ATE354814T1 - Vereinzelte die-wafer mit mikrospiegeln - Google Patents

Vereinzelte die-wafer mit mikrospiegeln

Info

Publication number
ATE354814T1
ATE354814T1 AT05000599T AT05000599T ATE354814T1 AT E354814 T1 ATE354814 T1 AT E354814T1 AT 05000599 T AT05000599 T AT 05000599T AT 05000599 T AT05000599 T AT 05000599T AT E354814 T1 ATE354814 T1 AT E354814T1
Authority
AT
Austria
Prior art keywords
micro
mirror
mirrors
array
post
Prior art date
Application number
AT05000599T
Other languages
German (de)
English (en)
Inventor
Andrew G Huibers
Fedor Ilkov
Satyadev Patel
Peter W Richards
John Stockton
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/631,536 external-priority patent/US6529310B1/en
Priority claimed from US09/732,445 external-priority patent/US6523961B2/en
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Application granted granted Critical
Publication of ATE354814T1 publication Critical patent/ATE354814T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0032—Packages or encapsulation
    • B81B7/0067—Packages or encapsulation for controlling the passage of optical signals through the package
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/28—Reflectors in projection beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00—Details of television systems
    • H04N5/74—Projection arrangements for image reproduction, e.g. using eidophor
    • H04N5/7416—Projection arrangements for image reproduction, e.g. using eidophor involving the use of a spatial light modulator, e.g. a light valve, controlled by a video signal
    • H04N5/7458—Projection arrangements for image reproduction, e.g. using eidophor involving the use of a spatial light modulator, e.g. a light valve, controlled by a video signal the modulator being an array of deformable mirrors, e.g. digital micromirror device [DMD]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0369—Static structures characterized by their profile
    • B81B2203/0384—Static structures characterized by their profile sloped profile

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Computer Hardware Design (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Projection Apparatus (AREA)
  • Micromachines (AREA)
  • Transforming Electric Information Into Light Information (AREA)
  • Led Device Packages (AREA)
  • Prostheses (AREA)
  • Hybrid Cells (AREA)
AT05000599T 2000-08-03 2001-08-03 Vereinzelte die-wafer mit mikrospiegeln ATE354814T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/631,536 US6529310B1 (en) 1998-09-24 2000-08-03 Deflectable spatial light modulator having superimposed hinge and deflectable element
US22924600P 2000-08-30 2000-08-30
US09/732,445 US6523961B2 (en) 2000-08-30 2000-12-07 Projection system and mirror elements for improved contrast ratio in spatial light modulators

Publications (1)

Publication Number Publication Date
ATE354814T1 true ATE354814T1 (de) 2007-03-15

Family

ID=27397927

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05000599T ATE354814T1 (de) 2000-08-03 2001-08-03 Vereinzelte die-wafer mit mikrospiegeln

Country Status (8)

Country Link
EP (1) EP1315993A4 (enrdf_load_stackoverflow)
JP (5) JP3889705B2 (enrdf_load_stackoverflow)
KR (1) KR100724081B1 (enrdf_load_stackoverflow)
CN (5) CN100371763C (enrdf_load_stackoverflow)
AT (1) ATE354814T1 (enrdf_load_stackoverflow)
AU (1) AU2001281019A1 (enrdf_load_stackoverflow)
DE (10) DE20122616U1 (enrdf_load_stackoverflow)
WO (1) WO2002012925A2 (enrdf_load_stackoverflow)

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US7300162B2 (en) 2000-08-30 2007-11-27 Texas Instruments Incorporated Projection display
US7307775B2 (en) * 2000-12-07 2007-12-11 Texas Instruments Incorporated Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates
US7023606B2 (en) 2001-08-03 2006-04-04 Reflectivity, Inc Micromirror array for projection TV
SG111972A1 (en) * 2002-10-17 2005-06-29 Agency Science Tech & Res Wafer-level package for micro-electro-mechanical systems
US7042622B2 (en) 2003-10-30 2006-05-09 Reflectivity, Inc Micromirror and post arrangements on substrates
US7397517B2 (en) * 2003-05-30 2008-07-08 Kazuhiro Ohara Display system and signal processing using diamond-shaped DMDs
US6871958B2 (en) 2003-08-18 2005-03-29 Evans & Sutherland Computer Corporation Wide angle scanner for panoramic display
US7012669B2 (en) 2003-08-18 2006-03-14 Evans & Sutherland Computer Corporation Reflection barrier for panoramic display
US7334902B2 (en) 2003-08-18 2008-02-26 Evans & Sutherland Computer Corporation Wide angle scanner for panoramic display
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KR101912093B1 (ko) * 2010-10-29 2018-10-26 삼성전자 주식회사 광학 장치
CN102087414B (zh) * 2010-11-03 2012-12-26 凝辉(天津)科技有限责任公司 一种阵列式分区投影方法
CN102683474B (zh) * 2011-03-18 2014-11-05 浙江大立科技股份有限公司 一种基于复合牺牲层的红外探测器制作方法
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CN103777450A (zh) * 2014-01-06 2014-05-07 吴震 发光装置、投影显示装置和发光系统
CN103777445B (zh) * 2014-01-06 2018-12-25 杨毅 投影显示装置
JP2016029430A (ja) * 2014-07-25 2016-03-03 セイコーエプソン株式会社 電気光学装置、電気光学装置の製造方法、及び電子機器
DE102015200626B3 (de) 2015-01-16 2016-07-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. MEMS Aktuator, System mit einer Mehrzahl vom MEMS Aktuatoren und Verfahren zum Herstellen eines MEMS Aktuators
CN104835908A (zh) * 2015-04-17 2015-08-12 上海华虹宏力半导体制造有限公司 用于3d amr的氮化钽刻蚀方法
US10589980B2 (en) * 2017-04-07 2020-03-17 Texas Instruments Incorporated Isolated protrusion/recession features in a micro electro mechanical system
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Also Published As

Publication number Publication date
JP2006178447A (ja) 2006-07-06
JP2005122145A (ja) 2005-05-12
CN1567019A (zh) 2005-01-19
JP2005099793A (ja) 2005-04-14
KR100724081B1 (ko) 2007-06-04
DE20122370U1 (de) 2005-05-19
DE20122371U1 (de) 2005-05-19
DE20122372U1 (de) 2005-05-19
JP2004506230A (ja) 2004-02-26
JP3889705B2 (ja) 2007-03-07
DE20122614U1 (de) 2006-09-14
DE60126849T2 (de) 2007-11-08
WO2002012925A3 (en) 2002-09-06
DE20122616U1 (de) 2006-09-14
EP1315993A2 (en) 2003-06-04
CN1444738A (zh) 2003-09-24
DE20122373U1 (de) 2005-05-19
WO2002012925A2 (en) 2002-02-14
AU2001281019A1 (en) 2002-02-18
CN100412602C (zh) 2008-08-20
DE60126849D1 (de) 2007-04-05
DE20122617U1 (de) 2006-09-14
CN1567021A (zh) 2005-01-19
JP2005122146A (ja) 2005-05-12
DE20122618U1 (de) 2006-11-23
CN1567020A (zh) 2005-01-19
JP3889759B2 (ja) 2007-03-07
KR20030036665A (ko) 2003-05-09
CN100392467C (zh) 2008-06-04
CN1567018A (zh) 2005-01-19
JP3889757B2 (ja) 2007-03-07
JP3768514B2 (ja) 2006-04-19
DE20122615U1 (de) 2006-09-14
CN100412604C (zh) 2008-08-20
CN100371763C (zh) 2008-02-27
CN100412603C (zh) 2008-08-20
EP1315993A4 (en) 2005-07-13

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