AU2001286905A1 - Trench schottky rectifier - Google Patents
Trench schottky rectifierInfo
- Publication number
- AU2001286905A1 AU2001286905A1 AU2001286905A AU8690501A AU2001286905A1 AU 2001286905 A1 AU2001286905 A1 AU 2001286905A1 AU 2001286905 A AU2001286905 A AU 2001286905A AU 8690501 A AU8690501 A AU 8690501A AU 2001286905 A1 AU2001286905 A1 AU 2001286905A1
- Authority
- AU
- Australia
- Prior art keywords
- schottky rectifier
- trench schottky
- trench
- rectifier
- schottky
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/872—Schottky diodes
- H01L29/8725—Schottky diodes of the trench MOS barrier type [TMBS]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/872—Schottky diodes
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/653,084 | 2000-08-31 | ||
US09/653,084 US6707127B1 (en) | 2000-08-31 | 2000-08-31 | Trench schottky rectifier |
PCT/US2001/026954 WO2002019433A2 (en) | 2000-08-31 | 2001-08-29 | Trench schottky rectifier |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001286905A1 true AU2001286905A1 (en) | 2002-03-13 |
Family
ID=24619436
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001286905A Abandoned AU2001286905A1 (en) | 2000-08-31 | 2001-08-29 | Trench schottky rectifier |
Country Status (9)
Country | Link |
---|---|
US (2) | US6707127B1 (ko) |
EP (1) | EP1314207B1 (ko) |
JP (1) | JP4855636B2 (ko) |
KR (1) | KR100765924B1 (ko) |
CN (1) | CN1286187C (ko) |
AU (1) | AU2001286905A1 (ko) |
DE (1) | DE60118217T2 (ko) |
TW (1) | TW523933B (ko) |
WO (1) | WO2002019433A2 (ko) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10063443B4 (de) * | 2000-12-20 | 2005-03-03 | Infineon Technologies Ag | Verfahren zur Herstellung einer Elektrode eines mittels Feldeffekt steuerbaren Halbleiterbauelements und mittels Feldeffekt steuerbares Halbleiterbauelement |
US7009247B2 (en) * | 2001-07-03 | 2006-03-07 | Siliconix Incorporated | Trench MIS device with thick oxide layer in bottom of gate contact trench |
US20060038223A1 (en) * | 2001-07-03 | 2006-02-23 | Siliconix Incorporated | Trench MOSFET having drain-drift region comprising stack of implanted regions |
US7291884B2 (en) * | 2001-07-03 | 2007-11-06 | Siliconix Incorporated | Trench MIS device having implanted drain-drift region and thick bottom oxide |
US7033876B2 (en) * | 2001-07-03 | 2006-04-25 | Siliconix Incorporated | Trench MIS device having implanted drain-drift region and thick bottom oxide and process for manufacturing the same |
US7002187B1 (en) * | 2003-06-09 | 2006-02-21 | Micrel, Inc. | Integrated schottky diode using buried power buss structure and method for making same |
US6977208B2 (en) * | 2004-01-27 | 2005-12-20 | International Rectifier Corporation | Schottky with thick trench bottom and termination oxide and process for manufacture |
US7238976B1 (en) * | 2004-06-15 | 2007-07-03 | Qspeed Semiconductor Inc. | Schottky barrier rectifier and method of manufacturing the same |
FR2880193A1 (fr) * | 2004-12-23 | 2006-06-30 | St Microelectronics Sa | Diode schottky a barriere verticale |
WO2006085267A2 (en) * | 2005-02-08 | 2006-08-17 | Nxp B.V. | Semiconductor device with trench field plate |
US8093651B2 (en) * | 2005-02-11 | 2012-01-10 | Alpha & Omega Semiconductor Limited | MOS device with integrated schottky diode in active region contact trench |
US7948029B2 (en) | 2005-02-11 | 2011-05-24 | Alpha And Omega Semiconductor Incorporated | MOS device with varying trench depth |
US7285822B2 (en) * | 2005-02-11 | 2007-10-23 | Alpha & Omega Semiconductor, Inc. | Power MOS device |
