BE1010550A3 - Compositions de film polymere de revetement et compositions de materiau d'enregistrement stabilisees. - Google Patents

Compositions de film polymere de revetement et compositions de materiau d'enregistrement stabilisees. Download PDF

Info

Publication number
BE1010550A3
BE1010550A3 BE9600333A BE9600333A BE1010550A3 BE 1010550 A3 BE1010550 A3 BE 1010550A3 BE 9600333 A BE9600333 A BE 9600333A BE 9600333 A BE9600333 A BE 9600333A BE 1010550 A3 BE1010550 A3 BE 1010550A3
Authority
BE
Belgium
Prior art keywords
sep
layer
tert
composition according
benzotriazole
Prior art date
Application number
BE9600333A
Other languages
English (en)
French (fr)
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Application granted granted Critical
Publication of BE1010550A3 publication Critical patent/BE1010550A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
    • B41M5/52—Macromolecular coatings
    • B41M5/5227—Macromolecular coatings characterised by organic non-macromolecular additives, e.g. UV-absorbers, plasticisers, surfactants
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155—Organic compounds therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Ink Jet (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
BE9600333A 1995-04-19 1996-04-17 Compositions de film polymere de revetement et compositions de materiau d'enregistrement stabilisees. BE1010550A3 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/424,843 US5574166A (en) 1995-04-19 1995-04-19 Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole

Publications (1)

Publication Number Publication Date
BE1010550A3 true BE1010550A3 (fr) 1998-10-06

Family

ID=23684097

Family Applications (1)

Application Number Title Priority Date Filing Date
BE9600333A BE1010550A3 (fr) 1995-04-19 1996-04-17 Compositions de film polymere de revetement et compositions de materiau d'enregistrement stabilisees.

Country Status (18)

Country Link
US (4) US5574166A (zh)
EP (1) EP0738718A1 (zh)
JP (2) JPH08291151A (zh)
KR (2) KR100426626B1 (zh)
CN (2) CN1059899C (zh)
AT (1) AT405936B (zh)
AU (2) AU707202B2 (zh)
BE (1) BE1010550A3 (zh)
BR (2) BR9601992A (zh)
CA (2) CA2174412A1 (zh)
DE (1) DE19615000A1 (zh)
ES (1) ES2130930B1 (zh)
FR (1) FR2733239B1 (zh)
GB (1) GB2299957B (zh)
IT (1) IT1283615B1 (zh)
NL (1) NL1002904C2 (zh)
SE (1) SE509606C2 (zh)
TW (1) TW419497B (zh)

Families Citing this family (90)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5574166A (en) * 1995-04-19 1996-11-12 Ciba-Geigy Corporation Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole
US6166218A (en) 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
US5977219A (en) * 1997-10-30 1999-11-02 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
CH693032A5 (de) * 1996-11-07 2003-01-31 Ciba Sc Holding Ag Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit.
AU7043298A (en) 1997-04-15 1998-11-11 Ciba Specialty Chemicals Holding Inc. Preparation of low-dust stabilisers
DE19723779A1 (de) * 1997-06-06 1998-12-10 Agfa Gevaert Ag Inkjet-System
US6383716B1 (en) 1997-08-22 2002-05-07 Asahi Kasei Kabushiki Kaisha Stable photosensitive resin composition
JP3448851B2 (ja) * 1997-11-28 2003-09-22 タキロン株式会社 添加剤含有樹脂成形品及びその製造方法
US5948150A (en) * 1998-05-05 1999-09-07 Hewlett-Packard Company Composition to improve colorfastness of a printed image
WO2000014126A1 (de) * 1998-09-09 2000-03-16 Ciba Specialty Chemicals Holding Inc. Photostabiles chromophor-system
DE69940811D1 (de) * 1999-02-19 2009-06-10 Asahi Kasei Chemicals Corp Stabile lichtempfindliche harzzusammensetzung
EP1046670B1 (en) * 1999-04-23 2003-07-09 Nippon Mitsubishi Oil Corporation Ultraviolet absorptive resin composition
EP1175467B1 (en) * 1999-05-03 2006-06-14 Ciba SC Holding AG Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole uv absorbers and laminated articles derived therefrom
US6245915B1 (en) 1999-05-03 2001-06-12 Ciba Specialty Chemicals Corporation Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety
US6268415B1 (en) 1999-05-03 2001-07-31 Ciba Specialty Chemicals Corporation Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom
US6187845B1 (en) * 1999-05-03 2001-02-13 Ciba Specialty Chemicals Corporation Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom
EP1068866A3 (de) * 1999-07-12 2004-03-17 Ciba SC Holding AG Verwendung von Mischungen aus Mikropigmenten zur Bräunungsverhinderung und Aufhellung der Haut und Haare
AU780351B2 (en) * 2000-02-01 2005-03-17 Ciba Specialty Chemicals Holding Inc. Method of content protection with durable UV absorbers
US6392056B1 (en) 2000-08-03 2002-05-21 Ciba Specialty Chemical Corporation 2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith
US6451887B1 (en) * 2000-08-03 2002-09-17 Ciba Specialty Chemicals Corporation Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith
US6387992B1 (en) 2000-11-27 2002-05-14 Ciba Specialty Chemicals Corporation Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith
US6649770B1 (en) * 2000-11-27 2003-11-18 Ciba Specialty Chemicals Corporation Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof
CN100402612C (zh) * 2001-01-16 2008-07-16 西巴特殊化学品控股有限公司 喷墨油墨和记录材料
JP4993421B2 (ja) * 2001-06-07 2012-08-08 株式会社Ａｄｅｋａ 合成樹脂組成物
US20050171253A1 (en) * 2002-02-19 2005-08-04 Andrews Stephen M. Containers or films comprising hydroxyphenlbenzotriazole uv absorbers for protecting contents against the effects of uv radiation
US20050209252A1 (en) * 2002-03-29 2005-09-22 Che-Ming Teng Cancer treatment
AU2003238442A1 (en) 2002-06-06 2003-12-22 Siba Spelcialty Chemicals Holding Inc. Electroluminescent device
DE10228186A1 (de) * 2002-06-24 2004-01-22 Merck Patent Gmbh UV-stabilisierte Partikel
KR100950626B1 (ko) * 2002-06-24 2010-04-01 메르크 파텐트 게엠베하 Ｕｖ-안정화 입자
DE10243438A1 (de) * 2002-09-18 2004-03-25 Merck Patent Gmbh Oberflächenmodifizierte Effektpigmente
WO2004056931A1 (en) * 2002-12-20 2004-07-08 Ciba Specialty Chemicals Holding Inc. Ink-jet ink and recording material
JP4563820B2 (ja) * 2003-01-29 2010-10-13 チバ ホールディング インコーポレーテッド インクジェットインクおよび記録材料
JP4850694B2 (ja) 2003-02-26 2012-01-11 チバ ホールディング インコーポレーテッド 水融和性立体阻害されたヒドロキシ置換アルコキシアミン類
US6974850B2 (en) * 2003-05-30 2005-12-13 3M Innovative Properties Company Outdoor weatherable photopolymerizable coatings
US7153588B2 (en) * 2003-05-30 2006-12-26 3M Innovative Properties Company UV resistant naphthalate polyester articles
JP4018674B2 (ja) * 2003-08-04 2007-12-05 キヤノン株式会社 インク用被記録媒体の製造方法
WO2005032833A1 (en) 2003-10-03 2005-04-14 Fuji Photo Film B.V. Recording medium
WO2005032835A1 (en) 2003-10-03 2005-04-14 Fuji Photo Film B.V. Recording medium
DE10358092A1 (de) * 2003-12-10 2005-07-14 Merck Patent Gmbh Oberflächenmodifizierte Partikel
US20060083940A1 (en) * 2004-04-30 2006-04-20 Solomon Bekele Ultraviolet light absorbing composition
US20060008588A1 (en) * 2004-07-12 2006-01-12 Marc Chilla Process for the production of multi-layer coatings
US7968151B2 (en) * 2004-07-12 2011-06-28 E. I. Du Pont De Nemours And Company Process for the production of multi-layer coatings
US7595011B2 (en) 2004-07-12 2009-09-29 Ciba Specialty Chemicals Corporation Stabilized electrochromic media
US20060068116A1 (en) * 2004-09-27 2006-03-30 Marc Chilla Process for the production of multi-layer coatings in light metallic color shades
US8865262B2 (en) * 2004-09-27 2014-10-21 Axalta Coating Systems Ip Co., Llc Process for producing multi-layer coatings in light metallic color shades
EP1794220A1 (en) * 2004-09-30 2007-06-13 Ciba Specialty Chemicals Holding Inc. Method for replenishing or introducing light stabilizers
US20060122293A1 (en) * 2004-12-03 2006-06-08 Rick Wilk Ultraviolet light absorber stabilizer combination
US20060134334A1 (en) * 2004-12-22 2006-06-22 Marc Chilla Process for the production of primer surfacer-free multi-layer coatings
US20060177639A1 (en) * 2005-02-04 2006-08-10 Elzen Kerstin T Process for the production of primer surfacer-free multi-layer coatings
US7910211B2 (en) * 2005-06-20 2011-03-22 E.I. Du Pont De Nemours And Company Process for the production of multi-layer coatings
US20070071901A1 (en) * 2005-09-29 2007-03-29 Giannoula Avgenaki Process for the production of multi-layer coatings
JP4821597B2 (ja) * 2006-01-06 2011-11-24 住友化学株式会社 多層光拡散板
TWI434073B (zh) * 2006-01-06 2014-04-11 Sumitomo Chemical Co 多層光擴散板
US20070238814A1 (en) * 2006-04-10 2007-10-11 Basf Corporation Method of making coating compositions
US20070260012A1 (en) * 2006-05-05 2007-11-08 Algrim Danald J HAPs free coating composition and film thereof
KR100836571B1 (ko) 2006-12-29 2008-06-10 제일모직주식회사 반도체 소자 밀봉용 에폭시 수지 조성물　및 이를 이용한반도체 소자
TW200829637A (en) * 2007-01-03 2008-07-16 Double Bond Chemical Ind Co Ltd Liquid containing 2-(-hydroxyl-3-α-cumylphenyl-5-tertiery-octylphenyl) -2-hydrogen-benzotriazole
US8399536B2 (en) 2007-06-29 2013-03-19 Basell Poliolefine Italia, s.r.l. Irradiated polyolefin composition comprising a non-phenolic stabilizer
US20090047092A1 (en) * 2007-08-15 2009-02-19 Ppg Industries Ohio, Inc. Coated fasteners
US20100056680A1 (en) * 2008-08-29 2010-03-04 Sumitomo Chemical Company, Limited Amorphous compound and stabilizer for polymers containing the amorphous compound
US7847103B2 (en) * 2008-10-04 2010-12-07 Chia-Hu Chang Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole
WO2010072592A1 (en) 2008-12-22 2010-07-01 Basf Se Method of improving scratch resistance and related products and uses
EP2451746B1 (en) 2009-07-07 2019-02-27 Basf Se Composition comprising potassium cesium tungsten bronze particles and use of these particles
FR2955038B1 (fr) * 2010-01-11 2012-05-11 Commissariat Energie Atomique Nanoparticules anti-uv
US20120329885A1 (en) * 2011-06-23 2012-12-27 Chia-Hu Chang Ultraviolet light absorbing compounds based on benzyl substituted 2-(2- hydroxyphenyl) benzotriazoles
JP5879170B2 (ja) * 2012-03-26 2016-03-08 積水化学工業株式会社 熱硬化性フラン樹脂組成物及びこれを用いたフラン樹脂積層体
WO2014066358A1 (en) 2012-10-23 2014-05-01 Basf Se Ethylenically unsaturated oligomers containing polymer stabilizer groups
CA2906521C (en) * 2013-03-16 2019-12-03 Prc-Desoto International, Inc. Azole compounds as corrosion inhibitors
KR102294024B1 (ko) 2013-09-27 2021-08-27 바스프 에스이 건축 재료를 위한 폴리올레핀 조성물
US10294423B2 (en) 2013-11-22 2019-05-21 Polnox Corporation Macromolecular antioxidants based on dual type moiety per molecule: structures, methods of making and using the same
TWI685524B (zh) 2013-12-17 2020-02-21 美商畢克美國股份有限公司 預先脫層之層狀材料
WO2017013028A1 (en) 2015-07-20 2017-01-26 Basf Se Flame retardant polyolefin articles
CN105694099B (zh) * 2016-03-09 2017-03-15 天津利安隆新材料股份有限公司 一种用于聚合物的添加剂
JP7111432B2 (ja) 2017-06-02 2022-08-02 コベストロ （ネザーランズ） ビー．ブイ． 光ファイバー用耐熱放射線硬化性コーティング
US11319246B2 (en) 2017-11-03 2022-05-03 Covestro (Netherlands) B.V. Water-blocking systems including fibers coated with liquid radiation curable SAP compositions
KR20210018338A (ko) 2018-06-01 2021-02-17 디에스엠 아이피 어셋츠 비.브이. 대체 올리고머를 통한 광섬유 코팅용 방사선 경화성 조성물 및 이로부터 제조된 코팅
WO2020041181A1 (en) 2018-08-22 2020-02-27 Basf Se Stabilized rotomolded polyolefin
JP7504865B2 (ja) 2018-08-30 2024-06-24 コベストロ （ネザーランズ） ビー．ヴィー． 光ファイバーをコーティングするための放射線硬化性組成物
JP2022509797A (ja) 2018-12-03 2022-01-24 コベストロ （ネザーランズ） ビー．ヴィー． 光ファイバーをコーティングするための充填放射線硬化性組成物およびそれから製造されるコーティング
US20230220239A1 (en) 2019-03-18 2023-07-13 Basf Se Uv curable compositions for dirt pick-up resistance
WO2020239563A1 (en) 2019-05-24 2020-12-03 Dsm Ip Assets B.V. Radiation curable compositions for coating optical fiber with enhanced high-speed processability
WO2020239564A1 (en) 2019-05-24 2020-12-03 Dsm Ip Assets B.V. Radiaton curable compositions for coating optical fiber with enhanced high-speed processability
WO2020243748A1 (en) 2019-05-31 2020-12-03 The Procter & Gamble Company Methods of making a deflection member
US20220282064A1 (en) 2019-07-30 2022-09-08 Basf Se Stabilizer composition
CN114207063B (zh) 2019-07-31 2023-07-25 科思创(荷兰)有限公司 具有多功能长臂低聚物的涂覆光纤用辐射固化组合物
CN115515784A (zh) 2020-04-03 2022-12-23 科思创(荷兰)有限公司 多层光学器件
JP2023520782A (ja) 2020-04-03 2023-05-19 コベストロ （ネザーランズ） ビー．ヴィー． 自己修復型光ファイバとその製造に使用される組成物
WO2023205221A2 (en) 2022-04-21 2023-10-26 Covestro (Netherlands) B.V. Low-volatility radiation curable compositions for coating optical fibers
WO2023209007A1 (en) 2022-04-29 2023-11-02 Ineos Styrolution Group Gmbh Acrylonitrile styrene acrylate (asa) copolymer composition having good uv resistance with reduced uv absorber content
WO2023209004A1 (en) 2022-04-29 2023-11-02 Ineos Styrolution Group Gmbh Acrylonitrile styrene acrylate copolymer composition with improved uv resistance

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4315848A (en) * 1979-05-10 1982-02-16 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions
US4379721A (en) * 1980-03-14 1983-04-12 Spezial-Papiermaschinenfabrik August Alfred Krupp Gmbh & Co. Pressure sensitive recording materials

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH494060A (de) * 1961-06-16 1970-07-31 Geigy Ag J R Verwendung von 2-(2'-Hydrophenyl)-benztriazolverbindungen als Lichtschutzmittel
JPS4967378A (zh) * 1972-11-02 1974-06-29
JPS565279B2 (zh) * 1974-08-15 1981-02-04
US4355071A (en) * 1978-05-03 1982-10-19 E. I. Dupont De Nemours And Company Clear coat/color coat finish containing ultraviolet light stabilizer
EP0006564B1 (de) * 1978-06-26 1981-12-30 Ciba-Geigy Ag 2-(2-Hydroxy-3.5-disubstituiertes-phenyl)-2H-benzotriazol und damit stabilisierte Mischungen
US4278589A (en) * 1978-06-26 1981-07-14 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole and stabilized compositions
US4283327A (en) * 1979-01-25 1981-08-11 Ciba-Geigy Corporation 2-(2-Hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole stabilized compositions
US4347180A (en) * 1979-05-16 1982-08-31 Ciba-Geigy Corporation High caustic coupling process for preparing substituted 2-nitro-2'-hydroxyazobenzenes
US4559293A (en) * 1983-04-08 1985-12-17 Kimoto & Co., Ltd. Photosensitive recording material developable with aqueous neutral salt solution
DE3328771A1 (de) * 1983-08-10 1985-02-28 Basf Ag, 6700 Ludwigshafen Verfahren zur kontinuierlichen herstellung von sauerstoff enthaltenden verbindungen
US4587346A (en) * 1985-01-22 1986-05-06 Ciba-Geigy Corporation Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures
US4675352A (en) * 1985-01-22 1987-06-23 Ciba-Geigy Corporation Liquid 2-(2-hydroxy-3-higher branched alkyl-5-methyl-phenyl)-2H-benzotriazole mixtures, stabilized compositions and processes for preparing liquid mixtures
US4760148A (en) * 1985-09-03 1988-07-26 Ciba-Geigy Corporation 5-aralkyl substituted 2H-benzotriazoles and stabilized compositions
JPS62262777A (ja) * 1986-05-09 1987-11-14 Kansai Paint Co Ltd 防食塗膜形成法
US5096977A (en) * 1987-08-12 1992-03-17 Atochem North America, Inc. Process for preparing polymer bound UV stabilizers
US4973701A (en) * 1988-04-11 1990-11-27 Ciba-Geigy Corporation Liquid substituted 2H-benzotriazole mixtures, stabilized compositions and processes for preparing the liquid mixtures
US5240975A (en) * 1988-04-11 1993-08-31 Ciba-Geigy Corporation Liquid substituted 2H-benzotriazole mixtures, stabilized compositions
US5095062A (en) * 1988-04-11 1992-03-10 Ciba-Geigy Corporation Stabilized compositions containing liquid substituted 2H-benzotriazole mixtures
US5199979A (en) * 1988-11-25 1993-04-06 Ppg Industries, Inc. UV resistant, abrasion resistant coatings
US5045396A (en) * 1988-11-23 1991-09-03 Ppg Industries, Inc. UV resistant primer
US5098477A (en) * 1988-12-14 1992-03-24 Ciba-Geigy Corporation Inks, particularly for ink printing
DE58907949D1 (de) * 1988-12-14 1994-07-28 Ciba Geigy Ag Aufzeichnungsmaterial für Tintenstrahldruck.
EP0520938B1 (de) * 1991-06-03 1997-09-24 Ciba SC Holding AG UV-Absorber enthaltendes photographisches Material
US5354794A (en) * 1993-02-03 1994-10-11 Ciba-Geigy Corporation Electro coat/base coat/clear coat finishes stabilized with S-triazine UV absorbers
DE4404081A1 (de) * 1994-02-09 1995-08-10 Basf Ag UV-stabilisierte Polyoxymethylenformmassen
EP0698637A3 (en) * 1994-08-22 1996-07-10 Ciba Geigy Ag Polyurethanes stabilized with selected UV absorbers of 5-substituted benzotriazole
US5574166A (en) * 1995-04-19 1996-11-12 Ciba-Geigy Corporation Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4315848A (en) * 1979-05-10 1982-02-16 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions
US4379721A (en) * 1980-03-14 1983-04-12 Spezial-Papiermaschinenfabrik August Alfred Krupp Gmbh & Co. Pressure sensitive recording materials

Also Published As

Publication number Publication date
NL1002904A1 (nl) 1996-10-22
KR960037664A (ko) 1996-11-19
US5554760A (en) 1996-09-10
TW419497B (en) 2001-01-21
AU706957B2 (en) 1999-07-01
ES2130930A1 (es) 1999-07-01
KR100378233B1 (ko) 2003-06-12
GB2299957A (en) 1996-10-23
CA2174411A1 (en) 1996-10-20
ITMI960751A0 (zh) 1996-04-18
ATA70596A (de) 1999-05-15
AU5073196A (en) 1996-10-31
US5574166A (en) 1996-11-12
SE9601345L (sv) 1996-10-20
EP0738718A1 (en) 1996-10-23
CA2174411C (en) 2007-02-20
SE9601345D0 (sv) 1996-04-10
AU5078496A (en) 1996-10-31
ITMI960751A1 (it) 1997-10-18
IT1283615B1 (it) 1998-04-22
CN1140187A (zh) 1997-01-15
KR100426626B1 (ko) 2004-07-12
SE509606C2 (sv) 1999-02-15
JPH08291151A (ja) 1996-11-05
KR960037748A (ko) 1996-11-19
GB2299957B (en) 1997-11-12
JPH08290112A (ja) 1996-11-05
ES2130930B1 (es) 2000-03-01
AU707202B2 (en) 1999-07-08
GB9607427D0 (en) 1996-06-12
JP3309153B2 (ja) 2002-07-29
AT405936B (de) 1999-12-27
NL1002904C2 (nl) 1998-04-10
US5563242A (en) 1996-10-08
CN1140168A (zh) 1997-01-15
DE19615000A1 (de) 1996-10-24
US5607987A (en) 1997-03-04
CN1066181C (zh) 2001-05-23
BR9601992A (pt) 1998-10-06
BR9601991A (pt) 1998-04-07
CA2174412A1 (en) 1996-10-20
FR2733239B1 (fr) 2004-10-01
FR2733239A1 (fr) 1996-10-25
CN1059899C (zh) 2000-12-27

Similar Documents

Publication Publication Date Title
BE1010550A3 (fr) Compositions de film polymere de revetement et compositions de materiau d'enregistrement stabilisees.
BE1011537A3 (fr) Composition de revetement comprenant un compose stabilisant, ledit compose et son utilisation.
BE1013234A3 (fr) Composes stabilisants, composition les contenant et leur utilisation.
DE60028755T2 (de) Stabilisierte klebzusammensetzung mit hochlöslichen, rotverschobenen, photostabilen benzotriazolen uv-absorbente und daraus gewonnene laminerte gegenstände
BE1009090A3 (fr) Bis-resorcinyltriazines comme stabilisants pour matieres sensibles.
BE1006797A5 (fr) Absorbeurs d'uv.
US5096781A (en) Water-soluble compounds as light stabilizers
RU2127264C1 (ru) Замещенные бензотриазолы, стабилизированные композиции и покрывная система
KR100474240B1 (ko) 비페닐릴기로치환된트리스-아릴-s-트리아진
DE19750906A1 (de) Hydroxyphenyltriazine
DE10296560T5 (de) Benzotriazole und deren Verwendung als UV-Lichtstabilisatoren
DE60202860T2 (de) Langkettige, sterisch gehinderte amine und damit stabilisierte zusammensetzungen
EP0373574A1 (de) Tinten, insbesondere für den Tintenstrahldruck
JPH0420913B2 (zh)
BE1009827A3 (fr) Agent de revetement stabilise contre la degradation par la lumiere, la chaleur et l'oxygene.
CH691302A5 (de) Bis-Resorcinyltriazine und deren Verwendung als Stabilisatoren für organisches Materialoder für ein photographisches Aufzeichnungsmaterial.

Legal Events

Date Code Title Description
RE Patent lapsed

Effective date: 20110430