DE60327621D1 - Verfahren zur Abscheidung von Elektrolytfilmen - Google Patents

Verfahren zur Abscheidung von Elektrolytfilmen

Info

Publication number
DE60327621D1
DE60327621D1 DE60327621T DE60327621T DE60327621D1 DE 60327621 D1 DE60327621 D1 DE 60327621D1 DE 60327621 T DE60327621 T DE 60327621T DE 60327621 T DE60327621 T DE 60327621T DE 60327621 D1 DE60327621 D1 DE 60327621D1
Authority
DE
Germany
Prior art keywords
deposit
vapor
phase
component
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60327621T
Other languages
English (en)
Inventor
Yevgen Kalynushkin
Elena Shembel
Peter Novak
Chris Flury
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ener1 Battery Co
Original Assignee
Ener1 Battery Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ener1 Battery Co filed Critical Ener1 Battery Co
Application granted granted Critical
Publication of DE60327621D1 publication Critical patent/DE60327621D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Secondary Cells (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Inorganic Insulating Materials (AREA)
  • Glass Compositions (AREA)
  • Conductive Materials (AREA)
  • Fuel Cell (AREA)
DE60327621T 2002-03-27 2003-03-26 Verfahren zur Abscheidung von Elektrolytfilmen Expired - Fee Related DE60327621D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/108,140 US7208195B2 (en) 2002-03-27 2002-03-27 Methods and apparatus for deposition of thin films
PCT/US2003/009375 WO2003083166A1 (en) 2002-03-27 2003-03-26 Methods and apparatus for deposition of thin films

Publications (1)

Publication Number Publication Date
DE60327621D1 true DE60327621D1 (de) 2009-06-25

Family

ID=28452812

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60327621T Expired - Fee Related DE60327621D1 (de) 2002-03-27 2003-03-26 Verfahren zur Abscheidung von Elektrolytfilmen

Country Status (7)

Country Link
US (2) US7208195B2 (de)
EP (1) EP1497479B1 (de)
AT (1) ATE431441T1 (de)
AU (1) AU2003226086A1 (de)
CA (1) CA2518421A1 (de)
DE (1) DE60327621D1 (de)
WO (1) WO2003083166A1 (de)

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US20030054105A1 (en) * 2001-08-14 2003-03-20 Hammond Robert H. Film growth at low pressure mediated by liquid flux and induced by activated oxygen
US9793523B2 (en) 2002-08-09 2017-10-17 Sapurast Research Llc Electrochemical apparatus with barrier layer protected substrate
US20070264564A1 (en) 2006-03-16 2007-11-15 Infinite Power Solutions, Inc. Thin film battery on an integrated circuit or circuit board and method thereof
US20050271893A1 (en) * 2004-06-04 2005-12-08 Applied Microstructures, Inc. Controlled vapor deposition of multilayered coatings adhered by an oxide layer
US7700155B1 (en) * 2004-04-08 2010-04-20 Novellus Systems, Inc. Method and apparatus for modulation of precursor exposure during a pulsed deposition process
JP4925569B2 (ja) 2004-07-08 2012-04-25 ローム株式会社 有機エレクトロルミネッセント素子
US8900695B2 (en) * 2007-02-23 2014-12-02 Applied Microstructures, Inc. Durable conformal wear-resistant carbon-doped metal oxide-comprising coating
US8236379B2 (en) * 2007-04-02 2012-08-07 Applied Microstructures, Inc. Articles with super-hydrophobic and-or super-hydrophilic surfaces and method of formation
US20080248263A1 (en) * 2007-04-02 2008-10-09 Applied Microstructures, Inc. Method of creating super-hydrophobic and-or super-hydrophilic surfaces on substrates, and articles created thereby
JP2008311277A (ja) * 2007-06-12 2008-12-25 Elpida Memory Inc 成膜処理装置および成膜処理方法
KR20150128817A (ko) 2007-12-21 2015-11-18 사푸라스트 리써치 엘엘씨 전해질 막을 위한 표적을 스퍼터링하는 방법
WO2009089417A1 (en) 2008-01-11 2009-07-16 Infinite Power Solutions, Inc. Thin film encapsulation for thin film batteries and other devices
JP2012500610A (ja) 2008-08-11 2012-01-05 インフィニット パワー ソリューションズ， インコーポレイテッド 電磁エネルギー獲得ための統合コレクタ表面を有するエネルギーデバイスおよびその方法
JP5492998B2 (ja) 2009-09-01 2014-05-14 インフィニット パワー ソリューションズ， インコーポレイテッド 薄膜バッテリを組み込んだプリント回路基板
JP2013528912A (ja) 2010-06-07 2013-07-11 インフィニット パワー ソリューションズ， インコーポレイテッド 再充電可能高密度電気化学素子
US8888918B2 (en) 2011-03-31 2014-11-18 Seagate Technology Llc Vapor collection
WO2013028977A2 (en) * 2011-08-24 2013-02-28 Mustang Vacuum Systems, Inc. Apparatus and method for the evaporation and deposition of materials
US9692039B2 (en) 2012-07-24 2017-06-27 Quantumscape Corporation Nanostructured materials for electrochemical conversion reactions
US9353439B2 (en) 2013-04-05 2016-05-31 Lam Research Corporation Cascade design showerhead for transient uniformity
US10158115B2 (en) * 2013-06-06 2018-12-18 Quantumscape Corporation Flash evaporation of solid state battery component
US20150243974A1 (en) 2014-02-25 2015-08-27 Quantumscape Corporation Hybrid electrodes with both intercalation and conversion materials
WO2016025866A1 (en) 2014-08-15 2016-02-18 Quantumscape Corporation Doped conversion materials for secondary battery cathodes
US10023959B2 (en) 2015-05-26 2018-07-17 Lam Research Corporation Anti-transient showerhead

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US3640689A (en) * 1970-03-04 1972-02-08 Fansteel Inc Composite hard metal product
JPS59217964A (ja) * 1983-05-26 1984-12-08 Hitachi Ltd 薄膜電池の正極構造
US4436862A (en) * 1983-06-14 1984-03-13 Nl Industries, Inc. Thermally stable thickener
US4715875A (en) * 1984-11-13 1987-12-29 Ispra Fibroptics Industries Herzlia Ltd. Manufacture of optical fibre preforms
US4606935A (en) * 1985-10-10 1986-08-19 International Business Machines Corporation Process and apparatus for producing high purity oxidation on a semiconductor substrate
KR910006164B1 (ko) * 1987-03-18 1991-08-16 가부시키가이샤 도시바 박막형성방법과 그 장치
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US5804259A (en) * 1996-11-07 1998-09-08 Applied Materials, Inc. Method and apparatus for depositing a multilayered low dielectric constant film
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Also Published As

Publication number Publication date
ATE431441T1 (de) 2009-05-15
EP1497479A4 (de) 2006-10-18
US7208195B2 (en) 2007-04-24
EP1497479A1 (de) 2005-01-19
AU2003226086A1 (en) 2003-10-13
WO2003083166A1 (en) 2003-10-09
EP1497479B1 (de) 2009-05-13
CA2518421A1 (en) 2003-10-09
US20030185977A1 (en) 2003-10-02
US20070134427A1 (en) 2007-06-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee