ATE327997T1 - Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden - Google Patents

Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden

Info

Publication number
ATE327997T1
ATE327997T1 AT01974090T AT01974090T ATE327997T1 AT E327997 T1 ATE327997 T1 AT E327997T1 AT 01974090 T AT01974090 T AT 01974090T AT 01974090 T AT01974090 T AT 01974090T AT E327997 T1 ATE327997 T1 AT E327997T1
Authority
AT
Austria
Prior art keywords
photostable
absorbers
silylated
compositions stabilized
benzotriazole
Prior art date
Application number
AT01974090T
Other languages
English (en)
Inventor
Ramanathan Ravichandran
Joseph Suhadolnik
Mervin Gale Wood
Rong Xiong
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE327997T1 publication Critical patent/ATE327997T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)
AT01974090T 2000-08-03 2001-07-26 Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden ATE327997T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US22278300P 2000-08-03 2000-08-03
US30304801P 2001-07-05 2001-07-05

Publications (1)

Publication Number Publication Date
ATE327997T1 true ATE327997T1 (de) 2006-06-15

Family

ID=26917137

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01974090T ATE327997T1 (de) 2000-08-03 2001-07-26 Photostabile, silylierte benzotriazol uv-absorber und zusammensetzungen, die mit diesen stabilisiert werden

Country Status (9)

Country Link
US (1) US6677392B2 (de)
EP (1) EP1305320B1 (de)
JP (1) JP4912561B2 (de)
KR (1) KR20030022347A (de)
AT (1) ATE327997T1 (de)
AU (1) AU2001293708A1 (de)
DE (1) DE60120178T2 (de)
TW (1) TW548303B (de)
WO (1) WO2002012252A1 (de)

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US20040185269A1 (en) * 2003-03-18 2004-09-23 Loper Scott W. Scratch and mar resistant low VOC coating composition
EP1620500B1 (de) * 2003-05-06 2012-07-11 Basf Se Lichthärtbare und stabilisierte beschichtungen
US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP2005343969A (ja) * 2004-06-01 2005-12-15 Showa Techno Coat Kk 紫外線遮蔽塗料
US7642303B2 (en) * 2004-10-15 2010-01-05 Shakely Thomas L Thermoplastic articles for packaging UV sensitive materials, processes for the articles production and use and novel UV absorbers
US7364672B2 (en) * 2004-12-06 2008-04-29 Arlon, Inc. Low loss prepregs, compositions useful for the preparation thereof and uses therefor
JP4595061B2 (ja) * 2005-03-24 2010-12-08 東レ・モノフィラメント株式会社 工業布帛用ポリアミドステープルおよび工業布帛
JP4595060B2 (ja) * 2005-03-24 2010-12-08 東レ・モノフィラメント株式会社 工業織物用ポリアミドモノフィラメントおよび工業織物
JP2007231099A (ja) * 2006-02-28 2007-09-13 Fujifilm Corp 分散物
US20080009211A1 (en) * 2006-07-07 2008-01-10 Matthew Raymond Himes Assemblies useful for the preparation of electronic components and methods for making same
WO2008010421A1 (fr) * 2006-07-21 2008-01-24 Konica Minolta Opto, Inc. éléments optiques, son procédé de fabrication, plaque polarisante et dispositif d'affichage à cristaux liquides
JP5190650B2 (ja) * 2007-02-14 2013-04-24 シプロ化成株式会社 ベンゾトリアゾール誘導体化合物
US8642246B2 (en) * 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US7772355B2 (en) 2008-01-28 2010-08-10 The United States Of America As Represented By The Secretary Of The Navy Divinylsilane-terminated aromatic ether-aromatic ketone-containing compounds
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5907588B2 (ja) * 2011-04-04 2016-04-26 関西ペイント株式会社 シルセスキオキサン化合物及びこれを含むコーティング組成物
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9530571B2 (en) * 2011-11-18 2016-12-27 Adeka Corporation Compound and support material supporting this novel compound
JP5910478B2 (ja) * 2012-12-07 2016-04-27 信越化学工業株式会社 樹脂用コーティング剤組成物
WO2015130652A1 (en) 2014-02-25 2015-09-03 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Synthesis of oligomeric divinyldialkylsilane containing compositions
TWI813049B (zh) 2014-11-20 2023-08-21 美商塞特工業公司 安定劑組合物及使用該組合物以保護有機材料抵抗uv光及熱降解之方法
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
JP6975705B2 (ja) 2015-07-07 2021-12-01 スリーエム イノベイティブ プロパティズ カンパニー 置換ベンゾトリアゾールフェノール
KR102117177B1 (ko) 2016-01-12 2020-06-02 후지필름 가부시키가이샤 조성물, 막, 유리 물품, 화합물, 고순도 조성물, 화합물의 제조 방법 및 막의 제조 방법
EP3578599A1 (de) 2018-06-08 2019-12-11 Cytec Industries Inc. Granulare stabilisatorzusammensetzungen zur verwendung in polymerharzen und verfahren zur herstellung davon
US20220162174A1 (en) * 2019-04-26 2022-05-26 Miyoshi Oil & Fat Co., Ltd. Ultraviolet absorber having excellent heat resistance and long-wavelength absorption
CN111548659A (zh) * 2020-06-01 2020-08-18 烟台布莱特光电材料有限公司 一种新型的uv固化物及其制备的mini led荧光膜片
WO2024083872A1 (en) 2022-10-18 2024-04-25 Cytec Industries Inc. Synergistic stabilizer compositions and methods for using same for protecting organic materials from uv light and thermal degradation

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Also Published As

Publication number Publication date
JP4912561B2 (ja) 2012-04-11
DE60120178D1 (de) 2006-07-06
AU2001293708A1 (en) 2002-02-18
EP1305320A1 (de) 2003-05-02
TW548303B (en) 2003-08-21
WO2002012252A1 (en) 2002-02-14
US20020115753A1 (en) 2002-08-22
DE60120178T2 (de) 2007-04-26
JP2004505984A (ja) 2004-02-26
US6677392B2 (en) 2004-01-13
KR20030022347A (ko) 2003-03-15
EP1305320B1 (de) 2006-05-31

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