ATE89423T1 - Lichtschutz-maskenfilm. - Google Patents

Lichtschutz-maskenfilm.

Info

Publication number
ATE89423T1
ATE89423T1 AT89301485T AT89301485T ATE89423T1 AT E89423 T1 ATE89423 T1 AT E89423T1 AT 89301485 T AT89301485 T AT 89301485T AT 89301485 T AT89301485 T AT 89301485T AT E89423 T1 ATE89423 T1 AT E89423T1
Authority
AT
Austria
Prior art keywords
mask film
light protection
protection mask
lightsafe
acrylonitrile
Prior art date
Application number
AT89301485T
Other languages
English (en)
Inventor
Hiroshi Maruyama
Naohiko Kiryu
Etsuko Minezaki
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Application granted granted Critical
Publication of ATE89423T1 publication Critical patent/ATE89423T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/14—Layer or component removable to expose adhesive
    • Y10T428/1424—Halogen containing compound
    • Y10T428/1433—Coloring agent containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31507—Of polycarbonate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31725—Of polyamide
    • Y10T428/3175—Next to addition polymer from unsaturated monomer[s]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31786—Of polyester [e.g., alkyd, etc.]
    • Y10T428/31797—Next to addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31935—Ester, halide or nitrile of addition polymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Laminated Bodies (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Insulating Materials (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
AT89301485T 1988-02-16 1989-02-16 Lichtschutz-maskenfilm. ATE89423T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3361288A JPH07111577B2 (ja) 1988-02-16 1988-02-16 マスキングフィルム
EP89301485A EP0329437B1 (de) 1988-02-16 1989-02-16 Lichtschutz-Maskenfilm

Publications (1)

Publication Number Publication Date
ATE89423T1 true ATE89423T1 (de) 1993-05-15

Family

ID=12391282

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89301485T ATE89423T1 (de) 1988-02-16 1989-02-16 Lichtschutz-maskenfilm.

Country Status (11)

Country Link
US (1) US4923727A (de)
EP (1) EP0329437B1 (de)
JP (1) JPH07111577B2 (de)
KR (1) KR920003795B1 (de)
AT (1) ATE89423T1 (de)
AU (1) AU610990B2 (de)
CA (1) CA1321513C (de)
DE (1) DE68906417D1 (de)
FI (1) FI90291C (de)
HK (1) HK4394A (de)
NZ (1) NZ228014A (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0769602B2 (ja) * 1988-04-19 1995-07-31 ソマール株式会社 遮光性マスキングフィルム
US5368962A (en) * 1988-11-10 1994-11-29 Somar Corporation Masking film
JPH0766177B2 (ja) * 1989-06-21 1995-07-19 フジレックス株式会社 遮光性マスキングフィルム
JPH0782231B2 (ja) * 1990-01-30 1995-09-06 フジレックス株式会社 遮光性マスキングフィルム
US5707704A (en) * 1994-12-27 1998-01-13 Kimoto Co., Ltd. Masking films
JPH09236903A (ja) * 1996-03-01 1997-09-09 Kimoto & Co Ltd 遮光性マスキングフィルム
DE10118484A1 (de) * 2001-04-12 2002-10-24 Wacker Chemie Gmbh Verfahren zur Herstellung von mehrschichtigen Beschichtungen
DE102005035905A1 (de) * 2005-07-28 2007-02-01 Tesa Ag Nitrilkautschuk Blends zur Fixierung von Metallteilen auf Kunststoffen
US7971647B2 (en) 2008-05-21 2011-07-05 Paal, L.L.C. Apparatus and method for raising a fluid in a well
JP6216247B2 (ja) * 2013-03-28 2017-10-18 住友理工株式会社 電子写真用部材
GB2556861B (en) * 2015-12-01 2021-10-20 Kimberly Clark Co Absorbent and protective composition containing an elastomeric copolymer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846011B2 (ja) * 1978-02-01 1983-10-13 ダイセル化学工業株式会社 遮光性マスキングフィルム
JPS58108537A (ja) * 1981-12-22 1983-06-28 Daicel Chem Ind Ltd 遮光性マスキングフイルム
GB8415782D0 (en) * 1984-06-20 1984-07-25 Autotype Int Ltd Masking films
JPS61110141A (ja) * 1984-11-05 1986-05-28 Shinko Kagaku Kogyo Kk 遮光性マスキングフイルム
JPS61166549A (ja) * 1985-01-18 1986-07-28 Somar Corp 遮光性マスキングフイルム

Also Published As

Publication number Publication date
JPH01207753A (ja) 1989-08-21
US4923727A (en) 1990-05-08
KR920003795B1 (ko) 1992-05-14
EP0329437B1 (de) 1993-05-12
DE68906417D1 (de) 1993-06-17
KR890013524A (ko) 1989-09-23
CA1321513C (en) 1993-08-24
AU610990B2 (en) 1991-05-30
HK4394A (en) 1994-01-21
FI890713A0 (fi) 1989-02-15
FI90291B (fi) 1993-09-30
NZ228014A (en) 1991-02-26
JPH07111577B2 (ja) 1995-11-29
FI90291C (fi) 1994-01-10
AU3003489A (en) 1989-08-17
EP0329437A3 (en) 1989-10-25
FI890713L (fi) 1989-08-17
EP0329437A2 (de) 1989-08-23

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties