ATE322084T1 - Kondensator mit variabler kapazität - Google Patents

Kondensator mit variabler kapazität

Info

Publication number
ATE322084T1
ATE322084T1 AT01931828T AT01931828T ATE322084T1 AT E322084 T1 ATE322084 T1 AT E322084T1 AT 01931828 T AT01931828 T AT 01931828T AT 01931828 T AT01931828 T AT 01931828T AT E322084 T1 ATE322084 T1 AT E322084T1
Authority
AT
Austria
Prior art keywords
zones
type
recesses
regions
capacitor
Prior art date
Application number
AT01931828T
Other languages
English (en)
Inventor
Jean-Louis Sanchez
Jean-Pierre Laur
Hedi Hakim
Patrick Austin
Jean Jalade
Marie Breil
Original Assignee
Centre Nat Rech Scient
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre Nat Rech Scient filed Critical Centre Nat Rech Scient
Application granted granted Critical
Publication of ATE322084T1 publication Critical patent/ATE322084T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92Capacitors with potential-jump barrier or surface barrier
    • H01L29/93Variable capacitance diodes, e.g. varactors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0657Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0684Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
    • H01L29/0688Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions characterised by the particular shape of a junction between semiconductor regions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92Capacitors with potential-jump barrier or surface barrier
    • H01L29/94Metal-insulator-semiconductors, e.g. MOS

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Oscillators With Electromechanical Resonators (AREA)
  • Control Of Eletrric Generators (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
AT01931828T 2000-05-09 2001-05-09 Kondensator mit variabler kapazität ATE322084T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0005887A FR2808924B1 (fr) 2000-05-09 2000-05-09 Condenseur a capacite variable

Publications (1)

Publication Number Publication Date
ATE322084T1 true ATE322084T1 (de) 2006-04-15

Family

ID=8850021

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01931828T ATE322084T1 (de) 2000-05-09 2001-05-09 Kondensator mit variabler kapazität

Country Status (9)

Country Link
US (1) US6703681B2 (de)
EP (1) EP1287564B1 (de)
JP (1) JP4868683B2 (de)
AT (1) ATE322084T1 (de)
AU (1) AU2001258520A1 (de)
CA (1) CA2409683C (de)
DE (1) DE60118358T2 (de)
FR (1) FR2808924B1 (de)
WO (1) WO2001086729A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080157159A1 (en) * 2006-12-28 2008-07-03 International Business Machines Corporation Highly tunable metal-on-semiconductor varactor
US7989922B2 (en) * 2008-02-08 2011-08-02 International Business Machines Corporation Highly tunable metal-on-semiconductor trench varactor
CN102084488A (zh) * 2008-06-13 2011-06-01 昆南诺股份有限公司 纳米结构mos电容器
US8722503B2 (en) * 2010-07-16 2014-05-13 Texas Instruments Incorporated Capacitors and methods of forming
US9318485B2 (en) * 2012-08-10 2016-04-19 Infineon Technologies Ag Capacitor arrangements and method for manufacturing a capacitor arrangement
EP2999002A1 (de) * 2014-09-18 2016-03-23 Services Petroliers Schlumberger Kondensatorzelle und Verfahren zu ihrer Herstellung
CN117238974A (zh) * 2023-09-21 2023-12-15 扬州国宇电子有限公司 一种等差式多环区的超突变变容二极管及其制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1229093B (de) * 1963-01-23 1966-11-24 Basf Ag Verfahren zur Herstellung von Hexahydropyrimidinderivaten
GB1439351A (en) * 1972-06-02 1976-06-16 Texas Instruments Inc Capacitor
US4017885A (en) * 1973-10-25 1977-04-12 Texas Instruments Incorporated Large value capacitor
JPS5690566A (en) * 1979-12-24 1981-07-22 Mitsubishi Electric Corp Semiconductor device
JPS5816577A (ja) * 1981-07-23 1983-01-31 Clarion Co Ltd 半導体装置
JPS5933884A (ja) * 1982-08-19 1984-02-23 Matsushita Electronics Corp 可変容量ダイオ−ド
DE19631389A1 (de) * 1995-08-29 1997-03-06 Hewlett Packard Co Monolithischer spannungsvariabler Kondensator
JP3934352B2 (ja) * 2000-03-31 2007-06-20 Tdk株式会社 積層型セラミックチップコンデンサとその製造方法
US6484054B2 (en) * 2000-06-12 2002-11-19 Medtronic, Inc. Deep trench semiconductor capacitors having reverse bias diodes for implantable medical devices

Also Published As

Publication number Publication date
JP4868683B2 (ja) 2012-02-01
US20030183866A1 (en) 2003-10-02
WO2001086729A1 (fr) 2001-11-15
DE60118358D1 (de) 2006-05-18
EP1287564A1 (de) 2003-03-05
CA2409683C (en) 2010-02-23
CA2409683A1 (en) 2001-11-15
EP1287564B1 (de) 2006-03-29
AU2001258520A1 (en) 2001-11-20
FR2808924B1 (fr) 2002-08-16
JP2003535461A (ja) 2003-11-25
US6703681B2 (en) 2004-03-09
FR2808924A1 (fr) 2001-11-16
DE60118358T2 (de) 2006-12-14

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