ATE204030T1 - Verfahren zur herstellung einer hartstoffschutzschicht - Google Patents

Verfahren zur herstellung einer hartstoffschutzschicht

Info

Publication number
ATE204030T1
ATE204030T1 AT95939327T AT95939327T ATE204030T1 AT E204030 T1 ATE204030 T1 AT E204030T1 AT 95939327 T AT95939327 T AT 95939327T AT 95939327 T AT95939327 T AT 95939327T AT E204030 T1 ATE204030 T1 AT E204030T1
Authority
AT
Austria
Prior art keywords
pct
producing
protective layer
hard material
date
Prior art date
Application number
AT95939327T
Other languages
English (en)
Inventor
Stephane Neuville
Original Assignee
Plasma Innovation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasma Innovation filed Critical Plasma Innovation
Application granted granted Critical
Publication of ATE204030T1 publication Critical patent/ATE204030T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0658—Carbon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/347—Carbon nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Glass Compositions (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Carbon And Carbon Compounds (AREA)
AT95939327T 1994-11-07 1995-11-06 Verfahren zur herstellung einer hartstoffschutzschicht ATE204030T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9413323A FR2726579A1 (fr) 1994-11-07 1994-11-07 Procede de depot d'un revetement protecteur de type pseudo carbonne diamant amorphe
PCT/FR1995/001455 WO1996014448A1 (fr) 1994-11-07 1995-11-06 Procede de depot d'un revetement protecteur de grande durete

Publications (1)

Publication Number Publication Date
ATE204030T1 true ATE204030T1 (de) 2001-08-15

Family

ID=9468576

Family Applications (1)

Application Number Title Priority Date Filing Date
AT95939327T ATE204030T1 (de) 1994-11-07 1995-11-06 Verfahren zur herstellung einer hartstoffschutzschicht

Country Status (9)

Country Link
US (1) US5846613A (de)
EP (1) EP0787222B1 (de)
CN (1) CN1053931C (de)
AT (1) ATE204030T1 (de)
AU (1) AU4119696A (de)
DE (1) DE69522115T2 (de)
ES (1) ES2162639T3 (de)
FR (1) FR2726579A1 (de)
WO (1) WO1996014448A1 (de)

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DE19646475A1 (de) * 1996-11-11 1998-05-14 Notter Werkzeugbau Gmbh Tablettierwerkzeug mit adhäsionshemmender Beschichtung
DE19651953A1 (de) * 1996-12-13 1998-07-02 Bayer Bitterfeld Gmbh Vorrichtung zum Verpressen von fließfähigen Feststoffen oder halbfesten Stoffen
IT1289815B1 (it) * 1996-12-30 1998-10-16 Sorin Biomedica Cardio Spa Stent per angioplastica e relativo procedimento di produzione
JPH10330932A (ja) * 1997-05-28 1998-12-15 Anelva Corp スパッタリング装置
ATA119098A (de) * 1998-07-09 1999-05-15 Ims Ionen Mikrofab Syst Verfahren zur erzeugung eines kohlenstoffilmes auf einem substrat
GB2342660B (en) * 1998-10-12 2000-09-27 Univ Houston Process for producing a carbon film on a substrate
US6660365B1 (en) 1998-12-21 2003-12-09 Cardinal Cg Company Soil-resistant coating for glass surfaces
US6461731B1 (en) 1999-05-03 2002-10-08 Guardian Industries Corp. Solar management coating system including protective DLC
US6261693B1 (en) 1999-05-03 2001-07-17 Guardian Industries Corporation Highly tetrahedral amorphous carbon coating on glass
US6312808B1 (en) 1999-05-03 2001-11-06 Guardian Industries Corporation Hydrophobic coating with DLC & FAS on substrate
US6447891B1 (en) 1999-05-03 2002-09-10 Guardian Industries Corp. Low-E coating system including protective DLC
US6475573B1 (en) 1999-05-03 2002-11-05 Guardian Industries Corp. Method of depositing DLC inclusive coating on substrate
US6368664B1 (en) 1999-05-03 2002-04-09 Guardian Industries Corp. Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon
US6338901B1 (en) 1999-05-03 2002-01-15 Guardian Industries Corporation Hydrophobic coating including DLC on substrate
US6335086B1 (en) 1999-05-03 2002-01-01 Guardian Industries Corporation Hydrophobic coating including DLC on substrate
US6280834B1 (en) 1999-05-03 2001-08-28 Guardian Industries Corporation Hydrophobic coating including DLC and/or FAS on substrate
US6277480B1 (en) 1999-05-03 2001-08-21 Guardian Industries Corporation Coated article including a DLC inclusive layer(s) and a layer(s) deposited using siloxane gas, and corresponding method
GB9910841D0 (en) * 1999-05-10 1999-07-07 Univ Nanyang Heat transfer surface
US6265305B1 (en) * 1999-10-01 2001-07-24 United Microelectronics Corp. Method of preventing corrosion of a titanium layer in a semiconductor wafer
DE10002861A1 (de) * 2000-01-24 2001-08-09 Walter Ag Zerspannungswerkzeug mit Carbonitrid-Beschichtung
DE10056242A1 (de) * 2000-11-14 2002-05-23 Alstom Switzerland Ltd Kondensationswärmeübertrager
US6537429B2 (en) 2000-12-29 2003-03-25 Lam Research Corporation Diamond coatings on reactor wall and method of manufacturing thereof
JP5013353B2 (ja) * 2001-03-28 2012-08-29 隆 杉野 成膜方法及び成膜装置
JP4153212B2 (ja) * 2002-02-04 2008-09-24 富士通株式会社 テトラヘドラルアモルファスカーボン膜およびその製造方法
FR2867247B1 (fr) * 2004-03-05 2006-06-02 Skf Ab Dispositif de galet tendeur
JPWO2006001340A1 (ja) * 2004-06-23 2008-04-17 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 両面研磨用キャリアおよびその製造方法
JP2008505842A (ja) 2004-07-12 2008-02-28 日本板硝子株式会社 低保守コーティング
DE102004041235A1 (de) * 2004-08-26 2006-03-02 Ina-Schaeffler Kg Verschleißfeste Beschichtung und Verfahren zur Herstellung derselben
US7923114B2 (en) 2004-12-03 2011-04-12 Cardinal Cg Company Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
US8092660B2 (en) 2004-12-03 2012-01-10 Cardinal Cg Company Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films
CN1870863B (zh) * 2005-05-28 2011-06-08 鸿富锦精密工业（深圳）有限公司 便携式电子装置外壳及其制作方法
TWI386494B (zh) * 2005-11-18 2013-02-21 Hon Hai Prec Ind Co Ltd 一種具有多層鍍膜之模具
CN1970827B (zh) * 2005-11-25 2010-05-05 鸿富锦精密工业（深圳）有限公司 一种具有多层类金刚石碳膜的模具的制作方法
CN100390316C (zh) * 2006-01-19 2008-05-28 上海电机学院 n型CVD共掺杂金刚石薄膜的制备方法
WO2007124291A2 (en) 2006-04-19 2007-11-01 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US8646444B2 (en) * 2007-03-27 2014-02-11 Electrolux Home Products, Inc. Glide rack
WO2009036263A2 (en) 2007-09-14 2009-03-19 Cardinal Cg Company Low-maintenance coating technology
KR100991770B1 (ko) * 2010-03-15 2010-11-03 한국과학기술연구원 입방정계 질화붕소 박막의 증착 방법
CN103160781B (zh) * 2011-12-16 2015-07-01 中国科学院兰州化学物理研究所 模具钢表面多层梯度纳米复合类金刚石薄膜的制备方法
CN102816913B (zh) * 2012-09-04 2013-11-13 北京理工大学 一种利用超音速颗粒轰击技术提高非晶合金塑性的方法
EP3541762B1 (de) 2016-11-17 2022-03-02 Cardinal CG Company Statisch-dissipative beschichtungstechnologie
CN109994351B (zh) * 2018-01-02 2021-07-13 台湾积体电路制造股份有限公司 离子布植机及离子布植机腔室的制造方法
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DE3941202A1 (de) * 1989-12-14 1990-06-07 Fried. Krupp Gmbh, 4300 Essen Verfahren zur erzeugung von schichten aus harten kohlenstoffmodifikationen und vorrichtung zur durchfuehrung des verfahrens
DE4113791A1 (de) * 1991-04-26 1992-10-29 Solvay Deutschland Verfahren zur abscheidung einer bor und stickstoff enthaltenden schicht

Also Published As

Publication number Publication date
EP0787222A1 (de) 1997-08-06
DE69522115T2 (de) 2002-04-25
CN1169757A (zh) 1998-01-07
AU4119696A (en) 1996-05-31
ES2162639T3 (es) 2002-01-01
WO1996014448A1 (fr) 1996-05-17
EP0787222B1 (de) 2001-08-08
CN1053931C (zh) 2000-06-28
US5846613A (en) 1998-12-08
DE69522115D1 (de) 2001-09-13
FR2726579A1 (fr) 1996-05-10

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