ZA989812B - Improvements in relation to the manufacture of lithographic printing forms - Google Patents
Improvements in relation to the manufacture of lithographic printing formsInfo
- Publication number
- ZA989812B ZA989812B ZA989812A ZA989812A ZA989812B ZA 989812 B ZA989812 B ZA 989812B ZA 989812 A ZA989812 A ZA 989812A ZA 989812 A ZA989812 A ZA 989812A ZA 989812 B ZA989812 B ZA 989812B
- Authority
- ZA
- South Africa
- Prior art keywords
- relation
- manufacture
- lithographic printing
- printing forms
- forms
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
- B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/165—Thermal imaging composition
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9722861.3A GB9722861D0 (en) | 1997-10-29 | 1997-10-29 | Improvements in relation to the manufacture of lithographic printing forms |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA989812B true ZA989812B (en) | 1999-05-04 |
Family
ID=10821273
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA989812A ZA989812B (en) | 1997-10-29 | 1998-10-28 | Improvements in relation to the manufacture of lithographic printing forms |
Country Status (9)
Country | Link |
---|---|
US (1) | US6461795B1 (xx) |
EP (1) | EP1024958B1 (xx) |
JP (1) | JP4643002B2 (xx) |
AU (1) | AU9553098A (xx) |
BR (1) | BR9814054B1 (xx) |
DE (1) | DE69810804T2 (xx) |
GB (1) | GB9722861D0 (xx) |
WO (1) | WO1999021715A1 (xx) |
ZA (1) | ZA989812B (xx) |
Families Citing this family (68)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9722861D0 (en) * | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Improvements in relation to the manufacture of lithographic printing forms |
EP1452312A1 (en) | 1997-10-17 | 2004-09-01 | Fuji Photo Film Co., Ltd. | A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser |
GB9722862D0 (en) * | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Pattern formation |
US6534238B1 (en) | 1998-06-23 | 2003-03-18 | Kodak Polychrome Graphics, Llc | Thermal digital lithographic printing plate |
US6352811B1 (en) | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
EP1159133B1 (en) | 1998-11-16 | 2003-04-09 | Mitsubishi Chemical Corporation | Positive-working photosensitive lithographic printing plate and method for producing the same |
CA2314520A1 (en) * | 1999-07-30 | 2001-01-30 | Domenico Tiefenthaler | Composition sensitive to ir radiation and to heat and lithographic plate coated therewith |
US6706466B1 (en) | 1999-08-03 | 2004-03-16 | Kodak Polychrome Graphics Llc | Articles having imagable coatings |
US6461794B1 (en) | 1999-08-11 | 2002-10-08 | Kodak Polychrome Graphics Llc | Lithographic printing forms |
US6391524B2 (en) | 1999-11-19 | 2002-05-21 | Kodak Polychrome Graphics Llc | Article having imagable coatings |
US6296982B1 (en) | 1999-11-19 | 2001-10-02 | Kodak Polychrome Graphics Llc | Imaging articles |
US6300038B1 (en) | 1999-11-19 | 2001-10-09 | Kodak Polychrome Graphics Llc | Articles having imagable coatings |
US6692896B2 (en) * | 2000-03-01 | 2004-02-17 | Fuji Photo Film Co., Ltd. | Heat mode-compatible planographic printing plate |
JP4137345B2 (ja) | 2000-06-05 | 2008-08-20 | 富士フイルム株式会社 | 平版印刷版原版 |
JP4233199B2 (ja) * | 2000-06-30 | 2009-03-04 | 富士フイルム株式会社 | 平版印刷版の製造方法 |
EP1307341B1 (en) | 2000-08-04 | 2007-04-04 | Kodak Polychrome Graphics Company Ltd. | Lithographic printing form and method of preparation and use thereof |
US6649324B1 (en) * | 2000-08-14 | 2003-11-18 | Kodak Polychrome Graphics Llc | Aqueous developer for lithographic printing plates |
