ATE510446T1 - Verfahren und vorrichtung für den betrieb einer elektrischen entladungsvorrichtung - Google Patents

Verfahren und vorrichtung für den betrieb einer elektrischen entladungsvorrichtung

Info

Publication number
ATE510446T1
ATE510446T1 AT05826686T AT05826686T ATE510446T1 AT E510446 T1 ATE510446 T1 AT E510446T1 AT 05826686 T AT05826686 T AT 05826686T AT 05826686 T AT05826686 T AT 05826686T AT E510446 T1 ATE510446 T1 AT E510446T1
Authority
AT
Austria
Prior art keywords
electrodes
operating
plasma
electrical discharge
electrode
Prior art date
Application number
AT05826686T
Other languages
English (en)
Inventor
Michael Loeken
Jakob Neff
Juergen Klein
Sven Probst
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE510446T1 publication Critical patent/ATE510446T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Theoretical Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT05826686T 2004-12-04 2005-11-29 Verfahren und vorrichtung für den betrieb einer elektrischen entladungsvorrichtung ATE510446T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004058500A DE102004058500A1 (de) 2004-12-04 2004-12-04 Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung
PCT/IB2005/053946 WO2006059275A2 (en) 2004-12-04 2005-11-29 Method and apparatus for operating an electrical discharge device

Publications (1)

Publication Number Publication Date
ATE510446T1 true ATE510446T1 (de) 2011-06-15

Family

ID=36273567

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05826686T ATE510446T1 (de) 2004-12-04 2005-11-29 Verfahren und vorrichtung für den betrieb einer elektrischen entladungsvorrichtung

Country Status (6)

Country Link
US (1) US8227777B2 (de)
EP (1) EP1820377B1 (de)
JP (1) JP2008522379A (de)
AT (1) ATE510446T1 (de)
DE (1) DE102004058500A1 (de)
WO (1) WO2006059275A2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7872244B2 (en) * 2007-08-08 2011-01-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9316675B2 (en) 2012-09-06 2016-04-19 Mks Instruments, Inc. Secondary plasma detection systems and methods
DK3528266T3 (da) * 2018-02-15 2021-01-04 Abb Power Grids Switzerland Ag Isolering af ikke-væskenedsænkede transformere
CN111293662B (zh) * 2020-05-13 2020-10-09 湖南省湘电试研技术有限公司 一种绝缘子的放电路径控制参数的确定方法、装置及设备
DE102021213828B4 (de) 2021-12-06 2023-07-27 Carl Zeiss Smt Gmbh Verfahren zum Ziel-Betreiben einer EUV-Strahlungsquelle

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JPH0638391B2 (ja) * 1985-04-30 1994-05-18 日本電信電話株式会社 Ｘ線露光装置
JPS62172648A (ja) * 1986-01-24 1987-07-29 Nippon Telegr & Teleph Corp <Ntt> Ｘ線発生装置
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US5914974A (en) * 1997-02-21 1999-06-22 Cymer, Inc. Method and apparatus for eliminating reflected energy due to stage mismatch in nonlinear magnetic compression modules
US6576917B1 (en) * 1997-03-11 2003-06-10 University Of Central Florida Adjustable bore capillary discharge
US6566668B2 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with tandem ellipsoidal mirror units
US6586757B2 (en) * 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
EP1173874A4 (de) * 1999-03-31 2007-04-11 Science Res Lab Inc Plasmabrenner und verfahren zur verwendung
US7456571B1 (en) * 2002-05-21 2008-11-25 Imaging Systems Technology Microsphere plasma display
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JP2002014598A (ja) * 2000-04-26 2002-01-18 Dainippon Printing Co Ltd ホログラム原版及びその作製方法
US6421421B1 (en) * 2000-05-22 2002-07-16 Plex, Llc Extreme ultraviolet based on colliding neutral beams
DE10032639A1 (de) * 2000-07-05 2002-01-24 Rheinmetall W & M Gmbh Kompakte Pulsstromversorgung
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EP1397945A1 (de) * 2001-06-07 2004-03-17 Plex LLC Röntgen- und extremultraviolett-photonenquelle mit sternförmigem pinch
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DE10215469B4 (de) * 2002-04-05 2005-03-17 Xtreme Technologies Gmbh Anordnung zur Unterdrückung von Teilchenemission bei einer Strahlungserzeugung auf Basis eines heißen Plasmas
US7157854B1 (en) * 2002-05-21 2007-01-02 Imaging Systems Technology Tubular PDP
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TWI255394B (en) * 2002-12-23 2006-05-21 Asml Netherlands Bv Lithographic apparatus with debris suppression means and device manufacturing method
DE10310623B8 (de) * 2003-03-10 2005-12-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum

Also Published As

Publication number Publication date
US8227777B2 (en) 2012-07-24
EP1820377A2 (de) 2007-08-22
WO2006059275A3 (en) 2006-08-31
US20090173896A1 (en) 2009-07-09
JP2008522379A (ja) 2008-06-26
EP1820377B1 (de) 2011-05-18
WO2006059275A2 (en) 2006-06-08
DE102004058500A1 (de) 2006-06-08

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