WO2023093089A1 - 掩膜板及掩膜装置 - Google Patents

掩膜板及掩膜装置 Download PDF

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Publication number
WO2023093089A1
WO2023093089A1 PCT/CN2022/106818 CN2022106818W WO2023093089A1 WO 2023093089 A1 WO2023093089 A1 WO 2023093089A1 CN 2022106818 W CN2022106818 W CN 2022106818W WO 2023093089 A1 WO2023093089 A1 WO 2023093089A1
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WO
WIPO (PCT)
Prior art keywords
line
subsection
mask plate
extension direction
evaporation
Prior art date
Application number
PCT/CN2022/106818
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English (en)
French (fr)
Chinese (zh)
Inventor
韩冰
Original Assignee
昆山国显光电有限公司
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Application filed by 昆山国显光电有限公司 filed Critical 昆山国显光电有限公司
Priority to KR1020237028901A priority Critical patent/KR20230130751A/ko
Priority to JP2023554394A priority patent/JP2024509238A/ja
Publication of WO2023093089A1 publication Critical patent/WO2023093089A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Definitions

  • the present application relates to the technical field of display device preparation, in particular to a mask plate and a mask device.
  • sensor modules such as cameras and infrared sensors
  • a light-transmitting hole-digging area is usually arranged in the middle area of one end of the display panel, and a sensor module is arranged in the hole-digging area.
  • metal masks are usually used to vapor-deposit organic light-emitting materials. Due to the change of the shape of the display panel, the complexity of mask plate design for some products with special shapes is gradually increasing, and the mask plate is easily deformed and wrinkled, resulting in the ineffective contact between the mask plate and the substrate to be evaporated during product evaporation. Defective vapor deposition occurs.
  • Embodiments of the present application provide a mask plate and a mask device, aiming at improving evaporation yield.
  • the embodiment of the first aspect of the present application provides a mask for evaporating a substrate to be evaporated, the mask includes a panel area, the panel area includes an evaporation part and a non-evaporation part, and at least part of the non-evaporation part Located on one side of the evaporation part in the first direction, the non-evaporation part includes a first subsection and at least one second subsection, and the boundary line between the first subsection and the evaporation part is enclosed to form a non-evaporation area , at least one second subsection is located in the non-evaporation area, and the mass-space ratios of the adjacent two of the evaporation section, the first subsection, and the second subsection are different, and the mass-space ratio is the mass of each component itself and The ratio of the total volume of the space occupied by itself.
  • the mass-space ratios of any two of the evaporation part, the first subsection, and the second subsection adjacent to the boundary are different, and the first subsection and the boundary adjacent to the evaporation part A first boundary line is formed.
  • the first boundary line includes a first abrupt line extending in a straight line or a curve, and the extension direction of the first abrupt line or the extension direction of its tangent line is parallel to the first direction or the angle between the two forms an acute angle.
  • a second dividing line is formed adjacent to the boundary between the first subdivision and the second subdivision, at least part of the second dividing line extends in a straight line or a curve, and at least part of the second dividing line
  • the extension direction of the second boundary line or the extension direction of its tangent line is parallel to the extension direction of at least part of the first boundary line or the extension direction of its tangent line, or the extension direction of at least part of the second boundary line or the extension direction of its tangent line is parallel to at least part of the first boundary line
  • the included angle between the extending direction of the boundary line or the extending direction of its tangent is an acute angle.
  • the first dividing line further includes a second abrupt line extending in a straight line or a curve, and the extension direction of the second abrupt line or the extension direction of its tangent line is perpendicular to the first direction
  • the second The boundary line includes a second sub-line adjacent to the second mutation line, the second sub-line extends in a straight line or a curve, and the extension direction of the second sub-line or the extension direction of its tangent line is the same as that of the second mutation line or the second mutation line.
  • the extending directions of the tangents are parallel to each other, or the angle between the extending direction of the second sub-line or the extending direction of the tangent and the extending direction of the second abrupt line or the extending direction of the tangent of the second abrupt line is an acute angle.
  • the second sub-wire includes a plurality of short wires distributed at intervals.
  • the second boundary line includes the first sub-line adjacent to the first mutation line.
  • the first sub-line extends in a straight line or a curve, and the extension direction of the first sub-line or its tangent
  • the extension direction of the first mutation line or the extension direction of the tangent line of the first mutation line is parallel to each other, or the extension direction of the first sub-line or the extension direction of the tangent line is parallel to the extension direction of the first mutation line or the tangent line of the first mutation line
  • the included angle is an acute angle.
  • the at least one second subsection includes a plurality of second subsections, and the plurality of second subsections are distributed at intervals in the non-evaporation area.
  • the plurality of second subsections are distributed symmetrically with respect to a central line extending along the first direction and bisecting the vapor deposition portion.
  • the second subdivision itself is arranged axisymmetrically with respect to an axis extending along the first direction.
  • adjacent boundary lines of two adjacent second subsections are arranged parallel to each other or the included angle is an acute angle.
  • the second subsection includes a plurality of openings, and the openings are disposed through the second subsection along the thickness direction of the mask plate; or the openings are formed by depressions on the surface of the second subsection.
  • the present application also provides a masking device, including: a frame, and the masking plate provided in any one of the embodiments of the first aspect above is disposed on the frame.
  • the mask plate includes a panel area, and the panel area is used for evaporating a complete display panel.
  • the panel area includes an evaporation part and a non-evaporation part, the evaporation part can be used for the normal display area of the evaporation display panel, and the non-evaporation part can be used for the hole-digging area in the evaporation display panel.
  • the non-evaporation section includes a first subsection and a second subsection, and at least one second subsection is located in the non-evaporation area enclosed by the first subsection, and the mass-space ratio of the first subsection and the second subsection is different, so that a material mutation boundary can be formed between the first subsection and the second subsection.
  • the mass-space ratios of the first subsection and the vapor deposition part are different, so that material mutation boundaries can also be formed between the first subsection and the evaporation part. These material mutation boundaries can improve the deformation resistance of the mask plate, and make the mask The stress on different positions of the plate is more balanced, and it is not easy to produce wrinkles, which can improve the problem of poor evaporation caused by the ineffective contact between the mask plate and the substrate to be evaporated during product evaporation.
  • FIG. 1 is a schematic structural diagram of a display panel
  • Fig. 2 is a schematic structural view of a mask provided by the embodiment of the first aspect of the present application
  • Fig. 3 is the partial enlarged structure schematic diagram of I place in Fig. 2;
  • Fig. 4 is a schematic diagram of a partially enlarged structure at I in Fig. 2 in another embodiment of the first aspect of the present application;
  • Fig. 5 is a schematic diagram of a partially enlarged structure at I in Fig. 2 in yet another embodiment of the first aspect of the present application;
  • FIG. 6 is a schematic structural diagram of a mask device provided by an embodiment of the second aspect of the present application.
  • Mask plate 20. Frame; 30. Display panel; 31. Display area; 32. Non-display area;
  • Non-evaporation department 210. First division; 220. Second division; 211. Opening;
  • MA panel area
  • P centerline
  • FIG. 1 is a schematic structural diagram of a display panel 30 .
  • the display panel 30 includes a display area 31 and a non-display area 32.
  • the non-display area 32 can be a hole-digging area, for example, and the non-display area 32 is used to place components such as a camera and an earpiece.
  • an evaporation area and a non-evaporation area are usually set in the panel area MA used for evaporation of the display panel 30 on the mask plate, and the non-evaporation area is usually a shielding area.
  • the non-evaporation area is usually a shielding area. Plate structure, when the mask is stretched, it will lead to deformation and wrinkles due to the difference in force between the evaporation area and the non-evaporation area, resulting in the ineffective contact between the mask plate and the substrate to be evaporated during product evaporation, and evaporation Poor plating phenomenon.
  • the present application is proposed.
  • the mask plate and the mask device according to the embodiment of the present application will be described in detail below with reference to FIG. 2 to FIG. 5 .
  • FIG. 2 is a schematic structural diagram of a mask plate 10 provided in an embodiment of the first aspect of the present application.
  • FIG. 3 is a schematic diagram of a partially enlarged structure at position I in FIG. 2 .
  • the mask 10 of the embodiment of the present application is used for evaporating a substrate to be evaporated, and the mask 10 includes a panel area MA.
  • the panel area MA includes a vapor deposition part 100 and a non-evaporation part 200 disposed on the vapor deposition part 100 .
  • the non-evaporation portion 200 is at least partially disposed on one side of the evaporation portion 100 in the first direction, that is, at least part of the non-evaporation portion 200 is located on one side of the evaporation portion 100 in the first direction.
  • the first direction may be, for example, the longitudinal direction shown in FIG. 1 and the transverse direction shown in FIGS. 2 and 3 .
  • a part of the non-evaporation section 200, or the main body of the non-evaporation section 200, or the whole of the non-evaporation section 200 is located on one side of the evaporation section 100 in the longitudinal direction of FIG. , or the main body of the non-vapor deposition unit 200 , or the entire non-vapor deposition unit 200 may be located on one side of the vapor deposition unit 100 in the lateral direction of FIGS. 2 and 3 .
  • the non-evaporation part 200 includes a first subsection 210 and a second subsection 220.
  • the boundary line adjacent to the first subsection 210 and the evaporation part 100 is enclosed to form a non-evaporation area.
  • At least one second subsection 220 is located in the In the non-evaporation area mentioned above.
  • the vapor deposition unit 100 , the first subsection 210 and the second subsection 220 have at least one group of two with adjacent boundaries and different mass-to-space ratios.
  • At least one set of elements is provided, for example, the vapor deposition part 100 and the first subsection 210, and the vapor deposition part 100 Adjacent to the first subsection 210 and having a different mass-space ratio; or, having at least one set of elements, such as the first subsection 210 and the second subsection 220, the first subsection 210 and the second subsection 220 Adjacent and with different mass-space ratios.
  • the mass-space ratios of any two adjacent to any boundary are different. That is, the vapor deposition part 100 is adjacent to the first subsection 210 and has a different mass-space ratio, and the first subsection 210 is adjacent to the second subsection 220 and has a different mass-space ratio.
  • the mass-to-space ratio is the ratio of the mass of each component to the total volume of the space it occupies.
  • the total volume of the occupied space includes the volume of the solid part and the volume of the cavity part arranged in the solid.
  • the panel area MA is an area where the mask 10 is used for vapor deposition to form a single display panel 30 .
  • the evaporation part 100 is used for evaporation to form the display area 31 of the display panel 30
  • the non-evaporation area is used to form the non-display area 32 of the display panel 30 .
  • There may be only one panel area MA on the mask 10 or multiple panel areas MA are arranged on the mask 10 , for example, multiple panel areas MA are distributed in rows and columns on the mask 10 .
  • the difference in mass-space ratio between the two adjacent boundaries of the evaporation section 100, the first subsection 210, and the second subsection 220 means that if the boundaries of the evaporation section 100 and the first subsection 210 are adjacent, the evaporation
  • the mass-space ratios of the section 100 and the first subsection 210 are different; if the boundaries of the first subsection 210 and the second subsection 220 are adjacent, the mass-space ratios of the first subsection 210 and the second subsection 220 are different.
  • the vapor deposition part 100 is used for vapor deposition to form the display area 31 of the display panel 30.
  • the vapor deposition part 100 has a plurality of vapor deposition openings (not shown in the figure), and the evaporation The plated openings may form sub-pixels of the display panel 30 .
  • the mass-to-space ratio of the vapor deposition part 100 refers to the total mass of the vapor deposition part 100 divided by the total volume of the space occupied by the outer contour of the vapor deposition part 100 .
  • the total size of the space occupied by the outer contour of the evaporation section 100 includes the volume of the space occupied by the evaporation openings on the evaporation section 100 .
  • the mass-to-space ratio of the first subsection 210 refers to the total mass of the first subsection 210 divided by the total volume of the space occupied by the outer contour of the first subsection 210 .
  • the mass-to-space ratio of the second subsection 220 refers to the total mass of the second subsection 220 divided by the total volume of the space occupied by the outer contour of the second subsection 220 .
  • the mask 10 includes a panel area MA, and the panel area MA is used for evaporating a complete display panel 30 .
  • the panel area MA includes an evaporation portion 100 and a non-evaporation portion 200, the evaporation portion 100 can be used for the normal display area 31 of the evaporation display panel 30, and the non-evaporation portion 200 can be used for digging holes in the evaporation display panel 30 district.
  • the non-evaporation part 200 includes a first subsection 210 and a second subsection 220, and at least one second subsection 220 is located in the non-evaporation area surrounded by the first subsection 210.
  • the first subsection 210 and the second subsection The mass-to-space ratios of the subsections 220 are different, so that a material abrupt change boundary can be formed between the first subsection 210 and the second subsection 220 .
  • the mass-space ratios of the first subsection 210 and the vapor deposition part 100 are different, so that material mutation boundaries can also be formed between the first subsection 210 and the evaporation part 100, and these material mutation boundaries can improve the deformation resistance of the mask plate 10 , and make the force of different positions of the mask plate 10 more balanced, less prone to wrinkles, and can improve the poor evaporation problem caused by the ineffective contact between the mask plate 10 and the substrate to be evaporated during product evaporation.
  • the material of the evaporation part 100, the first subsection 210 and the second subsection 220 can be the same, and the mass space of the evaporation part 100 can be reduced by opening evaporation openings, grooves, etc. on the evaporation part 100 Alternatively, the mass-to-space ratio of the second subsection 220 can also be reduced by opening through holes or grooves on the second subsection 220 .
  • FIG. 4 is a partially enlarged structural schematic diagram of the position I in FIG. 2 in another embodiment of the first aspect of the present application.
  • Fig. 5 is a partial enlarged structural schematic diagram of the position I in Fig. 2 in yet another embodiment of the first aspect of the present application.
  • a first boundary line 300 is formed adjacent to the boundary of the first subsection 210 and the vapor deposition portion 100, and the first boundary line 300 includes a first abrupt change line 310 extending in a straight line or a curve, so The extension direction of the first sudden change line 310 or the extension direction of its tangent line is parallel to the first direction or the angle between them is an acute angle.
  • the angle between the extension direction of the first abrupt line 310 or the extension direction of its tangent and the first direction may be an acute angle less than 45 degrees, for example, the extension direction of the first abrupt line 310 or the extension direction of its tangent and the first direction may be an acute angle of less than 45 degrees.
  • the included angle of the first direction is an acute angle less than 30 degrees, preferably 0 degrees. The smaller the included angle here, the better the effect of stress dispersion and the better the ability to resist deformation.
  • the angle between the extension direction of the first sudden change line 310 and the first direction is an acute angle.
  • the extension direction of the first abrupt line 310 and the first direction may also be parallel to each other.
  • FIG. 4 illustrates an example in which the first sudden change line 310 is a straight line. In other embodiments, the first sudden change line 310 may also be a curved line.
  • the angle between the extending direction of the tangent of the first sudden change line 310 and the first direction is an acute angle.
  • the extending direction of the tangent of the first abrupt line 310 is parallel to the first direction.
  • the non-evaporation part 100 is at least partially disposed on one side of the vapor deposition part 200 along the first direction.
  • the extension direction of the first sudden change line 310 or the extension direction of its tangent line is parallel to the first direction or the angle between them forms an acute angle.
  • the non-evaporation part 100 and the vapor deposition part 200 tend to separate along the tension direction. Since the included angle between the first abrupt line 310 and the first direction is relatively small, the arrangement of the first abrupt line 310 in this way can reduce the stress and strain on it and improve the deformation resistance of the mask plate 10 in the first direction. This makes the mask plate 10 less likely to be wrinkled.
  • a second dividing line 400 is formed adjacent to the boundaries of the first subsection 210 and the second subsection 220, and at least part of the second dividing line 400 is a straight line.
  • the extension direction of at least part of the second boundary line 400 or the extension direction of the tangent line is parallel to the extension direction of at least part of the first boundary line 300 or the extension direction of the tangent line, or at least part of the second boundary line 400
  • the angle between the extending direction of the first dividing line 300 or the extending direction of the tangent thereof and the extending direction of at least part of the first boundary line 300 or the extending direction of the tangent thereof is an acute angle.
  • the angle between the extending direction of at least part of the second boundary line 400 or the extending direction of the tangent thereof and the extending direction of at least part of the first boundary line 300 or the extending direction of the tangent thereof may be an acute angle less than 45 degrees.
  • the angle between the extending direction of at least part of the second boundary line 400 or the extending direction of the tangent thereof and the extending direction of at least part of the first boundary line 300 or the extending direction of the tangent thereof is an acute angle less than 30 degrees. The smaller the included angle here, the better the effect of stress dispersion and the better the ability to resist deformation.
  • the angle between the extension direction of at least part of the second boundary line 400 or the extension direction of the tangent line and the extension direction of at least part of the first boundary line 300 or the extension direction of the tangent line is 0 degrees, that is, at least part of the second boundary line 400
  • the extension direction of the first boundary line 300 or the extension direction of the tangent line thereof and the extension direction of at least part of the first boundary line 300 or the extension direction of the tangent line thereof are parallel to each other, which is the best implementation mode.
  • the extension direction of at least part of the second dividing line 400 is parallel to the extending direction of at least part of the first dividing line 300, or at least part of the second dividing line 400
  • the included angle between the extending direction and the extending direction of at least part of the first boundary line 300 is an acute angle.
  • the extension direction of the tangent of the second boundary line 400 is parallel to the extension direction of at least part of the tangent line of the first boundary line 300, or at least part of the second boundary line
  • the angle between the extending direction of the tangent of the boundary line 400 and the extending direction of at least part of the tangent of the first boundary line 300 is an acute angle.
  • the second boundary line 40 when the mask plate 10 is stretched along the first direction, at least part of the second boundary line 40 can share the tensile force borne by the first boundary line 30, which can improve the tension of the mask plate 10 in the first direction.
  • the upward deformation resistance makes the mask plate 10 less likely to be wrinkled.
  • the first boundary line 300 further includes a second abrupt line 320 extending in a straight line or a curve, and the extension direction of the second abrupt line 320 or its tangent direction
  • the first direction is vertical.
  • the second dividing line 400 also includes a second sub-line 420 adjacent to the second abrupt line 320, the second sub-line 420 extends in a straight line or a curve, and the extension direction of the second sub-line 420 or the extension direction of its tangent line is the same as that of the second sub-line 420.
  • the extension directions of the tangents of the mutation line 320 or the second mutation line 320 are parallel to each other, or the extension direction of the second sub-line 420 or the extension direction of the tangent thereof is parallel to the extension direction of the second mutation line 320 or the tangent of the second mutation line 320
  • the included angle is an acute angle.
  • the extending direction of the second sub-line 420 is parallel to the extending direction of the second sudden change line 320, or the extending direction of the second sub-line 420 is parallel to the second sudden change line.
  • the angle included in the extending direction of the line 320 is an acute angle.
  • the extension direction of the tangent of the second sub-line 420 is parallel to the extension direction of the tangent of the second abrupt line 320, or the tangent of the second sub-line 420
  • the angle between the extending direction and the extending direction of the tangent of the second abrupt line 320 is an acute angle.
  • the second sub-wire 420 can share the stress of the second abrupt line 320 , thereby improving the deformation and wrinkle problem of the mask 10 .
  • the second sub-wire 420 includes a plurality of short wires 421 distributed at intervals.
  • the stress concentration on the same second sub-wire 420 can be dispersed to further improve the deformation and wrinkle problem of the mask plate 10 .
  • the second sub-line 420 includes a plurality of short lines 421 arranged at intervals. A plurality of the edges distributed at intervals can form a second sub-line 420 including a plurality of short lines 421 .
  • the second boundary line 400 includes a first sub-line 410 adjacent to the first abrupt line 310, and the first sub-line 410 extends in a straight line or a curve,
  • the extension direction of the first sub-line 410 or the extension direction of the tangent thereof is parallel to the extension direction of the first abrupt line 310 or the extension direction of the tangent of the first abrupt line 310, or the extension direction of the first sub-line 410 or the extension direction of the tangent thereof is parallel to
  • the angle included in the extension direction of the first abrupt line 310 or the tangent of the first abrupt line 310 is an acute angle.
  • the included angle between the extending direction of the first sub-line 410 or the extending direction of the tangent thereof and the extending direction of the first abrupt line 310 or the extending direction of the tangent of the first abrupt line 310 may be an acute angle less than 45 degrees.
  • the angle between the extending direction of the first sub-line 410 or the extending direction of the tangent thereof and the extending direction of the first abrupt line 310 or the extending direction of the tangent of the first abrupt line 310 is an acute angle less than 30 degrees. The smaller the included angle here, the better the effect of stress dispersion and the better the ability to resist deformation.
  • the angle between the extension direction of the first sub-line 410 or the extension direction of its tangent and the extension direction of the first abrupt line 310 or the tangent of the first abrupt line 310 is 0 degrees, that is, the extension direction of the first sub-line 410 or its It is the best implementation mode that the extending direction of the tangent line is parallel to the extending direction of the first abrupt line 310 or the extending direction of the tangent line of the first abrupt line 310 .
  • the extension direction of the first sub-line 410 is parallel to the extension direction of the first abrupt line 310 .
  • the angle between the extending direction of the first sub-line 410 and the extending direction of the first abrupt line 310 is an acute angle.
  • the extension direction of the tangent of the first sub-line 410 is parallel to the extension direction of the tangent of the first abrupt line 310 .
  • the included angle between the extending direction of the tangent of the first sub-line 410 and the extending direction of the tangent of the first abrupt line 310 is an acute angle.
  • the first sub-wire 410 can share the stress of the first abrupt line 310 , thereby improving the deformation and wrinkle problem of the mask 10 .
  • At least one second subsection 220 includes a plurality of second subsections 220, that is, there are multiple second subsections 220, and the plurality of second subsections 220 are distributed at intervals in the non-evaporation area.
  • a plurality of abrupt changes in material can be formed between the plurality of second subsections 220 and the first subsection 210, thereby improving the Deformation and wrinkling of the mask 10 ; on the other hand, a plurality of second subsections 220 are distributed at intervals in the non-evaporation area, and when the mask 10 is stretched, the stress on the non-evaporation area can be improved.
  • the mask plate 10 includes a centerline P extending along the first direction and bisecting the evaporation portion 100 , and the plurality of second subsections 220 are about the centerline P P is distributed symmetrically, so that the structural strength of different regions of the mask 10 is consistent.
  • the mask plate 10 is stretched along the first direction, the force on the mask plate 10 is more balanced, the stress accumulation caused by the unbalanced force is improved, and the mask plate 10 is deformed and wrinkled.
  • the position of the central line P is shown by a dotted line, and the dotted line does not constitute a structural limitation on the mask plate 10 provided by the embodiment of the present application.
  • the axis extending along the first direction of the second subsection 220 is arranged axially symmetrically.
  • the force on the mask plate 10 is more balanced, the stress accumulation caused by the unbalanced force is improved, and the mask plate 10 is deformed and wrinkled.
  • the angle between adjacent boundary lines of two adjacent second subsections 220 is an acute angle
  • two adjacent Adjacent boundary lines of the second subsection 220 may also be arranged parallel to each other.
  • Adjacent boundary lines of two adjacent second subsections 220 refer to two boundary lines where two adjacent second subsections 220 are close to each other, for example, the lower boundary line of the first second subsection 220 in FIG.
  • the upper boundary lines of the two second subsections 220 Setting the adjacent boundary lines of the two adjacent second subsections 220 parallel to each other can balance the force on the two boundary lines, improve the deformation resistance of the mask 10 , and further improve the deformation and wrinkle problem of the mask 10 .
  • the second subsection 220 includes a plurality of openings 211 disposed therethrough.
  • the opening 211 can reduce the mass-space ratio of the second subsection 220, so that a material mutation boundary is formed between the second subsection 220 and the first subsection 10, thereby improving the deformation resistance of the mask 10 and further improving the mask 10. of folds.
  • the shape of the opening 211 can be a circular hole, an oval hole, a polygonal hole and combinations thereof.
  • the opening 211 can be arranged in various manners, for example, the opening 211 is arranged through the second subsection 220 along the thickness direction of the mask plate; or the opening 211 is formed by a depression on the surface of the second subsection 220 .
  • the vapor deposition part 100 is used for vapor deposition to form the display region 31 of the display panel 30, there are vapor deposition openings on the vapor deposition part 100, and the mass-space ratio of the vapor deposition part 100 is reduced. Even if no patterning process is performed on the first subsection 210 , a material discontinuity boundary can be formed between the vapor deposition part 100 and the first subsection 210 . After the opening 211 is provided on the second subsection 220 , even if the first subsection 210 is not patterned, a material break boundary can be formed between the first subsection 210 and the second subsection 220 .
  • the adjacent two for example, between any adjacent two of the evaporation part 100, the first subsection 210 and the second subsection 220
  • the mass-space ratio is different, and the preparation method is simple and convenient.
  • both the first subsection 210 and the second subsection 220 are polygonal, so that more first dividing lines 300 and second dividing lines 400 can be arranged parallel to each other.
  • the shapes of the first subsection 210 and the second subsection 220 can be the same or different, for example, the second subsection 220 can be a triangle, and the first subsection 210 can be a quadrilateral, as long as the first subsection 210 and the second subsection 220 are both It is polygonal, so that both the first subsection 210 and the second subsection 220 have straight outer edge lines, and then more first dividing lines 300 and second dividing lines 400 are arranged parallel to each other.
  • both the first subsection 210 and the second subsection 220 have arc-shaped sides, so that more first dividing lines 300 and second dividing lines 400 can be parallel to each other.
  • the shape of the non-evaporation area is trapezoidal
  • the shape of the second subsection 220 is triangular
  • a plurality of second subsections 220 are distributed at intervals in the non-evaporation area, close to the first
  • One side of the second subsection 220 provided by a boundary line 300 is arranged parallel to the first boundary line 300, and when the mask plate 10 is stretched, this side of the second subsection 220 can share the weight of the first boundary line 300. force, so that the force of the mask plate 10 is more balanced.
  • the shape of the non-evaporation region may also be a rectangle
  • the shape of the first subsection 210 may be a quadrangle, a pentagon, or the like.
  • the shape of the second subsection 220 may also be trapezoidal, polygonal, arc-shaped, or other figures.
  • the side of part of the second subsection 220 is arranged parallel to the second boundary line 400, and when the mask plate 10 is stretched, the edge can share the force of the second boundary line 400, so that the force of the mask plate 10 is Forces are more balanced.
  • the edges of more than two second subsections 220 are arranged parallel to the second boundary line 400 , that is, the second subline 420 includes a plurality of short lines 421 , and each second subsection 220 is parallel to the second boundary line 400
  • the set sides form a short line 421
  • a plurality of short lines 421 form a second sub-line 420 .
  • the plurality of second subsections 220 are distributed in a single row along the second direction.
  • the plurality of second subsections 220 may also be multi-row multi-column subsections.
  • the second direction intersects the first direction, for example, the second direction perpendicularly intersects the first direction.
  • the second subsection 220 is an isosceles triangle, and a plurality of second subsections 220 have the same shape, so that the second subsection 220 can be more evenly distributed in the non-evaporation area, and the second subsection 220 The upper opposite two sides can be arranged in parallel.
  • the number of the second subsections 220 is an odd number, and the second subsections 220 located in the middle of a single row in the second direction are arranged symmetrically with respect to the central line P.
  • the number of the second subsections 220 is an even number, and the plurality of second subsections 220 are arranged symmetrically with respect to the central line P.
  • the materials of any two of the first subsection 210, the second subsection 220, and the evaporation section 100 are different, that is, the materials of the first subsection 210, the second subsection 220, and the evaporation section 100 are each different.
  • the material difference between any two of the first subsection 210, the second subsection 220 and the vapor deposition part 100 here may be the same configuration of the materials in the first subsection 210, the second subsection 220 and the vapor deposition part 100.
  • the ratio is different, or the types of materials in the first subsection 210, the second subsection 220, and the vapor deposition section 100 are different, as long as the material mutation line can be formed before the first subsection 210 and the second section, the second subsection 220 and It is only necessary to form a material discontinuity line between the vapor deposition parts 100 .
  • FIG. 6 is a schematic structural diagram of a mask device provided by an embodiment of the second aspect of the present application.
  • the mask device provided by the embodiment of the second aspect of the present application includes: a frame 20 , and a mask plate 10 disposed on the frame 20 .
  • the mask plate 10 may be the mask plate 10 in any one of the embodiments of the first aspect above. Since the evaporation device provided in the embodiment of the second aspect of the present application includes the mask plate 10 provided in the embodiment of the second aspect of the application, the masking device provided in the embodiment of the second aspect of the application has the implementation of any of the above-mentioned first aspects. The beneficial effects of the mask plate 10 provided in this example will not be repeated here.
  • one mask plate 10 may be disposed in the frame 20 of the mask device, or more than two mask plates 10 may be disposed in the frame 20 of the mask device.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
PCT/CN2022/106818 2021-11-29 2022-07-20 掩膜板及掩膜装置 WO2023093089A1 (zh)

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JP2023554394A JP2024509238A (ja) 2021-11-29 2022-07-20 マスクプレート及びマスク装置

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CN114134460B (zh) * 2021-11-29 2023-06-06 昆山国显光电有限公司 掩膜板
TWI816625B (zh) * 2023-01-30 2023-09-21 達運精密工業股份有限公司 金屬遮罩結構

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KR20230130751A (ko) 2023-09-12
CN114134460A (zh) 2022-03-04

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