ATE542837T1 - Polycyclische resistzusammensetzungen mit verbesserter ätzbeständigkeit - Google Patents

Polycyclische resistzusammensetzungen mit verbesserter ätzbeständigkeit

Info

Publication number
ATE542837T1
ATE542837T1 AT08170128T AT08170128T ATE542837T1 AT E542837 T1 ATE542837 T1 AT E542837T1 AT 08170128 T AT08170128 T AT 08170128T AT 08170128 T AT08170128 T AT 08170128T AT E542837 T1 ATE542837 T1 AT E542837T1
Authority
AT
Austria
Prior art keywords
polycyclic
etch resistance
resistant compositions
improved etch
cyclic
Prior art date
Application number
AT08170128T
Other languages
English (en)
Inventor
Saikumar Jayaraman
Brian L Goodall
Larry F Rhodes
Robert A Shick
Richard Vicari
Robert D Allen
Juliann Opitz
Ratnam Sooriyakumaran
Thomas Wallow
Original Assignee
Sumitomo Bakelite Co
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co, Ibm filed Critical Sumitomo Bakelite Co
Application granted granted Critical
Publication of ATE542837T1 publication Critical patent/ATE542837T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
    • C08G61/08—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds of carbocyclic compounds containing one or more carbon-to-carbon double bonds in the ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Polyethers (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Insulating Materials (AREA)
  • Polymerization Catalysts (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Drying Of Semiconductors (AREA)
AT08170128T 1998-02-23 1999-02-19 Polycyclische resistzusammensetzungen mit verbesserter ätzbeständigkeit ATE542837T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7555798P 1998-02-23 1998-02-23

Publications (1)

Publication Number Publication Date
ATE542837T1 true ATE542837T1 (de) 2012-02-15

Family

ID=22126530

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08170128T ATE542837T1 (de) 1998-02-23 1999-02-19 Polycyclische resistzusammensetzungen mit verbesserter ätzbeständigkeit

Country Status (11)

Country Link
US (2) US6147177A (de)
EP (2) EP1058699A1 (de)
JP (2) JP2002504573A (de)
KR (1) KR100617354B1 (de)
CN (1) CN1223615C (de)
AT (1) ATE542837T1 (de)
AU (1) AU3303599A (de)
ID (1) ID26627A (de)
MY (1) MY133442A (de)
TW (1) TWI250384B (de)
WO (1) WO1999042502A1 (de)

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CN100346229C (zh) * 2002-09-30 2007-10-31 日本瑞翁株式会社 放射线敏感性树脂组合物、树脂图案膜及其形成方法以及树脂图案膜的应用
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US7402642B2 (en) * 2003-12-23 2008-07-22 Exxonmobil Research And Engineering Company Linear functional copolymers of ethylene with precise and minimum run length distributions and method of making thereof
US7101654B2 (en) * 2004-01-14 2006-09-05 Promerus Llc Norbornene-type monomers and polymers containing pendent lactone or sultone groups
US20050192409A1 (en) * 2004-02-13 2005-09-01 Rhodes Larry F. Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof
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US7727705B2 (en) * 2007-02-23 2010-06-01 Fujifilm Electronic Materials, U.S.A., Inc. High etch resistant underlayer compositions for multilayer lithographic processes
JP5017227B2 (ja) * 2008-09-26 2012-09-05 富士フイルム株式会社 ノルボルネン系付加重合体、それを用いた光学材料
US8753790B2 (en) * 2009-07-01 2014-06-17 Promerus, Llc Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
JP5692232B2 (ja) * 2010-08-27 2015-04-01 住友ベークライト株式会社 フォトレジスト用樹脂組成物
EP2643371B1 (de) * 2010-11-24 2014-04-02 Promerus, LLC Selbst abbildbares folienbildendes polymer, zusammensetzungen davon und vorrichtungen und strukturen daraus
KR101496976B1 (ko) * 2011-07-14 2015-03-02 스미토모 베이클리트 컴퍼니 리미티드 화학 방사선에 대한 이미지-와이즈 노광 후에 패턴화된 층을 형성하는 중합체 및 이의 조성물
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Also Published As

Publication number Publication date
EP2045275A2 (de) 2009-04-08
TWI250384B (en) 2006-03-01
US6451499B1 (en) 2002-09-17
EP2045275B1 (de) 2012-01-25
EP1058699A1 (de) 2000-12-13
CN1292002A (zh) 2001-04-18
US6147177A (en) 2000-11-14
CN1223615C (zh) 2005-10-19
MY133442A (en) 2007-11-30
JP2009235414A (ja) 2009-10-15
JP2002504573A (ja) 2002-02-12
ID26627A (id) 2001-01-25
HK1035199A1 (en) 2001-11-16
EP2045275A3 (de) 2009-07-29
KR20010041216A (ko) 2001-05-15
KR100617354B1 (ko) 2006-08-31
AU3303599A (en) 1999-09-06
WO1999042502A1 (en) 1999-08-26

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