KR910017226A - 감광 재생요소를 위한 폴리올레핀 이면 코팅 - Google Patents
감광 재생요소를 위한 폴리올레핀 이면 코팅 Download PDFInfo
- Publication number
- KR910017226A KR910017226A KR1019910003922A KR910003922A KR910017226A KR 910017226 A KR910017226 A KR 910017226A KR 1019910003922 A KR1019910003922 A KR 1019910003922A KR 910003922 A KR910003922 A KR 910003922A KR 910017226 A KR910017226 A KR 910017226A
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- element according
- crosslinked polyolefin
- molecular weight
- polyolefin
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F3/00—Colour separation; Correction of tonal value
- G03F3/10—Checking the colour or tonal value of separation negatives or positives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C3/00—Packages of films for inserting into cameras, e.g. roll-films, film-packs; Wrapping materials for light-sensitive plates, films or papers, e.g. materials characterised by the use of special dyes, printing inks, adhesives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/162—Protective or antiabrasion layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Luminescent Compositions (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (7)
- (1)화학선에 대해 투명하며, 가교된 폴리올레핀 단독중합체 또는 공중합체 층으로 표면이 코팅된(여기서, 코팅면은 다음(2)의 광경화성 층과 직면하지 않음)박리성 피복 시트, (2)광경화성 층, (3) 비감광 엘라스토머성 층 및 (4)지지체 시트의 순서로 이루어짐을 특징으로 하는 다층, 박리성 감광요소.
- 제1항에 있어서, 피복 시트와 광경화성 층 사이에 광이형 층을 함유함을 특징으로 하는 요소.
- 제2항에 있어서, 광이형 층이 일반식 H(OCH2CH2)nOH의 고상 옥시에틸렌 단독중합체 광이형제(여기서 n은 3,000이상의 분자량을 가진 단독중합체를 제공하기에 충분한 정수임)로 이루어짐을 특징으로 하는 요소.
- 제1항에 있어서, 가교된 폴리올레핀이 불포화 지방족 탄화 수소임을 특징으로 하는 요소.
- 제4항에 있어서, 가교된 폴리올레핀의 분자량이 적어도 2000이상이고 산가의 범위가 10내지 50임을 특징으로 하는 요소.
- 제3항에 있어서, 가교된 폴리올레핀이 불포화 지방족 탄화수소임을 특징으로 하는 요소.
- 제6항에 있어서, 가교된 올레핀의 분자량이 적어도 2000이상이고 산가의 범위가 10내지 50임을 특징으로 하는 요소.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US49296690A | 1990-03-13 | 1990-03-13 | |
US492966 | 1990-03-13 | ||
US492,966 | 1990-03-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910017226A true KR910017226A (ko) | 1991-11-05 |
KR950004197B1 KR950004197B1 (ko) | 1995-04-27 |
Family
ID=23958333
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910003922A KR950004197B1 (ko) | 1990-03-13 | 1991-03-12 | 감광 재생 요소를 위한 폴리올레핀 이면 코팅 |
Country Status (8)
Country | Link |
---|---|
US (1) | US5135836A (ko) |
EP (1) | EP0446820B1 (ko) |
JP (1) | JPH04219758A (ko) |
KR (1) | KR950004197B1 (ko) |
CN (1) | CN1054837A (ko) |
AU (1) | AU7284991A (ko) |
CA (1) | CA2037804A1 (ko) |
DE (1) | DE69104632T2 (ko) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5087549A (en) * | 1990-10-19 | 1992-02-11 | E. I. Du Pont De Nemours And Company | Image reproduction process using a peel-apart photosensitive element |
US5300399A (en) * | 1993-01-21 | 1994-04-05 | Hoechst Celanese Corporation | Negative working, peel developable, single sheet color proofing system having a crosslinked layer containing a polymer with phenolic moieties |
MY120763A (en) | 1997-09-19 | 2005-11-30 | Hitachi Chemical Co Ltd | Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer |
JP3615752B1 (ja) | 2003-11-18 | 2005-02-02 | 淳 高橋 | 細径樹脂捩じりブラシ |
US7022492B2 (en) | 2003-12-15 | 2006-04-04 | Dade Behring Inc. | Ecstasy haptens and immunogens |
US6991911B2 (en) | 2003-12-15 | 2006-01-31 | Dade Behring Inc. | Assay for entactogens |
US7424245B2 (en) * | 2005-10-19 | 2008-09-09 | Static Control Components, Inc. | Systems and methods for remanufacturing imaging components |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4191572A (en) * | 1975-06-03 | 1980-03-04 | E. I. Du Pont De Nemours And Company | Process for image reproduction using multilayer photosensitive element with solvent-soluble layer |
DE2758575A1 (de) * | 1977-12-29 | 1979-07-05 | Hoechst Ag | Lichtempfindliches schichtuebertragungsmaterial |
JPS5799647A (en) * | 1980-12-11 | 1982-06-21 | Mitsubishi Chem Ind Ltd | Photosensitive lithographic printing plate material |
US4489154A (en) * | 1983-12-22 | 1984-12-18 | E. I. Du Pont De Nemours And Company | Process for preparing a surprint proof |
US4634658A (en) * | 1984-12-27 | 1987-01-06 | E. I. Du Pont De Nemours And Company | Process for preparing surprint proof of an improved support |
DE3736980A1 (de) * | 1987-10-31 | 1989-05-18 | Basf Ag | Mehrschichtiges, flaechenfoermiges, lichtempfindliches aufzeichnungsmaterial |
US4885225A (en) * | 1988-04-29 | 1989-12-05 | Minnesota Mining And Manufacturing Company | Color proof with non-blocking thermal adhesive layer with particulate polymer beads |
US4902594A (en) * | 1988-10-21 | 1990-02-20 | Hoechst Celanese Corporation | Transferrable, thermoplastic, antiblocking/adhesive protecting layer for images |
-
1991
- 1991-03-08 CA CA002037804A patent/CA2037804A1/en not_active Abandoned
- 1991-03-09 DE DE69104632T patent/DE69104632T2/de not_active Expired - Fee Related
- 1991-03-09 EP EP91103636A patent/EP0446820B1/en not_active Expired - Lifetime
- 1991-03-12 JP JP3070420A patent/JPH04219758A/ja active Pending
- 1991-03-12 KR KR1019910003922A patent/KR950004197B1/ko active IP Right Grant
- 1991-03-13 AU AU72849/91A patent/AU7284991A/en not_active Abandoned
- 1991-03-13 CN CN91101478A patent/CN1054837A/zh active Pending
- 1991-09-20 US US07/763,048 patent/US5135836A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0446820A3 (en) | 1992-10-28 |
EP0446820A2 (en) | 1991-09-18 |
US5135836A (en) | 1992-08-04 |
EP0446820B1 (en) | 1994-10-19 |
CN1054837A (zh) | 1991-09-25 |
DE69104632T2 (de) | 1995-05-11 |
KR950004197B1 (ko) | 1995-04-27 |
DE69104632D1 (de) | 1994-11-24 |
JPH04219758A (ja) | 1992-08-10 |
AU7284991A (en) | 1991-09-19 |
CA2037804A1 (en) | 1991-09-14 |
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Date | Code | Title | Description |
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A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
NORF | Unpaid initial registration fee |