ATE307846T1 - Verfahren zur herstellung feiner polymerpartikel und diese enthaltende lithographische druckplatte - Google Patents
Verfahren zur herstellung feiner polymerpartikel und diese enthaltende lithographische druckplatteInfo
- Publication number
- ATE307846T1 ATE307846T1 AT01130905T AT01130905T ATE307846T1 AT E307846 T1 ATE307846 T1 AT E307846T1 AT 01130905 T AT01130905 T AT 01130905T AT 01130905 T AT01130905 T AT 01130905T AT E307846 T1 ATE307846 T1 AT E307846T1
- Authority
- AT
- Austria
- Prior art keywords
- printing plate
- polymer particles
- water
- lithographic printing
- plate containing
- Prior art date
Links
- 229920000642 polymer Polymers 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002245 particle Substances 0.000 title 1
- 239000010419 fine particle Substances 0.000 abstract 3
- 239000002904 solvent Substances 0.000 abstract 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 3
- 239000008346 aqueous phase Substances 0.000 abstract 2
- 229920001600 hydrophobic polymer Polymers 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 abstract 1
- 230000000737 periodic effect Effects 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/12—Powdering or granulating
- C08J3/14—Powdering or granulating by precipitation from solutions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1025—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials using materials comprising a polymeric matrix containing a polymeric particulate material, e.g. hydrophobic heat coalescing particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/08—Developable by water or the fountain solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000401985A JP2002201283A (ja) | 2000-12-28 | 2000-12-28 | ポリマー微粒子の製造方法およびそれを用いた平版印刷用原板 |
JP2001031189A JP2002226597A (ja) | 2001-02-07 | 2001-02-07 | ポリマー微粒子の製造方法および平版印刷用原板 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE307846T1 true ATE307846T1 (de) | 2005-11-15 |
Family
ID=26607136
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01130905T ATE307846T1 (de) | 2000-12-28 | 2001-12-28 | Verfahren zur herstellung feiner polymerpartikel und diese enthaltende lithographische druckplatte |
Country Status (4)
Country | Link |
---|---|
US (1) | US6815137B2 (de) |
EP (1) | EP1219668B1 (de) |
AT (1) | ATE307846T1 (de) |
DE (1) | DE60114352T2 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6627556B1 (en) | 2002-04-24 | 2003-09-30 | Lsi Logic Corporation | Method of chemically altering a silicon surface and associated electrical devices |
JP4101632B2 (ja) * | 2002-11-01 | 2008-06-18 | 株式会社カネカ | 硬化性組成物および復元性、クリープ性改善方法 |
KR101020164B1 (ko) | 2003-07-17 | 2011-03-08 | 허니웰 인터내셔날 인코포레이티드 | 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법 |
JP4460929B2 (ja) * | 2004-03-19 | 2010-05-12 | 富士フイルム株式会社 | 平版印刷原版および平版印刷方法 |
US20090087783A1 (en) * | 2005-08-30 | 2009-04-02 | Mitsui Chemicals, Inc. | Original plate for lithography, and resin composition for photosensitive layer in original plate for lithography |
WO2007058373A1 (en) * | 2005-11-16 | 2007-05-24 | Fujifilm Corporation | Surface-hydrophilic structure |
JP5094081B2 (ja) * | 2005-11-17 | 2012-12-12 | 富士フイルム株式会社 | 親水性部材及びその製造方法 |
US7879526B2 (en) * | 2005-12-26 | 2011-02-01 | Cheil Industries, Inc. | Hardmask compositions for resist underlayer films |
GB0617859D0 (en) * | 2006-09-11 | 2006-10-18 | Syngenta Ltd | Compositions for photoprotection |
US8012591B2 (en) * | 2006-09-21 | 2011-09-06 | Fujifilm Corporation | Hydrophilic composition and hydrophilic member |
JP2008074972A (ja) * | 2006-09-21 | 2008-04-03 | Fujifilm Corp | 塗布組成物、親水性部材及びその製造方法 |
US20080177022A1 (en) * | 2006-09-29 | 2008-07-24 | Sumiaki Yamasaki | Hydrophilic film forming composition and hydrophilic member |
JP2008238711A (ja) * | 2007-03-28 | 2008-10-09 | Fujifilm Corp | 親水性部材及び下塗り組成物 |
DE102007018383A1 (de) * | 2007-04-17 | 2008-10-23 | Tesa Ag | Flächenförmiges Material mit hydrophilen und hydrophoben Bereichen und deren Herstellung |
US20090029179A1 (en) * | 2007-05-14 | 2009-01-29 | Fujifilm Corporation | Two-liquid composition, hydrophilic composition and hydrophilic member |
JP2009227809A (ja) * | 2008-03-21 | 2009-10-08 | Fujifilm Corp | 親水性組成物及び親水性処理部材 |
US8377624B2 (en) | 2009-03-27 | 2013-02-19 | Eastman Kodak Company | Negative-working thermal imageable elements |
JP6194003B2 (ja) | 2012-10-09 | 2017-09-06 | ザ プロクター アンド ギャンブル カンパニー | 有益剤及びこれを含む組成物の特定又は評価方法 |
CN110151591A (zh) | 2012-10-09 | 2019-08-23 | 宝洁公司 | 鉴定协同化妆品组合的方法 |
WO2014176344A1 (en) * | 2013-04-24 | 2014-10-30 | Momentive Specialty Chemicals Inc. | Method for preparing a sol-gel resin |
WO2014176367A2 (en) | 2013-04-24 | 2014-10-30 | Momentive Specialty Chemicals Inc. | Method for preparing a sol-gel resin |
JPWO2017002641A1 (ja) * | 2015-06-30 | 2017-12-07 | 富士フイルム株式会社 | 印刷用原版、平版印刷版、印刷用捨て版、及び、その積層体 |
US20210261807A1 (en) * | 2018-08-16 | 2021-08-26 | University Of Kansas | Self-healing, omniphobic coatings and related methods |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1242020A (fr) * | 1958-11-25 | 1960-09-23 | Hoechst Ag | Procédé pour isoler de leurs solutions des matières à haut poids moléculaire denature caoutchouteuse |
FR1424008A (fr) * | 1963-12-05 | 1966-01-07 | Gevaert Photo Prod Nv | Procédé d'enregistrement d'informations au moyen d'un matériel sensible à la chaleur et à la pression |
JPS523653A (en) * | 1975-06-27 | 1977-01-12 | Fuji Photo Film Co Ltd | Process for producing fine polymer particles |
GB9110417D0 (en) * | 1991-05-14 | 1991-07-03 | Du Pont Howson Ltd | Improvements in or relating to the formation of images |
US5417164A (en) * | 1991-07-24 | 1995-05-23 | Nippon Shokubai Co., Ltd. | Thermosensitive recording material and thermosensitive recording method |
JP3064807B2 (ja) | 1993-04-20 | 2000-07-12 | 旭化成工業株式会社 | 平版印刷原版およびその製版方法 |
WO1994023954A1 (en) | 1993-04-20 | 1994-10-27 | Asahi Kasei Kogyo Kabushiki Kaisha | Lithographic printing original plate and method for producing the same |
JPH1020541A (ja) * | 1996-07-04 | 1998-01-23 | Fuji Xerox Co Ltd | 画像形成材料及びその製造方法並びに画像記録体 |
DE69613470T2 (de) | 1996-09-25 | 2002-06-06 | Agfa-Gevaert N.V., Mortsel | Verfahren zur Herstellung einer lithographischen Druckplatte unter Verwendung eines wärme-empfindlichen Materials |
US6427595B1 (en) * | 1996-12-19 | 2002-08-06 | Agfa-Gevaert | Heat-sensitive imaging element for making lithographic printing plates comprising polymer particles with a specific particle size |
US5981151A (en) * | 1997-08-01 | 1999-11-09 | Agfa-Gevaert, N.V. | Photothermographic material and a method for producing lithographic plates therewith |
DE19781578C2 (de) | 1997-08-22 | 2001-11-15 | Mitsubishi Paper Mills Ltd | Bildgebendes Material, Verfahren zur Bildgebung, Verfahren zur Herstellung einer lithographischen Druckplatte und Anlage, die dafür verwendet wird, Verfahren zur Herstellung einer Platte für eine lithographische Druckplatte und Verfahren zur Herstellung einer gedruckten Leitungsplatte |
EP0925916B1 (de) | 1997-12-09 | 2002-04-10 | Agfa-Gevaert | Rückstandsfreies Aufzeichnungselement ohne Materialabtrag für die Herstellung von Flachdruckplatten mit unterschiedlicher Farbdichte zwischen Bild und Nicht-Bild |
DE69818659T2 (de) | 1998-07-31 | 2004-08-12 | Agfa-Gevaert | Verarbeitungsfreie thermische Flachdruckplatte mit definierter Nanostruktur |
JP3743604B2 (ja) | 1999-03-24 | 2006-02-08 | 富士写真フイルム株式会社 | 平版印刷用原板 |
US6653042B1 (en) | 1999-06-04 | 2003-11-25 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor, method for producing the same, and method of lithographic printing |
US6294595B1 (en) * | 1999-08-30 | 2001-09-25 | Nexpress Solutions Llc | Polymeric powders and method of preparation |
US6323251B1 (en) * | 1999-09-24 | 2001-11-27 | 3M Innovative Properties Co | Thermoplastic/thermoset hybrid foams and methods for making same |
-
2001
- 2001-12-28 DE DE60114352T patent/DE60114352T2/de not_active Expired - Lifetime
- 2001-12-28 US US10/028,356 patent/US6815137B2/en not_active Expired - Fee Related
- 2001-12-28 EP EP01130905A patent/EP1219668B1/de not_active Expired - Lifetime
- 2001-12-28 AT AT01130905T patent/ATE307846T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US6815137B2 (en) | 2004-11-09 |
EP1219668A2 (de) | 2002-07-03 |
EP1219668B1 (de) | 2005-10-26 |
EP1219668A3 (de) | 2003-10-29 |
DE60114352T2 (de) | 2006-07-20 |
DE60114352D1 (de) | 2005-12-01 |
US20020182529A1 (en) | 2002-12-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |