AU574766B2 - A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method - Google Patents

A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method

Info

Publication number
AU574766B2
AU574766B2 AU39769/85A AU3976985A AU574766B2 AU 574766 B2 AU574766 B2 AU 574766B2 AU 39769/85 A AU39769/85 A AU 39769/85A AU 3976985 A AU3976985 A AU 3976985A AU 574766 B2 AU574766 B2 AU 574766B2
Authority
AU
Australia
Prior art keywords
curing
respect
improved
resin composition
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU39769/85A
Other languages
English (en)
Other versions
AU3976985A (en
Inventor
Kuniaki Minonishi
Reijiro Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=12748126&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=AU574766(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Publication of AU3976985A publication Critical patent/AU3976985A/en
Application granted granted Critical
Publication of AU574766B2 publication Critical patent/AU574766B2/en
Anticipated expiration legal-status Critical
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
AU39769/85A 1984-03-13 1985-03-12 A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method Expired AU574766B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59-46472 1984-03-13
JP59046472A JPS60191237A (ja) 1984-03-13 1984-03-13 露光硬化後非粘着性感光性樹脂組成物

Publications (2)

Publication Number Publication Date
AU3976985A AU3976985A (en) 1985-09-19
AU574766B2 true AU574766B2 (en) 1988-07-14

Family

ID=12748126

Family Applications (1)

Application Number Title Priority Date Filing Date
AU39769/85A Expired AU574766B2 (en) 1984-03-13 1985-03-12 A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method

Country Status (5)

Country Link
US (1) US4716094A (cg-RX-API-DMAC7.html)
EP (1) EP0154994B1 (cg-RX-API-DMAC7.html)
JP (1) JPS60191237A (cg-RX-API-DMAC7.html)
AU (1) AU574766B2 (cg-RX-API-DMAC7.html)
DE (1) DE3571086D1 (cg-RX-API-DMAC7.html)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5288571A (en) * 1986-10-02 1994-02-22 Asahi Kasei Kogyo Kabushiki Kaisha Photoresin printing plate for use in printing a corrugated board
JPH07113767B2 (ja) * 1986-10-02 1995-12-06 旭化成工業株式会社 段ボ−ル印刷用感光性樹脂印刷版
DE3725948A1 (de) * 1987-08-05 1989-02-16 Hoechst Ag Dispersionsloesung, daraus hergestellte bistabile reversible dispersionsschicht und deren verwendung
DE3904780A1 (de) * 1989-02-17 1990-08-23 Basf Ag Verfahren zur herstellung von photopolymerisierten reliefdruckplatten mit klebfreier oberflaeche
JP2644898B2 (ja) * 1989-11-16 1997-08-25 旭化成工業株式会社 レリーフ形成用感光性樹脂組成物
DE4206949A1 (de) * 1992-03-05 1993-09-09 Basf Ag Formmassen auf der basis ungesaettigter copolyamide
US5328805A (en) * 1992-08-28 1994-07-12 W. R. Grace & Co.-Conn. Aqueous developable photosensitive polyurethane-(meth)acrylate
DE69511084T2 (de) * 1994-05-10 2000-03-16 Asahi Kasei Kogyo K.K. Flüssige lichtempfindliche harzzusammensetzung für flexographie
EP0691357A1 (en) 1994-06-17 1996-01-10 Polyfibron Technologies, Inc. Liquid polyurethane (meth)acrylate photopolymer useful for flexographic printing plate
JPH0829970A (ja) * 1994-07-12 1996-02-02 Asahi Chem Ind Co Ltd 感光性樹脂凸版の表面粘着性除去方法
US5776661A (en) * 1994-08-24 1998-07-07 Macdermid Imaging Technology, Inc. Process for imaging of liquid photopolymer printing plates
DE69512007T2 (de) * 1994-12-13 2000-01-27 Macdermid Imaging Technology Inc., Waterbury Weichreliefsphotopolymerdruckplatten für Flexographie
AU4376296A (en) 1994-12-13 1996-07-03 Hercules Incorporated Photosensitive compositions and clean running photopolymer printing plates therefrom
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US5912106A (en) * 1996-09-10 1999-06-15 Ciba Specialty Chemicals Corporation Method for improving photoimage quality
JP3912705B2 (ja) * 1998-03-05 2007-05-09 東京応化工業株式会社 ネガ型感光性樹脂組成物およびこれを用いた感光性樹脂版
ES2284452T3 (es) * 1999-01-14 2007-11-16 Macdermid Incorporated Composicion de resina fotosensible para placas de impresion flexografica.
US6500601B1 (en) * 1999-08-18 2002-12-31 M&R Marking Systems, Inc. Method of manufacturing photopolymer plates
US6579664B2 (en) * 2001-03-30 2003-06-17 Napp Systems, Inc. High performance, photoimageable resin compositions and printing plates prepared therefrom
US8362151B2 (en) * 2002-05-31 2013-01-29 Elsicon, Inc. Hybrid polymer materials for liquid crystal alignment layers
US6919404B2 (en) * 2002-05-31 2005-07-19 Elsicon, Inc. Hybrid polymer materials for liquid crystal alignment layers
WO2003102045A1 (en) 2002-05-31 2003-12-11 Elsicon, Inc. Hybrid polymer materials for liquid crystal alignment layers
CN100529971C (zh) * 2003-02-19 2009-08-19 旭化成电子材料株式会社 制造用于凸版印刷的可水显影的印版的方法
US20050056954A1 (en) * 2003-09-12 2005-03-17 Devlin Brian Gerrard Method for making contact lenses
GB0413366D0 (en) * 2004-06-15 2004-07-21 Heeschen Andreas Binder-free photopolymerizable compositions
DE102004030019A1 (de) * 2004-06-22 2006-01-19 Xetos Ag Photopolymerisierbare Zusammensetzung
EP2182786B1 (en) * 2008-11-04 2011-07-13 Rohm and Haas Electronic Materials LLC Improved hot melt compositions
JP5899145B2 (ja) * 2012-06-18 2016-04-06 富士フイルム株式会社 インプリント用下層膜形成組成物およびパターン形成方法
US9217928B1 (en) 2014-08-13 2015-12-22 Macdermid Printing Solutions, Llc Clean flexographic printing plates and method of making the same
JP6264679B1 (ja) * 2016-03-16 2018-01-31 東洋紡株式会社 水現像可能なフレキソ印刷用感光性樹脂組成物、及びそれから得られるフレキソ印刷用感光性樹脂原版
EP3680715B8 (en) 2017-09-05 2022-07-06 Toyobo Co., Ltd. Water-developable photosensitive resin composition for flexographic printing use, photosensitive resin original plate for flexographic printing use which is produced from the composition and its use by flexographic printing with uv ink or uv vanish

