AU2003231387A1 - Line element and method of manufacturing the line element - Google Patents

Line element and method of manufacturing the line element

Info

Publication number
AU2003231387A1
AU2003231387A1 AU2003231387A AU2003231387A AU2003231387A1 AU 2003231387 A1 AU2003231387 A1 AU 2003231387A1 AU 2003231387 A AU2003231387 A AU 2003231387A AU 2003231387 A AU2003231387 A AU 2003231387A AU 2003231387 A1 AU2003231387 A1 AU 2003231387A1
Authority
AU
Australia
Prior art keywords
line element
manufacturing
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003231387A
Other languages
English (en)
Inventor
Satoshi Fujimoto
Yasuhiko Kasama
Kenji Omote
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ideal Star Inc
Original Assignee
Ideal Star Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ideal Star Inc filed Critical Ideal Star Inc
Publication of AU2003231387A1 publication Critical patent/AU2003231387A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0657Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312Gate electrodes for field effect devices
    • H01L29/42316Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42384Gate electrodes for field effect devices for field-effect transistors with insulated gate for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor
    • H01L29/42392Gate electrodes for field effect devices for field-effect transistors with insulated gate for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor fully surrounding the channel, e.g. gate-all-around
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B10/00Static random access memory [SRAM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/01Manufacture or treatment
    • H10B12/02Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/05Making the transistor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/50Peripheral circuit region structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B41/00Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/491Vertical transistors, e.g. vertical carbon nanotube field effect transistors [CNT-FETs]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/221Carbon nanotubes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/615Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Ceramic Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Film Transistor (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
AU2003231387A 2002-05-02 2003-05-02 Line element and method of manufacturing the line element Abandoned AU2003231387A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002131011 2002-05-02
JP2002-131011 2002-05-02
PCT/JP2003/005620 WO2003094237A1 (fr) 2002-05-02 2003-05-02 Element lineaire et procede de fabrication correspondant

Publications (1)

Publication Number Publication Date
AU2003231387A1 true AU2003231387A1 (en) 2003-11-17

Family

ID=29397337

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003231387A Abandoned AU2003231387A1 (en) 2002-05-02 2003-05-02 Line element and method of manufacturing the line element

Country Status (7)

Country Link
US (2) US7491613B2 (ja)
JP (1) JP5016190B2 (ja)
KR (1) KR20040101568A (ja)
CN (1) CN1650433B (ja)
AU (1) AU2003231387A1 (ja)
TW (1) TW200308103A (ja)
WO (1) WO2003094237A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006095812A1 (ja) * 2005-03-09 2006-09-14 Ideal Star Inc. 線状発光素子及び表示装置
US7511344B2 (en) * 2007-01-17 2009-03-31 International Business Machines Corporation Field effect transistor
FR2941089B1 (fr) * 2009-01-15 2011-01-21 Commissariat Energie Atomique Transistor a source et drain filaires
JP5941625B2 (ja) * 2011-06-01 2016-06-29 太陽工業株式会社 膜状太陽光発電装置
WO2015194815A1 (ko) 2014-06-17 2015-12-23 한국기계연구원 유기 반도체 소자 및 이의 제조 방법, 이를 이용한 직물 구조체 및 부직물 구조체, 그리고 이를 이용한 반도체 장치
KR101579101B1 (ko) * 2014-06-17 2015-12-21 한국기계연구원 유기 반도체 소자 및 이의 제조 방법, 이를 이용한 직물 구조체 및 부직물 구조체, 그리고 이를 이용한 반도체 장치
KR101914514B1 (ko) 2017-02-08 2018-11-05 서울대학교산학협력단 섬유형 트랜지스터, 이의 제조방법 및 섬유형 트랜지스터를 포함하는 직물형 집적 회로
TWI658472B (zh) * 2017-04-28 2019-05-01 吳政雄 複合導電體結合之電導體及其製造方法
WO2021095172A1 (ja) 2019-11-13 2021-05-20 エスユウテック株式会社 串刺し装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6129179A (ja) * 1984-07-19 1986-02-10 Oki Electric Ind Co Ltd 繊維状光電変換素子
DE8700578U1 (ja) * 1987-01-13 1988-11-10 Hoegl, Helmut, Dr., 8023 Pullach, De
JP2721183B2 (ja) * 1988-07-20 1998-03-04 キヤノン株式会社 非線形光学素子
JP3135899B2 (ja) 1989-06-06 2001-02-19 株式会社リコー 電気素子
US5719975A (en) * 1996-09-03 1998-02-17 Hughes Electronics Optically reconfigurable conductive line element
JP3435304B2 (ja) 1997-03-13 2003-08-11 株式会社東芝 液晶表示装置
JP3794144B2 (ja) * 1997-12-26 2006-07-05 富士ゼロックス株式会社 光半導体素子およびその製造方法
JP2000031006A (ja) * 1998-07-08 2000-01-28 Asahi Optical Co Ltd 半導体回路形成装置
WO2000051186A1 (en) * 1999-02-22 2000-08-31 Clawson Joseph E Jr Nanostructure device and apparatus
JP3217764B2 (ja) * 1999-05-28 2001-10-15 株式会社三井ハイテック 円筒状半導体素子を用いた半導体装置
JP2001077445A (ja) * 1999-06-21 2001-03-23 Sony Corp 機能一次元構造体の製造方法および機能構造体の製造方法
US6723394B1 (en) * 1999-06-21 2004-04-20 Cambridge University Technical Services Limited Aligned polymers for an organic TFT
JP2002009290A (ja) * 2000-06-21 2002-01-11 Fuji Xerox Co Ltd 有機電子素子の製造方法、および、該製造方法により製造された有機電子素子
US6437422B1 (en) * 2001-05-09 2002-08-20 International Business Machines Corporation Active devices using threads

Also Published As

Publication number Publication date
TWI335083B (ja) 2010-12-21
CN1650433A (zh) 2005-08-03
JPWO2003094237A1 (ja) 2005-09-08
WO2003094237A1 (fr) 2003-11-13
JP5016190B2 (ja) 2012-09-05
US8212240B2 (en) 2012-07-03
US7491613B2 (en) 2009-02-17
KR20040101568A (ko) 2004-12-02
TW200308103A (en) 2003-12-16
US20090152682A1 (en) 2009-06-18
CN1650433B (zh) 2010-08-04
US20050253134A1 (en) 2005-11-17

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase