EP1300056A2 - Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it - Google Patents
Method of producing short-wave radiation from a gas-discharge plasma and device for implementing itInfo
- Publication number
- EP1300056A2 EP1300056A2 EP01965060A EP01965060A EP1300056A2 EP 1300056 A2 EP1300056 A2 EP 1300056A2 EP 01965060 A EP01965060 A EP 01965060A EP 01965060 A EP01965060 A EP 01965060A EP 1300056 A2 EP1300056 A2 EP 1300056A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- discharge
- electrodes
- discharge chamber
- ionization
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
Abstract
A method and apparatus produce short-wave radiation from a gas-discharge plasma, comprising pre-ionization of the gas in the discharge region between coaxial electrodes achieved through an axial aperture formed in one of the electrodes and initiation of a pinch-type discharge. Pre-ionization is achieved by a flux of radiation having wavelengths from the UV to X-ray range and by a flux of accelerated electrons from the plasma of a pulsed sliding discharge initiated in a region not optically communicating with the axis of the pinch-type discharge, the fluxes of radiation and electrons being formed axially symmetrically and directed into the part of the discharge region outside the axis. The source of pre-ionization is disposed outside the discharge chamber and is designed in the form of an axially symmetrical system for forming a sliding discharge, said system comprising an elongated initiating electrode arranged coaxially with the electrodes of the discharge chamber. A pulse generator being introduced into the device that has a rate of growth of output voltage of more than 1011 V/s, the output of positive polarity of which is connected to the initiating electrode for forming the sliding discharge. A dielectric insert with an axial aperture can be introduced into the discharge chamber, on the surface of said insert there are disposed electrodes of the discharge chamber.
Description
Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
Background of the Invention
1. Field of the Invention
The invention relates to a method and device for producing extremely short-wave UV and soft X-ray radiation from a dense hot plasma discharge of pinch type. The field of application includes lithography, particularly in the spectral range around 13.5 nm, lasers in the short-wave UV and X-ray ranges, and X-ray microscopy.
2. Discussion of the Related Art
A method is known for producing short-wave radiation at λ = 13.5 nm using a plasma focus (see U.S. patent no. 5,763,930, hereby incorporated by reference). However, a condition of effective operation is the addition of lithium vapor to the inert gas contained in the discharge chamber, and this substantially complicates the design of the source of radiation and contaminates the space outside the discharge.
A method of producing short-wave radiation with the aid of a z-pinch involving RF pre-ionization is devoid of this disadvantage, but the dielectric wall of the discharge chamber at which the pinch-type discharge is initiated is
subject both to exposure to powerful radiation flux and the substance that forms as a result of electrode erosion (see U.S. patent no. 5,504,795, hereby incorporated by reference). This limits the possibilities of achieving a long service life when this approacr i^ implemented.
A close technical achievement is a method of producing short-wave radiation from a gas-discharge plasma that consists in the pre-ionization of gas in the discharge region between coaxial electrodes achieved through an axial aperture in one of the electrodes, and in initiating a pinch-type discharge (see German patent DE 197 53 696 Al, hereby incorporated by reference).
The device for implementing this method contains a discharge chamber having two axially symmetrical electrodes optically communicating through an aperture formed in one of the electrodes, with a source of pre-ionization disposed outside the discharge chamber (see the '696 published application).
In this method and device, pre-ionization is achieved by a low-current discharge that is automatically formed in a cavity of the cathode when discharge voltage is applied and that then propagates into the discharge gap through the aperture in the hollow cathode. The internal dielectric wall of the discharge chamber may be disposed outside the zone irradiated by the discharge, and this enables a long service life to be achieved in a periodically pulsed operating mode.
Disadvantages of this method and the device for implementing it are a low efficiency of conversion of the energy input into radiation in the short-wave range due to the low level of pre-ionization and its non-ideal spatial distribution in the gap between the electrodes of the discharge chamber. Since the pre-ionization is carried out substantially in the paraxial region of the discharge gap, increasing the cross-sectional area of a pinch-type discharge is made difficult at its initial stage, and this limits the possibility of increasing the energy and the average power of the short-wave radiation. In addition, the long time of formation (approximately 1 ms) of the automatic pre-ionization and of the initiation of a pinch-type discharge compared with the time interval between individual pulses and the low rate of growth (approximately 107 V/s) of the
discharge voltage limit the possibility of achieving a high radiation energy stability from pulse to pulse.
It is desired to provide an increase in the efficiency, average power and stability of short-wave radiation of a gas-discharge plasma.
Summary of the Invention
In accordance with this object, a method is provided for producing short-wave radiation from a gas-discharge plasma, including pre-ionization of the gas in the discharge region between coaxial electrodes achieved through an axial aperture formed in one of the electrodes and initiation of a pinch-type discharge. Pre-ionization is achieved simultaneously by a flux of radiation having wavelengths from the UV to X-ray range and by the flux of accelerated electrons from the plasma of the pulsed sliding discharge initiated in a region not optically communicating with the axis of the pinch-type discharge. A rate of growth of the discharge voltage across the region preferably and advantageously exceeds 1011 V/s. Fluxes of radiation and electrons are preferably formed axially symmetrically and are directed into part of the discharge region outside the axis.
The method can be implemented by a device containing a discharge chamber having two axially symmetrical electrodes optically communicating through an aperture formed in one of the electrodes, with a source of pre-ionization disposed outside the discharge chamber. The source of pre-ionization preferably derives from an axially symmetrical system of forming a sliding discharge comprising an elongated initiating electrode coated with a dielectric layer, on the surface of which there is disposed a trigger electrode, the initiating electrode being arranged coaxially with the electrodes of the discharge chamber and formed so that the dielectric layer is disposed in a region not optically communicating with the axis of the discharge chamber and one of the electrodes of the system for forming a sliding discharge being combined with one of the electrodes of the discharge chamber, a generator having a rate of growth of output voltage of more than 10u V/s being introduced into the device,
the output of positive polarity of which is connected to the initiating electrode, while the output of negative polarity of the pulsed generator is connected to the trigger electrode of the system for forming a sliding discharge.
A dielectric insert in which an axial aperture is formed is preferably introduced into the discharge chamber, and the electrodes of the discharge chamber are disposed on the surface of the dielectric insert.
A cylindrical plasma envelope having high conductivity forms in the discharge region as a result of pre-ionization. This establishes the initiation of a pinch-type discharge under ideal conditions and ensures an increase in the output of short-wave radiation from the hot plasma discharge. In contrast to providing a substantially paraxial pre-ionization, the cross-sectional size of the pinch-type discharge is advantageously increased according to the invention when it is initiated. This makes it possible to increase the kinetic energy of the plasma substantially at the stage when it is compressed by the magnetic field of the discharge, and this ensures a more effective heating of the plasma column and an increase in the energy of the short-wave radiation, and also in its average power in the periodically pulsed mode. The use of a high rate of growth of the discharge voltage (more than 10u V/s) establishes a highly stable initiation of a homogeneous sliding discharge that achieves pre-ionization and, in turn, ensures the possibility of achieving a high stability of the energy .of the short-wave radiation from the plasma of the pinch-type discharge.
Brief Description of the Drawings
Figure 1 shows diagrammatically a device for implementing the preferred method.
Figure 2 shows a device into whose discharge chamber a dielectric insert has been introduced.
Incorporation by Reference
The above cited references and discussion of the related art, and the invention summary are hereby incorporated by reference into this discussion of
the preferred embodiment, as providing alternative elements and features that may be used with elements and features of the preferred embodiment in accord with the present invention. For this purpose, the following additional references are hereby incorporated by reference:
C. Stallings, et al, "Imploding Argon Plasma Experiments", Appl. Phys. Lett. 35(7), 1 October 1979;
US patents no. 4,635,282, 4,504,964, 6,051,841, 3,961,197, 5,763,930, 5,504,795, 5,081,638, 4,797,888, 5,499,282 and 5,875,207; and
German patent publications DE 295 21 572 and DE 197 53 696 Al
M. McGeoch, "Radio Frequency Preionized Z-Pinch Source for Extreme Ultraviolet Lithography, Applied Optics, Vol. 37, No. 9 (20 March 1998); and
US patent applications no. 09/532,276 and 60/162,845, each of which is assigned to the same assignee as the present application.
Detailed Description of the Preferred Embodiment
The device comprises a supply source 1 that, in one case, comprises a storage capacitor with a commutator, charging induction coils, a pulse capacitor and a magnetic switch, and is connected to electrodes 2, 3 of the discharge chamber 4; a pulse generator 5, which is connected to the trigger electrode 6 and the initiating electrode 7 of the axially symmetrical system for forming a sliding discharge on the surface of the dielectric layer 8, and also a liquid coolant 9 and an insulator 10 of the discharge chamber. In Figure 2 there is disposed in the discharge chamber a dielectric insert 11 in which an axial aperture is formed and on the surface there are disposed electrodes 2, 3.
The method of producing short-wave radiation from the gas-discharge plasma is preferably implemented as follows.
When the supply source 1 is switched on, the voltage starts to increase between the electrodes 2, 3 of the discharge chamber 4.
The pulse generator 5 is switched on and the voltage pulse is applied to the electrodes 6, 7 of the pre-ionizer with a rate of growth greater than 10u V/s, between which electrodes a sliding discharge is initiated on the surface of the
dielectric layer 8. Alternative approaches to providing electrical pulses to preionization electrodes including wherein the preionization electrodes are coupled to the main electrodes, either directly or through capacitive, inductive and/or resistive elements for controlling the timing and/or magnitude of the preionization pulses with relative to main pulses, are understood to those skilled in the gas discharge arts.
With initiation in a gas of low pressure, preferably < 102 Pa, a beam of accelerated electrons is generated and, in the system for forming a sliding discharge, a homogeneous plasma layer that serves as a source of radiation having wavelengths from the UV to the X-ray range is formed on the surface of the thin dielectric layer. With the rate of growth of voltage, a high stability is achieved in initiating the sliding discharge from pulse to pulse and, in the energy balance of the pulsed sliding discharge at the stage when it is formed, the fraction of energy expended on the formation of the beam of escaping electrons and the generation of X-ray radiation becomes substantial. The negative polarity of the trigger electrode 6 with respect to the initiating electrode 7 decreases the voltage amplitude between the electrodes by a factor of several times compared with the case where the polarity is reversed. Owing to the elongated design of the initiating electrode and, correspondingly, also of the surface discharge gap, that is to say with a length exceeding its cross-sectional size, a further reduction is achieved in the initiating voltage of the sliding discharge in a gas at low pressure. All this reduces the electrical load on the dielectric layer and ensures the achievement of a long operational surface life. The combination of one of the electrodes of the system for forming a sliding discharge with one of the main electrodes of the discharge chamber, for example, electrode 7 with electrode 3, simplifies the design of the device.
In an axially symmetrical system for initiating a sliding discharge with an initiating electrode coaxial with the electrodes of the discharge chamber, generated beams of accelerated electrons and irradiation are formed axially symmetrically. In this process, the beams of accelerated electrons and irradiation are emitted from a region not optically communicating with the
discharge chamber and disposed outside it. Owing to the design and disposition of the system for forming the sliding discharge in the form indicated, and also owing to the indicated choice of polarity of the applied voltage, the flux of accelerated electrons and the flux of radiation having wavelengths from the UV to X-ray range is introduced in a controlled manner into the discharge region. The radiation and electron beam propagates through the axial aperture in the electrode 3 into that part of the discharge region outside the axis that is optically communicating with the plasma layer of the sliding discharge and the gas in it is pre-ionized. As a result of the pre-ionization, a cylindrical plasma envelope is created between the electrodes 6, 7 of the discharge region.
Between the electrodes 2, 3, there develops over the cylindrical plasma envelope a low-current discharge, the current of which is limited by the charge leakage current of the pulse capacitor of the supply source 1 through the magnetic switch. During the low-current discharge, the ionization of the plasma envelope increases, the ionization predominantly developing on the outside of the plasma envelope adjacent to the electrodes 2, 3 due to the skin effect.
The magnetic switch opens and the pulse capacitor of the pulse source 1, which is fully charged at this instant, discharges through the electrodes 2, 3 onto the plasma envelope created as a result of the pre-ionization and the flow of the low-current discharge. The plasma envelope is compressed by the magnetic field of the current flowing over it and it is confined to the axis of the discharge region for a short time. The column of the dense hot plasma that forms on the axis of the discharge region emits short-wave radiation. The usable part of the radiation leaves the discharge region through the aperture in one of the electrodes. During this process, the surface of the dielectric layer 8 disposed in the region not optically communicating with the axis of the discharge region is not subjected to exposure to hard UV and X-ray radiation, beams of charged particles and plasma fluxes generated on the axis of the discharge chamber 4. This ensures the achievement of a long operational life of the system for forming the sliding discharge.
The cycle of operation is repeated and, during the time between pulses, the device is cooled by a liquid coolant 9 circulating through the electrodes.
The introduction into the discharge chamber of a dielectric insert 11 (see Figure 2) in which an axial aperture is formed and on the surface of which there are disposed electrodes of the discharge chamber, simplifies the conditions of efficiently producing short-wave radiation from the gas-discharge plasma. First of all, reliable protection of the insulator 10 of the discharge chamber from the radiation of the pinch-type discharge is ensured, and this increases the reliability of operation of the device within a wide range of operational parameters. Secondly, the inductance of the discharge chamber is reduced, and this makes it possible to reduce the expenditure of energy on producing a dense hot plasma in a pinch-type discharge and to increase the optical output of short-wave radiation. In addition, the plasma envelope created as a result of the pre-ionization is formed on the internal surface of the cylindrical aperture of the dielectric insert, and this stabilizes the pinch-type discharge at stage when it is initiated. This results in an increase in the energy of the short-wave radiation at the final stage of the discharge and in an increase in its stability from pulse to pulse. Since the voltage between the electrodes on the surface of the dielectric insert is minimized as a result of the intense pre-ionization, the probability of its electrical breakdown is sharply reduced. Since the dielectric insert is not an element of the body of the discharge chamber, the mechanical loads in it are minimized. All this makes it possible to ensure a long operational service life of the device if a material is chosen for the dielectric insert that has a high thermal stability, for example silicon nitride Si3N4.
Thus, the preferred method makes it possible to form a cylindrical plasma envelope that is optimum in shape, dimensions and conductivity stably from pulse to pulse as a result of the pre-ionization, and this results in an increase in the efficiency, average power and energy stability of the short-wave radiation of the gas-discharge plasma.
While exemplary drawings and specific embodiments of the present invention have been described and illustrated, it is to be understood that that the
scope of the present invention is not to be limited to the particular embodiments discussed. Thus, the embodiments shall be regarded as illustrative rather than restrictive, and it should be understood that variations may be made in those embodiments by workers skilled in the arts without departing from the scope of the present invention as set forth in the claims that follow, and equivalents thereof.
In addition, in the method claims that follow, the steps have been ordered in selected typographical sequences. However, the sequences have been selected and so ordered for typographical convenience and are not intended to imply any particular order for performing the steps, except for those claims wherein a particular ordering of steps is expressly set forth or understood by one of ordinary skill in the art as being necessary.
Claims
1. A method of producing short-wave radiation from a gas-discharge plasma, comprising pre-ionization of the gas in the discharge region between coaxial electrodes achieved through an axial aperture formed in one of the electrodes and initiation of a pinch-type discharge, wherein pre-ionization is achieved simultaneously by the flux of radiation having wavelengths from the UV to the X-ray range and by the flux of accelerated electrons from the plasma of the pulsed sliding discharge initiated in a region not optically communicating with the axis of the pinch-type discharge.
2. The method of Claim 1, wherein a rate of growth of the discharge voltage across the region exceeds 10u V/s.
3. The method of Claim 2, wherein fluxes of radiation and electrons are formed axially symmetrically and are directed into the part of the discharge region outside the axis.
4. A device for producing short-wave radiation from a gas-discharge plasma, comprising a discharge chamber having two axially symmetrical electrodes, which chamber optically communicates through an aperture formed in one of the electrodes, with a source of pre-ionization disposed outside the discharge chamber, wherein the source of pre-ionization is designed in the form of an axially symmetrical system for forming a sliding discharge, which system comprises an elongated electrode coated with a dielectric layer on whose surface is disposed a trigger electrode.
5. The device of Claim 4, wherein the elongated electrode is cylindrically formed.
6. The device of Claim 5, wherein the elongated electrode is arranged coaxially with main electrodes of the discharge chamber.
7. The device of Claim 6, wherein the elongated electrode is configured such that the dielectric layer is disposed in a region not optically linked to the axis of the discharge chamber.
8. The device of Claim 7, wherein one of the electrodes of the system for forming the sliding discharge is combined with one of the electrodes of the discharge chamber.
9. The device of Claim 8, further comprising a pulse generator connected to the preionization electrodes and having a rate of growth of output voltage of more than 10" V/s.
10. The device of Claim 9, wherein an output of positive polarity of which generator is connected to the cylindrical electrode, while the output of negative polarity of the pulse generator is connected to the trigger electrode of the system for forming the sliding discharge.
11. The device of Claim 10, wherein the discharge chamber includes a dielectric insert in which an axial aperture is formed, and the electrodes of the discharge chamber are disposed on the surface of the dielectric insert.
12. The device of Claim 4, wherein the elongated electrode is arranged coaxially with main electrodes of the discharge chamber.
13. The device of Claim 4, wherein the elongated electrode is configured such that the dielectric layer is disposed in a region not optically linked to the axis of the discharge chamber.
14. The device of Claim 4, wherein one of the electrodes of the system for forming the sliding discharge is combined with one of the electrodes of the discharge chamber.
15. The device of Claim 4, further comprising a pulse generator connected to the preionization electrodes and having a rate of growth of output voltage of more than 10π V/s.
16. The device of Claim 15, wherein an output of positive polarity of which generator is connected to the cylindrical electrode, while the output of negative polarity of the pulse generator is connected to the trigger electrode of the system for forming the sliding discharge.
17. The device of Claim 4, wherein the discharge chamber includes a dielectric insert in which an axial aperture is formed, and the electrodes of the discharge chamber are disposed on the surface of the dielectric insert.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US693490 | 1991-04-30 | ||
| RU2000117336/09A RU2206186C2 (en) | 2000-07-04 | 2000-07-04 | Method and device for producing short-wave radiation from gas-discharge plasma |
| RU2000117336 | 2000-07-04 | ||
| US09/693,490 US6414438B1 (en) | 2000-07-04 | 2000-10-20 | Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it |
| PCT/EP2001/007658 WO2002007484A2 (en) | 2000-07-04 | 2001-07-04 | Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1300056A2 true EP1300056A2 (en) | 2003-04-09 |
Family
ID=26654057
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP01965060A Withdrawn EP1300056A2 (en) | 2000-07-04 | 2001-07-04 | Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1300056A2 (en) |
| AU (1) | AU2001285797A1 (en) |
| TW (1) | TW503669B (en) |
| WO (1) | WO2002007484A2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10139677A1 (en) * | 2001-04-06 | 2002-10-17 | Fraunhofer Ges Forschung | Method and device for generating extremely ultraviolet radiation and soft X-rays |
| FR2841684B1 (en) * | 2002-06-28 | 2004-09-24 | Centre Nat Rech Scient | RADIATION SOURCE, ESPECIALLY ULTRAVIOLET WITH DISCHARGES |
| DE10238096B3 (en) * | 2002-08-21 | 2004-02-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gas discharge lamp for extreme UV lithography or X-ray microscopy has tapered electrode opening for transport of charge carriers from external region to discharge space |
| DE10310623B8 (en) * | 2003-03-10 | 2005-12-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and apparatus for generating a plasma by electrical discharge in a discharge space |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01296596A (en) * | 1988-05-25 | 1989-11-29 | Hitachi Ltd | Plasma x-ray generating device |
-
2001
- 2001-07-04 TW TW90116371A patent/TW503669B/en not_active IP Right Cessation
- 2001-07-04 EP EP01965060A patent/EP1300056A2/en not_active Withdrawn
- 2001-07-04 WO PCT/EP2001/007658 patent/WO2002007484A2/en not_active Application Discontinuation
- 2001-07-04 AU AU2001285797A patent/AU2001285797A1/en not_active Abandoned
Non-Patent Citations (1)
| Title |
|---|
| See references of WO0207484A3 * |
Also Published As
| Publication number | Publication date |
|---|---|
| TW503669B (en) | 2002-09-21 |
| WO2002007484A3 (en) | 2002-04-25 |
| WO2002007484A2 (en) | 2002-01-24 |
| AU2001285797A1 (en) | 2002-01-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6414438B1 (en) | Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it | |
| JP3978385B2 (en) | Apparatus and method for generating extreme ultraviolet radiation based on gas discharge | |
| US7605385B2 (en) | Electro-less discharge extreme ultraviolet light source | |
| US8471226B2 (en) | Extreme ultraviolet light source device and method for producing extreme ultraviolet light | |
| US7180082B1 (en) | Method for plasma formation for extreme ultraviolet lithography-theta pinch | |
| JP4958480B2 (en) | Generator for generation of intense short-wavelength radiation by gas discharge plasma | |
| Fomenkov et al. | EUV discharge light source based on a dense plasma focus operated with positive and negative polarity | |
| JPH0734350B2 (en) | Plasma switch with hollow cathode | |
| EP1397945A1 (en) | Star pinch x-ray and extreme ultraviolet photon source | |
| US6075838A (en) | Z-pinch soft x-ray source using diluent gas | |
| EP1300056A2 (en) | Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it | |
| EP0402842A2 (en) | Substance vaporizing apparatus | |
| van Goor et al. | High-average power XeCl laser with x-ray preionization and spiker-sustainer excitation | |
| US7323701B2 (en) | Gas discharge lamp | |
| JP3808511B2 (en) | Pulse gas laser generator | |
| Schriever et al. | Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts | |
| Borisov et al. | High-power gas-discharge EUV source | |
| Urai et al. | High-repetition-rate operation of the wire ion plasma source using a novel method | |
| Ohzu | Enhancement of soft X-ray emission from a pinch plasma using a rotating plasma for pre-ionization | |
| Borisov et al. | Hydrogen fluoride chemical laser initiated by a discharge creeping on the surface of a dielectric | |
| US20120153829A1 (en) | Method and Apparatus for the Generation of Short-Wavelength Radiation by Means of a Gas Discharge-Based High-Frequency, High-Current Discharge | |
| Teramoto et al. | Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography | |
| Katsuki et al. | Z-pinch discrarge based EUV radiation source driven by a low inductance gap-less circuit | |
| JPS6140076A (en) | Metal vapor laser | |
| Rondo et al. | MODIFICATION OF Z-PINCH PLASMAS WITH AN AXIAL MAGNETIC FIELDS |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| 17P | Request for examination filed |
Effective date: 20020712 |
|
| AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
| AX | Request for extension of the european patent |
Extension state: AL LT LV MK RO SI |
|
| GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
| 18D | Application deemed to be withdrawn |
Effective date: 20071221 |