BRPI0516432A - processo para depositar uma camada de organossiloxano - Google Patents
processo para depositar uma camada de organossiloxanoInfo
- Publication number
- BRPI0516432A BRPI0516432A BRPI0516432-0A BRPI0516432A BRPI0516432A BR PI0516432 A BRPI0516432 A BR PI0516432A BR PI0516432 A BRPI0516432 A BR PI0516432A BR PI0516432 A BRPI0516432 A BR PI0516432A
- Authority
- BR
- Brazil
- Prior art keywords
- depositing
- layer
- oxidant
- organosiloxane layer
- organosiloxane
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/048—Forming gas barrier coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/056—Forming hydrophilic coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2201/00—Polymeric substrate or laminate
- B05D2201/02—Polymeric substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2252/00—Sheets
- B05D2252/02—Sheets of indefinite length
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2369/00—Characterised by the use of polycarbonates; Derivatives of polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Silicon Polymers (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Physical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Abstract
PROCESSO PARA DEPOSITAR UMA CAMADA DE ORGANOSSILOXANO. Um Processo para depositar uma camada de organossiloxano, siloxano ou óxido de silício polimerizado por plasma sobre a superfície de um substrato polimérico orgânico por deposição por descarga brilhante em pressão atmosférica de uma mistura gasosa compreendendo um composto contendo silício e um oxidante, caracterizado pelo fato de o oxidante compreender N~ 2~0.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US62369104P | 2004-10-29 | 2004-10-29 | |
PCT/US2005/037435 WO2006049865A1 (en) | 2004-10-29 | 2005-10-19 | Improved deposition rate plasma enhanced chemical vapor process |
Publications (1)
Publication Number | Publication Date |
---|---|
BRPI0516432A true BRPI0516432A (pt) | 2008-09-02 |
Family
ID=35659034
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0516432-0A BRPI0516432A (pt) | 2004-10-29 | 2005-10-19 | processo para depositar uma camada de organossiloxano |
Country Status (11)
Country | Link |
---|---|
US (1) | US20080107820A1 (pt) |
EP (1) | EP1819843A1 (pt) |
JP (1) | JP2008545059A (pt) |
KR (1) | KR20070072899A (pt) |
CN (1) | CN101048532A (pt) |
BR (1) | BRPI0516432A (pt) |
CA (1) | CA2582302A1 (pt) |
MX (1) | MX2007005122A (pt) |
RU (1) | RU2007119783A (pt) |
TW (1) | TW200633056A (pt) |
WO (1) | WO2006049865A1 (pt) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011041862A1 (pt) | 2009-10-07 | 2011-04-14 | Braskem S.A. | Processo via extrusão para preparar uma composição polimérica híbrida, composição polimérica híbrida e artigo |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8586149B2 (en) | 2003-06-18 | 2013-11-19 | Ford Global Technologies, Llc | Environmentally friendly reactive fixture to allow localized surface engineering for improved adhesion to coated and non-coated substrates |
US7517561B2 (en) | 2005-09-21 | 2009-04-14 | Ford Global Technologies, Llc | Method of coating a substrate for adhesive bonding |
US20080115444A1 (en) | 2006-09-01 | 2008-05-22 | Kalkanoglu Husnu M | Roofing shingles with enhanced granule adhesion and method for producing same |
FR2908137A1 (fr) * | 2006-11-02 | 2008-05-09 | Lapeyre Sa | Procede de depot de couche mince et produit obtenu |
US8349435B2 (en) | 2007-04-04 | 2013-01-08 | Certainteed Corporation | Mineral surfaced asphalt-based roofing products with encapsulated healing agents and methods of producing the same |
DE602008002592D1 (de) * | 2007-05-21 | 2010-10-28 | Lubrizol Advanced Mat Inc | Harte, aliphatische thermoplastische Polyurethane |
CN101772588A (zh) * | 2007-07-30 | 2010-07-07 | 陶氏环球技术公司 | 大气压等离子体增强化学气相沉积方法 |
US20100255216A1 (en) * | 2007-11-29 | 2010-10-07 | Haley Jr Robert P | Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate |
US8206794B2 (en) * | 2009-05-04 | 2012-06-26 | The Boeing Company | System and method for applying abrasion-resistant coatings |
DE102009030303A1 (de) | 2009-06-24 | 2010-12-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung von Antireflexschicht-bildenden Beschichtungen sowie Antireflexbeschichtungen |
DE102009048397A1 (de) * | 2009-10-06 | 2011-04-07 | Plasmatreat Gmbh | Atmosphärendruckplasmaverfahren zur Herstellung oberflächenmodifizierter Partikel und von Beschichtungen |
RU2550871C9 (ru) * | 2010-08-16 | 2016-05-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный университет имени М.В. Ломоносова" (МГУ) | Штамп для морфологической модификации полимеров, способ его получения и способ формирования супергидрофильных и супергидрофобных самоочищающихся покрытий с его использованием |
JP5956074B2 (ja) | 2012-08-29 | 2016-07-20 | カーディアック ペースメイカーズ, インコーポレイテッド | 医療用リードのための向上した低摩擦コーティングおよび製造方法 |
RU2525486C2 (ru) * | 2012-11-06 | 2014-08-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Самарский государственный технический университет" | Способ получения антибиотического покрытия на фильтрующем материале |
RU2569644C2 (ru) * | 2012-12-04 | 2015-11-27 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Самарский государственный технический университет" | Способ получения антибиотического покрытия в тлеющем разряде в парах 3-нитро-1-адамантановой кислоты |
US20150280051A1 (en) * | 2014-04-01 | 2015-10-01 | Tsmc Solar Ltd. | Diffuser head apparatus and method of gas distribution |
CN106366337A (zh) * | 2016-08-30 | 2017-02-01 | 兰州空间技术物理研究所 | 一种复合原子氧防护涂层的制备方法 |
US10730799B2 (en) | 2016-12-31 | 2020-08-04 | Certainteed Corporation | Solar reflective composite granules and method of making solar reflective composite granules |
EP3700491A2 (en) | 2017-10-27 | 2020-09-02 | Corning Incorporated | Methods of treating a surface of a polymer material by atmospheric pressure plasma |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3658584A (en) * | 1970-09-21 | 1972-04-25 | Monsanto Co | Semiconductor doping compositions |
US5224441A (en) * | 1991-09-27 | 1993-07-06 | The Boc Group, Inc. | Apparatus for rapid plasma treatments and method |
FR2704558B1 (fr) * | 1993-04-29 | 1995-06-23 | Air Liquide | Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement. |
ATE402277T1 (de) * | 2002-02-05 | 2008-08-15 | Dow Global Technologies Inc | Chemische dampfphasenabscheidung auf einem substrat mittels eines korona-plasmas |
CN100479110C (zh) * | 2002-06-14 | 2009-04-15 | 积水化学工业株式会社 | 氧化膜形成方法及氧化膜形成装置 |
-
2005
- 2005-10-19 RU RU2007119783/02A patent/RU2007119783A/ru not_active Application Discontinuation
- 2005-10-19 JP JP2007538982A patent/JP2008545059A/ja active Pending
- 2005-10-19 CA CA002582302A patent/CA2582302A1/en not_active Abandoned
- 2005-10-19 EP EP05808846A patent/EP1819843A1/en not_active Withdrawn
- 2005-10-19 BR BRPI0516432-0A patent/BRPI0516432A/pt not_active IP Right Cessation
- 2005-10-19 WO PCT/US2005/037435 patent/WO2006049865A1/en active Application Filing
- 2005-10-19 MX MX2007005122A patent/MX2007005122A/es unknown
- 2005-10-19 CN CNA2005800372107A patent/CN101048532A/zh active Pending
- 2005-10-19 US US11/664,455 patent/US20080107820A1/en not_active Abandoned
- 2005-10-19 KR KR1020077009629A patent/KR20070072899A/ko not_active Application Discontinuation
- 2005-10-28 TW TW094137825A patent/TW200633056A/zh unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011041862A1 (pt) | 2009-10-07 | 2011-04-14 | Braskem S.A. | Processo via extrusão para preparar uma composição polimérica híbrida, composição polimérica híbrida e artigo |
Also Published As
Publication number | Publication date |
---|---|
TW200633056A (en) | 2006-09-16 |
WO2006049865A1 (en) | 2006-05-11 |
CN101048532A (zh) | 2007-10-03 |
CA2582302A1 (en) | 2006-05-11 |
JP2008545059A (ja) | 2008-12-11 |
KR20070072899A (ko) | 2007-07-06 |
RU2007119783A (ru) | 2008-12-10 |
MX2007005122A (es) | 2007-06-22 |
EP1819843A1 (en) | 2007-08-22 |
US20080107820A1 (en) | 2008-05-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BRPI0516432A (pt) | processo para depositar uma camada de organossiloxano | |
BRPI0515714A (pt) | processo para preparar um revestimento em múltiplas camadas na superfìcie de um substrato polimérico orgánico por meio de uma deposição por plasma à pressão atmosférica | |
EP3614442A3 (en) | Semiconductor device having oxide semiconductor layer and manufactoring method thereof | |
TW200737400A (en) | Etch resistant wafer processing apparatus and method for producing the same | |
ATE495551T1 (de) | Herstellungsverfahren von einem soi-transistor mit selbstjustierter grundplatte und gate und mit einer vergrabenen oxidschicht mit veränderlicher dicke | |
WO2004101177A3 (de) | Verfahren zur beschichtung von substraten mit kohlenstoffbasiertem material | |
SG131011A1 (en) | Silicon based substrate with hafnium containing barrier layer | |
TW200631773A (en) | Optical dry-films and methods of forming optical devices with dry-films | |
TW200717651A (en) | Method and system for forming a high-k dielectric layer | |
WO2012024114A3 (en) | Methods for forming a hydrogen free silicon containing dielectric film | |
TW200721506A (en) | Improved thin film transistor substrate for display unit | |
TW200732845A (en) | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method | |
WO2008064246A3 (en) | Method of clustering sequential processing for a gate stack structure | |
BRPI0519609A2 (pt) | artigo, e, mÉtodo para proteger uma superfÍcie de substrato | |
TW200506090A (en) | Methods for forming aluminum containing films utilizing amino aluminum precursors | |
TW200742072A (en) | Semiconductor device and manufacturing method therefor | |
WO2007040587A3 (en) | Method for forming a multiple layer passivation film and a deice | |
SG170616A1 (en) | Diffusion barrier coatings having graded compositions and devices inforporting the same | |
SG152141A1 (en) | Soi substrates with a fine buried insulating layer | |
WO2006037300A3 (de) | Verfahren zum herstellen einer schicht aus einem dotierten halbleitermaterial | |
TW200746354A (en) | Multi-step anneal of thin films for film densification and improved gap-fill | |
WO2007048963A3 (fr) | Procede de traitement d'un substrat | |
CR8471A (es) | Metodo para formar una cubierta curable por radiacion y articulo cubierto | |
WO2010065457A3 (en) | Method of providing a semiconductor device with a dielectric layer and semiconductor device thereof | |
TWI267166B (en) | Semiconductor device and manufacturing method thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE AS 3A, 4A, 5A E 6A ANUIDADES. |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 2160 DE 29/05/2012. |