ATE327997T1 - Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden - Google Patents

Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden

Info

Publication number
ATE327997T1
ATE327997T1 AT01974090T AT01974090T ATE327997T1 AT E327997 T1 ATE327997 T1 AT E327997T1 AT 01974090 T AT01974090 T AT 01974090T AT 01974090 T AT01974090 T AT 01974090T AT E327997 T1 ATE327997 T1 AT E327997T1
Authority
AT
Austria
Prior art keywords
photostable
absorbers
silylated
compositions stabilized
benzotriazole
Prior art date
Application number
AT01974090T
Other languages
German (de)
English (en)
Inventor
Ramanathan Ravichandran
Joseph Suhadolnik
Mervin Gale Wood
Rong Xiong
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE327997T1 publication Critical patent/ATE327997T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)
AT01974090T 2000-08-03 2001-07-26 Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden ATE327997T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US22278300P 2000-08-03 2000-08-03
US30304801P 2001-07-05 2001-07-05

Publications (1)

Publication Number Publication Date
ATE327997T1 true ATE327997T1 (de) 2006-06-15

Family

ID=26917137

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01974090T ATE327997T1 (de) 2000-08-03 2001-07-26 Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden

Country Status (9)

Country Link
US (1) US6677392B2 (cg-RX-API-DMAC7.html)
EP (1) EP1305320B1 (cg-RX-API-DMAC7.html)
JP (1) JP4912561B2 (cg-RX-API-DMAC7.html)
KR (1) KR20030022347A (cg-RX-API-DMAC7.html)
AT (1) ATE327997T1 (cg-RX-API-DMAC7.html)
AU (1) AU2001293708A1 (cg-RX-API-DMAC7.html)
DE (1) DE60120178T2 (cg-RX-API-DMAC7.html)
TW (1) TW548303B (cg-RX-API-DMAC7.html)
WO (1) WO2002012252A1 (cg-RX-API-DMAC7.html)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1472574A4 (en) * 2001-11-15 2005-06-08 Honeywell Int Inc ANTI-REFLECTIVE COATINGS DESIGNED TO BE INSTALLED BY ROTATION FOR PHOTOLITHOGRAPHY
JP3829933B2 (ja) * 2002-05-16 2006-10-04 信越化学工業株式会社 難燃性シリコーン組成物
US20040185269A1 (en) * 2003-03-18 2004-09-23 Loper Scott W. Scratch and mar resistant low VOC coating composition
WO2004099302A1 (en) * 2003-05-06 2004-11-18 Ciba Specialty Chemicals Holding Inc. Photo-cured and stabilized coatings
US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP2005343969A (ja) * 2004-06-01 2005-12-15 Showa Techno Coat Kk 紫外線遮蔽塗料
US7642303B2 (en) * 2004-10-15 2010-01-05 Shakely Thomas L Thermoplastic articles for packaging UV sensitive materials, processes for the articles production and use and novel UV absorbers
US7364672B2 (en) * 2004-12-06 2008-04-29 Arlon, Inc. Low loss prepregs, compositions useful for the preparation thereof and uses therefor
JP4595060B2 (ja) * 2005-03-24 2010-12-08 東レ・モノフィラメント株式会社 工業織物用ポリアミドモノフィラメントおよび工業織物
JP4595061B2 (ja) * 2005-03-24 2010-12-08 東レ・モノフィラメント株式会社 工業布帛用ポリアミドステープルおよび工業布帛
JP2007231099A (ja) * 2006-02-28 2007-09-13 Fujifilm Corp 分散物
US20080009211A1 (en) * 2006-07-07 2008-01-10 Matthew Raymond Himes Assemblies useful for the preparation of electronic components and methods for making same
KR101228650B1 (ko) * 2006-07-21 2013-01-31 코니카 미놀타 어드밴스드 레이어즈 인코포레이티드 광학 필름, 그의 제조 방법, 편광판 및 액정 표시 장치
JP5190650B2 (ja) * 2007-02-14 2013-04-24 シプロ化成株式会社 ベンゾトリアゾール誘導体化合物
US8642246B2 (en) * 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US7772355B2 (en) 2008-01-28 2010-08-10 The United States Of America As Represented By The Secretary Of The Navy Divinylsilane-terminated aromatic ether-aromatic ketone-containing compounds
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5907588B2 (ja) * 2011-04-04 2016-04-26 関西ペイント株式会社 シルセスキオキサン化合物及びこれを含むコーティング組成物
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9530571B2 (en) * 2011-11-18 2016-12-27 Adeka Corporation Compound and support material supporting this novel compound
JP5910478B2 (ja) * 2012-12-07 2016-04-27 信越化学工業株式会社 樹脂用コーティング剤組成物
US9085692B1 (en) 2014-02-25 2015-07-21 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Synthesis of oligomeric divinyldialkylsilane containing compositions
TWI760297B (zh) 2014-11-20 2022-04-11 美商塞特工業公司 安定劑組合物及使用該組合物以保護有機材料抵抗ｕｖ光及熱降解之方法
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
JP6975705B2 (ja) 2015-07-07 2021-12-01 スリーエム イノベイティブ プロパティズ カンパニー 置換ベンゾトリアゾールフェノール
WO2017122503A1 (ja) 2016-01-12 2017-07-20 富士フイルム株式会社 組成物、膜、ガラス物品、化合物、高純度組成物、化合物の製造方法および膜の製造方法
CN111315797A (zh) 2017-11-10 2020-06-19 默克专利股份有限公司 有机半导体化合物
EP3578599A1 (en) 2018-06-08 2019-12-11 Cytec Industries Inc. Granular stabilizer compositions for use in polymer resins and methods of making same
KR102797624B1 (ko) * 2019-04-26 2025-04-21 미요시 유시 가부시끼가이샤 내열성과 장파장 흡수가 우수한 자외선 흡수제
CN111548659A (zh) * 2020-06-01 2020-08-18 烟台布莱特光电材料有限公司 一种新型的uv固化物及其制备的mini led荧光膜片
WO2024083872A1 (en) 2022-10-18 2024-04-25 Cytec Industries Inc. Synergistic stabilizer compositions and methods for using same for protecting organic materials from uv light and thermal degradation
WO2025056330A1 (en) 2023-09-13 2025-03-20 Cytec Industries Inc. Stabilized polymer compositions with improved color resistance

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4373060A (en) * 1980-05-30 1983-02-08 General Electric Company Silicone coating for unprimed plastic substrate and coated articles
US4373061A (en) 1980-05-30 1983-02-08 General Electric Company Silicone coating for unprimed plastic substrate and coated articles
US4316033A (en) * 1980-05-30 1982-02-16 General Electric Company Alkoxysilylbenzotriazoles
US4322455A (en) 1980-09-15 1982-03-30 General Electric Company Process for producing an ultraviolet radiation stabilized polymeric article
US4439494A (en) * 1982-03-01 1984-03-27 General Electric Company Silyl-polyacrylates for polycarbonate substrates
JPH0730251B2 (ja) * 1987-10-09 1995-04-05 旭電化工業株式会社 耐光性の改善された高分子材料組成物
US4859759A (en) 1988-04-14 1989-08-22 Kimberly-Clark Corporation Siloxane containing benzotriazolyl/tetraalkylpiperidyl substituent
IT1243409B (it) 1990-12-17 1994-06-10 Ciba Geigy Spa Composti piperidinici contenenti gruppi silenici atti all'impiego come stabilizzanti per materiali organici
ES2083136T3 (es) 1991-03-05 1996-04-01 Ciba Geigy Ag 2-(2-hidroxifenil)-4,6-diaril-1,3,5-triazinas sililadas.
JPH06115270A (ja) * 1992-10-01 1994-04-26 Fuji Photo Film Co Ltd 熱転写受像材料
IT1270870B (it) 1993-03-11 1997-05-13 Ciba Geigy Ag Composti polimetilipeperidinici contenenti gruppi silanici atti all'impiego come stabilizzanti per materiali organici
EP0667379B1 (de) 1994-02-10 2002-07-17 Ciba SC Holding AG Holzschutzanstrich
US5391795A (en) 1994-02-18 1995-02-21 General Electric Company Silylated agents useful for absorbing ultraviolet light
US6576797B1 (en) 1994-03-31 2003-06-10 Ciba Specialty Chemicals Corporation Thioether substituted hydroxybenzophenones and stabilized compositions
FR2726561B1 (fr) * 1994-11-08 1996-12-13 Oreal Nouveaux filtres solaires, compositions cosmetiques photoprotectrices les contenant et utilisations
JP3524617B2 (ja) * 1995-03-13 2004-05-10 新日本石油株式会社 紫外線吸収剤及びコーティング材料
TW325490B (en) 1995-06-23 1998-01-21 Ciba Sc Holding Ag Polysiloxane light stabilizers
DE69617688T2 (de) 1995-07-03 2002-08-22 Ciba Speciality Chemicals Holding Inc., Basel Zusammensetzungen aus synthetischen Polymeren und einem Polysilanderivat.
JP3752010B2 (ja) * 1995-07-04 2006-03-08 新日本石油株式会社 調光素子
US6166218A (en) 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
US5679820A (en) 1996-12-16 1997-10-21 General Electric Company Silylated ultraviolet light absorbers having resistance to humidity
JPH10219231A (ja) * 1997-01-31 1998-08-18 Nippon Oil Co Ltd 紫外線吸収材料の製造方法
JP4092525B2 (ja) * 2000-02-04 2008-05-28 信越化学工業株式会社 コーティング剤組成物並びにコーティング方法及びコーティング物品

Also Published As

Publication number Publication date
KR20030022347A (ko) 2003-03-15
US6677392B2 (en) 2004-01-13
AU2001293708A1 (en) 2002-02-18
JP2004505984A (ja) 2004-02-26
DE60120178T2 (de) 2007-04-26
TW548303B (en) 2003-08-21
DE60120178D1 (de) 2006-07-06
US20020115753A1 (en) 2002-08-22
EP1305320A1 (en) 2003-05-02
EP1305320B1 (en) 2006-05-31
WO2002012252A1 (en) 2002-02-14
JP4912561B2 (ja) 2012-04-11

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