ATE452220T1 - Verfahren zur abscheidung anorganischer/organischer filme - Google Patents
Verfahren zur abscheidung anorganischer/organischer filmeInfo
- Publication number
- ATE452220T1 ATE452220T1 AT03737510T AT03737510T ATE452220T1 AT E452220 T1 ATE452220 T1 AT E452220T1 AT 03737510 T AT03737510 T AT 03737510T AT 03737510 T AT03737510 T AT 03737510T AT E452220 T1 ATE452220 T1 AT E452220T1
- Authority
- AT
- Austria
- Prior art keywords
- organic film
- coating
- depositing inorganic
- hybrid
- describes
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Silicon Compounds (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1019781A NL1019781C2 (nl) | 2002-01-18 | 2002-01-18 | Deklaag alsmede werkwijzen en inrichtingen voor de vervaardiging daarvan. |
PCT/NL2003/000037 WO2003066933A1 (en) | 2002-01-18 | 2003-01-17 | Method for depositing inorganic/organic films |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE452220T1 true ATE452220T1 (de) | 2010-01-15 |
Family
ID=27730963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT03737510T ATE452220T1 (de) | 2002-01-18 | 2003-01-17 | Verfahren zur abscheidung anorganischer/organischer filme |
Country Status (9)
Country | Link |
---|---|
US (1) | US8178170B2 (de) |
EP (1) | EP1466035B1 (de) |
JP (1) | JP2005517089A (de) |
CN (1) | CN100347335C (de) |
AT (1) | ATE452220T1 (de) |
AU (1) | AU2003244361A1 (de) |
DE (1) | DE60330543D1 (de) |
NL (1) | NL1019781C2 (de) |
WO (1) | WO2003066933A1 (de) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4269263B2 (ja) * | 2003-07-01 | 2009-05-27 | 富士電機デバイステクノロジー株式会社 | 硬質カーボン膜の形成方法および装置 |
EP1582270A1 (de) * | 2004-03-31 | 2005-10-05 | Vlaamse Instelling voor Technologisch Onderzoek | Verfahren und Vorrichtung zum Beschichten eines Substrats mittels dielektrischer Sperrentladung |
EP1586674A1 (de) * | 2004-04-14 | 2005-10-19 | Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO | Vorrichtung und Methode zur Herstellung von Schichten |
DE102005007825B4 (de) | 2005-01-10 | 2015-09-17 | Interpane Entwicklungs-Und Beratungsgesellschaft Mbh | Verfahren zur Herstellung einer reflexionsmindernden Beschichtung, reflexionsmindernde Schicht auf einem transparenten Substrat sowie Verwendung einer derartigen Schicht |
GB0504384D0 (en) * | 2005-03-03 | 2005-04-06 | Univ Durham | Method for producing a composite coating |
US7387813B2 (en) | 2005-07-07 | 2008-06-17 | Specialty Coating Systems, Inc. | Methods of preparation of hollow microstructures and nanostructures |
EP1741826A1 (de) | 2005-07-08 | 2007-01-10 | Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO | Verfahren zur Beschichtung einer Polymerschicht enthaltend Nanomaterialien auf einem Substrat und Vorrichtung |
DE102005045350B4 (de) * | 2005-09-22 | 2009-07-16 | Siemens Ag | Druckschablone eines SMT-Prozesses |
US7994372B2 (en) | 2005-10-31 | 2011-08-09 | Specialty Coating Systems, Inc. | Parylene variants and methods of synthesis and use |
EP1951924A4 (de) * | 2005-11-07 | 2011-01-05 | Micropyretics Heaters Int | Materialien mit erhöhtem emissionsvermögen und herstellungsverfahren dafür |
US7498273B2 (en) * | 2006-05-30 | 2009-03-03 | Applied Materials, Inc. | Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes |
US20080102223A1 (en) * | 2006-11-01 | 2008-05-01 | Sigurd Wagner | Hybrid layers for use in coatings on electronic devices or other articles |
US9376771B2 (en) * | 2006-11-27 | 2016-06-28 | Mhi Health Devices, Llc | Antimicrobial materials and coatings |
EP1938907A1 (de) * | 2006-12-28 | 2008-07-02 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Auftragen von Partikeln auf einem Substrat |
US7652178B2 (en) | 2007-02-26 | 2010-01-26 | Specialty Coating Systems, Inc. | Perfluoroparacyclophane and methods of synthesis and use thereof |
TWI538737B (zh) * | 2007-08-31 | 2016-06-21 | 阿普托麥克股份有限公司 | 材料沉積總成 |
US7541297B2 (en) | 2007-10-22 | 2009-06-02 | Applied Materials, Inc. | Method and system for improving dielectric film quality for void free gap fill |
US7964040B2 (en) | 2007-11-08 | 2011-06-21 | Applied Materials, Inc. | Multi-port pumping system for substrate processing chambers |
EP2159304A1 (de) * | 2008-08-27 | 2010-03-03 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Vorrichtung und Verfahren zur Atomlagenabscheidung |
KR20110056400A (ko) * | 2008-09-03 | 2011-05-27 | 다우 코닝 코포레이션 | 나노입자들을 제조하기 위한 저압 고주파수 펄스형 플라즈마 리액터 |
TWI387394B (zh) * | 2009-03-04 | 2013-02-21 | Chung Shan Inst Of Science | 有機電激發光元件及其製造方法 |
GB201000538D0 (en) * | 2010-01-14 | 2010-03-03 | P2I Ltd | Liquid repellent surfaces |
US10283321B2 (en) | 2011-01-18 | 2019-05-07 | Applied Materials, Inc. | Semiconductor processing system and methods using capacitively coupled plasma |
DE102011001140A1 (de) * | 2011-03-08 | 2012-09-13 | Thyssenkrupp Steel Europe Ag | Stahlflachprodukt, Verfahren zum Herstellen eines Stahlflachprodukts und Verfahren zum Herstellen eines Bauteils |
US9029264B2 (en) * | 2012-03-14 | 2015-05-12 | Applied Materials, Inc. | Methods for depositing a tin-containing layer on a substrate |
RU2513496C2 (ru) * | 2012-05-31 | 2014-04-20 | Федеральное государственное унитарное предприятие "Научно-производственное объединение "Радиевый институт имени В.Г. Хлопина" | Износостойкое металлическое покрытие на основе хрома и способ его нанесения |
WO2014078497A1 (en) * | 2012-11-16 | 2014-05-22 | Liquipel Ip Llc | Apparatus and methods for plasma enhanced chemical vapor deposition of dielectric/polymer coatings |
CN107460448B (zh) * | 2017-08-04 | 2020-02-04 | 中国科学院宁波材料技术与工程研究所 | 一种基体表面的修饰涂层及其制备方法 |
CN110629204A (zh) * | 2018-06-21 | 2019-12-31 | 逢甲大学 | 抗刮疏水层镀制于金属表面的方法 |
FR3091875B1 (fr) * | 2019-01-17 | 2021-09-24 | Innovative Systems Et Tech Isytech | Procédé et dispositif de traitement pour le dépôt d’un revêtement à effet barrière |
NL2025153B1 (en) * | 2020-03-17 | 2021-10-20 | Heineken Supply Chain Bv | Surface with an antibiofouling and/or antimicrobial layer |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR920002864B1 (ko) * | 1987-07-20 | 1992-04-06 | 가부시기가이샤 히다찌세이사꾸쇼 | 플라즈마 처리방법 및 그 장치 |
KR940003787B1 (ko) * | 1988-09-14 | 1994-05-03 | 후지쓰 가부시끼가이샤 | 박막 형성장치 및 방법 |
US5024927A (en) * | 1988-10-06 | 1991-06-18 | Ricoh Company, Ltd. | Information recording medium |
JPH03111578A (ja) * | 1989-06-29 | 1991-05-13 | Toshiba Corp | 薄膜形成方法及び薄膜形成装置 |
FR2708624A1 (fr) * | 1993-07-30 | 1995-02-10 | Neuville Stephane | Procédé de dépôt d'un revêtement protecteur à base de pseudo carbone diamant amorphe ou de carbure de silicium modifié. |
DE4445427C2 (de) * | 1994-12-20 | 1997-04-30 | Schott Glaswerke | Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht |
JP3119172B2 (ja) * | 1995-09-13 | 2000-12-18 | 日新電機株式会社 | プラズマcvd法及び装置 |
US6068884A (en) * | 1998-04-28 | 2000-05-30 | Silcon Valley Group Thermal Systems, Llc | Method of making low κ dielectric inorganic/organic hybrid films |
ITMI981159A1 (it) | 1998-05-26 | 1999-11-26 | Universita' Degli Studi Di Roma Tor Vergata | Nuova classe di materiali a base diamante e tecniche per la loro sintesi |
JP3514186B2 (ja) * | 1999-09-16 | 2004-03-31 | 日新電機株式会社 | 薄膜形成方法及び装置 |
WO2001036703A1 (en) * | 1999-11-19 | 2001-05-25 | Nano Scale Surface Systems, Inc. | System and method for depositing inorganic/organic dielectric films |
-
2002
- 2002-01-18 NL NL1019781A patent/NL1019781C2/nl not_active IP Right Cessation
-
2003
- 2003-01-17 US US10/501,225 patent/US8178170B2/en not_active Expired - Fee Related
- 2003-01-17 AT AT03737510T patent/ATE452220T1/de not_active IP Right Cessation
- 2003-01-17 AU AU2003244361A patent/AU2003244361A1/en not_active Abandoned
- 2003-01-17 DE DE60330543T patent/DE60330543D1/de not_active Expired - Lifetime
- 2003-01-17 EP EP20030737510 patent/EP1466035B1/de not_active Expired - Lifetime
- 2003-01-17 CN CNB038023113A patent/CN100347335C/zh not_active Expired - Fee Related
- 2003-01-17 JP JP2003566274A patent/JP2005517089A/ja not_active Withdrawn
- 2003-01-17 WO PCT/NL2003/000037 patent/WO2003066933A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
US20050118427A1 (en) | 2005-06-02 |
CN1617949A (zh) | 2005-05-18 |
DE60330543D1 (de) | 2010-01-28 |
NL1019781C2 (nl) | 2003-07-21 |
CN100347335C (zh) | 2007-11-07 |
JP2005517089A (ja) | 2005-06-09 |
EP1466035A1 (de) | 2004-10-13 |
US8178170B2 (en) | 2012-05-15 |
AU2003244361A1 (en) | 2003-09-02 |
EP1466035B1 (de) | 2009-12-16 |
WO2003066933A1 (en) | 2003-08-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |