ATE394708T1 - Vorrichtung zur erzeugung von extremem uv-licht und anwendung auf eine lithografiequelle mit extremer uv-strahlung - Google Patents

Vorrichtung zur erzeugung von extremem uv-licht und anwendung auf eine lithografiequelle mit extremer uv-strahlung

Info

Publication number
ATE394708T1
ATE394708T1 AT05777195T AT05777195T ATE394708T1 AT E394708 T1 ATE394708 T1 AT E394708T1 AT 05777195 T AT05777195 T AT 05777195T AT 05777195 T AT05777195 T AT 05777195T AT E394708 T1 ATE394708 T1 AT E394708T1
Authority
AT
Austria
Prior art keywords
target
laser beams
focused
extreme
collection axis
Prior art date
Application number
AT05777195T
Other languages
English (en)
Inventor
Guy Cheymol
Philippe Cormont
Pierre-Yves Thro
Olivier Sublemontier
Martin Schmidt
Benoit Barthod
Original Assignee
Commissariat Energie Atomique
Alcatel Vacuum Technology Fran
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique, Alcatel Vacuum Technology Fran filed Critical Commissariat Energie Atomique
Application granted granted Critical
Publication of ATE394708T1 publication Critical patent/ATE394708T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Photoreceptors In Electrophotography (AREA)
AT05777195T 2004-06-14 2005-06-14 Vorrichtung zur erzeugung von extremem uv-licht und anwendung auf eine lithografiequelle mit extremer uv-strahlung ATE394708T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0406429A FR2871622B1 (fr) 2004-06-14 2004-06-14 Dispositif de generation de lumiere dans l'extreme ultraviolet et application a une source de lithographie par rayonnement dans l'extreme ultraviolet

Publications (1)

Publication Number Publication Date
ATE394708T1 true ATE394708T1 (de) 2008-05-15

Family

ID=34946881

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05777195T ATE394708T1 (de) 2004-06-14 2005-06-14 Vorrichtung zur erzeugung von extremem uv-licht und anwendung auf eine lithografiequelle mit extremer uv-strahlung

Country Status (10)

Country Link
US (1) US7399981B2 (de)
EP (1) EP1800188B1 (de)
JP (1) JP2008503078A (de)
KR (1) KR20070058386A (de)
CN (1) CN100541336C (de)
AT (1) ATE394708T1 (de)
DE (1) DE602005006599D1 (de)
FR (1) FR2871622B1 (de)
RU (1) RU2006143322A (de)
WO (1) WO2006000718A1 (de)

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EP2083328B1 (de) * 2008-01-28 2013-06-19 Media Lario s.r.l. Kollektor für streifenden Strahlungseinfall geeignet für lasererzeugte Plasmaquellen
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EP2182412A1 (de) * 2008-11-04 2010-05-05 ASML Netherlands B.V. Strahlungsquelle und lithografische Vorrichtung
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US8587768B2 (en) 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
DE102010028655A1 (de) * 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh EUV-Kollektor
US8258485B2 (en) * 2010-08-30 2012-09-04 Media Lario Srl Source-collector module with GIC mirror and xenon liquid EUV LPP target system
US20120050707A1 (en) * 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and tin wire EUV LPP target system
US20120050706A1 (en) * 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and xenon ice EUV LPP target system
DE102010047419B4 (de) * 2010-10-01 2013-09-05 Xtreme Technologies Gmbh Verfahren und Vorrichtung zur Erzeugung von EUV-Strahlung aus einem Gasentladungsplasma
US9516732B2 (en) 2011-09-02 2016-12-06 Asml Netherlands B.V. Radiation source
US9366967B2 (en) 2011-09-02 2016-06-14 Asml Netherlands B.V. Radiation source
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US9127981B2 (en) * 2013-08-06 2015-09-08 Cymer, Llc System and method for return beam metrology with optical switch
IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv A light source operated by a laser and a method using a mode mixer
IL234727B (en) 2013-09-20 2020-09-30 Asml Netherlands Bv A light source operated by a laser in an optical system corrected for deviations and the method of manufacturing the system as mentioned
US9723703B2 (en) * 2014-04-01 2017-08-01 Kla-Tencor Corporation System and method for transverse pumping of laser-sustained plasma
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
US9748086B2 (en) 2014-05-15 2017-08-29 Excelitas Technologies Corp. Laser driven sealed beam lamp
KR102211898B1 (ko) * 2014-11-27 2021-02-05 삼성전자주식회사 노광 장치용 액체 누출 감지 장치 및 방법
US10034362B2 (en) * 2014-12-16 2018-07-24 Kla-Tencor Corporation Plasma-based light source
WO2016148608A1 (ru) * 2015-03-16 2016-09-22 Игорь Георгиевич РУДОЙ Источник широкополосного оптического излучения с высокой яркостью
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
CN104914680B (zh) * 2015-05-25 2017-03-08 中国科学院上海光学精密机械研究所 基于溶胶射流靶的lpp‑euv光源系统
DE102016205893A1 (de) * 2016-04-08 2017-10-12 Carl Zeiss Smt Gmbh EUV-Kollektor zum Einsatz in einer EUV-Projektionsbelichtungsanlage
RU2658314C1 (ru) * 2016-06-14 2018-06-20 Общество С Ограниченной Ответственностью "Эуф Лабс" Высокояркостный источник эуф-излучения и способ генерации излучения из лазерной плазмы
KR102669150B1 (ko) 2016-07-27 2024-05-27 삼성전자주식회사 자외선(uv) 노광 장치를 구비한 극자외선(euv) 노광 시스템
US10959318B2 (en) * 2018-01-10 2021-03-23 Kla-Tencor Corporation X-ray metrology system with broadband laser produced plasma illuminator
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
US20200235544A1 (en) * 2019-01-22 2020-07-23 Coherent, Inc. Diode-pumped solid-state laser apparatus for laser annealing
US11086226B1 (en) * 2020-06-03 2021-08-10 Lawrence Livermore National Security, Llc Liquid tamped targets for extreme ultraviolet lithography
RU2765486C1 (ru) * 2021-06-07 2022-01-31 Федеральное государственное бюджетное учреждение науки Физико-технический институт им. А.Ф. Иоффе Российской академии наук Термоядерная мишень непрямого инициирования
CN113433805B (zh) * 2021-07-26 2023-04-14 广东省智能机器人研究院 极紫外光光刻方法和系统
CN113433804B (zh) * 2021-07-26 2023-04-14 广东省智能机器人研究院 极紫外光光刻方法和系统

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Also Published As

Publication number Publication date
EP1800188B1 (de) 2008-05-07
DE602005006599D1 (de) 2008-06-19
JP2008503078A (ja) 2008-01-31
FR2871622B1 (fr) 2008-09-12
US20060039435A1 (en) 2006-02-23
RU2006143322A (ru) 2008-07-20
WO2006000718A1 (fr) 2006-01-05
CN100541336C (zh) 2009-09-16
US7399981B2 (en) 2008-07-15
KR20070058386A (ko) 2007-06-08
EP1800188A1 (de) 2007-06-27
FR2871622A1 (fr) 2005-12-16
CN101019078A (zh) 2007-08-15

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