US8283723B2 (en) * | 2005-02-11 | 2012-10-09 | Alpha & Omega Semiconductor Limited | MOS device with low injection diode |
US8362547B2 (en) | 2005-02-11 | 2013-01-29 | Alpha & Omega Semiconductor Limited | MOS device with Schottky barrier controlling layer |
US7671439B2 (en) * | 2005-02-11 | 2010-03-02 | Alpha & Omega Semiconductor, Ltd. | Junction barrier Schottky (JBS) with floating islands |
JP2006339508A (ja) * | 2005-06-03 | 2006-12-14 | Sumitomo Electric Ind Ltd | 半導体装置およびその製造方法 |
CN101361194B (zh) * | 2005-12-27 | 2010-12-22 | 美商科斯德半导体股份有限公司 | 用于快速恢复整流器结构的装置及方法 |
US7602036B2 (en) * | 2006-03-07 | 2009-10-13 | International Rectifier Corporation | Trench type Schottky rectifier with oxide mass in trench bottom |
JP2008034572A (ja) * | 2006-07-28 | 2008-02-14 | Matsushita Electric Ind Co Ltd | 半導体装置とその製造方法 |
US8159021B2 (en) * | 2008-02-20 | 2012-04-17 | Force-Mos Technology Corporation | Trench MOSFET with double epitaxial structure |
US7858506B2 (en) * | 2008-06-18 | 2010-12-28 | Micron Technology, Inc. | Diodes, and methods of forming diodes |
US7902075B2 (en) | 2008-09-08 | 2011-03-08 | Semiconductor Components Industries, L.L.C. | Semiconductor trench structure having a sealing plug and method |
US7960781B2 (en) | 2008-09-08 | 2011-06-14 | Semiconductor Components Industries, Llc | Semiconductor device having vertical charge-compensated structure and sub-surface connecting layer and method |
US9000550B2 (en) | 2008-09-08 | 2015-04-07 | Semiconductor Components Industries, Llc | Semiconductor component and method of manufacture |
IT1394649B1 (it) * | 2009-06-01 | 2012-07-05 | St Microelectronics Srl | Fotodiodo con contatto schottky sulle pareti di trincee parallele e relativo metodo di fabbricazione |
DE102009028248A1 (de) * | 2009-08-05 | 2011-02-10 | Robert Bosch Gmbh | Halbleiteranordnung |
US9577079B2 (en) | 2009-12-17 | 2017-02-21 | Infineon Technologies Ag | Tunnel field effect transistors |
JP2011199306A (ja) * | 2011-06-03 | 2011-10-06 | Sumitomo Electric Ind Ltd | 半導体装置およびその製造方法 |
CN102222701A (zh) * | 2011-06-23 | 2011-10-19 | 哈尔滨工程大学 | 一种沟槽结构肖特基器件 |
CN103094100B (zh) * | 2011-10-28 | 2015-09-30 | 比亚迪股份有限公司 | 一种形成肖特基二极管的方法 |
CN103579368A (zh) * | 2012-07-18 | 2014-02-12 | 朱江 | 一种沟槽肖特基半导体装置及其制备方法 |
TWI511305B (zh) * | 2012-11-01 | 2015-12-01 | Chip Integration Tech Co Ltd | 蕭特基整流元件之製造方法 |
CN103022090A (zh) * | 2012-12-27 | 2013-04-03 | 淄博美林电子有限公司 | 一种高效率、高耐压肖特基芯片 |
CN104124151B (zh) * | 2014-07-14 | 2017-08-25 | 中航(重庆)微电子有限公司 | 一种沟槽结构肖特基势垒二极管及其制作方法 |
EP3067935A1 (en) * | 2015-03-10 | 2016-09-14 | ABB Technology AG | Power semiconductor rectifier with controllable on-state voltage |
JP7284721B2 (ja) * | 2020-01-30 | 2023-05-31 | 株式会社豊田中央研究所 | ダイオード |
CN113193053B (zh) * | 2021-05-20 | 2023-11-07 | 电子科技大学 | 一种具有高正向电流密度的沟槽肖特基二极管 |
JP2023079551A (ja) * | 2021-11-29 | 2023-06-08 | Tdk株式会社 | ショットキーバリアダイオード |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5599774A (en) * | 1979-01-26 | 1980-07-30 | Semiconductor Res Found | Electrostatic induction type thyristor |
JPS562625A (en) * | 1979-06-20 | 1981-01-12 | Shindengen Electric Mfg Co Ltd | Manufacture of epitaxial wafer |
JPS6140841A (ja) * | 1984-07-31 | 1986-02-27 | Miyazakiken | 多孔質ガラス成形物及びその製造方法 |
EP0363552B1 (en) * | 1988-07-27 | 1993-10-13 | Tanaka Kikinzoku Kogyo K.K. | Process for preparing metal particles |
US4990988A (en) * | 1989-06-09 | 1991-02-05 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Laterally stacked Schottky diodes for infrared sensor applications |
US4982260A (en) | 1989-10-02 | 1991-01-01 | General Electric Company | Power rectifier with trenches |
US5381026A (en) * | 1990-09-17 | 1995-01-10 | Kabushiki Kaisha Toshiba | Insulated-gate thyristor |
JP3297060B2 (ja) * | 1990-09-17 | 2002-07-02 | 株式会社東芝 | 絶縁ゲート型サイリスタ |
JP2555475B2 (ja) * | 1990-10-16 | 1996-11-20 | 工業技術院長 | 無機質微小球体の製造方法 |
JPH05114723A (ja) * | 1991-03-28 | 1993-05-07 | Murata Mfg Co Ltd | シヨツトキーバリア半導体装置及びその製造方法 |
US5262668A (en) | 1992-08-13 | 1993-11-16 | North Carolina State University At Raleigh | Schottky barrier rectifier including schottky barrier regions of differing barrier heights |
JP3173186B2 (ja) * | 1992-10-08 | 2001-06-04 | 株式会社村田製作所 | ショットキーバリア半導体装置の製造方法 |
US5365102A (en) | 1993-07-06 | 1994-11-15 | North Carolina State University | Schottky barrier rectifier with MOS trench |
US5588983A (en) * | 1994-02-16 | 1996-12-31 | Murata Manufacturing Co., Ltd. | Production of copper powder |
JPH07263717A (ja) * | 1994-03-23 | 1995-10-13 | Nippon Telegr & Teleph Corp <Ntt> | 整流素子およびその製造方法 |
US5609919A (en) * | 1994-04-21 | 1997-03-11 | Altamat Inc. | Method for producing droplets |
US5962893A (en) | 1995-04-20 | 1999-10-05 | Kabushiki Kaisha Toshiba | Schottky tunneling device |
JP3329642B2 (ja) * | 1995-04-20 | 2002-09-30 | 株式会社東芝 | 半導体装置 |
US5612567A (en) | 1996-05-13 | 1997-03-18 | North Carolina State University | Schottky barrier rectifiers and methods of forming same |
US5705830A (en) * | 1996-09-05 | 1998-01-06 | Northrop Grumman Corporation | Static induction transistors |
JP3420698B2 (ja) * | 1998-03-24 | 2003-06-30 | 株式会社東芝 | 半導体装置及びその製造方法 |
JP2001068688A (ja) * | 1999-08-26 | 2001-03-16 | Fuji Electric Co Ltd | ショットキーバリアダイオードの製造方法およびショットキーバリアダイオード |
US6494931B1 (en) * | 1999-11-12 | 2002-12-17 | Mitsui Mining And Smelting Co., Ltd. | Nickel powder and conductive paste |
US6593620B1 (en) * | 2000-10-06 | 2003-07-15 | General Semiconductor, Inc. | Trench DMOS transistor with embedded trench schottky rectifier |
US6420768B1 (en) * | 2000-12-15 | 2002-07-16 | General Semiconductor, Inc. | Trench schottky barrier rectifier and method of making the same |
US6580141B2 (en) * | 2001-06-01 | 2003-06-17 | General Semiconductor, Inc. | Trench schottky rectifier |
-
2000
- 2000-08-31 US US09/653,084 patent/US6707127B1/en not_active Expired - Lifetime
-
2001
- 2001-08-29 JP JP2002524229A patent/JP4855636B2/ja not_active Expired - Lifetime
- 2001-08-29 AU AU2001286905A patent/AU2001286905A1/en not_active Abandoned
- 2001-08-29 DE DE60118217T patent/DE60118217T2/de not_active Expired - Lifetime
- 2001-08-29 WO PCT/US2001/026954 patent/WO2002019433A2/en active IP Right Grant
- 2001-08-29 EP EP01966385A patent/EP1314207B1/en not_active Expired - Lifetime
- 2001-08-29 CN CNB018150403A patent/CN1286187C/zh not_active Expired - Lifetime
- 2001-08-29 KR KR1020037002858A patent/KR100765924B1/ko active IP Right Grant
- 2001-08-31 TW TW090121685A patent/TW523933B/zh not_active IP Right Cessation
-
2002
- 2002-01-10 US US10/043,633 patent/US6518152B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1314207A2 (en) | 2003-05-28 |
US6518152B2 (en) | 2003-02-11 |
US20020066926A1 (en) | 2002-06-06 |
US6707127B1 (en) | 2004-03-16 |
JP4855636B2 (ja) | 2012-01-18 |
JP2004521480A (ja) | 2004-07-15 |
CN1498425A (zh) | 2004-05-19 |
DE60118217D1 (de) | 2006-05-11 |
WO2002019433A3 (en) | 2002-12-05 |
KR20030038718A (ko) | 2003-05-16 |
WO2002019433A2 (en) | 2002-03-07 |
CN1286187C (zh) | 2006-11-22 |
EP1314207B1 (en) | 2006-03-22 |
TW523933B (en) | 2003-03-11 |
DE60118217T2 (de) | 2006-12-28 |
KR100765924B1 (ko) | 2007-10-11 |
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