ATE431441T1 - Verfahren zur abscheidung von elektrolytfilmen - Google Patents
Verfahren zur abscheidung von elektrolytfilmenInfo
- Publication number
- ATE431441T1 ATE431441T1 AT03745631T AT03745631T ATE431441T1 AT E431441 T1 ATE431441 T1 AT E431441T1 AT 03745631 T AT03745631 T AT 03745631T AT 03745631 T AT03745631 T AT 03745631T AT E431441 T1 ATE431441 T1 AT E431441T1
- Authority
- AT
- Austria
- Prior art keywords
- deposit
- vapor
- phase
- component
- depositing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Secondary Cells (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Inorganic Insulating Materials (AREA)
- Glass Compositions (AREA)
- Conductive Materials (AREA)
- Fuel Cell (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/108,140 US7208195B2 (en) | 2002-03-27 | 2002-03-27 | Methods and apparatus for deposition of thin films |
PCT/US2003/009375 WO2003083166A1 (en) | 2002-03-27 | 2003-03-26 | Methods and apparatus for deposition of thin films |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE431441T1 true ATE431441T1 (de) | 2009-05-15 |
Family
ID=28452812
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT03745631T ATE431441T1 (de) | 2002-03-27 | 2003-03-26 | Verfahren zur abscheidung von elektrolytfilmen |
Country Status (7)
Country | Link |
---|---|
US (2) | US7208195B2 (de) |
EP (1) | EP1497479B1 (de) |
AT (1) | ATE431441T1 (de) |
AU (1) | AU2003226086A1 (de) |
CA (1) | CA2518421A1 (de) |
DE (1) | DE60327621D1 (de) |
WO (1) | WO2003083166A1 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030054105A1 (en) * | 2001-08-14 | 2003-03-20 | Hammond Robert H. | Film growth at low pressure mediated by liquid flux and induced by activated oxygen |
US20070264564A1 (en) | 2006-03-16 | 2007-11-15 | Infinite Power Solutions, Inc. | Thin film battery on an integrated circuit or circuit board and method thereof |
US7993773B2 (en) | 2002-08-09 | 2011-08-09 | Infinite Power Solutions, Inc. | Electrochemical apparatus with barrier layer protected substrate |
US20050271893A1 (en) * | 2004-06-04 | 2005-12-08 | Applied Microstructures, Inc. | Controlled vapor deposition of multilayered coatings adhered by an oxide layer |
US7700155B1 (en) * | 2004-04-08 | 2010-04-20 | Novellus Systems, Inc. | Method and apparatus for modulation of precursor exposure during a pulsed deposition process |
JP4925569B2 (ja) | 2004-07-08 | 2012-04-25 | ローム株式会社 | 有機エレクトロルミネッセント素子 |
US8900695B2 (en) * | 2007-02-23 | 2014-12-02 | Applied Microstructures, Inc. | Durable conformal wear-resistant carbon-doped metal oxide-comprising coating |
US20080248263A1 (en) * | 2007-04-02 | 2008-10-09 | Applied Microstructures, Inc. | Method of creating super-hydrophobic and-or super-hydrophilic surfaces on substrates, and articles created thereby |
US8236379B2 (en) * | 2007-04-02 | 2012-08-07 | Applied Microstructures, Inc. | Articles with super-hydrophobic and-or super-hydrophilic surfaces and method of formation |
JP2008311277A (ja) * | 2007-06-12 | 2008-12-25 | Elpida Memory Inc | 成膜処理装置および成膜処理方法 |
KR20100102180A (ko) | 2007-12-21 | 2010-09-20 | 인피니트 파워 솔루션스, 인크. | 전해질 막을 위한 표적을 스퍼터링하는 방법 |
KR101606183B1 (ko) | 2008-01-11 | 2016-03-25 | 사푸라스트 리써치 엘엘씨 | 박막 배터리 및 기타 소자를 위한 박막 캡슐화 |
US8906523B2 (en) | 2008-08-11 | 2014-12-09 | Infinite Power Solutions, Inc. | Energy device with integral collector surface for electromagnetic energy harvesting and method thereof |
CN102576828B (zh) | 2009-09-01 | 2016-04-20 | 萨普拉斯特研究有限责任公司 | 具有集成薄膜电池的印刷电路板 |
JP2013528912A (ja) | 2010-06-07 | 2013-07-11 | インフィニット パワー ソリューションズ, インコーポレイテッド | 再充電可能高密度電気化学素子 |
US8888918B2 (en) | 2011-03-31 | 2014-11-18 | Seagate Technology Llc | Vapor collection |
US20140302238A1 (en) * | 2011-08-24 | 2014-10-09 | Mustang Vacuum Systems, Inc. | Apparatus and Method for the Evaporation and Deposition of Materials |
US9692039B2 (en) | 2012-07-24 | 2017-06-27 | Quantumscape Corporation | Nanostructured materials for electrochemical conversion reactions |
US9353439B2 (en) | 2013-04-05 | 2016-05-31 | Lam Research Corporation | Cascade design showerhead for transient uniformity |
WO2014197751A1 (en) * | 2013-06-06 | 2014-12-11 | Quantumscape Corporation | Flash evaporation of solid state battery component |
EP3111493B1 (de) | 2014-02-25 | 2020-12-09 | QuantumScape Corporation | Hybridelektroden mit einlagerungs- sowie umwandlungsmaterialien |
WO2016025866A1 (en) | 2014-08-15 | 2016-02-18 | Quantumscape Corporation | Doped conversion materials for secondary battery cathodes |
US10023959B2 (en) | 2015-05-26 | 2018-07-17 | Lam Research Corporation | Anti-transient showerhead |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3640689A (en) * | 1970-03-04 | 1972-02-08 | Fansteel Inc | Composite hard metal product |
JPS59217964A (ja) * | 1983-05-26 | 1984-12-08 | Hitachi Ltd | 薄膜電池の正極構造 |
US4436862A (en) * | 1983-06-14 | 1984-03-13 | Nl Industries, Inc. | Thermally stable thickener |
US4715875A (en) * | 1984-11-13 | 1987-12-29 | Ispra Fibroptics Industries Herzlia Ltd. | Manufacture of optical fibre preforms |
US4606935A (en) * | 1985-10-10 | 1986-08-19 | International Business Machines Corporation | Process and apparatus for producing high purity oxidation on a semiconductor substrate |
EP0283311B1 (de) * | 1987-03-18 | 2001-08-01 | Kabushiki Kaisha Toshiba | Verfahren zur Herstellung von Dünnschichten |
US4949783A (en) * | 1988-05-18 | 1990-08-21 | Veeco Instruments, Inc. | Substrate transport and cooling apparatus and method for same |
JPH05326315A (ja) * | 1992-05-25 | 1993-12-10 | Itochu Fine Chem Kk | 薄膜コンデンサおよびその製造装置 |
US6432281B2 (en) * | 1995-12-20 | 2002-08-13 | Recherche Et Developpement Due Groupe Cockerill Sambre | Process for formation of a coating on a substrate |
US5804259A (en) * | 1996-11-07 | 1998-09-08 | Applied Materials, Inc. | Method and apparatus for depositing a multilayered low dielectric constant film |
FR2762448B1 (fr) | 1997-04-22 | 1999-07-09 | Centre Nat Rech Scient | Materiau d'electrode positive a base d'oxysulfure de titane pour generateur electrochimique et son procede de preparation |
US6045864A (en) * | 1997-12-01 | 2000-04-04 | 3M Innovative Properties Company | Vapor coating method |
US6037241A (en) * | 1998-02-19 | 2000-03-14 | First Solar, Llc | Apparatus and method for depositing a semiconductor material |
US6338756B2 (en) * | 1998-06-30 | 2002-01-15 | Seh America, Inc. | In-situ post epitaxial treatment process |
US6040017A (en) * | 1998-10-02 | 2000-03-21 | Sigma Laboratories, Inc. | Formation of multilayered photonic polymer composites |
UA56228C2 (uk) * | 1999-11-01 | 2003-05-15 | Міжнародний Центр Електронно-Променевих Технологій Інституту Електрозварювання Ім. Е.О.Патона Нану | Композиційний зливок для одержання шляхом випаровування функціонально градієнтного покриття із зовнішнім керамічним шаром на металевій підкладці (варіанти) |
DE10007059A1 (de) * | 2000-02-16 | 2001-08-23 | Aixtron Ag | Verfahren und Vorrichtung zur Herstellung von beschichteten Substraten mittels Kondensationsbeschichtung |
DE60131698T2 (de) * | 2000-05-31 | 2008-10-30 | Tokyo Electron Ltd. | Thermische Behandlungsvorrichtung und Verfahren |
US7112543B2 (en) * | 2001-01-04 | 2006-09-26 | Micron Technology, Inc. | Methods of forming assemblies comprising silicon-doped aluminum oxide |
US6468595B1 (en) * | 2001-02-13 | 2002-10-22 | Sigma Technologies International, Inc. | Vaccum deposition of cationic polymer systems |
JP4682456B2 (ja) * | 2001-06-18 | 2011-05-11 | 株式会社日立ハイテクノロジーズ | 基板処理方法及び基板処理装置 |
US20030116432A1 (en) * | 2001-12-26 | 2003-06-26 | Applied Materials, Inc. | Adjustable throw reactor |
US6876442B2 (en) * | 2002-02-13 | 2005-04-05 | Applied Materials, Inc. | Method of calibrating and using a semiconductor processing system |
-
2002
- 2002-03-27 US US10/108,140 patent/US7208195B2/en not_active Expired - Fee Related
-
2003
- 2003-03-26 DE DE60327621T patent/DE60327621D1/de not_active Expired - Fee Related
- 2003-03-26 WO PCT/US2003/009375 patent/WO2003083166A1/en not_active Application Discontinuation
- 2003-03-26 EP EP03745631A patent/EP1497479B1/de not_active Expired - Lifetime
- 2003-03-26 CA CA002518421A patent/CA2518421A1/en not_active Abandoned
- 2003-03-26 AU AU2003226086A patent/AU2003226086A1/en not_active Abandoned
- 2003-03-26 AT AT03745631T patent/ATE431441T1/de not_active IP Right Cessation
-
2007
- 2007-02-21 US US11/677,270 patent/US20070134427A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
DE60327621D1 (de) | 2009-06-25 |
WO2003083166A1 (en) | 2003-10-09 |
US20030185977A1 (en) | 2003-10-02 |
EP1497479A4 (de) | 2006-10-18 |
EP1497479B1 (de) | 2009-05-13 |
US7208195B2 (en) | 2007-04-24 |
CA2518421A1 (en) | 2003-10-09 |
EP1497479A1 (de) | 2005-01-19 |
US20070134427A1 (en) | 2007-06-14 |
AU2003226086A1 (en) | 2003-10-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |