ATE452220T1 - Verfahren zur abscheidung anorganischer/organischer filme - Google Patents

Verfahren zur abscheidung anorganischer/organischer filme

Info

Publication number
ATE452220T1
ATE452220T1 AT03737510T AT03737510T ATE452220T1 AT E452220 T1 ATE452220 T1 AT E452220T1 AT 03737510 T AT03737510 T AT 03737510T AT 03737510 T AT03737510 T AT 03737510T AT E452220 T1 ATE452220 T1 AT E452220T1
Authority
AT
Austria
Prior art keywords
organic film
coating
depositing inorganic
hybrid
describes
Prior art date
Application number
AT03737510T
Other languages
English (en)
Inventor
Joannes Linden
Gregory Alcott
Edward Hamers
De Sanden Mauritius Van
Original Assignee
Tno
Univ Eindhoven Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tno, Univ Eindhoven Tech filed Critical Tno
Application granted granted Critical
Publication of ATE452220T1 publication Critical patent/ATE452220T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Silicon Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
AT03737510T 2002-01-18 2003-01-17 Verfahren zur abscheidung anorganischer/organischer filme ATE452220T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1019781A NL1019781C2 (nl) 2002-01-18 2002-01-18 Deklaag alsmede werkwijzen en inrichtingen voor de vervaardiging daarvan.
PCT/NL2003/000037 WO2003066933A1 (en) 2002-01-18 2003-01-17 Method for depositing inorganic/organic films

Publications (1)

Publication Number Publication Date
ATE452220T1 true ATE452220T1 (de) 2010-01-15

Family

ID=27730963

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03737510T ATE452220T1 (de) 2002-01-18 2003-01-17 Verfahren zur abscheidung anorganischer/organischer filme

Country Status (9)

Country Link
US (1) US8178170B2 (de)
EP (1) EP1466035B1 (de)
JP (1) JP2005517089A (de)
CN (1) CN100347335C (de)
AT (1) ATE452220T1 (de)
AU (1) AU2003244361A1 (de)
DE (1) DE60330543D1 (de)
NL (1) NL1019781C2 (de)
WO (1) WO2003066933A1 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4269263B2 (ja) * 2003-07-01 2009-05-27 富士電機デバイステクノロジー株式会社 硬質カーボン膜の形成方法および装置
EP1582270A1 (de) * 2004-03-31 2005-10-05 Vlaamse Instelling voor Technologisch Onderzoek Verfahren und Vorrichtung zum Beschichten eines Substrats mittels dielektrischer Sperrentladung
EP1586674A1 (de) * 2004-04-14 2005-10-19 Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO Vorrichtung und Methode zur Herstellung von Schichten
DE102005007825B4 (de) 2005-01-10 2015-09-17 Interpane Entwicklungs-Und Beratungsgesellschaft Mbh Verfahren zur Herstellung einer reflexionsmindernden Beschichtung, reflexionsmindernde Schicht auf einem transparenten Substrat sowie Verwendung einer derartigen Schicht
GB0504384D0 (en) * 2005-03-03 2005-04-06 Univ Durham Method for producing a composite coating
US7387813B2 (en) 2005-07-07 2008-06-17 Specialty Coating Systems, Inc. Methods of preparation of hollow microstructures and nanostructures
EP1741826A1 (de) 2005-07-08 2007-01-10 Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO Verfahren zur Beschichtung einer Polymerschicht enthaltend Nanomaterialien auf einem Substrat und Vorrichtung
DE102005045350B4 (de) * 2005-09-22 2009-07-16 Siemens Ag Druckschablone eines SMT-Prozesses
US7994372B2 (en) 2005-10-31 2011-08-09 Specialty Coating Systems, Inc. Parylene variants and methods of synthesis and use
EP1951924A4 (de) * 2005-11-07 2011-01-05 Micropyretics Heaters Int Materialien mit erhöhtem emissionsvermögen und herstellungsverfahren dafür
US7498273B2 (en) * 2006-05-30 2009-03-03 Applied Materials, Inc. Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes
US20080102223A1 (en) * 2006-11-01 2008-05-01 Sigurd Wagner Hybrid layers for use in coatings on electronic devices or other articles
US9376771B2 (en) * 2006-11-27 2016-06-28 Mhi Health Devices, Llc Antimicrobial materials and coatings
EP1938907A1 (de) * 2006-12-28 2008-07-02 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Auftragen von Partikeln auf einem Substrat
US7652178B2 (en) 2007-02-26 2010-01-26 Specialty Coating Systems, Inc. Perfluoroparacyclophane and methods of synthesis and use thereof
TWI538737B (zh) * 2007-08-31 2016-06-21 阿普托麥克股份有限公司 材料沉積總成
US7541297B2 (en) 2007-10-22 2009-06-02 Applied Materials, Inc. Method and system for improving dielectric film quality for void free gap fill
US7964040B2 (en) 2007-11-08 2011-06-21 Applied Materials, Inc. Multi-port pumping system for substrate processing chambers
EP2159304A1 (de) * 2008-08-27 2010-03-03 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Vorrichtung und Verfahren zur Atomlagenabscheidung
KR20110056400A (ko) * 2008-09-03 2011-05-27 다우 코닝 코포레이션 나노입자들을 제조하기 위한 저압 고주파수 펄스형 플라즈마 리액터
TWI387394B (zh) * 2009-03-04 2013-02-21 Chung Shan Inst Of Science 有機電激發光元件及其製造方法
GB201000538D0 (en) * 2010-01-14 2010-03-03 P2I Ltd Liquid repellent surfaces
US10283321B2 (en) 2011-01-18 2019-05-07 Applied Materials, Inc. Semiconductor processing system and methods using capacitively coupled plasma
DE102011001140A1 (de) * 2011-03-08 2012-09-13 Thyssenkrupp Steel Europe Ag Stahlflachprodukt, Verfahren zum Herstellen eines Stahlflachprodukts und Verfahren zum Herstellen eines Bauteils
US9029264B2 (en) * 2012-03-14 2015-05-12 Applied Materials, Inc. Methods for depositing a tin-containing layer on a substrate
RU2513496C2 (ru) * 2012-05-31 2014-04-20 Федеральное государственное унитарное предприятие "Научно-производственное объединение "Радиевый институт имени В.Г. Хлопина" Износостойкое металлическое покрытие на основе хрома и способ его нанесения
WO2014078497A1 (en) * 2012-11-16 2014-05-22 Liquipel Ip Llc Apparatus and methods for plasma enhanced chemical vapor deposition of dielectric/polymer coatings
CN107460448B (zh) * 2017-08-04 2020-02-04 中国科学院宁波材料技术与工程研究所 一种基体表面的修饰涂层及其制备方法
CN110629204A (zh) * 2018-06-21 2019-12-31 逢甲大学 抗刮疏水层镀制于金属表面的方法
FR3091875B1 (fr) * 2019-01-17 2021-09-24 Innovative Systems Et Tech Isytech Procédé et dispositif de traitement pour le dépôt d’un revêtement à effet barrière
NL2025153B1 (en) * 2020-03-17 2021-10-20 Heineken Supply Chain Bv Surface with an antibiofouling and/or antimicrobial layer

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR920002864B1 (ko) * 1987-07-20 1992-04-06 가부시기가이샤 히다찌세이사꾸쇼 플라즈마 처리방법 및 그 장치
KR940003787B1 (ko) * 1988-09-14 1994-05-03 후지쓰 가부시끼가이샤 박막 형성장치 및 방법
US5024927A (en) * 1988-10-06 1991-06-18 Ricoh Company, Ltd. Information recording medium
JPH03111578A (ja) * 1989-06-29 1991-05-13 Toshiba Corp 薄膜形成方法及び薄膜形成装置
FR2708624A1 (fr) * 1993-07-30 1995-02-10 Neuville Stephane Procédé de dépôt d'un revêtement protecteur à base de pseudo carbone diamant amorphe ou de carbure de silicium modifié.
DE4445427C2 (de) * 1994-12-20 1997-04-30 Schott Glaswerke Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht
JP3119172B2 (ja) * 1995-09-13 2000-12-18 日新電機株式会社 プラズマｃｖｄ法及び装置
US6068884A (en) * 1998-04-28 2000-05-30 Silcon Valley Group Thermal Systems, Llc Method of making low κ dielectric inorganic/organic hybrid films
ITMI981159A1 (it) 1998-05-26 1999-11-26 Universita' Degli Studi Di Roma Tor Vergata Nuova classe di materiali a base diamante e tecniche per la loro sintesi
JP3514186B2 (ja) * 1999-09-16 2004-03-31 日新電機株式会社 薄膜形成方法及び装置
WO2001036703A1 (en) * 1999-11-19 2001-05-25 Nano Scale Surface Systems, Inc. System and method for depositing inorganic/organic dielectric films

Also Published As

Publication number Publication date
US20050118427A1 (en) 2005-06-02
CN1617949A (zh) 2005-05-18
DE60330543D1 (de) 2010-01-28
NL1019781C2 (nl) 2003-07-21
CN100347335C (zh) 2007-11-07
JP2005517089A (ja) 2005-06-09
EP1466035A1 (de) 2004-10-13
US8178170B2 (en) 2012-05-15
AU2003244361A1 (en) 2003-09-02
EP1466035B1 (de) 2009-12-16
WO2003066933A1 (en) 2003-08-14

Similar Documents

Publication Publication Date Title
ATE452220T1 (de) Verfahren zur abscheidung anorganischer/organischer filme
ATE479202T1 (de) Verfahren zur herstellung vollfarbiger organischer elektrolumineszenter vorrichtungen
ATE516154T1 (de) Sicherheitselement und verfahren zu seiner herstellung
TW200639269A (en) Plating method
DE602006002256D1 (de) Verfahren zum aufbringen einer beschichtung auf eine oberfläche eines linsensubstrats
WO2005104259A3 (de) Verkapselung für ein organisches elekronisches bauteil, herstellungsverfahren dazu, sowie verwendung
ATE407982T1 (de) Metalleffektpigmente mit anorganisch/organischer mischschicht, verfahren zur herstellung solcher metalleffektpigmente und deren verwendung
ATE484609T1 (de) Verfahren zur herstellung einer funktionsschicht
ATE275441T1 (de) Verfahren zur herstellung eines mikrostrukturierten oberflächenreliefs durch prägen thixotroper schichten und mikrostrukturiertes oberflächenrelief
ATE557069T1 (de) Verfahren zur beschichtung von metallischen oberflächen mit einer zusammensetzung reich an polymer
ATE460466T1 (de) Aktivierungsverfahren mithilfe eines modifikationsmittels
ATE490037T1 (de) Verfahren zur herstellung einer mikronadel oder eines mikroimplantats
TW200643120A (en) Coatings
WO2010054077A3 (en) Partmarking of coated plastic substrates
ATE395985T1 (de) Beschichtungsverfahren und beschichtungsmittel
ATE270589T1 (de) Verfahren zur beschichtung metallischer substratoberflächen und beschichtete oberfläche
ATE420906T1 (de) Acrylmodifizierte hybrid-alkydlatices, beschichtungszusammensetzung, verfahren zur erhöhung und anpassung der viscositat und beschichtetes substrat
EA201190323A1 (ru) Защитное покрытие, способ защиты подложки и применение этого способа
ATE411406T1 (de) Verfahren zum auftragen intermetallischer schichten mit verwendung von inokulantien
ATE542785T1 (de) Verfahren zur elektrophoretischen beschichtung
ATE327835T1 (de) Verfahren und grundierungszusammensetzung zur beschichtung eines unpolaren substrates
DE50310646D1 (de) Verfahren zur beschichtung von metalloberflächen
ATE374735T1 (de) Verfahren zur abscheidung von aluminiumoxidbeschichtungen
ATE316112T1 (de) Flammbehandlungsverfahren
ATE542237T1 (de) Verfahren zur übertragung mit einem ferroelektrischen substrat

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties