CN110629204A - 抗刮疏水层镀制于金属表面的方法 - Google Patents

抗刮疏水层镀制于金属表面的方法 Download PDF

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CN110629204A
CN110629204A CN201810641212.6A CN201810641212A CN110629204A CN 110629204 A CN110629204 A CN 110629204A CN 201810641212 A CN201810641212 A CN 201810641212A CN 110629204 A CN110629204 A CN 110629204A
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plasma
metal surface
hydrophobic layer
scratch
pretreatment
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林永森
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Feng Chia University
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

本发明公开了一种抗刮疏水层镀制于金属表面的方法，其步骤包含：电浆表面预处理：将一金属表面以电浆进行表面预处理；该预处理使用的该电浆以氢气≧0.1sccm、等离子体放电频率≧100kHz、功率≧10watts以及该金属表面温度≦180℃进行，进一步地可包含氩气≧0sccm；以及抗刮疏水层沉积：将电浆预处理后的该金属表面，以电浆形式将该抗刮疏水层沉积于该金属表面，该抗刮疏水层厚度较佳≧100nm；沉积使用的该电浆以氩气及/或氮气≧0sccm、含碳硅氧化合物蒸汽≧0.1sccm、等离子体放电频率≧100kHz、功率≧10watts(瓦特)以及该金属表面M的温度≦180℃进行。

Description

抗刮疏水层镀制于金属表面的方法
技术领域
本发明涉及一种抗刮疏水层的镀制方法，尤其涉及将该抗刮疏水层镀制于金属表面的方法。
背景技术
厨房用具是人们不可或缺的日常生活用品，其材质主要是金属，为了达到不沾、避免金属生锈或是在反复使用的过程中造成金属表面刮损等目的，通常会在金属表面涂制不沾、防锈或防刮涂层。
然而，目前现有的厨房用具涂层不耐磨、容易脱落，而失去不沾或防锈、防刮的功能，甚至脱落的金属与食物混合后被食用，造成健康的危害。
发明内容
为了解决现有镀制涂层容易脱落而失去不沾、防锈或防刮功能的问题，本发明提供一种抗刮疏水层镀制于金属表面的方法。
本发明提供一种抗刮疏水层镀制于金属表面的方法，其步骤包含：
电浆表面预处理：将一金属表面以电浆进行表面预处理；该预处理使用的该电浆以氢气≧0.1sccm、等离子体放电频率≧100kHz、功率≧10watts以及该金属表面温度≦180℃进行；以及抗刮疏水层沉积：将电浆预处理后的该金属表面，以电浆形式将该抗刮疏水层沉积于该金属表面，该抗刮疏水层厚度≧100nm；沉积使用的该电浆以氩气及/或氮气≧0sccm、含碳硅氧化合物蒸汽≧0.1sccm、等离子体放电频率≧100kHz、功率≧10watts(瓦特)以及该金属表面M的温度≦180℃进行。
作为本发明的进一步改进，其中，该电浆表面预处理步骤中该电浆进一步包含氩气>0sccm。
作为本发明的进一步改进，其中，该抗刮疏水层的材质的X射线光电子能谱仪为碳>20at％、硅≧15at％以及氧≧25at％。
作为本发明的进一步改进，其中，该抗刮疏水层的材质的X射线光电子能谱仪进一步包含氮≧0.1at％。
作为本发明的进一步改进，其中，该金属表面的材质为铝。
作为本发明的进一步改进，其中，该金属表面为铝制的一厨房用具。
本发明具有的优点在于：
通过上述说明可知，本发明利用电浆进行表面处理与镀制，使得沉积的抗刮疏水层得以牢固地附着于金属表面，不易被刮除或损坏。
附图说明
图1为本发明抗刮疏水层镀制于金属表面的方法流程图；
图2为金属表面M沉积抗刮疏水层的示意图；
图3为本发明电浆设备的示意图；
图4为本发明ATR-FTIR光谱测试图。
符号说明：
10 电浆设备
11 腔室
12 阳极
13 阴极
M 金属表面
具体实施方式
如图1～图2所示，本发明抗刮疏水层镀制于金属表面的方法，其步骤包含：
电浆预处理：将一金属表面M以电浆进行表面预处理。预处理使用的该电浆以氩气≧0sccm(Standardcubiccentimeterperminute，较佳≧0.1sccm)、氢气≧0.1sccm、等离子体放电频率(Frequencyofplasmadischarge)≧100kHz、功率≧10watts(瓦特)以及该金属表面M的温度≦180℃进行；
抗刮疏水层沉积：将电浆预处理后的该金属表面M，同样以电浆形式将一抗刮疏水层L沉积于该金属表面M表面，厚度较佳≧100nm。沉积使用的该电浆以氩气及/或氮气≧0sccm(较佳为≧0.1)、含碳硅氧化合物蒸汽≧0.1sccm、等离子体放电频率(Frequencyofplasmadischarge)≧100kHz、功率≧10watts(瓦特)以及该金属表面M的温度≦180℃进行。
其中，如图4所示的本发明该抗刮疏水层L的ATR-FTIR光谱测试，其材质为SiOxCyNzHw，而利用X射线光电子能谱仪(X-rayphotoelectronspectroscopy,XPS)测定后为：碳(Carbon)>20at％、硅(Silicon)≧15at％、氧(Oxygen)≧25at％以及氮(Nitrogen)≧0at％(较佳氮≧0.1at％)；该抗刮疏水层L一较佳实施例可例如六甲基二硅氧烷(Hexamethyldisiloxane,HMDSO)。该金属表面M材质较佳为铝的金属。
本发明于电浆预处理的步骤以及沉积抗刮疏水层的步骤使用的电浆处理温度以低温制程，在维持沉积抗刮疏水层高附着度，不易脱落或刮除的功效外，也相对节省能源。
如图3所示，上述该预处理与沉积步骤所使用的电浆设备10较佳包含一腔室11以及设置于该腔室11内部的一阳极(Anode)12与一阴极(Cathode)13，该阳极12与该阴极13对应设置，且于二者之间摆放待处理的该金属表面M，通入氩气与氢气等电浆气体后进行电浆制程。
为了证实本发明的镀制方法所形成的该抗刮疏水层L确实具有抗刮与疏水的功效，以下为本发明的确效性试验。
取本发明三种沉积抗刮疏水层L的实施例，并对应测试其表面硬度(Surfacehardness)、抗刮强度(Scratchresistance)以及表面能(Totalsurfacefreeenergy)如下表1。
表1
自表1可知，本发明的抗刮疏水层具有优异的表面硬度与抗刮强度，且表面能测试数据证实本发明具有疏水特性，特别适用于金属，特别是铝制的厨房用具，包含锅具、刀具、夹取或盛装用具。
上述仅为本发明的较佳实施例而已，并非用以限定本发明主张的权利范围，凡其它未脱离本发明所揭示的精神所完成的等效改变或修饰，均应包括在本发明的主张范围内。

Claims (6)

1.一种抗刮疏水层镀制于金属表面的方法，其特征在于，其步骤包含：
电浆表面预处理：将一金属表面以电浆进行表面预处理；该预处理使用的该电浆以氢气≧0.1sccm、等离子体放电频率≧100kHz、功率≧10watts以及该金属表面温度≦180℃进行；以及
抗刮疏水层沉积：将电浆预处理后的该金属表面，以电浆形式将该抗刮疏水层沉积于该金属表面，该抗刮疏水层厚度≧100nm；沉积使用的该电浆以氩气及/或氮气≧0sccm、含碳硅氧化合物蒸汽≧0.1sccm、等离子体放电频率≧100kHz、功率≧10watts以及该金属表面M的温度≦180℃进行。
2.如权利要求1所述的抗刮疏水层镀制于金属表面的方法，其特征在于，该电浆表面预处理的该电浆进一步包含氩气≧0.1sccm。
3.如权利要求1所述的抗刮疏水层镀制于金属表面的方法，其特征在于，该抗刮疏水层的材质的X射线光电子能谱仪为碳>20at％、硅≧15at％以及氧≧25at％。
4.如权利要求3所述的抗刮疏水层镀制于金属表面的方法，其特征在于，该抗刮疏水层的材质的X射线光电子能谱仪进一步包含氮≧0.1at％。
5.如权利要求1所述的抗刮疏水层镀制于金属表面的方法，其特征在于，该金属表面的材质为铝。
6.如权利要求1所述的抗刮疏水层镀制于金属表面的方法，其特征在于，该金属表面为铝制的一厨房用具。
CN201810641212.6A 2018-06-21 2018-06-21 抗刮疏水层镀制于金属表面的方法 Pending CN110629204A (zh)

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* Cited by examiner, † Cited by third party
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WO2015088681A1 (en) * 2013-12-11 2015-06-18 Rubicon Technology, Inc. Method of deposition of highly scratch-resistant diamond films onto glass substrates by use of a plasma-enhanced chemical vapor deposition
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CN107636844A (zh) * 2015-03-17 2018-01-26 欧提腾股份有限公司 新颖的碳硅氧烷聚合物组成物及其制造方法与使用方法

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