ATE268954T1 - Justierbare halterung für ein optisches element in einem gaslaser - Google Patents
Justierbare halterung für ein optisches element in einem gaslaserInfo
- Publication number
- ATE268954T1 ATE268954T1 AT01104173T AT01104173T ATE268954T1 AT E268954 T1 ATE268954 T1 AT E268954T1 AT 01104173 T AT01104173 T AT 01104173T AT 01104173 T AT01104173 T AT 01104173T AT E268954 T1 ATE268954 T1 AT E268954T1
- Authority
- AT
- Austria
- Prior art keywords
- laser
- optical element
- optical axis
- tube
- aperture
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/511,648 US6493375B1 (en) | 2000-02-22 | 2000-02-22 | Adjustable mounting unit for an optical element of a gas laser |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE268954T1 true ATE268954T1 (de) | 2004-06-15 |
Family
ID=24035810
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01104173T ATE268954T1 (de) | 2000-02-22 | 2001-02-21 | Justierbare halterung für ein optisches element in einem gaslaser |
Country Status (4)
Country | Link |
---|---|
US (1) | US6493375B1 (de) |
EP (1) | EP1130699B1 (de) |
AT (1) | ATE268954T1 (de) |
DE (1) | DE60103675T2 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6804284B1 (en) * | 2000-02-22 | 2004-10-12 | Tuilaser Ag | Optical element holding and extraction device |
US9502850B2 (en) * | 2013-03-26 | 2016-11-22 | Mitsubishi Electric Corporation | Gas laser device |
CN104966981B (zh) * | 2015-07-14 | 2018-03-13 | 京东方科技集团股份有限公司 | 激光器 |
US11670490B2 (en) * | 2017-09-29 | 2023-06-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Integrated circuit fabrication system with adjustable gas injector |
US10840066B2 (en) | 2018-06-13 | 2020-11-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Adjustable fastening device for plasma gas injectors |
CN113422278B (zh) * | 2021-06-04 | 2022-03-25 | 滨州学院 | 一种高倍频效率的绿激光器 |
CN115602393B (zh) * | 2022-10-11 | 2024-08-30 | 国网宁夏电力有限公司 | 一种提高盆式绝缘子沿面闪络电压的方法及铝高压电极 |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3400596A (en) | 1966-04-15 | 1968-09-10 | Spectra Physics | Adjustable optical element supporting apparatus |
US4746201A (en) | 1967-03-06 | 1988-05-24 | Gordon Gould | Polarizing apparatus employing an optical element inclined at brewster's angle |
US3753144A (en) | 1971-10-18 | 1973-08-14 | W Kearns | Gas laser structure |
DE2255048A1 (de) | 1972-11-10 | 1974-05-09 | Isco Optische Werke Gmbh | Kunststoff-fassung fuer objektive mit veraenderbarer brennweite |
US3886474A (en) | 1973-04-30 | 1975-05-27 | Coherent Radiation | Gas laser having an integral optical resonator with external stabilizing means |
US4423510A (en) | 1979-08-17 | 1983-12-27 | Westinghouse Electric Corp. | Laser tube design incorporating low inductance capacitor |
US4448385A (en) | 1981-05-12 | 1984-05-15 | Honeywell Inc. | Stable alignment mechanism for laser mirrors |
DE3130399A1 (de) | 1981-07-31 | 1983-02-17 | Siemens AG, 1000 Berlin und 8000 München | Optischer sender (laser) mit einer justiervorrichtung fuer einen reflektorspiegel des laserresonators |
JPS5861843A (ja) | 1981-09-12 | 1983-04-13 | Senichi Masuda | 極短パルス高電圧発生装置 |
DE3212928C2 (de) | 1982-04-07 | 1984-01-26 | Lambda Physik GmbH, 3400 Göttingen | Entladungsgepumpter Laser |
EP0166028A3 (de) | 1984-06-25 | 1987-04-22 | Siemens Aktiengesellschaft | Justiereinrichtung für einen Reflektorspiegel eines Laserresonators |
US4686685A (en) * | 1985-06-06 | 1987-08-11 | Laser Corporation Of America | Gas laser having thermally stable optical mount |
DE3541744A1 (de) | 1985-11-26 | 1987-05-27 | Heraeus Gmbh W C | Gaslaser |
JP2512137Y2 (ja) | 1986-03-28 | 1996-09-25 | 日本電気株式会社 | ガスレ−ザ発振器 |
DE3718467A1 (de) | 1987-06-02 | 1988-12-15 | Siemens Ag | Justiereinrichtung fuer ein optisches element |
US4891818A (en) | 1987-08-31 | 1990-01-02 | Acculase, Inc. | Rare gas-halogen excimer laser |
US5473162A (en) | 1987-10-26 | 1995-12-05 | Baylor University | Infrared emission detection of a gas |
JPH02250383A (ja) | 1989-03-24 | 1990-10-08 | Mitsubishi Heavy Ind Ltd | 部分反射鏡角度調整装置 |
EP0456875A1 (de) | 1990-05-18 | 1991-11-21 | Siemens Aktiengesellschaft | Wellenleiterlaser |
JPH05152643A (ja) | 1991-07-10 | 1993-06-18 | Mitsubishi Electric Corp | レーザ発振装置 |
DE4128776A1 (de) | 1991-08-29 | 1993-03-04 | Siemens Ag | Spiegelfassung fuer laser |
JPH0567823A (ja) | 1991-09-05 | 1993-03-19 | Nec Corp | 放電励起パルスガスレーザ装置 |
US5373523A (en) | 1992-10-15 | 1994-12-13 | Kabushiki Kaisha Komatsu Seisakusho | Excimer laser apparatus |
US5319663A (en) | 1992-12-18 | 1994-06-07 | Lumonics Inc. | Dust precipitation in a gas laser |
JPH06237034A (ja) | 1993-02-10 | 1994-08-23 | Nec Corp | 放電励起ガスレーザ装置 |
US5591317A (en) | 1994-02-16 | 1997-01-07 | Pitts, Jr.; M. Michael | Electrostatic device for water treatment |
US5438587A (en) | 1994-03-31 | 1995-08-01 | Spectranetics | Preionizer for laser assembly |
US5748663A (en) | 1994-06-08 | 1998-05-05 | Qsource, Inc. | Retangular discharge gas laser |
US5585641A (en) | 1995-05-23 | 1996-12-17 | The Regents Of The University Of California | Large area, surface discharge pumped, vacuum ultraviolet light source |
US5857775A (en) | 1995-09-05 | 1999-01-12 | Tyco Group S.A.R.L. | Thermometer probe having a watertight seal |
US5729564A (en) | 1996-07-31 | 1998-03-17 | Visx, Incorporated | Electrostatic precipitator for a gas discharge laser |
US5771258A (en) | 1997-02-11 | 1998-06-23 | Cymer, Inc. | Aerodynamic chamber design for high pulse repetition rate excimer lasers |
JP3932207B2 (ja) | 1997-03-14 | 2007-06-20 | デマリア エレクトロオプティックス システムズ アイエヌシー | 無線周波数励起導波レーザ |
US6018537A (en) | 1997-07-18 | 2000-01-25 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
DE29715466U1 (de) | 1997-08-28 | 1997-10-23 | TUI Laser GmbH, 82166 Gräfelfing | Resonatoranordnung für einen Laser |
DE29716875U1 (de) | 1997-09-19 | 1997-11-20 | TUI Laser AG, 82166 Gräfelfing | Excimerlaser |
US6151346A (en) | 1997-12-15 | 2000-11-21 | Cymer, Inc. | High pulse rate pulse power system with fast rise time and low current |
US6208674B1 (en) | 1998-09-18 | 2001-03-27 | Cymer, Inc. | Laser chamber with fully integrated electrode feedthrough main insulator |
US6359922B1 (en) | 1999-10-20 | 2002-03-19 | Cymer, Inc. | Single chamber gas discharge laser with line narrowed seed beam |
US6363094B1 (en) | 2000-06-09 | 2002-03-26 | Cymer, Inc. | Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects |
-
2000
- 2000-02-22 US US09/511,648 patent/US6493375B1/en not_active Expired - Lifetime
-
2001
- 2001-02-21 AT AT01104173T patent/ATE268954T1/de not_active IP Right Cessation
- 2001-02-21 EP EP01104173A patent/EP1130699B1/de not_active Expired - Lifetime
- 2001-02-21 DE DE60103675T patent/DE60103675T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1130699A2 (de) | 2001-09-05 |
US6493375B1 (en) | 2002-12-10 |
EP1130699A3 (de) | 2002-05-22 |
DE60103675D1 (de) | 2004-07-15 |
DE60103675T2 (de) | 2005-06-16 |
EP1130699B1 (de) | 2004-06-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |