ATE472172T1 - Verfahren zur herstellung einer silizium- elektrode für plasma-reaktionskammer - Google Patents

Verfahren zur herstellung einer silizium- elektrode für plasma-reaktionskammer

Info

Publication number
ATE472172T1
ATE472172T1 AT03716753T AT03716753T ATE472172T1 AT E472172 T1 ATE472172 T1 AT E472172T1 AT 03716753 T AT03716753 T AT 03716753T AT 03716753 T AT03716753 T AT 03716753T AT E472172 T1 ATE472172 T1 AT E472172T1
Authority
AT
Austria
Prior art keywords
producing
reaction chamber
plasma reaction
silicon electrode
silicon
Prior art date
Application number
AT03716753T
Other languages
English (en)
Inventor
Daxing Ren
Jerome Hubacek
Nicholas Webb
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/247,722 external-priority patent/US6846726B2/en
Application filed by Lam Res Corp filed Critical Lam Res Corp
Application granted granted Critical
Publication of ATE472172T1 publication Critical patent/ATE472172T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/3255—Material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Silicon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
AT03716753T 2002-04-17 2003-03-21 Verfahren zur herstellung einer silizium- elektrode für plasma-reaktionskammer ATE472172T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US37348902P 2002-04-17 2002-04-17
US10/247,722 US6846726B2 (en) 2002-04-17 2002-09-20 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers
PCT/US2003/008702 WO2003090263A1 (en) 2002-04-17 2003-03-21 Silicon parts for plasma reaction chambers

Publications (1)

Publication Number Publication Date
ATE472172T1 true ATE472172T1 (de) 2010-07-15

Family

ID=32853019

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03716753T ATE472172T1 (de) 2002-04-17 2003-03-21 Verfahren zur herstellung einer silizium- elektrode für plasma-reaktionskammer

Country Status (9)

Country Link
EP (1) EP1497849B1 (de)
JP (2) JP4837894B2 (de)
KR (1) KR100954711B1 (de)
CN (1) CN100382230C (de)
AT (1) ATE472172T1 (de)
AU (1) AU2003220446A1 (de)
DE (1) DE60333088D1 (de)
IL (2) IL164439A0 (de)
TW (1) TWI279857B (de)

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* Cited by examiner, † Cited by third party
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US7482550B2 (en) 2006-10-16 2009-01-27 Lam Research Corporation Quartz guard ring
JP2010519763A (ja) * 2007-02-22 2010-06-03 ハナ シリコン アイエヌシー プラズマ処理装置用シリコン素材の製造方法
US7942965B2 (en) * 2007-03-19 2011-05-17 Applied Materials, Inc. Method of fabricating plasma reactor parts
KR100922620B1 (ko) * 2007-08-24 2009-10-21 하나실리콘(주) 플라즈마 처리 장치용 실리콘 소재의 제조 방법
KR100922621B1 (ko) * 2007-08-24 2009-10-21 하나실리콘(주) 플라즈마 처리 장치용 실리콘 소재의 제조 방법
KR100918076B1 (ko) * 2007-08-24 2009-09-22 하나실리콘(주) 플라즈마 처리 장치용 실리콘 소재의 제조 방법
SG10201407723PA (en) * 2007-12-19 2014-12-30 Lam Res Corp A composite showerhead electrode assembly for a plasma processing apparatus
WO2009078923A2 (en) 2007-12-19 2009-06-25 Lam Research Corporation Film adhesive for semiconductor vacuum processing apparatus
KR101485830B1 (ko) * 2013-12-30 2015-01-22 하나머티리얼즈(주) 내구성이 향상된 플라즈마 처리 장비용 단결정 실리콘 부품 및 이의 제조 방법
US9406534B2 (en) * 2014-09-17 2016-08-02 Lam Research Corporation Wet clean process for cleaning plasma processing chamber components
KR101984223B1 (ko) * 2014-10-22 2019-09-03 하나머티리얼즈(주) 반도체 공정용 플라즈마 장치의 일체형 상부 전극 및 이의 제조 방법
US9947558B2 (en) * 2016-08-12 2018-04-17 Lam Research Corporation Method for conditioning silicon part
KR20200052976A (ko) * 2017-10-05 2020-05-15 램 리써치 코포레이션 실리콘 튜브들을 생성하기 위한 퍼니스들 (furnace) 및 몰드들 (mold) 을 포함하는 전자기 주조 시스템들
CN111900071A (zh) * 2020-07-17 2020-11-06 上海富乐德智能科技发展有限公司 半导体设备蚀刻装置硅电极部件的再生方法
KR102494678B1 (ko) * 2021-04-14 2023-02-06 주식회사 케이엔제이 에지링 가공 시스템 및 방법
KR102498344B1 (ko) * 2021-04-14 2023-02-10 주식회사 케이엔제이 에지링 외경 가공장치 및 방법
KR102468583B1 (ko) * 2021-04-14 2022-11-22 주식회사 케이엔제이 에지링 내경 가공장치 및 방법

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JPH033244A (ja) * 1989-05-30 1991-01-09 Shin Etsu Handotai Co Ltd 半導体シリコン基板の熱処理方法
US5516730A (en) * 1994-08-26 1996-05-14 Memc Electronic Materials, Inc. Pre-thermal treatment cleaning process of wafers
US5643639A (en) * 1994-12-22 1997-07-01 Research Triangle Institute Plasma treatment method for treatment of a large-area work surface apparatus and methods
JPH08236505A (ja) * 1995-02-28 1996-09-13 Sumitomo Sitix Corp プラズマエッチング装置用シリコン電極
JPH08274068A (ja) * 1995-03-30 1996-10-18 Sumitomo Sitix Corp プラズマエッチング装置用シリコン電極
JPH08274069A (ja) * 1995-03-30 1996-10-18 Sumitomo Sitix Corp プラズマエッチング装置用シリコン電極装置
JP2742247B2 (ja) * 1995-04-27 1998-04-22 信越半導体株式会社 シリコン単結晶基板の製造方法および品質管理方法
US5569356A (en) * 1995-05-19 1996-10-29 Lam Research Corporation Electrode clamping assembly and method for assembly and use thereof
JP3789586B2 (ja) * 1996-03-04 2006-06-28 信越化学工業株式会社 静電チャック
JP3172671B2 (ja) * 1996-03-19 2001-06-04 信越化学工業株式会社 静電チャック
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JP3298467B2 (ja) * 1997-07-18 2002-07-02 信越半導体株式会社 エピタキシャルウェーハの製造方法
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JPH1199463A (ja) * 1997-09-26 1999-04-13 Hitachi Ltd 切断方法および装置
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US6890861B1 (en) * 2000-06-30 2005-05-10 Lam Research Corporation Semiconductor processing equipment having improved particle performance
JP2002093777A (ja) * 2000-07-11 2002-03-29 Nisshinbo Ind Inc ドライエッチング装置
JP2002068885A (ja) * 2000-08-28 2002-03-08 Shin Etsu Chem Co Ltd シリコン製部品およびその表面金属不純物量の測定方法

Also Published As

Publication number Publication date
TW200402789A (en) 2004-02-16
AU2003220446A1 (en) 2003-11-03
TWI279857B (en) 2007-04-21
KR100954711B1 (ko) 2010-04-23
EP1497849A1 (de) 2005-01-19
EP1497849B1 (de) 2010-06-23
DE60333088D1 (de) 2010-08-05
JP4837894B2 (ja) 2011-12-14
CN1653589A (zh) 2005-08-10
KR20050006157A (ko) 2005-01-15
JP2005523584A (ja) 2005-08-04
IL164439A0 (en) 2005-12-18
IL164439A (en) 2010-05-17
JP2010157754A (ja) 2010-07-15
CN100382230C (zh) 2008-04-16

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