WO2002034517A1 (en) | 2000-10-26 | 2002-05-02 | Kodak Polychrome Graphics Company, Ltd. | Compositions comprising a pigment |
US6777164B2 (en) | 2001-04-06 | 2004-08-17 | Kodak Polychrome Graphics Llc | Lithographic printing forms |
EP1256444B1 (en) | 2001-04-09 | 2004-06-30 | Agfa-Gevaert | Positive-working lithographic printing plate precursor |
US6677106B2 (en) * | 2002-01-03 | 2004-01-13 | Kodak Polychrome Graphics Llc | Method and equipment for using photo- or thermally imagable, negatively working patterning compositions |
US6723489B2 (en) | 2002-01-30 | 2004-04-20 | Kodak Polychrome Graphics Llp | Printing form precursors |
JP2003320764A (ja) | 2002-02-27 | 2003-11-11 | Tokushu Paper Mfg Co Ltd | 平版印刷版用合紙及びその製造方法 |
US6843176B2 (en) | 2002-04-26 | 2005-01-18 | Kodak Polychrome Graphics, Llc | Method to remove unwanted, unexposed, radiation-sensitive layer in a lithographic printing plate |
CN100439120C (zh) * | 2002-10-04 | 2008-12-03 | 爱克发印艺公司 | 制造平版印刷版前体的方法 |
JP2006501505A (ja) * | 2002-10-04 | 2006-01-12 | アグフア−ゲヴエルト | リトグラフ印刷版前駆物質の製法 |
US20060234161A1 (en) | 2002-10-04 | 2006-10-19 | Eric Verschueren | Method of making a lithographic printing plate precursor |
WO2004030924A1 (en) * | 2002-10-04 | 2004-04-15 | Agfa-Gevaert | Method of making a lithographic printing plate precursor |
US7087359B2 (en) | 2003-01-27 | 2006-08-08 | Agfa-Gevaert | Heat-sensitive lithographic printing plate precursor |
US6953652B2 (en) | 2003-01-27 | 2005-10-11 | Agfa-Gevaert | Heat-sensitive lithographic printing plate precursor |
US6876017B2 (en) * | 2003-02-08 | 2005-04-05 | Intel Corporation | Polymer sacrificial light absorbing structure and method |
US20040241573A1 (en) * | 2003-06-02 | 2004-12-02 | Ray Kevin Barry | Thermally sensitive, white light safe mask for use in flexography |
US7297465B2 (en) | 2003-12-18 | 2007-11-20 | Agfa Graphics Nv | Heat-sensitive lithographic printing plate precursor |
US6969570B1 (en) | 2004-10-26 | 2005-11-29 | Kodak Polychrome Graphics, Llc | Solvent resistant imageable element |
ATE364643T1 (de) | 2004-11-09 | 2007-07-15 | Ipagsa Ind Sl | Thermisch reaktive, nah-infrarot absorbierende polymere und ihre verwendung in wärmeempfindlichen lithographischen druckplatten |
CA2610282C (en) * | 2005-06-03 | 2011-03-15 | American Dye Source Inc. | Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use |
US7175967B1 (en) | 2006-03-02 | 2007-02-13 | Eastman Kodak Company | Heat treatment of multilayer imageable elements |
GB2439734A (en) | 2006-06-30 | 2008-01-09 | Peter Andrew Reath Bennett | Coating for a lithographic precursor and use thereof |
US7175969B1 (en) | 2006-07-18 | 2007-02-13 | Eastman Kodak Company | Method of preparing negative-working radiation-sensitive elements |
DE602007006822D1 (de) | 2007-11-30 | 2010-07-08 | Agfa Graphics Nv | Verfahren zur Behandlung einer Lithografiedruckplatte |
ES2430562T3 (es) | 2008-03-04 | 2013-11-21 | Agfa Graphics N.V. | Método para la fabricación de un soporte de una plancha de impresión litográfica |
EP2106924B1 (en) | 2008-03-31 | 2011-06-29 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
ATE553920T1 (de) | 2009-06-18 | 2012-05-15 | Agfa Graphics Nv | Lithographiedruckplattenvorläufer |
US8298750B2 (en) | 2009-09-08 | 2012-10-30 | Eastman Kodak Company | Positive-working radiation-sensitive imageable elements |
JP5696155B2 (ja) | 2009-10-29 | 2015-04-08 | マイラン・グループ | リソグラフィック印刷プレート用コーティング組成物のためのガロタンニン化合物 |
EP2329951B1 (en) | 2009-12-04 | 2012-06-20 | AGFA Graphics NV | A lithographic printing plate precursor |
EP2547525A1 (en) | 2010-03-18 | 2013-01-23 | J P Imaging Limited | Improvements in or relating to printing |
US20120129093A1 (en) | 2010-11-18 | 2012-05-24 | Moshe Levanon | Silicate-free developer compositions |
US8530143B2 (en) | 2010-11-18 | 2013-09-10 | Eastman Kodak Company | Silicate-free developer compositions |
US8939080B2 (en) | 2010-11-18 | 2015-01-27 | Eastman Kodak Company | Methods of processing using silicate-free developer compositions |
WO2012101046A1 (en) | 2011-01-25 | 2012-08-02 | Agfa Graphics Nv | A lithographic printing plate precursor |
US20120192741A1 (en) | 2011-01-31 | 2012-08-02 | Moshe Nakash | Method for preparing lithographic printing plates |
ES2427137T3 (es) | 2011-02-18 | 2013-10-29 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
JP5705675B2 (ja) * | 2011-07-25 | 2015-04-22 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版及び平版印刷版の作製方法 |
CN104870193B (zh) | 2013-01-01 | 2017-12-22 | 爱克发印艺公司 | (乙烯、乙烯醇缩醛)共聚物和它们在平版印刷版前体中的用途 |
EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
ES2617557T3 (es) | 2014-05-15 | 2017-06-19 | Agfa Graphics Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
ES2660063T3 (es) | 2014-06-13 | 2018-03-20 | Agfa Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
ES2655798T3 (es) | 2014-12-08 | 2018-02-21 | Agfa Nv | Sistema para reducir los residuos de ablación |
EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
EP3157310A1 (en) | 2015-10-12 | 2017-04-19 | Agfa Graphics Nv | An entry sheet for perforating electric boards such as printed circuit boards |
EP3170662B1 (en) | 2015-11-20 | 2019-08-14 | Agfa Nv | A lithographic printing plate precursor |
CA3017777A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Nv | Method for processing a lithographic printing plate |
EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
EP3778253A1 (en) | 2019-08-13 | 2021-02-17 | Agfa Nv | Method for processing a lithographic printing plate |
EP4239411A1 (en) | 2022-03-04 | 2023-09-06 | Eco3 Bv | Method and apparatus for processing a lithographic printing plate precursor |
EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1245924A (en) * | 1967-09-27 | 1971-09-15 | Agfa Gevaert | Improvements relating to thermo-recording |
US4115120A (en) | 1977-09-29 | 1978-09-19 | International Business Machines Corporation | Method of forming thin film patterns by differential pre-baking of resist |
JPS5629250A (en) * | 1979-08-08 | 1981-03-24 | Konishiroku Photo Ind Co Ltd | Printing original plate and printing plate forming method |
US4532005A (en) * | 1984-05-21 | 1985-07-30 | At&T Bell Laboratories | Device lithography using multi-level resist systems |
US4708925A (en) | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
JPS63179359A (ja) * | 1987-01-21 | 1988-07-23 | Konica Corp | 感光性平版印刷版の製造方法 |
US5085972A (en) * | 1990-11-26 | 1992-02-04 | Minnesota Mining And Manufacturing Company | Alkoxyalkyl ester solubility inhibitors for phenolic resins |
US5338628A (en) * | 1991-09-17 | 1994-08-16 | Fuji Photo Film Co., Ltd. | Electrophotographic light-sensitive material |
JPH06250448A (ja) * | 1993-02-23 | 1994-09-09 | Konica Corp | 感光性平版印刷版 |
US5563011A (en) | 1993-04-21 | 1996-10-08 | Shipley Company Inc. | Color filter assembly |
EP0672954B1 (en) * | 1994-03-14 | 1999-09-15 | Kodak Polychrome Graphics LLC | Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates |
DE69515788T2 (de) | 1994-10-21 | 2000-09-07 | Ngk Insulators, Ltd. | Ein-Lagenresist Abhebeverfahren zur Erzeugung eines Musters auf einem Träger |
US5691094A (en) * | 1994-12-01 | 1997-11-25 | Fuji Photo Film Co., Ltd. | Method for preparation of printing plate by electrophotographic process and apparatus for use therein |
JPH0915838A (ja) * | 1995-06-28 | 1997-01-17 | Konica Corp | 印刷版形成材料及び印刷版形成方法 |
US5609995A (en) | 1995-08-30 | 1997-03-11 | Micron Technology, Inc. | Method for forming a thin uniform layer of resist for lithography |
JPH09120157A (ja) * | 1995-10-25 | 1997-05-06 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
JPH09197659A (ja) * | 1996-01-19 | 1997-07-31 | Konica Corp | 湿し水不要感光性平版印刷版及びそれを用いた平版印刷版の作製方法 |
JP3589365B2 (ja) * | 1996-02-02 | 2004-11-17 | 富士写真フイルム株式会社 | ポジ画像形成組成物 |
ES2181120T3 (es) * | 1996-04-23 | 2003-02-16 | Kodak Polychrome Graphics Co | Compuestos termosensibles para precursores de forma para impresion litografica positiva. |
JP3814961B2 (ja) * | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
JPH10239832A (ja) * | 1996-12-25 | 1998-09-11 | Konica Corp | 感光性平版印刷版の製造方法及び画像形成材料 |
US6083662A (en) * | 1997-05-30 | 2000-07-04 | Kodak Polychrome Graphics Llc | Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate |
JP3779444B2 (ja) * | 1997-07-28 | 2006-05-31 | 富士写真フイルム株式会社 | 赤外線レーザ用ポジ型感光性組成物 |
DE69827882T2 (de) * | 1997-08-13 | 2005-11-03 | Mitsubishi Chemical Corp. | Positiv arbeitende lichtempfindliche Zusammensetzung, lichtempfindliche Druckplatte und Verfahren zur Herstellung eines positiven Bildes |
GB9722861D0 (en) * | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Improvements in relation to the manufacture of lithographic printing forms |
GB9722862D0 (en) * | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Pattern formation |
JPH11198335A (ja) * | 1998-01-16 | 1999-07-27 | Fuji Photo Film Co Ltd | 平版印刷版の製造方法 |
EP0934822B1 (en) * | 1998-02-04 | 2005-05-04 | Mitsubishi Chemical Corporation | Positive photosensitive composition, positive photosensitive lithographic printing plate and method for forming a positive image |
US6352811B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
US6358669B1 (en) * | 1998-06-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
US6251559B1 (en) * | 1999-08-03 | 2001-06-26 | Kodak Polychrome Graphics Llc | Heat treatment method for obtaining imagable coatings and imagable coatings |
US6300038B1 (en) * | 1999-11-19 | 2001-10-09 | Kodak Polychrome Graphics Llc | Articles having imagable coatings |
US6296982B1 (en) * | 1999-11-19 | 2001-10-02 | Kodak Polychrome Graphics Llc | Imaging articles |
-
1997
- 1997-10-29 GB GBGB9722861.3A patent/GB9722861D0/en not_active Ceased
-
1998
- 1998-10-26 JP JP2000517846A patent/JP4643002B2/ja not_active Expired - Fee Related
- 1998-10-26 AU AU95530/98A patent/AU9553098A/en not_active Abandoned
- 1998-10-26 EP EP98949156A patent/EP1024958B1/en not_active Expired - Lifetime
- 1998-10-26 DE DE69810804T patent/DE69810804T2/de not_active Expired - Lifetime
- 1998-10-26 WO PCT/GB1998/003191 patent/WO1999021715A1/en active IP Right Grant
- 1998-10-26 BR BRPI9814054-0A patent/BR9814054B1/pt not_active IP Right Cessation
- 1998-10-28 ZA ZA989812A patent/ZA989812B/xx unknown
-
2000
- 2000-04-25 US US09/558,109 patent/US6461795B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69810804T2 (de) | 2003-11-20 |
US6461795B1 (en) | 2002-10-08 |
EP1024958A1 (en) | 2000-08-09 |
GB9722861D0 (en) | 1997-12-24 |
JP4643002B2 (ja) | 2011-03-02 |
BR9814054A (pt) | 2000-09-26 |
WO1999021715A1 (en) | 1999-05-06 |
BR9814054B1 (pt) | 2009-05-05 |
JP2001520953A (ja) | 2001-11-06 |
EP1024958B1 (en) | 2003-01-15 |
DE69810804D1 (de) | 2003-02-20 |
AU9553098A (en) | 1999-05-17 |
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