ATE469533T1 - Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung - Google Patents
Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlungInfo
- Publication number
- ATE469533T1 ATE469533T1 AT01125762T AT01125762T ATE469533T1 AT E469533 T1 ATE469533 T1 AT E469533T1 AT 01125762 T AT01125762 T AT 01125762T AT 01125762 T AT01125762 T AT 01125762T AT E469533 T1 ATE469533 T1 AT E469533T1
- Authority
- AT
- Austria
- Prior art keywords
- plasma
- ultraviolet radiation
- extreme ultraviolet
- electrodes
- generating extreme
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10117377 | 2001-04-06 | ||
| DE10139677A DE10139677A1 (de) | 2001-04-06 | 2001-08-11 | Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE469533T1 true ATE469533T1 (de) | 2010-06-15 |
Family
ID=26009027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01125762T ATE469533T1 (de) | 2001-04-06 | 2001-10-29 | Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7126143B2 (cg-RX-API-DMAC7.html) |
| EP (2) | EP1248499B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4330344B2 (cg-RX-API-DMAC7.html) |
| CN (1) | CN1311716C (cg-RX-API-DMAC7.html) |
| AT (1) | ATE469533T1 (cg-RX-API-DMAC7.html) |
| DE (3) | DE10139677A1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI284916B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2002082872A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10238096B3 (de) * | 2002-08-21 | 2004-02-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe |
| US6770895B2 (en) | 2002-11-21 | 2004-08-03 | Asml Holding N.V. | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
| DE10256663B3 (de) * | 2002-12-04 | 2005-10-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe für EUV-Strahlung |
| DE10260458B3 (de) | 2002-12-19 | 2004-07-22 | Xtreme Technologies Gmbh | Strahlungsquelle mit hoher durchschnittlicher EUV-Strahlungsleistung |
| JP2004226244A (ja) * | 2003-01-23 | 2004-08-12 | Ushio Inc | 極端紫外光源および半導体露光装置 |
| DE10310623B8 (de) | 2003-03-10 | 2005-12-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum |
| US6919573B2 (en) | 2003-03-20 | 2005-07-19 | Asml Holding N.V | Method and apparatus for recycling gases used in a lithography tool |
| DE10336273A1 (de) * | 2003-08-07 | 2005-03-10 | Fraunhofer Ges Forschung | Vorrichtung zur Erzeugung von EUV- und weicher Röntgenstrahlung |
| DE10359464A1 (de) | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
| JP5503108B2 (ja) | 2004-11-29 | 2014-05-28 | コーニンクレッカ フィリップス エヌ ヴェ | 約1nmから約30nmの波長範囲の放射線を発生させる方法および機器、ならびにリソグラフィー装置 |
| DE102004058500A1 (de) | 2004-12-04 | 2006-06-08 | Philips Intellectual Property & Standards Gmbh | Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung |
| DE102005025624B4 (de) * | 2005-06-01 | 2010-03-18 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas |
| KR20080019708A (ko) * | 2005-06-14 | 2008-03-04 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 단락에 대한 방사원 보호 방법 |
| DE102006022823B4 (de) * | 2006-05-12 | 2010-03-25 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von EUV-Strahlung auf Basis eines Gasentladungsplasmas |
| US7687788B2 (en) * | 2007-07-16 | 2010-03-30 | Asml Netherlands B.V. | Debris prevention system, radiation system, and lithographic apparatus |
| US8493548B2 (en) * | 2007-08-06 | 2013-07-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7655925B2 (en) | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
| US20090134129A1 (en) * | 2007-11-27 | 2009-05-28 | General Electric Company | Ablative plasma gun apparatus and system |
| DE102007060807B4 (de) * | 2007-12-18 | 2009-11-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungsquelle, insbesondere für EUV-Strahlung |
| NL1036595A1 (nl) * | 2008-02-28 | 2009-08-31 | Asml Netherlands Bv | Device constructed and arranged to generate radiation, lithographic apparatus, and device manufacturing method. |
| CN102119583B (zh) * | 2008-07-28 | 2013-09-11 | 皇家飞利浦电子股份有限公司 | 用于产生euv辐射或软x射线的方法和设备 |
| US20110109226A1 (en) * | 2009-11-06 | 2011-05-12 | Agilent Technologies, Inc. | Microplasma device with cavity for vacuum ultraviolet irradiation of gases and methods of making and using the same |
| CN102625557A (zh) * | 2012-03-30 | 2012-08-01 | 大连理工大学 | 大气压裸电极冷等离子体射流发生装置 |
| KR101542333B1 (ko) * | 2014-12-26 | 2015-08-05 | 한국과학기술연구원 | 다중 가스셀 모듈을 이용한 극자외선 빔 생성장치 |
| US11373845B2 (en) * | 2020-06-05 | 2022-06-28 | Applied Materials, Inc. | Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes |
| CN114442437B (zh) * | 2020-10-30 | 2024-05-17 | 上海宏澎能源科技有限公司 | 光源装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4201921A (en) * | 1978-07-24 | 1980-05-06 | International Business Machines Corporation | Electron beam-capillary plasma flash x-ray device |
| FR2551614B1 (fr) * | 1983-09-02 | 1986-03-21 | Centre Nat Rech Scient | Source intense de rayons x mous, a compression cylindrique de plasma, ce plasma etant obtenu a partir d'une feuille explosee |
| DE3332711A1 (de) * | 1983-09-10 | 1985-03-28 | Fa. Carl Zeiss, 7920 Heidenheim | Vorrichtung zur erzeugung einer plasmaquelle mit hoher strahlungsintensitaet im roentgenbereich |
| EP0411001A1 (de) * | 1988-04-26 | 1991-02-06 | Siemens Aktiengesellschaft | Nach dem te-prinzip arbeitender gaslaser mit einem anregungskreis und einem vielkanal-pseudofunken-schalter |
| DE19753696A1 (de) * | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung |
| DE19962160C2 (de) * | 1999-06-29 | 2003-11-13 | Fraunhofer Ges Forschung | Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung |
| TWI246872B (en) * | 1999-12-17 | 2006-01-01 | Asml Netherlands Bv | Radiation source for use in lithographic projection apparatus |
| TW518913B (en) * | 2000-07-03 | 2003-01-21 | Asml Netherlands Bv | Radiation source, lithographic apparatus, and semiconductor device manufacturing method |
| EP1300056A2 (en) * | 2000-07-04 | 2003-04-09 | Lambda Physik AG | Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it |
| RU2206186C2 (ru) | 2000-07-04 | 2003-06-10 | Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований | Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации |
-
2001
- 2001-08-11 DE DE10139677A patent/DE10139677A1/de not_active Withdrawn
- 2001-10-29 AT AT01125762T patent/ATE469533T1/de not_active IP Right Cessation
- 2001-10-29 EP EP01125762A patent/EP1248499B1/de not_active Expired - Lifetime
- 2001-10-29 DE DE50115489T patent/DE50115489D1/de not_active Expired - Lifetime
-
2002
- 2002-03-12 TW TW091104540A patent/TWI284916B/zh active
- 2002-03-23 EP EP02729817A patent/EP1374650A1/de not_active Withdrawn
- 2002-03-23 DE DE10291549T patent/DE10291549D2/de not_active Expired - Fee Related
- 2002-03-23 JP JP2002580685A patent/JP4330344B2/ja not_active Expired - Fee Related
- 2002-03-23 CN CNB02807825XA patent/CN1311716C/zh not_active Expired - Fee Related
- 2002-03-23 US US10/474,121 patent/US7126143B2/en not_active Expired - Fee Related
- 2002-03-23 WO PCT/DE2002/001085 patent/WO2002082872A1/de not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| CN1311716C (zh) | 2007-04-18 |
| EP1248499B1 (de) | 2010-05-26 |
| US7126143B2 (en) | 2006-10-24 |
| TWI284916B (en) | 2007-08-01 |
| DE50115489D1 (de) | 2010-07-08 |
| JP2004530269A (ja) | 2004-09-30 |
| WO2002082872A1 (de) | 2002-10-17 |
| JP4330344B2 (ja) | 2009-09-16 |
| EP1248499A1 (de) | 2002-10-09 |
| US20040183037A1 (en) | 2004-09-23 |
| CN1531840A (zh) | 2004-09-22 |
| DE10291549D2 (de) | 2004-04-15 |
| DE10139677A1 (de) | 2002-10-17 |
| EP1374650A1 (de) | 2004-01-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| REN | Ceased due to non-payment of the annual fee |