TW548303B - Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith - Google Patents

Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith Download PDF

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Publication number
TW548303B
TW548303B TW090118730A TW90118730A TW548303B TW 548303 B TW548303 B TW 548303B TW 090118730 A TW090118730 A TW 090118730A TW 90118730 A TW90118730 A TW 90118730A TW 548303 B TW548303 B TW 548303B
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TW
Taiwan
Prior art keywords
carbon atoms
group
phenyl
tert
cns
Prior art date
Application number
TW090118730A
Other languages
English (en)
Chinese (zh)
Inventor
Ramanathan Ravichandran
Joseph Suhadolnik
Mervin Gale Wood
Rong Xiong
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of TW548303B publication Critical patent/TW548303B/zh

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)
TW090118730A 2000-08-03 2001-08-01 Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith TW548303B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US22278300P 2000-08-03 2000-08-03
US30304801P 2001-07-05 2001-07-05

Publications (1)

Publication Number Publication Date
TW548303B true TW548303B (en) 2003-08-21

Family

ID=26917137

Family Applications (1)

Application Number Title Priority Date Filing Date
TW090118730A TW548303B (en) 2000-08-03 2001-08-01 Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith

Country Status (9)

Country Link
US (1) US6677392B2 (cg-RX-API-DMAC7.html)
EP (1) EP1305320B1 (cg-RX-API-DMAC7.html)
JP (1) JP4912561B2 (cg-RX-API-DMAC7.html)
KR (1) KR20030022347A (cg-RX-API-DMAC7.html)
AT (1) ATE327997T1 (cg-RX-API-DMAC7.html)
AU (1) AU2001293708A1 (cg-RX-API-DMAC7.html)
DE (1) DE60120178T2 (cg-RX-API-DMAC7.html)
TW (1) TW548303B (cg-RX-API-DMAC7.html)
WO (1) WO2002012252A1 (cg-RX-API-DMAC7.html)

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US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP2005343969A (ja) * 2004-06-01 2005-12-15 Showa Techno Coat Kk 紫外線遮蔽塗料
US7642303B2 (en) * 2004-10-15 2010-01-05 Shakely Thomas L Thermoplastic articles for packaging UV sensitive materials, processes for the articles production and use and novel UV absorbers
US7364672B2 (en) * 2004-12-06 2008-04-29 Arlon, Inc. Low loss prepregs, compositions useful for the preparation thereof and uses therefor
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JP4595061B2 (ja) * 2005-03-24 2010-12-08 東レ・モノフィラメント株式会社 工業布帛用ポリアミドステープルおよび工業布帛
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US20080009211A1 (en) * 2006-07-07 2008-01-10 Matthew Raymond Himes Assemblies useful for the preparation of electronic components and methods for making same
KR101228650B1 (ko) * 2006-07-21 2013-01-31 코니카 미놀타 어드밴스드 레이어즈 인코포레이티드 광학 필름, 그의 제조 방법, 편광판 및 액정 표시 장치
JP5190650B2 (ja) * 2007-02-14 2013-04-24 シプロ化成株式会社 ベンゾトリアゾール誘導体化合物
US8642246B2 (en) * 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US7772355B2 (en) 2008-01-28 2010-08-10 The United States Of America As Represented By The Secretary Of The Navy Divinylsilane-terminated aromatic ether-aromatic ketone-containing compounds
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5907588B2 (ja) * 2011-04-04 2016-04-26 関西ペイント株式会社 シルセスキオキサン化合物及びこれを含むコーティング組成物
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9530571B2 (en) * 2011-11-18 2016-12-27 Adeka Corporation Compound and support material supporting this novel compound
JP5910478B2 (ja) * 2012-12-07 2016-04-27 信越化学工業株式会社 樹脂用コーティング剤組成物
US9085692B1 (en) 2014-02-25 2015-07-21 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Synthesis of oligomeric divinyldialkylsilane containing compositions
TWI760297B (zh) 2014-11-20 2022-04-11 美商塞特工業公司 安定劑組合物及使用該組合物以保護有機材料抵抗ｕｖ光及熱降解之方法
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
JP6975705B2 (ja) 2015-07-07 2021-12-01 スリーエム イノベイティブ プロパティズ カンパニー 置換ベンゾトリアゾールフェノール
WO2017122503A1 (ja) 2016-01-12 2017-07-20 富士フイルム株式会社 組成物、膜、ガラス物品、化合物、高純度組成物、化合物の製造方法および膜の製造方法
CN111315797A (zh) 2017-11-10 2020-06-19 默克专利股份有限公司 有机半导体化合物
EP3578599A1 (en) 2018-06-08 2019-12-11 Cytec Industries Inc. Granular stabilizer compositions for use in polymer resins and methods of making same
KR102797624B1 (ko) * 2019-04-26 2025-04-21 미요시 유시 가부시끼가이샤 내열성과 장파장 흡수가 우수한 자외선 흡수제
CN111548659A (zh) * 2020-06-01 2020-08-18 烟台布莱特光电材料有限公司 一种新型的uv固化物及其制备的mini led荧光膜片
WO2024083872A1 (en) 2022-10-18 2024-04-25 Cytec Industries Inc. Synergistic stabilizer compositions and methods for using same for protecting organic materials from uv light and thermal degradation
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Also Published As

Publication number Publication date
KR20030022347A (ko) 2003-03-15
US6677392B2 (en) 2004-01-13
AU2001293708A1 (en) 2002-02-18
JP2004505984A (ja) 2004-02-26
DE60120178T2 (de) 2007-04-26
DE60120178D1 (de) 2006-07-06
US20020115753A1 (en) 2002-08-22
EP1305320A1 (en) 2003-05-02
EP1305320B1 (en) 2006-05-31
WO2002012252A1 (en) 2002-02-14
JP4912561B2 (ja) 2012-04-11
ATE327997T1 (de) 2006-06-15

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GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees