AR071923A1 - Disposicion de plasma - Google Patents

Disposicion de plasma

Info

Publication number
AR071923A1
AR071923A1 ARP090100853A ARP090100853A AR071923A1 AR 071923 A1 AR071923 A1 AR 071923A1 AR P090100853 A ARP090100853 A AR P090100853A AR P090100853 A ARP090100853 A AR P090100853A AR 071923 A1 AR071923 A1 AR 071923A1
Authority
AR
Argentina
Prior art keywords
plasma
arrangement
provision
plasma provision
pecvd
Prior art date
Application number
ARP090100853A
Other languages
English (en)
Inventor
Ricardo Enrique Biana
Original Assignee
Biana Luis Santiago
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Biana Luis Santiago filed Critical Biana Luis Santiago
Publication of AR071923A1 publication Critical patent/AR071923A1/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Disposicion para deposicion qu¡mica mejorada por plasma (PECVD) en donde superficies selectivas de substratos tubulares pueden ser tratadas para depositar de un material deseado, en donde uno de los electrodos empleados en la disposicion de plasma est  conformado por el substrato o pieza de trabajo sin la necesidad de contar con reactores de plasma voluminosos y capaz de rotar sobre un eje central.
ARP090100853A 2008-03-12 2009-03-11 Disposicion de plasma AR071923A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2008/001967 WO2009112053A1 (en) 2008-03-12 2008-03-12 Plasma system

Publications (1)

Publication Number Publication Date
AR071923A1 true AR071923A1 (es) 2010-07-28

Family

ID=39865243

Family Applications (1)

Application Number Title Priority Date Filing Date
ARP090100853A AR071923A1 (es) 2008-03-12 2009-03-11 Disposicion de plasma

Country Status (13)

Country Link
US (1) US8505480B2 (es)
EP (1) EP2253008B1 (es)
JP (1) JP5458445B2 (es)
KR (1) KR101514479B1 (es)
CN (1) CN101971288B (es)
AR (1) AR071923A1 (es)
BR (1) BRPI0822520B1 (es)
CA (1) CA2718253C (es)
DK (1) DK2253008T3 (es)
ES (1) ES2621951T3 (es)
MX (1) MX2010009997A (es)
RU (1) RU2476953C2 (es)
WO (1) WO2009112053A1 (es)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2476953C2 (ru) 2008-03-12 2013-02-27 Алитус Корпорейшн, С.А. Плазменная система
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
MX345403B (es) 2009-05-13 2017-01-30 Sio2 Medical Products Inc Revestimiento por pecvd utilizando un precursor organosilícico.
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US8715789B2 (en) * 2009-12-18 2014-05-06 Sub-One Technology, Inc. Chemical vapor deposition for an interior of a hollow article with high aspect ratio
CN102238795A (zh) * 2010-04-28 2011-11-09 盐城豪瑞达实业有限公司 一种惰性气体保护电弧等离子体石墨电极抗氧化烧蚀损耗的技术
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
EP2683836B1 (en) * 2011-03-10 2021-02-17 Kaiatech, Inc. Method and apparatus for treating containers
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US20120312233A1 (en) * 2011-06-10 2012-12-13 Ge Yi Magnetically Enhanced Thin Film Coating Method and Apparatus
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
EP2776603B1 (en) 2011-11-11 2019-03-06 SiO2 Medical Products, Inc. PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
DE102012103425A1 (de) * 2012-04-19 2013-10-24 Roth & Rau Ag Mikrowellenplasmaerzeugungsvorrichtung und Verfahren zu deren Betrieb
CA2887352A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
CN102905455A (zh) * 2012-10-17 2013-01-30 浙江理工大学 对织物或聚合物薄膜连续聚合改性的大气压等离子体系统
EP2914762B1 (en) 2012-11-01 2020-05-13 SiO2 Medical Products, Inc. Coating inspection method
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
CN102942950B (zh) * 2012-11-16 2015-01-28 中科合成油技术有限公司 一种提质重质碳氢化合物生产轻质油品的方法及其等离子体加氢反应器
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
KR102472240B1 (ko) 2013-03-11 2022-11-30 에스아이오2 메디컬 프로덕츠, 인크. 코팅된 패키징
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
WO2014144926A1 (en) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Coating method
JP6277398B2 (ja) * 2013-08-27 2018-02-14 株式会社ユーテック プラズマｃｖｄ装置及び配管内の成膜方法
US11326254B2 (en) 2014-03-03 2022-05-10 Picosun Oy Protecting an interior of a gas container with an ALD coating
US10329662B2 (en) 2014-03-03 2019-06-25 Picosun Oy Protecting an interior of a hollow body with an ALD coating
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
KR101594904B1 (ko) * 2014-09-19 2016-02-18 재단법인 포항산업과학연구원 플라즈마 코팅장치
US11077233B2 (en) 2015-08-18 2021-08-03 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
CN108559977B (zh) * 2018-01-22 2020-11-20 大连理工大学 一种在细长金属管内壁低温涂层的方法及设备
CN108601192B (zh) * 2018-06-25 2019-07-12 超力等离子技术(常州)有限公司 一种等离子发生器
JP6595671B2 (ja) * 2018-07-20 2019-10-23 ピコサン オーワイ Ａｌｄコーティングによる中空ボディ内面の保護
US11371145B2 (en) 2019-03-15 2022-06-28 Halliburton Energy Services, Inc. Depositing coatings on and within a housing, apparatus, or tool using a coating system positioned therein
US11371137B2 (en) 2019-03-15 2022-06-28 Halliburton Energy Services, Inc. Depositing coatings on and within housings, apparatus, or tools
CN110331373A (zh) * 2019-07-04 2019-10-15 国家电网有限公司 一种实现固体绝缘件表面电导率调控的装置及方法
CN113124683B (zh) * 2020-01-15 2022-09-27 株洲弗拉德科技有限公司 一种带上料器真空气相沉积炉
US11788189B2 (en) 2020-08-27 2023-10-17 Halliburton Energy Services, Inc. Depositing coatings on and within housings, apparatus, or tools utilizing pressurized cells
US11788187B2 (en) 2020-08-27 2023-10-17 Halliburton Energy Services, Inc. Depositing coatings on and within housings, apparatus, or tools utilizing counter current flow of reactants
WO2024091420A1 (en) * 2022-10-24 2024-05-02 Lam Research Corporation Showerhead with three plenums

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2030180B (en) * 1978-01-26 1983-05-25 Secr Defence Vapour deposition of metal in plasma discharge
IL74787A (en) * 1985-04-02 1988-12-30 Univ Ramot Method of depositing heat-reflecting coatings on tube and apparatus useful in such method
US5391232A (en) * 1985-12-26 1995-02-21 Canon Kabushiki Kaisha Device for forming a deposited film
JPH0651908B2 (ja) * 1985-12-28 1994-07-06 キヤノン株式会社 薄膜多層構造の形成方法
US5322568A (en) * 1985-12-28 1994-06-21 Canon Kabushiki Kaisha Apparatus for forming deposited film
JPS62167882A (ja) * 1986-01-20 1987-07-24 Nippon Kokan Kk <Nkk> 移動電極式コ−テイング方法
JPS62167887A (ja) * 1986-01-20 1987-07-24 Nippon Kokan Kk <Nkk> 加熱式コ−テイング装置
JPS62170477A (ja) * 1986-01-22 1987-07-27 Nippon Kokan Kk <Nkk> 管内外面のコ−テイング方法
JPS6326373A (ja) * 1986-07-18 1988-02-03 Kobe Steel Ltd プラズマｃｖｄによる管内面のコ−テイング方法
JPH05124841A (ja) * 1991-06-12 1993-05-21 Sumitomo Electric Ind Ltd ハーメチツクコート光フアイバの製造方法
MX9303141A (es) * 1992-05-28 1994-04-29 Polar Materials Inc Metodos y aparatos para depositar recubrimientos de barrera.
US5308649A (en) * 1992-06-26 1994-05-03 Polar Materials, Inc. Methods for externally treating a container with application of internal bias gas
JPH06326373A (ja) 1993-05-10 1994-11-25 Toyota Autom Loom Works Ltd 磁気抵抗半導体装置
US6112695A (en) * 1996-10-08 2000-09-05 Nano Scale Surface Systems, Inc. Apparatus for plasma deposition of a thin film onto the interior surface of a container
JP3684011B2 (ja) * 1996-12-12 2005-08-17 キヤノン株式会社 プラズマｃｖｄ法による堆積膜形成方法及び装置
DE19722272A1 (de) * 1997-05-28 1998-12-03 Leybold Systems Gmbh Vorrichtung zur Erzeugung von Plasma
JP3844274B2 (ja) * 1998-06-25 2006-11-08 独立行政法人産業技術総合研究所 プラズマｃｖｄ装置及びプラズマｃｖｄ方法
US6641673B2 (en) * 2000-12-20 2003-11-04 General Electric Company Fluid injector for and method of prolonged delivery and distribution of reagents into plasma
US7052736B2 (en) * 2002-06-11 2006-05-30 Southwest Research Institute Method for depositing coatings on the interior surfaces of tubular structures
US7300684B2 (en) * 2004-07-15 2007-11-27 Sub-One Technology, Inc. Method and system for coating internal surfaces of prefabricated process piping in the field
JP4664658B2 (ja) * 2004-12-02 2011-04-06 麒麟麦酒株式会社 プラズマｃｖｄ成膜装置及びガスバリア性を有するプラスチック容器の製造方法
US7608151B2 (en) 2005-03-07 2009-10-27 Sub-One Technology, Inc. Method and system for coating sections of internal surfaces
JP5260050B2 (ja) * 2005-05-27 2013-08-14 麒麟麦酒株式会社 ガスバリア性プラスチック容器の製造装置及びその容器の製造方法
RU2311492C1 (ru) * 2006-04-28 2007-11-27 Виктор Иванович Чайрев Устройство для высокоскоростного магнетронного распыления
JP4382784B2 (ja) * 2006-08-17 2009-12-16 ふくはうちテクノロジー株式会社 ダイヤモンドライクカーボン膜の製膜装置
MY154004A (en) * 2007-05-23 2015-04-30 Southwest Res Inst Plasma immersion ion processing fro coating of hollow substrates
RU2476953C2 (ru) 2008-03-12 2013-02-27 Алитус Корпорейшн, С.А. Плазменная система

Also Published As

Publication number Publication date
CN101971288A (zh) 2011-02-09
EP2253008A1 (en) 2010-11-24
ES2621951T3 (es) 2017-07-05
US8505480B2 (en) 2013-08-13
MX2010009997A (es) 2010-12-14
KR101514479B1 (ko) 2015-04-22
CN101971288B (zh) 2012-09-05
DK2253008T3 (en) 2017-05-08
RU2010140972A (ru) 2012-04-20
WO2009112053A1 (en) 2009-09-17
CA2718253A1 (en) 2009-09-17
EP2253008B1 (en) 2017-02-01
RU2476953C2 (ru) 2013-02-27
KR20110006655A (ko) 2011-01-20
JP5458445B2 (ja) 2014-04-02
BRPI0822520B1 (pt) 2019-05-21
BRPI0822520A2 (pt) 2015-06-16
US20110030617A1 (en) 2011-02-10
JP2011513593A (ja) 2011-04-28
CA2718253C (en) 2016-04-19

Similar Documents

Publication Publication Date Title
AR071923A1 (es) Disposicion de plasma
WO2012112584A3 (en) Atomic layer deposition using radicals of gas mixture
WO2013039881A3 (en) Carbosilane precursors for low temperature film deposition
ATE502690T1 (de) Oberflächenplasmagasverarbeitung
WO2012145492A3 (en) Apparatus for deposition of materials on a substrate
WO2011028349A3 (en) Remote hydrogen plasma source of silicon containing film deposition
WO2010095901A3 (en) Method for forming thin film using radicals generated by plasma
WO2011028377A3 (en) High concentration water pulses for atomic layer deposition
EA201100298A1 (ru) Источник плазмы и способы нанесения тонкопленочных покрытий с использованием плазменно-химического осаждения из газовой фазы
WO2012118955A3 (en) Apparatus and process for atomic layer deposition
WO2012034925A8 (en) Diamond electrodes for electrochemical devices
WO2011130017A3 (en) Multi-layer sin for functional and optical graded arc layers on crystalline solar cells
ATE510044T1 (de) Verfahren zur präzisionsbearbeitung von substraten und dessen verwendung
WO2010120411A3 (en) Pulsed plasma deposition for forming microcrystalline silicon layer for solar applications
JP2011023714A5 (ja) プラズマ成膜装置
WO2013154504A3 (en) Microwave plasma chemical vapour deposition apparatus
CL2017001716A1 (es) Técnicas de recubrimiento de barrera contra gas y artículos producidos mediante las mismas.
MY168836A (en) Coating fluid for boron diffusion
TW201130155A (en) Thin film and method of forming the same, and semiconductor light emitting device having the thin film
BR112012014980A2 (pt) célula solar película fina de silíco tendo turvação aperfeiçoada e métodos de fabricar a mesma.
JP2012188735A5 (es)
JP2012182447A5 (ja) 半導体膜の作製方法
NZ720017A (en) Photovoltaic systems and spray coating processes for producing photovoltaic systems
AR092977A1 (es) Composiciones de recubrimiento y procesos para preparar las mismas
EP3061845A3 (en) Metal organic chemical vapor deposition apparatus for solar cell

Legal Events

Date Code Title Description
FG Grant, registration