AU551827B2 - Photopolymerisable compositions - Google Patents

Photopolymerisable compositions

Info

Publication number
AU551827B2
AU551827B2 AU18536/83A AU1853683A AU551827B2 AU 551827 B2 AU551827 B2 AU 551827B2 AU 18536/83 A AU18536/83 A AU 18536/83A AU 1853683 A AU1853683 A AU 1853683A AU 551827 B2 AU551827 B2 AU 551827B2
Authority
AU
Australia
Prior art keywords
photopolymerisable compositions
photopolymerisable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU18536/83A
Other languages
English (en)
Other versions
AU1853683A (en
Inventor
Hideki Nagasaka
Noriaki Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Publication of AU1853683A publication Critical patent/AU1853683A/en
Application granted granted Critical
Publication of AU551827B2 publication Critical patent/AU551827B2/en
Assigned to MITSUBISHI CHEMICAL CORPORATION reassignment MITSUBISHI CHEMICAL CORPORATION Request to Amend Deed and Register Assignors: MITSUBISHI KASEI CORPORATION
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
AU18536/83A 1982-09-27 1983-08-30 Photopolymerisable compositions Ceased AU551827B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP57168088A JPS5956403A (ja) 1982-09-27 1982-09-27 光重合性組成物
JP57-168088 1982-09-27

Publications (2)

Publication Number Publication Date
AU1853683A AU1853683A (en) 1984-04-05
AU551827B2 true AU551827B2 (en) 1986-05-15

Family

ID=15861616

Family Applications (1)

Application Number Title Priority Date Filing Date
AU18536/83A Ceased AU551827B2 (en) 1982-09-27 1983-08-30 Photopolymerisable compositions

Country Status (6)

Country Link
US (1) US4985470A (fr)
EP (1) EP0107792B1 (fr)
JP (1) JPS5956403A (fr)
AU (1) AU551827B2 (fr)
CA (1) CA1222091A (fr)
DE (1) DE3361644D1 (fr)

Families Citing this family (114)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59226002A (ja) * 1983-06-06 1984-12-19 Fuji Photo Film Co Ltd 光重合性組成物
JPH0629285B2 (ja) * 1983-10-14 1994-04-20 三菱化成株式会社 光重合性組成物
SE458860B (sv) * 1986-02-06 1989-05-16 Itronic Process Ab Anordning vid en foer vaermebehandling av banformiga alster anordnad behandlingsanlaeggning
JP2538992B2 (ja) * 1987-07-21 1996-10-02 三菱化学株式会社 光重合性組成物
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
EP0324481B1 (fr) * 1988-01-15 1993-05-05 E.I. Du Pont De Nemours And Company Composition photopolymérisable, stable au stockage, pour la formation d'images d'indice de réfraction
US5514521A (en) * 1990-08-22 1996-05-07 Brother Kogyo Kabushiki Kaisha Photocurable composition
JP2871181B2 (ja) * 1991-07-09 1999-03-17 ブラザー工業株式会社 光硬化型組成物
JP3070184B2 (ja) * 1991-10-18 2000-07-24 三菱化学株式会社 光重合性組成物及び感光材料
JP2693670B2 (ja) * 1991-11-06 1997-12-24 住友ベークライト株式会社 感光性樹脂組成物
JP3141517B2 (ja) 1992-05-14 2001-03-05 ブラザー工業株式会社 光硬化型組成物
ES2145836T3 (es) * 1993-08-23 2000-07-16 Procter & Gamble Copolimeros elastomericos termoplasticos injertados de silicona, y composiciones que los contienen para el cuidado del pelo y la piel.
US5738974A (en) 1994-09-05 1998-04-14 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
DE69620723T2 (de) 1995-12-22 2002-12-05 Mitsubishi Chem Corp Fotopolymerisierbare Zusammensetzung für einen Farbfilter, Farbfilter und Flüssigkristallanzeigevorrichtung
JPH09218514A (ja) * 1996-02-09 1997-08-19 Brother Ind Ltd 光硬化型組成物及び感光性カプセル
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
JPH11184084A (ja) 1997-12-22 1999-07-09 Brother Ind Ltd 速硬化性感光性組成物及び記録用シート
US6573380B2 (en) 1999-03-09 2003-06-03 Kabushiki Kaisha Hayashibara Seibutsu Kagaku Kenkyujo 4-cyanocoumarin derivatives and uses thereof
KR101079607B1 (ko) 2001-12-13 2011-11-03 (주)하야시바라 생물화학연구소 쿠마린 화합물
US7521567B2 (en) 2003-07-11 2009-04-21 Kabushiki Kaisha Hayashibara Seibutsu Kagaku Kenkyujo Amine compound and uses thereof
WO2005029187A1 (fr) * 2003-09-22 2005-03-31 Agfa-Gevaert Composition photopolymerisable
US7830472B2 (en) 2004-04-26 2010-11-09 Mitsubishi Chemical Corporation Blue color composition for color filter, color filter, and color image display device
US7241557B2 (en) 2004-07-30 2007-07-10 Agfa Graphics Nv Photopolymerizable composition
US7439537B2 (en) 2004-07-30 2008-10-21 Agfa Graphics, N.V. Divinylfluorenes
US7749683B2 (en) * 2004-11-05 2010-07-06 Agfa Graphics Nv Photopolymerizable composition
JP4315892B2 (ja) 2004-11-25 2009-08-19 東京応化工業株式会社 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
ATE445861T1 (de) 2005-08-26 2009-10-15 Agfa Graphics Nv Photopolymer druckplattenvorläufer
EP2214056B1 (fr) 2005-11-18 2012-12-26 Agfa Graphics N.V. Procédé de fabrication d'une plaque d'impression lithographique
DE602005013536D1 (de) 2005-11-18 2009-05-07 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
EP1788429B1 (fr) 2005-11-18 2009-03-18 Agfa Graphics N.V. Procédé de fabrication d'une plaque d'impression lithographique
ATE426191T1 (de) 2005-11-18 2009-04-15 Agfa Graphics Nv Verfahren zur herstellung einer lithographischen druckplatte
PL1788443T3 (pl) 2005-11-18 2014-12-31 Agfa Nv Sposób wytwarzania litograficznej płyty drukowej
ATE422253T1 (de) 2005-11-18 2009-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
PL1788444T3 (pl) 2005-11-18 2011-06-30 Agfa Nv Sposób wytwarzania kliszy do druku litograficznego
DE602005012590D1 (de) 2005-11-18 2009-03-19 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
JP4816239B2 (ja) * 2005-11-21 2011-11-16 日立化成工業株式会社 永久レジスト用感光性エレメント、レジストパターンの形成方法、プリント配線板及び半導体素子
DK1788435T3 (da) 2005-11-21 2013-06-17 Agfa Graphics Nv Fremgangsmåde til fremstilling af en litografisk trykplade
EP1788449A1 (fr) 2005-11-21 2007-05-23 Agfa Graphics N.V. Procédé de fabrication d'une plaque d'impression lithographique
ATE430330T1 (de) 2005-11-21 2009-05-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
JP2007171407A (ja) * 2005-12-20 2007-07-05 Fujifilm Corp 平版印刷版原版及びその製版方法
TW200807104A (en) 2006-04-19 2008-02-01 Mitsubishi Chem Corp Color image display device
EP1884372B1 (fr) 2006-08-03 2009-10-21 Agfa Graphics N.V. Support pour plaque d'impression lithographique
ATE493688T1 (de) 2007-05-25 2011-01-15 Agfa Graphics Nv Flachdruckplattenvorläufer
EP2065211B1 (fr) 2007-11-30 2010-05-26 Agfa Graphics N.V. Procédé pour traiter une plaque d'impression lithographique
JP2011508814A (ja) * 2007-12-28 2011-03-17 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 熱および化学線硬化型接着剤組成物
CN101939857B (zh) 2008-02-07 2013-05-15 三菱化学株式会社 半导体发光装置、背光源、彩色图像显示装置以及这些中使用的荧光体
ES2430562T3 (es) 2008-03-04 2013-11-21 Agfa Graphics N.V. Método para la fabricación de un soporte de una plancha de impresión litográfica
JP5264427B2 (ja) 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
ATE514561T1 (de) 2008-03-31 2011-07-15 Agfa Graphics Nv Verfahren zur behandlung einer lithografischen druckplatte
JP5248203B2 (ja) 2008-05-29 2013-07-31 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP5228631B2 (ja) 2008-05-29 2013-07-03 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
CN102132218A (zh) 2008-08-22 2011-07-20 富士胶片株式会社 制备平版印刷版的方法
JP5405141B2 (ja) 2008-08-22 2014-02-05 富士フイルム株式会社 平版印刷版の作製方法
JP5171483B2 (ja) 2008-08-29 2013-03-27 富士フイルム株式会社 平版印刷版の作製方法
JP2011090294A (ja) 2009-09-24 2011-05-06 Fujifilm Corp 平版印刷版の作製方法
JP5541913B2 (ja) 2009-12-25 2014-07-09 富士フイルム株式会社 平版印刷版の作製方法
EP2339402A1 (fr) 2009-12-28 2011-06-29 Fujifilm Corporation Précurseur de plaque d'impression lithographique et procédé de préparation de plaque d'impression lithographique
JP5322963B2 (ja) 2010-01-29 2013-10-23 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5346845B2 (ja) 2010-02-26 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法及び平版印刷版原版用現像液
JP2011221522A (ja) 2010-03-26 2011-11-04 Fujifilm Corp 平版印刷版の作製方法
EP2555054B1 (fr) 2010-03-31 2018-06-20 FUJIFILM Corporation Procédé de préparation d'une plaque d'impression lithographique, et procédé d'impression
JP2012073594A (ja) 2010-08-31 2012-04-12 Fujifilm Corp 平版印刷版の作製方法
JP2012073595A (ja) 2010-08-31 2012-04-12 Fujifilm Corp 平版印刷版の作製方法
JP5205483B2 (ja) 2011-02-04 2013-06-05 富士フイルム株式会社 平版印刷版原版及び製版方法
JP5211187B2 (ja) 2011-02-28 2013-06-12 富士フイルム株式会社 平版印刷版原版及び製版方法
EP3001249B1 (fr) 2011-02-28 2019-12-25 FUJIFILM Corporation Précurseurs de plaque d'impression lithographique et procédés de préparation de telles plaques
JP5186574B2 (ja) 2011-02-28 2013-04-17 富士フイルム株式会社 平版印刷版原版及びその製版方法
WO2012133382A1 (fr) 2011-03-28 2012-10-04 富士フイルム株式会社 Procédé de fabrication d'une plaque d'impression lithographique
JP5301015B2 (ja) 2011-07-25 2013-09-25 富士フイルム株式会社 感光性平版印刷版原版及び平版印刷版の作製方法
JP5743783B2 (ja) 2011-07-27 2015-07-01 富士フイルム株式会社 感光性組成物、平版印刷版原版、及びポリウレタン
BR112014002574A2 (pt) 2011-08-22 2019-12-17 Fujifilm Corp precursores de placa de impressão litográfica e processos para preparação de placas de impressão litográfica
JP5432960B2 (ja) 2011-08-24 2014-03-05 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5401522B2 (ja) 2011-09-15 2014-01-29 富士フイルム株式会社 コーティング組成物、ならびに該組成物を用いた、画像形成材料、平版印刷版原版及び酸素遮断性フィルム
BR112014007143A2 (pt) 2011-09-26 2017-06-13 Fujifilm Corp processo para fabricar chapa de impressão litográfica
EP2762974B1 (fr) 2011-09-26 2017-07-26 Fujifilm Corporation Procédé de fabrication d'une plaque d'impression lithographique
JP5602195B2 (ja) 2011-09-27 2014-10-08 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5695267B2 (ja) 2012-02-20 2015-04-01 富士フイルム株式会社 製版処理廃液の濃縮方法およびリサイクル方法
JP5711168B2 (ja) 2012-02-27 2015-04-30 富士フイルム株式会社 平版印刷版原版および平版印刷版の作製方法
JP5715975B2 (ja) 2012-02-29 2015-05-13 富士フイルム株式会社 平版印刷版原版および平版印刷版の製造方法
US9329479B2 (en) 2012-06-05 2016-05-03 Agfa Graphics Nv Lithographic printing plate precusor
BR112015030811A2 (pt) 2013-06-14 2017-07-25 Agfa Graphics Nv precursor de placa de impressão litográfica
EP2883699B1 (fr) 2013-12-11 2017-05-03 Agfa Graphics Nv Précurseur de plaque d'impression lithographique et monomère
EP2916171B1 (fr) 2014-03-03 2017-05-31 Agfa Graphics Nv Procédé pour réaliser un précurseur de plaque d'impression lithographique
EP3032334B1 (fr) 2014-12-08 2017-10-18 Agfa Graphics Nv Système permettant de réduire les débris d'ablation
EP3147335A1 (fr) 2015-09-23 2017-03-29 BYK-Chemie GmbH Compositions colorantes contenant des agents mouillants et/ou dispersants à faible indice d'amine
BR112018068753A2 (pt) 2016-03-16 2019-01-22 Agfa Nv método para processar uma chapa de impressão litográfica
EP3392709A1 (fr) 2017-04-21 2018-10-24 Agfa Nv Précurseur de plaque d'impression lithographique
EP3431290B1 (fr) 2017-07-20 2021-09-08 Agfa Nv Précurseur de plaque d'impression lithographique
EP3474073B1 (fr) 2017-10-17 2022-12-07 Agfa Offset Bv Methode pour la fabrication d'une plaque d'impression
US20200347171A1 (en) 2017-11-15 2020-11-05 Byk-Chemie Gmbh Block co-polymer
WO2019096891A1 (fr) 2017-11-15 2019-05-23 Byk-Chemie Gmbh Copolymère bloc
EP3495891B1 (fr) 2017-12-08 2021-06-16 Agfa Nv Procédé de fabrication d'une plaque d'impression lithographique
WO2019179995A1 (fr) 2018-03-22 2019-09-26 Agfa Nv Précurseur de plaque d'impression lithographique
WO2019219570A1 (fr) 2018-05-14 2019-11-21 Agfa Nv Précurseur de plaque d'impression lithographique
EP3587113B1 (fr) 2018-06-21 2023-01-04 Agfa Offset Bv Précurseur de plaque d'impression lithographique
EP3587112B1 (fr) 2018-06-21 2024-04-03 Eco3 Bv Précurseur de plaque d'impression lithographique
EP3637188A1 (fr) 2018-10-08 2020-04-15 Agfa Nv Précurseur de révélateur effervescent pour le traitement d'un précurseur de plaque d'impression lithographique
EP3650938A1 (fr) 2018-11-09 2020-05-13 Agfa Nv Précurseur de plaque d'impression lithographique
WO2020120402A1 (fr) 2018-12-10 2020-06-18 Agfa Nv Traitement à la presse d'une plaque d'impression lithographique sensible aux uv ou aux ultraviolets
EP3686011A1 (fr) 2019-01-23 2020-07-29 Agfa Nv Précurseur de plaque d'impression lithographique
EP3815900A1 (fr) 2019-10-31 2021-05-05 Agfa Nv Précurseur de plaque d'impression lithographique et procédé de fabrication de particules de résine hydrophobe
EP3875271A1 (fr) 2020-03-04 2021-09-08 Agfa Nv Précurseur de plaque d'impression lithographique
EP3892469B1 (fr) 2020-04-10 2023-11-08 Eco3 Bv Plaque d'impression lithographique
EP3922462B1 (fr) 2020-06-08 2023-03-01 Agfa Offset Bv Précurseur de plaque d'impression photopolymère lithographique ayant une meilleure stabilité à la lumière du jour
EP3928983B1 (fr) 2020-06-24 2023-09-27 Eco3 Bv Précurseur de plaque d'impression lithographique
WO2021259650A1 (fr) 2020-06-24 2021-12-30 Agfa Offset Bv Précurseur de plaque d'impression lithographique
EP4171957A1 (fr) 2020-06-24 2023-05-03 Agfa Offset Bv Précurseur de plaque d'impression lithographique
EP3960455A1 (fr) 2020-08-31 2022-03-02 Agfa Offset Bv Précurseur de plaque d'impression lithographique
US20230382100A1 (en) 2020-10-09 2023-11-30 Agfa Offset Bv A Lithographic Printing Plate Precursor
US20240100820A1 (en) 2020-12-16 2024-03-28 Agfa Offset Bv Lithographic Printing Press Make-Ready Method
EP4035897A1 (fr) 2021-01-28 2022-08-03 Agfa Offset Bv Précurseur de plaque d'impression lithographique
EP4223534A1 (fr) 2022-02-07 2023-08-09 Agfa Offset Bv Précurseur de plaque d'impression lithographique
EP4239411A1 (fr) 2022-03-04 2023-09-06 Eco3 Bv Appareil et procédé de traitement d'un précurseur de plaque d'impression lithographique
EP4382306A1 (fr) 2022-12-08 2024-06-12 Eco3 Bv Procédé de préparation de presse d'impression lithographique

