubular susceptor | |
| JPH08148911A (ja) | 導波管同軸変換器及び導波管整合回路 | |
| JP6931461B2 (ja) | プラズマ発生用のアンテナ、それを備えるプラズマ処理装置及びアンテナ構造 | |
| US10594014B2 (en) | Connection structure of high-frequency transmission line | |
| KR20180064490A (ko) | 동축 애플리케이터로 플라즈마를 생성하기 위한 기초 장치 | |
| US20150013907A1 (en) | Microwave plasma processing apparatus, slot antenna, and semiconductor device | |
| US2808534A (en) | Traveling wave tube | |
| EP3598852B1 (en) | High-frequency coupler | |
| US20150013912A1 (en) | Microwave plasma processing apparatus, slot antenna, and semiconductor device | |
| JP4967107B2 (ja) | マイクロ波導入器、プラズマ発生装置及びプラズマ処理装置 | |
| JP7360934B2 (ja) | プラズマ処理装置及びプラズマ処理方法 | |
| JP3790216B2 (ja) | プラズマ発生装置 | |
| JP5273759B1 (ja) | プラズマ処理装置およびプラズマ処理方法 | |
| WO2014192062A1 (ja) | マイクロ波プラズマ発生装置の空洞共振器 | |
| CN107134657B (zh) | 一种周期分布的共焦波导介质陶瓷环微波吸收装置 | |
| US20190301813A1 (en) | Sleeve-type heat conducting structure | |
| US2766432A (en) | Wave guide transition | |
| US20250255347A1 (en) | Aerosol-generating device and microwave heating assembly thereof | |
| KR102901467B1 (ko) | 안테나 및 플라즈마 처리 장치 | |
| KR101310753B1 (ko) | 유도 안테나 | |
| JP2024125687A (ja) | プラズマ発生装置およびプラズマ処理装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B03A | Publication of a patent application or of a certificate of addition of invention [chapter 3.1 patent gazette] | ||
| B25G | Requested change of headquarter approved |
Owner name: DRAKA COMTEQ, B.V (NL) |
|
| B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
| B06T | Formal requirements before examination [chapter 6.20 patent gazette] | ||
| B11E | Dismissal acc. art. 34 of ipl - requirements for examination incomplete | ||
| B11T | Dismissal of application maintained [chapter 11.20 patent gazette] |