AU2001266998A1 - Method to restore hydrophobicity in dielectric films and materials - Google Patents
Method to restore hydrophobicity in dielectric films and materialsInfo
- Publication number
- AU2001266998A1 AU2001266998A1 AU2001266998A AU6699801A AU2001266998A1 AU 2001266998 A1 AU2001266998 A1 AU 2001266998A1 AU 2001266998 A AU2001266998 A AU 2001266998A AU 6699801 A AU6699801 A AU 6699801A AU 2001266998 A1 AU2001266998 A1 AU 2001266998A1
- Authority
- AU
- Australia
- Prior art keywords
- materials
- dielectric films
- hydrophobicity
- restore
- restore hydrophobicity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
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- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76814—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics post-treatment or after-treatment, e.g. cleaning or removal of oxides on underlying conductors
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
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- H01L21/76822—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc.
- H01L21/76826—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc. by contacting the layer with gases, liquids or plasmas
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- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
- H01L21/76831—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers in via holes or trenches, e.g. non-conductive sidewall liners
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US21421900P | 2000-06-23 | 2000-06-23 | |
US60214219 | 2000-06-23 | ||
PCT/US2001/019466 WO2002001621A2 (en) | 2000-06-23 | 2001-06-19 | Method to restore hydrophobicity in dielectric films and materials |
Publications (1)
Publication Number | Publication Date |
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AU2001266998A1 true AU2001266998A1 (en) | 2002-01-08 |
Family
ID=22798248
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001266998A Abandoned AU2001266998A1 (en) | 2000-06-23 | 2001-06-19 | Method to restore hydrophobicity in dielectric films and materials |
Country Status (9)
Country | Link |
---|---|
US (3) | US7029826B2 (en) |
EP (1) | EP1292973B1 (en) |
JP (2) | JP5307963B2 (en) |
KR (1) | KR100797202B1 (en) |
CN (1) | CN1279588C (en) |
AU (1) | AU2001266998A1 (en) |
CA (1) | CA2413592A1 (en) |
TW (1) | TWI264040B (en) |
WO (1) | WO2002001621A2 (en) |
Families Citing this family (105)
Publication number | Priority date | Publication date | Assignee | Title |
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GB9904427D0 (en) | 1999-02-26 | 1999-04-21 | Trikon Holdings Ltd | Method treating an insulating layer |
WO2001085308A2 (en) | 2000-05-05 | 2001-11-15 | Extraction Systems, Inc. | Filters employing both acidic polymers and physical-absorption media |
JP5307963B2 (en) | 2000-06-23 | 2013-10-02 | ハネウェル・インターナショナル・インコーポレーテッド | Method for restoring hydrophobicity in dielectric films and materials |
US7174303B2 (en) * | 2000-07-31 | 2007-02-06 | Uappoint, Inc | Customer driven, sponsor controlled network-based graphical scheduling system and method |
US7270941B2 (en) * | 2002-03-04 | 2007-09-18 | Tokyo Electron Limited | Method of passivating of low dielectric materials in wafer processing |
GB2410832A (en) * | 2002-06-14 | 2005-08-10 | Trikon Technologies Ltd | Porous dielectric films with a non-porous surface |
US6933246B2 (en) | 2002-06-14 | 2005-08-23 | Trikon Technologies Limited | Dielectric film |
US7005390B2 (en) * | 2002-10-09 | 2006-02-28 | Intel Corporation | Replenishment of surface carbon and surface passivation of low-k porous silicon-based dielectric materials |
EP1588411A4 (en) * | 2003-01-25 | 2008-10-01 | Honeywell Int Inc | Repair and restoration of damaged dielectric materials and films |
US7709371B2 (en) | 2003-01-25 | 2010-05-04 | Honeywell International Inc. | Repairing damage to low-k dielectric materials using silylating agents |
US6921727B2 (en) | 2003-03-11 | 2005-07-26 | Applied Materials, Inc. | Method for modifying dielectric characteristics of dielectric layers |
TWI257120B (en) | 2003-06-18 | 2006-06-21 | Fujitsu Ltd | Method for manufacturing semiconductor device |
US20040266184A1 (en) * | 2003-06-30 | 2004-12-30 | Ramachandrarao Vijayakumar S | Post-deposition modification of interlayer dielectrics |
US7425505B2 (en) * | 2003-07-23 | 2008-09-16 | Fsi International, Inc. | Use of silyating agents |
US7122481B2 (en) * | 2003-07-25 | 2006-10-17 | Intel Corporation | Sealing porous dielectrics with silane coupling reagents |
US7179758B2 (en) * | 2003-09-03 | 2007-02-20 | International Business Machines Corporation | Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics |
US8475666B2 (en) * | 2004-09-15 | 2013-07-02 | Honeywell International Inc. | Method for making toughening agent materials |
US7717929B2 (en) | 2003-12-19 | 2010-05-18 | Radi Medical Systems Ab | Technique for securing a suture |
US7223704B2 (en) * | 2004-08-27 | 2007-05-29 | Infineon Technologies Ag | Repair of carbon depletion in low-k dielectric films |
US8119537B2 (en) * | 2004-09-02 | 2012-02-21 | Micron Technology, Inc. | Selective etching of oxides to metal nitrides and metal oxides |
JP4903373B2 (en) | 2004-09-02 | 2012-03-28 | ローム株式会社 | Manufacturing method of semiconductor device |
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-
2001
- 2001-06-19 JP JP2002505668A patent/JP5307963B2/en not_active Expired - Fee Related
- 2001-06-19 AU AU2001266998A patent/AU2001266998A1/en not_active Abandoned
- 2001-06-19 CN CNB018145507A patent/CN1279588C/en not_active Expired - Fee Related
- 2001-06-19 EP EP01944605.3A patent/EP1292973B1/en not_active Expired - Lifetime
- 2001-06-19 KR KR1020027017542A patent/KR100797202B1/en not_active IP Right Cessation
- 2001-06-19 CA CA002413592A patent/CA2413592A1/en not_active Abandoned
- 2001-06-19 US US10/312,295 patent/US7029826B2/en not_active Expired - Fee Related
- 2001-06-19 WO PCT/US2001/019466 patent/WO2002001621A2/en active Search and Examination
- 2001-06-22 TW TW090115288A patent/TWI264040B/en not_active IP Right Cessation
-
2005
- 2005-11-28 US US11/287,992 patent/US8440388B2/en active Active
-
2007
- 2007-04-05 US US11/784,081 patent/US7858294B2/en not_active Expired - Lifetime
-
2012
- 2012-07-06 JP JP2012152710A patent/JP2012231164A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2002001621A3 (en) | 2002-03-21 |
US7858294B2 (en) | 2010-12-28 |
CA2413592A1 (en) | 2002-01-03 |
TWI264040B (en) | 2006-10-11 |
US7029826B2 (en) | 2006-04-18 |
CN1279588C (en) | 2006-10-11 |
EP1292973A2 (en) | 2003-03-19 |
CN1502122A (en) | 2004-06-02 |
JP2012231164A (en) | 2012-11-22 |
US20040013858A1 (en) | 2004-01-22 |
EP1292973B1 (en) | 2015-09-09 |
KR20030062237A (en) | 2003-07-23 |
WO2002001621A2 (en) | 2002-01-03 |
JP5307963B2 (en) | 2013-10-02 |
US20060078827A1 (en) | 2006-04-13 |
KR100797202B1 (en) | 2008-01-23 |
JP2004511896A (en) | 2004-04-15 |
US20070190735A1 (en) | 2007-08-16 |
US8440388B2 (en) | 2013-05-14 |
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