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4036644A (en) * 1973-03-16 1977-07-19 International Business Machines Corporation Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
US4057431A (en) * 1975-09-29 1977-11-08 The Goodyear Tire & Rubber Company Ethylenically polyurethane unsaturated composition
US4168981A (en) * 1977-04-14 1979-09-25 E. I. Du Pont De Nemours And Company Bis(substituted amino)sulfides as reversible inhibitor sources for photopolymerization

Family Cites Families (22)

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Publication number Priority date Publication date Assignee Title
BE605776A (cg-RX-API-DMAC7.html) * 1960-09-26
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
US3887379A (en) * 1972-03-30 1975-06-03 Ibm Photoresist azide sensitizer composition
FR2177770A1 (en) * 1972-03-30 1973-11-09 Ibm Photolacquer compsn - photosensitised with azo or cyanine dyes contg azide gp/s at an aromatic ring
FR2221754A1 (en) * 1973-03-16 1974-10-11 Ibm Photoresist mask prodn. using carboxylic acid in lacquer - for short exposure and good adhesion to substrate
JPS5641381B2 (cg-RX-API-DMAC7.html) * 1973-07-24 1981-09-28
JPS5760120B2 (cg-RX-API-DMAC7.html) * 1973-08-13 1982-12-17 Sapporo Breweries
US4218294A (en) * 1973-09-24 1980-08-19 Design Cote Corp. Radiation curable coating composition
JPS5326130B2 (cg-RX-API-DMAC7.html) * 1974-06-17 1978-07-31
SU542167A1 (ru) * 1974-11-19 1977-01-05 Украинский Научно-Исследовательский Институт Полиграфической Промышленности Способ изготовлени фотополимерных печатных форм
JPS595152B2 (ja) * 1975-11-22 1984-02-02 東洋紡績株式会社 セツチヤクザイソセイブツ
JPS52109926A (en) * 1976-02-25 1977-09-14 Fuji Photo Film Co Ltd Metallic image forming material
JPS5994B2 (ja) * 1976-09-14 1984-01-05 富士写真フイルム株式会社 感光性組成物
US4139436A (en) * 1977-02-07 1979-02-13 The Goodyear Tire & Rubber Company Polyetherurethane composition and polymer prepared by photopolymerization
IT1112290B (it) * 1978-07-26 1986-01-13 Snia Viscosa Resine poliestere insature non inibite dall'ossigeno dell'aria e procedimenti per ottenerle
JPS5550001A (en) * 1978-10-06 1980-04-11 Fuji Photo Film Co Ltd Photo-polymerizable composition
JPS5616182A (en) * 1979-07-18 1981-02-16 Tokyo Shibaura Electric Co Character pattern generator
US4268576A (en) * 1980-01-18 1981-05-19 Repeat-O-Type Stencil Manufacturing Co., Inc. Stencil sheet with solventless coating and method of preparation
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
JPS5897043A (ja) * 1981-12-04 1983-06-09 Teijin Ltd 液中後露光法
JPS6060640A (ja) * 1983-09-13 1985-04-08 Toyobo Co Ltd 画像複製材料およびその製造法
JPS6064345A (ja) * 1983-09-20 1985-04-12 Toyobo Co Ltd 耐スクラツチ性向上用処理液および耐スクラツチ性画像複製材料の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4036644A (en) * 1973-03-16 1977-07-19 International Business Machines Corporation Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
US4057431A (en) * 1975-09-29 1977-11-08 The Goodyear Tire & Rubber Company Ethylenically polyurethane unsaturated composition
US4168981A (en) * 1977-04-14 1979-09-25 E. I. Du Pont De Nemours And Company Bis(substituted amino)sulfides as reversible inhibitor sources for photopolymerization

Also Published As

Publication number Publication date
AU3976985A (en) 1985-09-19
EP0154994A3 (en) 1986-01-22
JPS60191237A (ja) 1985-09-28
US4716094A (en) 1987-12-29
JPH0555857B2 (cg-RX-API-DMAC7.html) 1993-08-18
EP0154994A2 (en) 1985-09-18
EP0154994B1 (en) 1989-06-14
DE3571086D1 (en) 1989-07-20

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