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
US3652275A (en) * 1970-07-09 1972-03-28 Du Pont HEXAARYLBIIMIDAZOLE BIS (p-DIALKYL-AMINOPHENYL-{60 ,{62 -UNSATURATED) KETONE COMPOSITIONS
ZA757987B (en) * 1975-12-23 1976-12-29 Dynachem Corp Adhesion promoters for polymerizable films
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
DE3023247C2 (de) * 1980-06-21 1982-09-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Lichtempfindliches Aufzeichnungsmaterial
JPS5721401A (en) * 1980-07-14 1982-02-04 Mitsubishi Chem Ind Ltd Photopolymerizable composition
DE3048490C2 (de) * 1980-12-22 1982-09-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Lichtempfindliches Aufzeichnungsmaterial
JPS57148740A (en) * 1981-03-10 1982-09-14 Toyobo Co Ltd Image duplicating material
US4459349A (en) * 1981-03-27 1984-07-10 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
US4410621A (en) * 1981-04-03 1983-10-18 Toyo Boseki Kabushiki Kaisha Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan

Also Published As

Publication number Publication date
EP0107792A1 (fr) 1984-05-09
JPS5956403A (ja) 1984-03-31
CA1222091A (fr) 1987-05-19
EP0107792B1 (fr) 1985-12-27
AU1853683A (en) 1984-04-05
DE3361644D1 (en) 1986-02-06
US4985470A (en) 1991-01-15
JPH0363562B2 (fr) 1991-10-01

Similar Documents

Publication Publication Date Title
AU551827B2 (en) Photopolymerisable compositions
AU553151B2 (en) Photopolymerisable compositions
AU563655B2 (en) Initiators for photopolymerisable compositions
AU534701B2 (en) Photopolymerisable compositions
AU569145B2 (en) Photopolymerizable fluoroacrylate compositions
AU560124B2 (en) Cycloalka(c)pyrrolcarboxylates
AU1146383A (en) Amidoximeguinolines
AU1112583A (en) Pyrazolo-quinolines, -thiazines and -oxazines
AU2238183A (en) Fibrescope
AU2239683A (en) Photoconductive compositions
AU2022683A (en) Photopolymerisable acrylic composition
AU3349984A (en) Photopolymerizable acrylabe compositions
GB8314459D0 (en) Photoresist compositions
AU1147783A (en) Rtv-organdpolysiloxane composition
AU553013B2 (en) Shampoo compositions
GB8329395D0 (en) Photopolymerisable compositions
AU1426383A (en) Scale-inhibiting compositions
AU3391584A (en) Photopolymerizable compositions
AU1089783A (en) N-benzothienylalkyl-n-alkyl-allylamines
AU556553B2 (en) Composition
AU560066B2 (en) Cholecalciferol compositions
AU2081583A (en) Oral compositions
AU549508B2 (en) Anaerosically-curing compositions
GB8315926D0 (en) Photopolymerisable compositions
AU1956083A (en) Compositions containing benzoxadiazole - or benzthiadiazole - dihydropyridines

Legal Events

Date Code Title Description
MK14 Patent ceased section 143(a) (annual fees not paid) or expired