BR0106878B1 - "processo para produção de resina absorvente de água". - Google Patents

"processo para produção de resina absorvente de água".

Info

Publication number
BR0106878B1
BR0106878B1 BRPI0106878-4A BR0106878A BR0106878B1 BR 0106878 B1 BR0106878 B1 BR 0106878B1 BR 0106878 A BR0106878 A BR 0106878A BR 0106878 B1 BR0106878 B1 BR 0106878B1
Authority
BR
Brazil
Prior art keywords
water absorbing
absorbing resin
producing water
producing
resin
Prior art date
Application number
BRPI0106878-4A
Other languages
English (en)
Other versions
BR0106878A (pt
Inventor
Yukihiro Matsumoto
Kunihiko Ishizaki
Teruyuki Kanto
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=18687082&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BR0106878(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed filed Critical
Publication of BR0106878A publication Critical patent/BR0106878A/pt
Publication of BR0106878B1 publication Critical patent/BR0106878B1/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/04Acids, Metal salts or ammonium salts thereof
    • C08F20/06Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
BRPI0106878-4A 2000-06-21 2001-06-20 "processo para produção de resina absorvente de água". BR0106878B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000187021 2000-06-21
PCT/JP2001/005265 WO2001098382A1 (fr) 2000-06-21 2001-06-20 Procede de production d'une resine absorbant l'eau

Publications (2)

Publication Number Publication Date
BR0106878A BR0106878A (pt) 2002-05-14
BR0106878B1 true BR0106878B1 (pt) 2011-05-03

Family

ID=18687082

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0106878-4A BR0106878B1 (pt) 2000-06-21 2001-06-20 "processo para produção de resina absorvente de água".

Country Status (7)

Country Link
US (2) US6927268B2 (pt)
EP (1) EP1302485B1 (pt)
JP (2) JP5349723B2 (pt)
CN (1) CN1206250C (pt)
BR (1) BR0106878B1 (pt)
WO (1) WO2001098382A1 (pt)
ZA (1) ZA200200723B (pt)

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EP1594608B1 (en) 2003-02-10 2013-07-17 Nippon Shokubai Co., Ltd. Particulate water absorbent containing water absorbent resin as a main component
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EP1791894B1 (en) * 2004-09-24 2020-10-21 Nippon Shokubai Co., Ltd. Particulate water-absorbing agent containing water-absorbent resin as a main component
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TWI394789B (zh) 2005-12-22 2013-05-01 Nippon Catalytic Chem Ind 吸水性樹脂組成物及其製造方法、吸收性物品
EP1837348B9 (en) * 2006-03-24 2020-01-08 Nippon Shokubai Co.,Ltd. Water-absorbing resin and method for manufacturing the same
EP2013251B1 (en) * 2006-03-27 2011-09-14 Nippon Shokubai Co.,Ltd. Water absorbing resin with improved internal structure and manufacturing method therefor
CN101410177B (zh) * 2006-03-27 2012-06-27 株式会社日本触媒 吸水剂、使用所述吸水剂的吸水芯片以及制备吸水剂的方法
EP2042521A1 (en) * 2006-03-29 2009-04-01 Nippon Shokubai Co., Ltd. Method of producing polyacrylic acid (salt) water-absorbent resin
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JP5167263B2 (ja) 2006-09-19 2013-03-21 ビーエーエスエフ ソシエタス・ヨーロピア 中和度の低い、色安定性の吸水性ポリマー粒子の製造方法
CN101173016B (zh) * 2006-11-01 2011-02-02 台湾塑胶工业股份有限公司 高性能高吸水性树脂的制造方法
WO2008102322A2 (en) 2007-02-22 2008-08-28 The Procter & Gamble Company Method of surface treating particulate material using electromagnetic radiation
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CN104407420B (zh) 2008-08-15 2019-06-11 康宁光缆系统有限公司 光缆及制造光缆的方法
WO2010090324A1 (ja) 2009-02-06 2010-08-12 株式会社日本触媒 ポリアクリル酸(塩)系吸水性樹脂およびその製造方法
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JP5801203B2 (ja) 2009-09-29 2015-10-28 株式会社日本触媒 粒子状吸水剤及びその製造方法
BR112012027407B1 (pt) 2010-04-26 2020-04-07 Nippon Catalytic Chem Ind resina absorvedora de água tipo ácido poliacrílico (sal), material sanitário contendo a mesma, método para produzir e identificar a mesma e método para produzir ácido poliacrílico (sal)
CN102858815B (zh) 2010-04-26 2016-07-06 株式会社日本触媒 聚丙烯酸(盐)、聚丙烯酸(盐)系吸水性树脂及其制造方法
KR101136873B1 (ko) * 2011-05-12 2012-04-20 주식회사 반포유통 클린 워터 배출장치
KR102000808B1 (ko) 2012-02-17 2019-07-16 가부시키가이샤 닛폰 쇼쿠바이 폴리아크릴산(염)계 흡수성 수지 및 그의 제조 방법
EP3896104A1 (en) 2012-11-21 2021-10-20 Basf Se Surface-postcrosslinked water-absorbent polymer particles
KR101700907B1 (ko) 2013-12-10 2017-01-31 주식회사 엘지화학 고흡수성 수지의 제조 방법
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KR20220031899A (ko) * 2019-07-05 2022-03-14 스미토모 세이카 가부시키가이샤 가교 중합체 젤 및 그 제조 방법, 단량체 조성물, 및 가교 중합체 입자의 제조 방법

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Also Published As

Publication number Publication date
EP1302485A1 (en) 2003-04-16
JP5349723B2 (ja) 2013-11-20
US7238743B2 (en) 2007-07-03
BR0106878A (pt) 2002-05-14
US20020120085A1 (en) 2002-08-29
CN1206250C (zh) 2005-06-15
WO2001098382A1 (fr) 2001-12-27
CN1383432A (zh) 2002-12-04
EP1302485B1 (en) 2013-04-24
EP1302485A4 (en) 2006-08-30
ZA200200723B (en) 2002-09-05
US20050228154A1 (en) 2005-10-13
US6927268B2 (en) 2005-08-09
JP2013100529A (ja) 2013-05-23

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Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 20/06/2001, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 20A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2624 DE 20-04-2021 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.