DE60103675D1 - Justierbare Halterung für ein optisches Element in einem Gaslaser - Google Patents

Justierbare Halterung für ein optisches Element in einem Gaslaser

Info

Publication number
DE60103675D1
DE60103675D1 DE60103675T DE60103675T DE60103675D1 DE 60103675 D1 DE60103675 D1 DE 60103675D1 DE 60103675 T DE60103675 T DE 60103675T DE 60103675 T DE60103675 T DE 60103675T DE 60103675 D1 DE60103675 D1 DE 60103675D1
Authority
DE
Germany
Prior art keywords
laser
optical element
optical axis
tube
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60103675T
Other languages
English (en)
Other versions
DE60103675T2 (de
Inventor
Hans Kodeda
Helmut Frowein
Claus Strowitzki
Alexander Hohla
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TuiLaser AG
Original Assignee
TuiLaser AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TuiLaser AG filed Critical TuiLaser AG
Application granted granted Critical
Publication of DE60103675D1 publication Critical patent/DE60103675D1/de
Publication of DE60103675T2 publication Critical patent/DE60103675T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE60103675T 2000-02-22 2001-02-21 Justierbare Halterung für ein optisches Element in einem Gaslaser Expired - Lifetime DE60103675T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US511648 2000-02-22
US09/511,648 US6493375B1 (en) 2000-02-22 2000-02-22 Adjustable mounting unit for an optical element of a gas laser

Publications (2)

Publication Number Publication Date
DE60103675D1 true DE60103675D1 (de) 2004-07-15
DE60103675T2 DE60103675T2 (de) 2005-06-16

Family

ID=24035810

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60103675T Expired - Lifetime DE60103675T2 (de) 2000-02-22 2001-02-21 Justierbare Halterung für ein optisches Element in einem Gaslaser

Country Status (4)

Country Link
US (1) US6493375B1 (de)
EP (1) EP1130699B1 (de)
AT (1) ATE268954T1 (de)
DE (1) DE60103675T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6804284B1 (en) * 2000-02-22 2004-10-12 Tuilaser Ag Optical element holding and extraction device
WO2014156538A1 (ja) * 2013-03-26 2014-10-02 三菱電機株式会社 ガスレーザ装置
CN104966981B (zh) * 2015-07-14 2018-03-13 京东方科技集团股份有限公司 激光器
US11670490B2 (en) * 2017-09-29 2023-06-06 Taiwan Semiconductor Manufacturing Co., Ltd. Integrated circuit fabrication system with adjustable gas injector
US10840066B2 (en) 2018-06-13 2020-11-17 Taiwan Semiconductor Manufacturing Co., Ltd. Adjustable fastening device for plasma gas injectors
CN113422278B (zh) * 2021-06-04 2022-03-25 滨州学院 一种高倍频效率的绿激光器

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3400596A (en) 1966-04-15 1968-09-10 Spectra Physics Adjustable optical element supporting apparatus
US4746201A (en) 1967-03-06 1988-05-24 Gordon Gould Polarizing apparatus employing an optical element inclined at brewster's angle
US3753144A (en) 1971-10-18 1973-08-14 W Kearns Gas laser structure
DE2255048A1 (de) 1972-11-10 1974-05-09 Isco Optische Werke Gmbh Kunststoff-fassung fuer objektive mit veraenderbarer brennweite
US3886474A (en) 1973-04-30 1975-05-27 Coherent Radiation Gas laser having an integral optical resonator with external stabilizing means
US4423510A (en) 1979-08-17 1983-12-27 Westinghouse Electric Corp. Laser tube design incorporating low inductance capacitor
US4448385A (en) 1981-05-12 1984-05-15 Honeywell Inc. Stable alignment mechanism for laser mirrors
DE3130399A1 (de) 1981-07-31 1983-02-17 Siemens AG, 1000 Berlin und 8000 München Optischer sender (laser) mit einer justiervorrichtung fuer einen reflektorspiegel des laserresonators
JPS5861843A (ja) 1981-09-12 1983-04-13 Senichi Masuda 極短パルス高電圧発生装置
DE3212928C2 (de) 1982-04-07 1984-01-26 Lambda Physik GmbH, 3400 Göttingen Entladungsgepumpter Laser
EP0166028A3 (de) 1984-06-25 1987-04-22 Siemens Aktiengesellschaft Justiereinrichtung für einen Reflektorspiegel eines Laserresonators
US4686685A (en) * 1985-06-06 1987-08-11 Laser Corporation Of America Gas laser having thermally stable optical mount
DE3541744A1 (de) 1985-11-26 1987-05-27 Heraeus Gmbh W C Gaslaser
JP2512137Y2 (ja) 1986-03-28 1996-09-25 日本電気株式会社 ガスレ−ザ発振器
DE3718467A1 (de) 1987-06-02 1988-12-15 Siemens Ag Justiereinrichtung fuer ein optisches element
US4891818A (en) 1987-08-31 1990-01-02 Acculase, Inc. Rare gas-halogen excimer laser
US5473162A (en) 1987-10-26 1995-12-05 Baylor University Infrared emission detection of a gas
JPH02250383A (ja) 1989-03-24 1990-10-08 Mitsubishi Heavy Ind Ltd 部分反射鏡角度調整装置
EP0456875A1 (de) 1990-05-18 1991-11-21 Siemens Aktiengesellschaft Wellenleiterlaser
JPH05152643A (ja) 1991-07-10 1993-06-18 Mitsubishi Electric Corp レーザ発振装置
DE4128776A1 (de) 1991-08-29 1993-03-04 Siemens Ag Spiegelfassung fuer laser
JPH0567823A (ja) 1991-09-05 1993-03-19 Nec Corp 放電励起パルスガスレーザ装置
US5373523A (en) 1992-10-15 1994-12-13 Kabushiki Kaisha Komatsu Seisakusho Excimer laser apparatus
US5319663A (en) 1992-12-18 1994-06-07 Lumonics Inc. Dust precipitation in a gas laser
JPH06237034A (ja) 1993-02-10 1994-08-23 Nec Corp 放電励起ガスレーザ装置
US5591317A (en) 1994-02-16 1997-01-07 Pitts, Jr.; M. Michael Electrostatic device for water treatment
US5438587A (en) 1994-03-31 1995-08-01 Spectranetics Preionizer for laser assembly
US5748663A (en) 1994-06-08 1998-05-05 Qsource, Inc. Retangular discharge gas laser
US5585641A (en) 1995-05-23 1996-12-17 The Regents Of The University Of California Large area, surface discharge pumped, vacuum ultraviolet light source
US5857775A (en) 1995-09-05 1999-01-12 Tyco Group S.A.R.L. Thermometer probe having a watertight seal
US5729564A (en) 1996-07-31 1998-03-17 Visx, Incorporated Electrostatic precipitator for a gas discharge laser
US5771258A (en) 1997-02-11 1998-06-23 Cymer, Inc. Aerodynamic chamber design for high pulse repetition rate excimer lasers
AU6939198A (en) 1997-03-14 1998-09-29 Demaria Electrooptics Systems Inc. Rf excited waveguide laser
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
DE29715466U1 (de) 1997-08-28 1997-10-23 Tui Laser Gmbh Resonatoranordnung für einen Laser
DE29716875U1 (de) 1997-09-19 1997-11-20 Tui Laser Ag Excimerlaser
US6151346A (en) 1997-12-15 2000-11-21 Cymer, Inc. High pulse rate pulse power system with fast rise time and low current
US6208674B1 (en) 1998-09-18 2001-03-27 Cymer, Inc. Laser chamber with fully integrated electrode feedthrough main insulator
US6359922B1 (en) 1999-10-20 2002-03-19 Cymer, Inc. Single chamber gas discharge laser with line narrowed seed beam
US6363094B1 (en) 2000-06-09 2002-03-26 Cymer, Inc. Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects

Also Published As

Publication number Publication date
ATE268954T1 (de) 2004-06-15
US6493375B1 (en) 2002-12-10
DE60103675T2 (de) 2005-06-16
EP1130699A3 (de) 2002-05-22
EP1130699B1 (de) 2004-06-09
EP1130699A2 (de) 2001-09-05

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Legal Events

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8364 No opposition during term of opposition