ATE437978T1 - Verfahren zur abscheidung von siliciumnitridfilmen und/oder siliciumoxidnitridfilmen mittels cvd - Google Patents
Verfahren zur abscheidung von siliciumnitridfilmen und/oder siliciumoxidnitridfilmen mittels cvdInfo
- Publication number
- ATE437978T1 ATE437978T1 AT06725524T AT06725524T ATE437978T1 AT E437978 T1 ATE437978 T1 AT E437978T1 AT 06725524 T AT06725524 T AT 06725524T AT 06725524 T AT06725524 T AT 06725524T AT E437978 T1 ATE437978 T1 AT E437978T1
- Authority
- AT
- Austria
- Prior art keywords
- nitride film
- cvd
- silicon
- deposing
- silicon oxide
- Prior art date
Links
- 229910052814 silicon oxide Inorganic materials 0.000 title abstract 2
- -1 SILICON OXIDE NITRIDE Chemical class 0.000 title 1
- 229910052581 Si3N4 Inorganic materials 0.000 title 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title 1
- 239000007789 gas Substances 0.000 abstract 2
- RSMKAORBGALEHE-UHFFFAOYSA-N N-[dimethylamino-[tris(dimethylamino)silyl]silyl]-N-methylmethanamine Chemical class CN(C)[SiH](N(C)C)[Si](N(C)C)(N(C)C)N(C)C RSMKAORBGALEHE-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2006/061284 WO2007112780A1 (en) | 2006-04-03 | 2006-04-03 | Method for depositing silicon nitride films and/or silicon oxynitride films by chemical vapor deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE437978T1 true ATE437978T1 (de) | 2009-08-15 |
Family
ID=37571840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT06725524T ATE437978T1 (de) | 2006-04-03 | 2006-04-03 | Verfahren zur abscheidung von siliciumnitridfilmen und/oder siliciumoxidnitridfilmen mittels cvd |
Country Status (8)
Country | Link |
---|---|
US (1) | US8377511B2 (de) |
EP (1) | EP2007917B1 (de) |
JP (1) | JP5149273B2 (de) |
KR (1) | KR101304726B1 (de) |
CN (1) | CN101466865A (de) |
AT (1) | ATE437978T1 (de) |
DE (1) | DE602006008190D1 (de) |
WO (1) | WO2007112780A1 (de) |
Families Citing this family (43)
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CN101443338A (zh) * | 2006-04-03 | 2009-05-27 | 乔治洛德方法研究和开发液化空气有限公司 | 含五(二甲基氨基)二硅烷前体的化合物及其制备方法 |
US8232176B2 (en) | 2006-06-22 | 2012-07-31 | Applied Materials, Inc. | Dielectric deposition and etch back processes for bottom up gapfill |
US7867923B2 (en) * | 2007-10-22 | 2011-01-11 | Applied Materials, Inc. | High quality silicon oxide films by remote plasma CVD from disilane precursors |
US8357435B2 (en) | 2008-05-09 | 2013-01-22 | Applied Materials, Inc. | Flowable dielectric equipment and processes |
US8980382B2 (en) | 2009-12-02 | 2015-03-17 | Applied Materials, Inc. | Oxygen-doping for non-carbon radical-component CVD films |
US8741788B2 (en) | 2009-08-06 | 2014-06-03 | Applied Materials, Inc. | Formation of silicon oxide using non-carbon flowable CVD processes |
US8449942B2 (en) | 2009-11-12 | 2013-05-28 | Applied Materials, Inc. | Methods of curing non-carbon flowable CVD films |
JP2013516763A (ja) | 2009-12-30 | 2013-05-13 | アプライド マテリアルズ インコーポレイテッド | フレキシブルな窒素/水素比を使用して生成されるラジカルを用いる誘電体膜成長 |
US8329262B2 (en) | 2010-01-05 | 2012-12-11 | Applied Materials, Inc. | Dielectric film formation using inert gas excitation |
SG182336A1 (en) | 2010-01-06 | 2012-08-30 | Applied Materials Inc | Flowable dielectric using oxide liner |
SG182333A1 (en) | 2010-01-07 | 2012-08-30 | Applied Materials Inc | In-situ ozone cure for radical-component cvd |
CN102844848A (zh) | 2010-03-05 | 2012-12-26 | 应用材料公司 | 通过自由基成分化学气相沉积的共形层 |
EP2553141A4 (de) * | 2010-04-01 | 2013-08-21 | Air Liquide | Ablagerung eines metallnitridhaltigen films mit einer kombination aus aminometall- und halogenierten metall-vorläufern |
US8580699B2 (en) | 2010-09-10 | 2013-11-12 | Applied Materials, Inc. | Embedded catalyst for atomic layer deposition of silicon oxide |
US9285168B2 (en) | 2010-10-05 | 2016-03-15 | Applied Materials, Inc. | Module for ozone cure and post-cure moisture treatment |
US8664127B2 (en) | 2010-10-15 | 2014-03-04 | Applied Materials, Inc. | Two silicon-containing precursors for gapfill enhancing dielectric liner |
US10283321B2 (en) | 2011-01-18 | 2019-05-07 | Applied Materials, Inc. | Semiconductor processing system and methods using capacitively coupled plasma |
US8450191B2 (en) | 2011-01-24 | 2013-05-28 | Applied Materials, Inc. | Polysilicon films by HDP-CVD |
US8716154B2 (en) | 2011-03-04 | 2014-05-06 | Applied Materials, Inc. | Reduced pattern loading using silicon oxide multi-layers |
US8445078B2 (en) | 2011-04-20 | 2013-05-21 | Applied Materials, Inc. | Low temperature silicon oxide conversion |
US8466073B2 (en) | 2011-06-03 | 2013-06-18 | Applied Materials, Inc. | Capping layer for reduced outgassing |
US9404178B2 (en) | 2011-07-15 | 2016-08-02 | Applied Materials, Inc. | Surface treatment and deposition for reduced outgassing |
US8617989B2 (en) | 2011-09-26 | 2013-12-31 | Applied Materials, Inc. | Liner property improvement |
US8551891B2 (en) | 2011-10-04 | 2013-10-08 | Applied Materials, Inc. | Remote plasma burn-in |
US8728955B2 (en) | 2012-02-14 | 2014-05-20 | Novellus Systems, Inc. | Method of plasma activated deposition of a conformal film on a substrate surface |
US9337018B2 (en) | 2012-06-01 | 2016-05-10 | Air Products And Chemicals, Inc. | Methods for depositing films with organoaminodisilane precursors |
US8889566B2 (en) | 2012-09-11 | 2014-11-18 | Applied Materials, Inc. | Low cost flowable dielectric films |
US9018108B2 (en) | 2013-01-25 | 2015-04-28 | Applied Materials, Inc. | Low shrinkage dielectric films |
CN105849221B (zh) | 2013-09-27 | 2019-06-18 | 乔治洛德方法研究和开发液化空气有限公司 | 胺取代的三甲硅烷基胺和三-二甲硅烷基胺化合物 |
US20150303060A1 (en) | 2014-04-16 | 2015-10-22 | Samsung Electronics Co., Ltd. | Silicon precursor, method of forming a layer using the same, and method of fabricating semiconductor device using the same |
US9412581B2 (en) | 2014-07-16 | 2016-08-09 | Applied Materials, Inc. | Low-K dielectric gapfill by flowable deposition |
US9472392B2 (en) | 2015-01-30 | 2016-10-18 | Applied Materials, Inc. | Step coverage dielectric |
US11124876B2 (en) | 2015-03-30 | 2021-09-21 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Si-containing film forming precursors and methods of using the same |
US9777025B2 (en) | 2015-03-30 | 2017-10-03 | L'Air Liquide, Société pour l'Etude et l'Exploitation des Procédés Georges Claude | Si-containing film forming precursors and methods of using the same |
US9899210B2 (en) | 2015-10-20 | 2018-02-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chemical vapor deposition apparatus and method for manufacturing semiconductor device using the same |
US9633838B2 (en) | 2015-12-28 | 2017-04-25 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Vapor deposition of silicon-containing films using penta-substituted disilanes |
KR102241936B1 (ko) * | 2016-03-17 | 2021-04-20 | 주식회사 원익아이피에스 | 실리콘산질화막의 증착방법 |
TWI753794B (zh) | 2016-03-23 | 2022-01-21 | 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 | 形成含矽膜之組成物及其製法與用途 |
US10192734B2 (en) | 2016-12-11 | 2019-01-29 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploration des Procédés Georges Claude | Short inorganic trisilylamine-based polysilazanes for thin film deposition |
TWI784022B (zh) * | 2017-07-31 | 2022-11-21 | 中國大陸商南大光電半導體材料有限公司 | 1,1,1-參(二甲胺基)二矽烷及其製備方法 |
JP7113670B2 (ja) * | 2018-06-08 | 2022-08-05 | 東京エレクトロン株式会社 | Ald成膜方法およびald成膜装置 |
CN110983300B (zh) * | 2019-12-04 | 2023-06-20 | 江苏菲沃泰纳米科技股份有限公司 | 镀膜设备及其应用 |
CN114634364B (zh) * | 2022-03-08 | 2023-08-11 | 中国科学院过程工程研究所 | 一种纯相Si2N2O粉体的合成方法 |
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JP3230029B2 (ja) * | 1994-05-30 | 2001-11-19 | 富士通株式会社 | Iii−v族化合物半導体結晶成長方法 |
US5874368A (en) * | 1997-10-02 | 1999-02-23 | Air Products And Chemicals, Inc. | Silicon nitride from bis(tertiarybutylamino)silane |
JP4116283B2 (ja) * | 2001-11-30 | 2008-07-09 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | ヘキサキス(モノヒドロカルビルアミノ)ジシランおよびその製造方法 |
JP4021653B2 (ja) | 2001-11-30 | 2007-12-12 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | Cvd法によるシリコン窒化物膜またはシリコンオキシ窒化物膜の製造方法 |
US7081271B2 (en) | 2001-12-07 | 2006-07-25 | Applied Materials, Inc. | Cyclical deposition of refractory metal silicon nitride |
JP2005536055A (ja) * | 2002-08-18 | 2005-11-24 | アヴィザ テクノロジー インコーポレイテッド | 酸化シリコン及び酸窒化シリコンの低温堆積 |
US7531679B2 (en) * | 2002-11-14 | 2009-05-12 | Advanced Technology Materials, Inc. | Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride |
US7446217B2 (en) | 2002-11-14 | 2008-11-04 | Advanced Technology Materials, Inc. | Composition and method for low temperature deposition of silicon-containing films |
AU2003303136A1 (en) | 2002-12-20 | 2004-07-14 | Applied Materials, Inc. | A method and apparatus for forming a high quality low temperature silicon nitride layer |
US7172792B2 (en) * | 2002-12-20 | 2007-02-06 | Applied Materials, Inc. | Method for forming a high quality low temperature silicon nitride film |
US7972663B2 (en) | 2002-12-20 | 2011-07-05 | Applied Materials, Inc. | Method and apparatus for forming a high quality low temperature silicon nitride layer |
JP4265409B2 (ja) * | 2003-02-13 | 2009-05-20 | 三菱マテリアル株式会社 | Si−Si結合を有する有機Si含有化合物を用いたSi含有薄膜の形成方法 |
US20050227017A1 (en) | 2003-10-31 | 2005-10-13 | Yoshihide Senzaki | Low temperature deposition of silicon nitride |
JP2005213633A (ja) * | 2004-02-02 | 2005-08-11 | L'air Liquide Sa Pour L'etude & L'exploitation Des Procede S Georges Claude | 化学気相成長法によるシリコン窒化物膜またはシリコンオキシ窒化物膜の製造方法 |
US20060286819A1 (en) * | 2005-06-21 | 2006-12-21 | Applied Materials, Inc. | Method for silicon based dielectric deposition and clean with photoexcitation |
CN101443338A (zh) * | 2006-04-03 | 2009-05-27 | 乔治洛德方法研究和开发液化空气有限公司 | 含五(二甲基氨基)二硅烷前体的化合物及其制备方法 |
-
2006
- 2006-04-03 CN CNA2006800544610A patent/CN101466865A/zh active Pending
- 2006-04-03 US US12/295,907 patent/US8377511B2/en active Active
- 2006-04-03 DE DE602006008190T patent/DE602006008190D1/de not_active Expired - Fee Related
- 2006-04-03 KR KR1020087026750A patent/KR101304726B1/ko active IP Right Grant
- 2006-04-03 WO PCT/EP2006/061284 patent/WO2007112780A1/en active Application Filing
- 2006-04-03 EP EP06725524A patent/EP2007917B1/de not_active Not-in-force
- 2006-04-03 AT AT06725524T patent/ATE437978T1/de not_active IP Right Cessation
- 2006-04-03 JP JP2009503426A patent/JP5149273B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
WO2007112780A1 (en) | 2007-10-11 |
US20100221428A1 (en) | 2010-09-02 |
KR101304726B1 (ko) | 2013-09-05 |
US8377511B2 (en) | 2013-02-19 |
EP2007917B1 (de) | 2009-07-29 |
EP2007917A1 (de) | 2008-12-31 |
JP2009532582A (ja) | 2009-09-10 |
JP5149273B2 (ja) | 2013-02-20 |
DE602006008190D1 (de) | 2009-09-10 |
KR20090009844A (ko) | 2009-01-23 |
CN101466865A (zh) | 2009-06-24 |
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RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |