BR0316657A - Composições de resina fotossensìvel compreendendo um corante isento de halogênio - Google Patents
Composições de resina fotossensìvel compreendendo um corante isento de halogênioInfo
- Publication number
- BR0316657A BR0316657A BR0316657-0A BR0316657A BR0316657A BR 0316657 A BR0316657 A BR 0316657A BR 0316657 A BR0316657 A BR 0316657A BR 0316657 A BR0316657 A BR 0316657A
- Authority
- BR
- Brazil
- Prior art keywords
- component
- alkyl
- photosensitive resin
- phenyl
- resin compositions
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0266—Marks, test patterns or identification means
- H05K1/0269—Marks, test patterns or identification means for visual or optical inspection
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/16—Inspection; Monitoring; Aligning
- H05K2203/161—Using chemical substances, e.g. colored or fluorescent, for facilitating optical or visual inspection
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials For Photolithography (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
"COMPOSIçõES DE RESINA FOTOSSENSìVEL COMPREENDENDO UM CORANTE ISENTO DE HALOGêNIO". A presente invenção refere-se a uma composição de resina fotossensível compreendendo a) como um componente (A) um corante verde de fórmula em que os anéis A, B, C e D são substituídos por hidróxi ou pela porção onde R~ 1~, é hidrogênio ou C~ 1~-C~ 4~alquila, R~ 2~ é hidrogênio ou C~ 1~-C~ 4~alquila, n é 0, 1, 2 ou 3 e o anel E é não-substituído ou substituído por C~ 1~-C~ 6~alquila, C~ 1~-C~ 6~alcóxi, hidróxi, NHCOR~ 3~, NHSO~ 2~R~ 4~ ou SO~ 2~NHR~ 5~, onde R~ 3~ é C~ 1~-C~ 4~alquila ou fenila, R~ 4~ é C~ 1~-C~ 4~alquila ou fenila e R~ 5~ é C~ 1~-C~ 4~alquila ou fenila, b) como um componente (B), um oligómero ou polímero solúvel em álcali (reativo ou não-reativo), c) como um componente (C), um monómero polimerizável, d) como um componente (D), um fotoiniciador, e) como um componente (E), um composto epóxi, e também, se desejado, f) como um componente (F), aditivos adicionais, utilizado como máscara de solda, resistente a ataque químico ou resistente à galvanização, na fabricação de placas de circuitos impressos.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02406035 | 2002-11-28 | ||
PCT/EP2003/050849 WO2004049070A2 (en) | 2002-11-28 | 2003-11-19 | Photosensitive resin composition comprising a halogen-free colorant |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0316657A true BR0316657A (pt) | 2005-10-18 |
Family
ID=32338233
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0316657-0A BR0316657A (pt) | 2002-11-28 | 2003-11-19 | Composições de resina fotossensìvel compreendendo um corante isento de halogênio |
Country Status (13)
Country | Link |
---|---|
US (1) | US8034531B2 (pt) |
EP (1) | EP1565789B1 (pt) |
JP (1) | JP4390707B2 (pt) |
KR (1) | KR101081756B1 (pt) |
CN (1) | CN100549825C (pt) |
AT (1) | ATE453877T1 (pt) |
AU (1) | AU2003298293A1 (pt) |
BR (1) | BR0316657A (pt) |
CA (1) | CA2507471A1 (pt) |
DE (1) | DE60330802D1 (pt) |
MX (1) | MXPA05005682A (pt) |
TW (1) | TW200421022A (pt) |
WO (1) | WO2004049070A2 (pt) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MY148552A (en) | 2005-10-25 | 2013-04-30 | Hitachi Chemical Co Ltd | Photosensitive resin composition, photosensitive element comprising the same, method of forming resist pattern, and process for producing printed wiring board |
US7713342B2 (en) * | 2006-12-19 | 2010-05-11 | Xerox Corporation | Phase change inks |
JP5291893B2 (ja) * | 2007-05-08 | 2013-09-18 | 太陽ホールディングス株式会社 | 光硬化性樹脂組成物およびその硬化物 |
WO2012036477A2 (ko) * | 2010-09-16 | 2012-03-22 | 주식회사 엘지화학 | 감광성 수지 조성물, 드라이 필름 솔더 레지스트 및 회로 기판 |
JP5809182B2 (ja) * | 2013-03-26 | 2015-11-10 | 株式会社タムラ製作所 | 感光性樹脂組成物 |
CN108003172A (zh) * | 2017-12-12 | 2018-05-08 | 深圳市华星光电技术有限公司 | 一种绿色光阻材料及其制备方法和应用 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4039585A (en) * | 1975-09-08 | 1977-08-02 | Uop Inc. | Hydroformylation process |
JPS61243869A (ja) | 1985-04-19 | 1986-10-30 | Taiyo Ink Seizo Kk | レジストインキ組成物 |
US4789620A (en) * | 1986-03-03 | 1988-12-06 | Mitsubishi Rayon Co. Ltd. | Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates |
US5578419A (en) | 1991-12-12 | 1996-11-26 | Mitsui Toatsu Chemicals, Incorporated | Dyes for color filters, and photosensitive resist resin composition containing the same |
EP0633296B1 (en) * | 1993-07-09 | 1999-10-13 | Mitsui Chemicals, Inc. | Novel dyestuffs and their use |
US5691101A (en) * | 1994-03-15 | 1997-11-25 | Kabushiki Kaisha Toshiba | Photosensitive composition |
DE59507879D1 (de) | 1994-09-23 | 2000-04-06 | Ciba Sc Holding Ag | Verfahren zur Herstellung von bromierten, Alkoxy-substituierten Metall-Phthalocyaninen |
US5798137A (en) * | 1995-06-07 | 1998-08-25 | Advanced Silicon Materials, Inc. | Method for silicon deposition |
EP0763580B1 (en) * | 1995-09-11 | 2003-08-13 | Toyo Ink Manufacturing Co., Ltd. | Aqueous type pigment dispersing agent, composition containing the same and aqueous pigment dispersion |
JP3653855B2 (ja) | 1996-04-15 | 2005-06-02 | 三菱化学株式会社 | フタロシアニン化合物及びそれを用いた光学記録媒体 |
WO1998014520A1 (en) * | 1996-10-03 | 1998-04-09 | Ciba Specialty Chemicals Holding Inc. | Substituted phthalocyanines and their use |
JP3286905B2 (ja) | 1997-08-04 | 2002-05-27 | 株式会社リコー | フタロシアニン化合物 |
JP4523679B2 (ja) | 1998-06-22 | 2010-08-11 | 太陽インキ製造株式会社 | ハロゲンフリーの着色顔料を用いたプリント配線板用緑色レジストインキ組成物 |
DE59903992D1 (de) * | 1998-09-21 | 2003-02-13 | Ciba Sc Holding Ag | Substituierte phthalocyanine |
DE19915717A1 (de) * | 1999-04-08 | 2000-10-12 | Agfa Gevaert Ag | Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht |
JP4075286B2 (ja) | 1999-06-21 | 2008-04-16 | 東洋インキ製造株式会社 | ハロゲンを含有しない緑色顔料組成物 |
US6214433B1 (en) * | 1999-10-04 | 2001-04-10 | Dsm N.V. | Radiation-curable coatings for optical discs and optical discs incorporating such coatings |
US6713230B2 (en) | 1999-10-25 | 2004-03-30 | Nan Ya Plastics Corporation | Photosensitive ink composition |
US20020077384A1 (en) * | 2000-05-10 | 2002-06-20 | Seiko Epson Corporation | Ink jet recording ink composition containing pigment coated with resin |
TWI237531B (en) | 2000-12-13 | 2005-08-01 | Goo Chemical Co Ltd | Solder resist ink |
US7144677B2 (en) * | 2001-03-21 | 2006-12-05 | Ricoh Company, Ltd. | Optical recording method and optical recording medium |
JP4472205B2 (ja) * | 2001-04-17 | 2010-06-02 | 株式会社リコー | フタロシアニン化合物 |
TWI227478B (en) * | 2001-04-26 | 2005-02-01 | Fuji Photo Film Co Ltd | Optical information recording medium |
US6726755B2 (en) * | 2002-02-08 | 2004-04-27 | Xerox Corporation | Ink compositions containing phthalocyanines |
-
2003
- 2003-11-19 CA CA002507471A patent/CA2507471A1/en not_active Abandoned
- 2003-11-19 KR KR1020057009694A patent/KR101081756B1/ko not_active IP Right Cessation
- 2003-11-19 WO PCT/EP2003/050849 patent/WO2004049070A2/en active Application Filing
- 2003-11-19 JP JP2004554539A patent/JP4390707B2/ja not_active Expired - Fee Related
- 2003-11-19 AU AU2003298293A patent/AU2003298293A1/en not_active Abandoned
- 2003-11-19 MX MXPA05005682A patent/MXPA05005682A/es not_active Application Discontinuation
- 2003-11-19 DE DE60330802T patent/DE60330802D1/de not_active Expired - Lifetime
- 2003-11-19 BR BR0316657-0A patent/BR0316657A/pt not_active Application Discontinuation
- 2003-11-19 AT AT03796025T patent/ATE453877T1/de not_active IP Right Cessation
- 2003-11-19 CN CNB2003801043254A patent/CN100549825C/zh not_active Expired - Fee Related
- 2003-11-19 EP EP03796025A patent/EP1565789B1/en not_active Expired - Lifetime
- 2003-11-19 US US10/535,373 patent/US8034531B2/en not_active Expired - Fee Related
- 2003-11-27 TW TW092133372A patent/TW200421022A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
TW200421022A (en) | 2004-10-16 |
CN100549825C (zh) | 2009-10-14 |
EP1565789B1 (en) | 2009-12-30 |
KR20050084033A (ko) | 2005-08-26 |
JP4390707B2 (ja) | 2009-12-24 |
WO2004049070A3 (en) | 2004-07-22 |
ATE453877T1 (de) | 2010-01-15 |
DE60330802D1 (de) | 2010-02-11 |
MXPA05005682A (es) | 2005-07-26 |
US8034531B2 (en) | 2011-10-11 |
US20050282923A1 (en) | 2005-12-22 |
EP1565789A2 (en) | 2005-08-24 |
KR101081756B1 (ko) | 2011-11-10 |
CA2507471A1 (en) | 2004-06-10 |
JP2006508381A (ja) | 2006-03-09 |
CN1717627A (zh) | 2006-01-04 |
AU2003298293A1 (en) | 2004-06-18 |
WO2004049070A2 (en) | 2004-06-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B11A | Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing | ||
B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |