WO2023090177A1 - 結晶化ガラス - Google Patents
結晶化ガラス Download PDFInfo
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- WO2023090177A1 WO2023090177A1 PCT/JP2022/041284 JP2022041284W WO2023090177A1 WO 2023090177 A1 WO2023090177 A1 WO 2023090177A1 JP 2022041284 W JP2022041284 W JP 2022041284W WO 2023090177 A1 WO2023090177 A1 WO 2023090177A1
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- WIPO (PCT)
- Prior art keywords
- glass
- less
- crystallized glass
- compressive stress
- ion exchange
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- 239000011521 glass Substances 0.000 title claims abstract description 129
- 238000005342 ion exchange Methods 0.000 claims abstract description 33
- 230000007423 decrease Effects 0.000 claims abstract description 21
- 229910001415 sodium ion Inorganic materials 0.000 claims abstract description 17
- 239000000203 mixture Substances 0.000 claims abstract description 16
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 24
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 23
- 229910052708 sodium Inorganic materials 0.000 claims description 20
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 17
- WVMPCBWWBLZKPD-UHFFFAOYSA-N dilithium oxido-[oxido(oxo)silyl]oxy-oxosilane Chemical compound [Li+].[Li+].[O-][Si](=O)O[Si]([O-])=O WVMPCBWWBLZKPD-UHFFFAOYSA-N 0.000 claims description 12
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 claims description 12
- 229910052912 lithium silicate Inorganic materials 0.000 claims description 12
- 238000002441 X-ray diffraction Methods 0.000 claims description 9
- 238000001228 spectrum Methods 0.000 claims description 9
- 238000002834 transmittance Methods 0.000 abstract description 20
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract description 3
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract description 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 2
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 229910052682 stishovite Inorganic materials 0.000 abstract description 2
- 229910052905 tridymite Inorganic materials 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000013078 crystal Substances 0.000 description 28
- 238000010438 heat treatment Methods 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 8
- 238000000465 moulding Methods 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- HEHRHMRHPUNLIR-UHFFFAOYSA-N aluminum;hydroxy-[hydroxy(oxo)silyl]oxy-oxosilane;lithium Chemical compound [Li].[Al].O[Si](=O)O[Si](O)=O.O[Si](=O)O[Si](O)=O HEHRHMRHPUNLIR-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 238000004031 devitrification Methods 0.000 description 6
- 238000007500 overflow downdraw method Methods 0.000 description 6
- 229910052670 petalite Inorganic materials 0.000 description 6
- 238000005191 phase separation Methods 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000006059 cover glass Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000006060 molten glass Substances 0.000 description 5
- 230000035515 penetration Effects 0.000 description 5
- 229910006404 SnO 2 Inorganic materials 0.000 description 4
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 4
- 235000010344 sodium nitrate Nutrition 0.000 description 4
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 239000005345 chemically strengthened glass Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000001376 precipitating effect Effects 0.000 description 3
- 101100371219 Pseudomonas putida (strain DOT-T1E) ttgE gene Proteins 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000003280 down draw process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000013001 point bending Methods 0.000 description 2
- 229920001690 polydopamine Polymers 0.000 description 2
- 235000010333 potassium nitrate Nutrition 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- TWQULNDIKKJZPH-UHFFFAOYSA-K trilithium;phosphate Chemical compound [Li+].[Li+].[Li+].[O-]P([O-])([O-])=O TWQULNDIKKJZPH-UHFFFAOYSA-K 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 241000699670 Mus sp. Species 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- -1 Ta 2 O 5 Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- CNLWCVNCHLKFHK-UHFFFAOYSA-N aluminum;lithium;dioxido(oxo)silane Chemical compound [Li+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O CNLWCVNCHLKFHK-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 238000007656 fracture toughness test Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 125000001475 halogen functional group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000009774 resonance method Methods 0.000 description 1
- 238000007372 rollout process Methods 0.000 description 1
- 238000000550 scanning electron microscopy energy dispersive X-ray spectroscopy Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 229910000500 β-quartz Inorganic materials 0.000 description 1
- 229910052644 β-spodumene Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
- C03C10/0027—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents containing SiO2, Al2O3, Li2O as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
Definitions
- the present invention relates to crystallized glass, and particularly to crystallized glass suitable for cover glass of mobile phones, digital cameras, PDAs (portable terminals), and touch panel displays.
- the cover glass especially the cover glass used for smartphones, is often used while moving, so it is easy to break when it falls on the road surface. Therefore, in the application of cover glass, it is important to increase the strength against falling on the road surface.
- Chemically strengthened glass has high strength. This is because having a compressive stress layer on the surface suppresses the formation and propagation of cracks on the surface. It is believed that the strength of tempered glass can be improved by adjusting the stress state of the compressive stress layer (see Patent Document 1, for example).
- Crystallized glass is made by depositing crystals inside the glass, that is, containing crystals inside the glass, and is known for its high strength.
- Patent Literature 2 discloses chemically strengthened crystallized glass, but its transmittance is low, and when used as a cover glass, the visibility of a display is reduced. There is also room for improvement in terms of impact resistance.
- the present invention is to create a crystallized glass with high transmittance and impact resistance in addition to high strength.
- the crystallized glass according to the first aspect of the present invention is crystallized glass having a compressive stress layer due to ion exchange, and has a composition of SiO 2 50 to 80% and Al 2 O 3 0 in terms of mol %. ⁇ 4.8%, P 2 O 5 0.2-15%, Li 2 O 1.5-30%, Na 2 O 0-15%, ZrO 2 1.5-10%, crystallized glass It is characterized by having a portion in which the Na ion concentration decreases from the surface side of the glass toward the inside.
- the "Na ion concentration" can be confirmed by, for example, measuring the cross section of the sample with SEM-EDX. In this way, crystallized glass having high transmittance and high impact resistance can be obtained.
- the crystallized glass according to the second aspect of the present invention preferably has a plate shape and the stress depth of the compressive stress layer is 13% or more of the plate thickness. By doing so, the resistance to crack penetration is increased, and the impact resistance tends to be increased.
- At least one of lithium disilicate and lithium metasilicate is preferably precipitated. By doing so, the transmittance tends to be high.
- the crystallized glass according to the fourth aspect of the present invention preferably has a half-value width FWHM at the maximum peak of the X-ray diffraction spectrum of 0.120° or more. By doing so, the transmittance is likely to be high.
- the "half width FWHM at the maximum peak of the X-ray diffraction spectrum" can be evaluated by a powder method with an X-ray diffractometer (eg, Aeris manufactured by Malvern Panalytical).
- the compressive stress value of the compressive stress layer is 100 MPa or more. By doing so, the resistance to crack penetration is increased, and the impact resistance tends to be increased.
- the crystallized glass according to the sixth aspect of the present invention preferably has a plate shape and a plate thickness of 1.5 mm or less. By doing so, the weight of the crystallized glass can be reduced.
- the crystallized glass according to the seventh aspect of the present invention is crystallized glass having a compressive stress layer due to ion exchange, wherein at least one of lithium disilicate and lithium metasilicate is precipitated, and It is characterized by having a portion in which the Na ion concentration decreases from the surface side of the glass toward the inside.
- the crystallized glass according to the eighth aspect of the present invention is crystallized glass having a compressive stress layer due to ion exchange, and has a composition of SiO 2 50 to 80% and Al 2 O 3 0 in terms of mol %. ⁇ 4.8%, P2O5 0.2-15 %, Li2O 1.5-30%, Na2O + K2O (total amount of Na2O and K2O ) 0-3.8% Na 2 O 0-3.8%, K 2 O 0-3.8%, ZrO 2 1.5-10%.
- strength, transmittance and impact resistance can all be achieved at high levels.
- the crystallizable glass according to the ninth aspect of the present invention has a glass composition of 50 to 80% SiO 2 , 0 to 4.8% Al 2 O 3 , and 0.2 to 0.2% P 2 O 5 in mol%. 15%, Li 2 O 1.5-30%, Na 2 O + K 2 O 0-3.8%, Na 2 O 0-3.8%, K 2 O 0-3.8%, ZrO 2 It is characterized by containing 1.5 to 10%.
- the crystallizable glass according to the tenth aspect of the present invention has, as a glass composition, SiO 2 50 to 80%, Al 2 O 3 0 to 4.8%, P 2 O 5 0.2 to 15%, Li 2 O 1.5-30%, Na 2 O 0-15%, and ZrO 2 1.5-10%.
- FIG. 12 shows the X-ray diffraction spectrum of the crystallized glass of Example 52 in Table 12;
- the crystallized glass (crystalline glass) of the present invention has a composition, in terms of mol %, of SiO 2 50 to 80%, Al 2 O 3 0 to 4.8%, P 2 O 5 0.2 to 15%, Li 2 O 1.5-30%, Na 2 O 0-15%, ZrO 2 1.5-10%.
- % display represents mol% unless otherwise specified.
- the numerical range indicated using “to” means a range including the numerical values before and after "to" as the minimum and maximum values, respectively.
- SiO 2 is a component that forms a network of glass, and is also a component for precipitating crystals of lithium disilicate, lithium metasilicate, and the like.
- the content of SiO 2 is preferably 50-80%, 55-75%, 60-73%, 60-70%, especially 65-70%. If the content of SiO 2 is too low, vitrification becomes difficult, Young's modulus and weather resistance tend to decrease, and lithium disilicate and lithium metasilicate are difficult to deposit. On the other hand, if the SiO2 content is too high, the meltability and moldability tend to deteriorate, and the thermal expansion coefficient becomes too low, making it difficult to match the thermal expansion coefficient of the surrounding materials. The transmittance tends to decrease due to precipitation of crystals that do not form.
- Al 2 O 3 is a component that adjusts precipitated crystals and adjusts compressive stress.
- the upper limit range of Al 2 O 3 is preferably 4.8% or less, 4.7% or less, 4.5% or less, 4.4% or less, 4.3% or less, 4.2% or less, and 4.0%. % or less, 3.8% or less, 3.5% or less, 3.3% or less, 3.0% or less, 2.8% or less, 2.5% or less, 2.2% or less, 2.1% or less , especially not more than 2.0%. If the Al 2 O 3 content is too high, the compressive stress value of the crystallized glass may decrease. On the other hand, if the content of Al 2 O 3 is too small, the transmittance and devitrification resistance may be likely to decrease. Therefore, the lower limit of the content of Al 2 O 3 is preferably 0% or more, 0.1% or more, 0.2% or more, 0.3% or more, 0.4% or more, 0.5% or more, 0.7% or more, 1.0% or more, particularly 1.5% or more.
- P 2 O 5 is a component for generating crystal nuclei.
- the content of P 2 O 5 is preferably 0.2-15%, 0.2-10%, 0.2-8%, 0.2-5%, 0.2-3%, especially 0 0.5-3%.
- Li 2 O is a component for precipitating crystals of lithium disilicate, lithium metasilicate, and the like, and is a component that further enhances ion exchange performance. However, if the content of Li 2 O is too large, the weather resistance tends to deteriorate.
- the upper limit range of Li 2 O is preferably 30% or less, 29% or less, 28% or less, 26% or less, particularly 25% or less
- the lower limit range is preferably 1.5% or more and 2% 3% or more, 4% or more, 4.5% or more, 5% or more, 5.5% or more, 6% or more, 6.3% or more, 6.5% or more, 6.6% or more, 8% 10% or more, 12% or more, 15% or more, 18% or more, 20% or more, 21% or more, 22% or more, 22.5% or more, 23% or more, 23.5% or more, 24% or more, In particular, it is 24.5% or more.
- Na 2 O is a component that lowers high-temperature viscosity and remarkably enhances meltability. It is also a component that contributes to the initial melting of the glass raw material. However, if the content of Na 2 O is too large, the crystallite size tends to become coarse, and the weather resistance tends to deteriorate.
- the upper limit range of Na 2 O is preferably 15% or less, 12% or less, 10% or less, 9.8% or less, 9.5% or less, 9.3% or less, 9.1% or less, 9% 8.7% or less, especially 7% or less, 6% or less, 5% or less, 4% or less, 3% or less, 2.4% or less, 2.2% or less, 2% or less, 1.8% % or less, 1.5% or less, and when weather resistance is important, 1% or less, particularly less than 1%, and the lower limit range is preferably 0% or more, 0.1% or more, 0.3% or more 0.5% or more, 0.8% or more, 1% or more, especially 2% or more.
- ZrO2 is a component for generating crystal nuclei.
- the upper range of ZrO2 is preferably 10% or less, 9% or less, 8% or less, 7% or less, 6.5% or less, especially 6% or less
- the lower limit range is preferably 1.5 % or more, 1.7% or more, 1.9% or more, 2% or more, 2.1% or more, 2.3% or more, 2.5% or more, 2.7% or more, 3% or more, 3.3% 3.5% or more, particularly 4% or more.
- the molar ratio Al 2 O 3 /SiO 2 is preferably 0.07 or less, 0.06 or less, 0.05 or less, 0.045 or less, 0.043 or less, 0.04 or less, 0.038 or less, 0. 035 or less, 0.033 or less, 0.03 or less, 0.028 or less, particularly 0 to 0.025. If the molar ratio Al 2 O 3 /SiO 2 is too large, vitrification may become difficult, or the compressive stress value of the crystallized glass may decrease.
- the molar ratio Al 2 O 3 /Li 2 O is preferably 0.2 or less, 0.15 or less, 0.14 or less, 0.13 or less, 0.12 or less, 0.11 or less, 0.1 or less, 0 0.09 or less, 0.08 or less, 0.07 or less, especially 0 to 0.065. If the molar ratio Al 2 O 3 /Li 2 O is too large, crystals such as lithium disilicate and lithium metasilicate are difficult to precipitate, crystals such as petalite are easy to precipitate, and the compressive stress value of the crystallized glass increases. is likely to decrease.
- the molar ratio Al 2 O 3 /(SiO 2 +Li 2 O) is preferably 0.06 or less, 0.055 or less, 0.05 or less, 0.047 or less, 0.045 or less, 0.043 or less, 0. 04 or less, 0.038 or less, 0.035 or less, 0.033 or less, particularly 0 to 0.03. If the molar ratio Al 2 O 3 /(SiO 2 +Li 2 O) is too large, crystals such as lithium disilicate and lithium metasilicate are difficult to precipitate, crystals such as petalite are easy to precipitate, and crystallized glass is produced. There is a possibility that the compressive stress value of will decrease.
- K 2 O is a component that enhances ion exchange performance, lowers high-temperature viscosity, and enhances meltability. However, if the K 2 O content is too high, the crystallite size tends to be coarse. Therefore, the content of K 2 O is preferably 0-7%, 0-5%, 0-3%, 0-2%, 0-1.5%, 0-1.2%, 0-1% less than, in particular 0 to 0.8%.
- Na 2 O + K 2 O which is the total amount of Na 2 O and K 2 O, is 0 to 8%, 0 to 7%, 0 to 5%, 0 to less than 3.8%, 0 to 3.5%, 0 ⁇ 3%, preferably 0-2.5%, particularly preferably 0-2%. If the content of Na 2 O+K 2 O is too high, the crystallite size tends to be coarse.
- the molar ratio (Na 2 O+K 2 O)/(Li 2 O+Na 2 O+K 2 O) is preferably less than 1.50, 1.40 or less, 1.30 or less, 1.20 or less, 1.10 or less, 1. 00 or less, 0.05 to 0.90, especially 0.10 to 0.80. If the molar ratio (Na 2 O + K 2 O)/(Li 2 O + Na 2 O + K 2 O) is too large, the ion exchange performance of the NaNO 3 molten salt is lowered, and the crystallized glass contains It becomes difficult to form a portion where the concentration of Na ions decreases, that is, a compressive stress layer based on Na ions.
- B 2 O 3 is a component that enhances meltability and devitrification resistance. However, if the content of B 2 O 3 is too large, the weather resistance tends to decrease. Thus, the content of B 2 O 3 is preferably 0-10%, 0-7%, 0-5%, 0-3%, especially 0-1%.
- MgO is a component that increases Young's modulus and ion exchange performance, lowers high-temperature viscosity, and enhances meltability. However, if the MgO content is too high, the glass tends to devitrify during molding. Therefore, the content of MgO is preferably 0-10%, 0-7%, 0-4%, 0-2%, 0-1%, especially 0-0.1%.
- CaO is a component that lowers high-temperature viscosity and increases meltability.
- the raw material to be introduced since the raw material to be introduced is relatively inexpensive, it is a component that reduces the batch cost.
- the content of CaO is preferably 0-5%, 0-3%, 0-1%, especially 0-0.5%.
- SrO is a component that suppresses phase separation and coarsening of the crystallite size, but if the content is too high, it becomes difficult to precipitate crystals by heat treatment. Therefore, the content of SrO is preferably 0-5%, 0-3%, 0-2%, especially 0-1%.
- BaO is a component that suppresses coarsening of the crystallite size, but if the content is too high, it becomes difficult to precipitate crystals by heat treatment. Therefore, the content of BaO is preferably 0-5%, 0-3%, 0-2%, especially 0-1%.
- ZnO is a component that lowers high-temperature viscosity and significantly increases meltability, and is a component that suppresses coarsening of crystallite size. However, if the ZnO content is too high, the glass tends to devitrify during molding.
- the content of ZnO is therefore preferably 0-5%, 0-3%, 0-2%, especially 0-1%.
- TiO 2 is a component for generating crystal nuclei and a component for improving weather resistance. However, when a large amount of TiO 2 is introduced, the glass tends to be colored and the transmittance tends to decrease. Thus, the content of TiO 2 is preferably 0-5%, 0-3%, in particular 0-1%.
- SnO 2 is a component that enhances the ion exchange performance, but if its content is too high, the devitrification resistance tends to decrease.
- the SnO 2 content is preferably 0-3%, 0.01-3%, 0.05-3%, 0.1-3%, especially 0.2-3%.
- effective fining agents can be added.
- a clarifier one or more selected from the group of Cl, SO 3 , CeO 2 and Sb 2 O 3 (preferably the group of Cl and SO 3 ) may be added in an amount of 0.001 to 1%.
- a preferred content of Fe 2 O 3 is less than 1000 ppm (less than 0.1% by weight), less than 800 ppm, less than 600 ppm, less than 400 ppm, especially less than 300 ppm. Furthermore, after restricting the content of Fe 2 O 3 to the above range, the molar ratio SnO 2 /(Fe 2 O 3 +SnO 2 ) is restricted to 0.8 or more, 0.9 or more, particularly 0.95 or more. is preferred. By doing so, the total light transmittance at wavelengths of 400 to 770 nm can be easily improved.
- Y 2 O 3 is a component that increases the strength of glass.
- Y 2 O 3 is expensive as a raw material, and if added in a large amount, the devitrification resistance tends to decrease.
- the content of Y 2 O 3 is preferably 0-15%, 0-12%, 0-10%, especially 0.1-1%.
- Gd 2 O 3 , Nb 2 O 5 , La 2 O 3 , Ta 2 O 5 and HfO 2 are components that increase the strength of the glass.
- Gd 2 O 3 , Nb 2 O 5 , La 2 O 3 , Ta 2 O 5 and HfO 2 are expensive raw materials, and if added in large amounts, the devitrification resistance tends to decrease.
- the total and individual contents of Gd 2 O 3 , Nb 2 O 5 , La 2 O 3 , Ta 2 O 5 , HfO 2 are preferably 0-15%, 0-10%, 0-5%, especially 0-3%.
- the crystallized glass of the present invention does not substantially contain As 2 O 3 , PbO, F, etc. as a composition from environmental considerations. Moreover , it is also preferable not to contain Bi2O3 substantially from an environmental consideration.
- the phrase "substantially does not contain” means that although the specified component is not actively added as a glass component, the addition of an impurity level is allowed. Specifically, the content of the specified component is 0. It refers to the case of less than 0.05%.
- the crystallized glass of the present invention it is possible to obtain a suitable glass composition range by appropriately combining the suitable content ranges of each component. , because it is possible to achieve both transmittance and impact resistance at high levels.
- the crystallized glass of the present invention preferably has the following properties.
- any one of lithium disilicate, lithium metasilicate, ⁇ -quartz, ⁇ -spodumene, trilithium phosphate, and petalite is preferably precipitated in order to increase the transmittance.
- Any one of silicate, lithium metasilicate and trilithium phosphate is preferably precipitated.
- it is preferable that lithium disilicate or lithium metasilicate is deposited as the main crystal (the crystal with the largest amount of deposition).
- petalite is not precipitated in order to increase the compressive stress value of the compressive stress layer.
- the half width FWHM at the maximum peak of the X-ray diffraction spectrum is preferably 0.120° or more, 0.121° or more, 0.122° or more, 0.123° or more, 0.125° or more, 0.130° or more , 0.135° or more, 0.140° or more, particularly 0.150° or more. If the half width FWHM at the maximum peak of the X-ray diffraction spectrum is too small, the transmittance tends to decrease.
- the fracture toughness K 1C before ion exchange treatment is preferably 0.7 MPa ⁇ m 0.5 or more, 0.8 MPa ⁇ m 0.5 or more, 1.0 MPa ⁇ m 0.5 or more, 1.2 MPa ⁇ m 0.5 or more. 5 or more, especially 1.5 to 3.5 MPa ⁇ m 0.5 . If the fracture toughness K1C is too small, the strength tends to be low.
- the “fracture toughness K 1C ” is based on JIS R1607 “Fine Ceramics Fracture Toughness Test Method”, and was measured using a pre-crack introduction fracture test method (SEPB method: Single-Edge-Precracked-Beam method). It is.
- the maximum load until the test piece breaks is measured by a three-point bending fracture test of the pre-crack introduced test piece, and the plane strain fracture is determined from the maximum load, pre-crack length, test piece size and distance between bending fulcrums.
- This is a method for determining toughness K 1C .
- the measured value of the fracture toughness K1C of each glass is the average value of five measurements.
- Young's modulus before ion exchange treatment is preferably 70 GPa or more, 72 GPa or more, 73 GPa or more, 74 GPa or more, 75 GPa or more, 76 GPa or more, 77 GPa or more, 78 GPa or more, 79 GPa or more, 80 GPa or more, 83 GPa or more, 85 GPa or more, 87 GPa or more, 90 GPa or more, especially 100 to 150 GPa.
- Young's modulus is low, the crystallized glass tends to bend when the plate thickness is thin. "Young's modulus" can be measured by a well-known resonance method.
- the Vickers hardness before ion exchange treatment is preferably 500 or higher, 550 or higher, 580 or higher, particularly 600 to 2500. If the Vickers hardness is too low, it will be easily scratched.
- the "Vickers hardness” is a value measured by pressing a Vickers indenter with a load of 100 gf using a Vickers hardness tester.
- the transmittance in the thickness direction at a wavelength of 400 nm is preferably 75% or more, 76% or more, 77% or more, 78% or more, 79% or more, 81% or more, 83% or more, 85% or more, 88% or more, particularly 89%. % or more.
- the “transmittance” is obtained by measuring the linear transmittance in the thickness direction using a spectrophotometer (Shimadzu UV-3100).
- the crystallized glass of the present invention preferably has the following properties after ion exchange treatment.
- the crystallized glass of the present invention is a portion of the crystallized glass in which the Na ion concentration decreases from the surface side to the inside of the glass, in other words, the Na ion concentration is reduced from the inside to the surface side of the glass. has an increasing portion. As a result, resistance to crack penetration from the glass surface increases, and impact resistance tends to increase. Note that when NaNO3 molten salt is used to perform an ion exchange treatment for introducing Na ions into the glass, the Na ion concentration on the glass surface becomes relatively high, and the Na ion concentration increases from the surface side to the inside of the glass. It becomes possible to form portions of decreasing concentration.
- the crystallized glass has Li There is a portion where the ion concentration increases, that is, a portion where the Li ion concentration decreases from the inner side of the glass toward the surface side.
- the crystallized glass of the present invention has a compressive stress layer due to ion exchange on the surface, and the compressive stress value of the compressive stress layer is preferably 100 MPa or more, 110 MPa or more, 120 MPa or more, 130 MPa or more, 140 MPa or more, 150 MPa or more, or 170 MPa. above, particularly above 200 MPa.
- a low compressive stress value tends to result in low resistance to crack penetration and low impact resistance.
- the compressive stress value is if the compressive stress value is too high, the tensile stress value at the center will be excessive, and there will be many fragments at breakage, which is dangerous. Therefore, the compressive stress value is preferably 1000 MPa or less, 900 MPa or less, 800 MPa or less, 700 MPa or less, 600 MPa or less, 500 MPa or less, especially 450 MPa or less.
- the stress depth of the compressive stress layer is preferably 13% or more, 14% or more, 15% or more, 16% or more, 17% or more, 17.5% or more, 18% or more, 18% or more of the plate thickness. .5% or more, especially 19% or more. If the stress depth is small, the resistance to crack penetration tends to be small and the impact resistance tends to be low.
- the internal tensile stress value is preferably 180 MPa or less, 150 PMa or less, 120 MPa or less, particularly 110 MPa or less. If the internal tensile stress value is too high, the crystallized glass will tend to self-destruct due to hard scratches. On the other hand, if the internal tensile stress value is too low, it becomes difficult to ensure the strength of the crystallized glass.
- the internal tensile stress value is preferably 35 MPa or higher, 45 MPa or higher, 55 MPa or higher, especially 70 MPa or higher.
- the internal tensile stress value can be measured by, for example, a scattered light photoelastic stress meter SLP-2000 manufactured by Orihara Seisakusho.
- the P180 scratch strength is an index of impact resistance, and is preferably 250 MPa or higher, 270 MPa or higher, 290 MPa or higher, and particularly 300 MPa or higher. Although the upper limit of the P180 scratch strength is not particularly limited, it is practically 800 MPa or less. The P180 scratch strength can be measured by the method described later.
- the crystallized glass of the present invention preferably has a plate shape, and preferably has a plate thickness of 2.0 mm or less, 1.5 mm or less, 1.3 mm or less, 1.1 mm or less, 1.0 mm or less, particularly 0 mm or less. .9 mm or less.
- the plate thickness is smaller, the weight of the crystallized glass can be reduced.
- the plate thickness is preferably 0.3 mm or more, 0.4 mm or more, 0.5 mm or more, 0.6 mm or more, particularly 0.7 mm or more.
- the method for producing the crystallized glass of the present invention will be described with an example of forming into a plate shape.
- glass raw materials prepared so as to have a desired glass composition are put into a continuous melting furnace, heated and melted at 1200 to 1700 ° C., clarified, and then the molten glass is supplied to a forming apparatus and formed into a plate shape. , to obtain a glass plate (crystalline glass plate) by cooling.
- a crystallizable glass refers to a glass capable of precipitating crystals, and does not necessarily contain crystals.
- a well-known method can be adopted as a method of cutting into a predetermined size after molding into a plate shape.
- the overflow down-draw method is a method capable of producing a large number of high-quality glass sheets.
- the molten glass is overflowed from both sides of the molded refractory, and while the overflowing molten glass is joined at the lower end of the molded refractory, it is stretched downward to form a plate shape.
- the surface to be the surface does not contact the surface of the compact refractory and is molded into a plate shape. Therefore, unpolished crystallizable glass having good surface quality can be manufactured at low cost.
- a cooling step in which one surface of the formed glass ribbon is brought into contact with a cooling roll and cooled.
- a glass having a low liquidus viscosity for example, a glass having a liquidus viscosity of less than 10 4.2 dPa ⁇ s, particularly a glass having a liquidus viscosity of less than 10 3.8 dPa ⁇ s
- a heating step for heating the surface in contact with the cooling roll by arranging a heater on the side of the surface in contact with the cooling roll below the cooling roll.
- molding methods such as a float method, a down-draw method (slot down-draw method, redraw method, etc.), a roll-out method, and a press method can be employed.
- the heat treatment step preferably includes a phase separation formation step of causing phase separation in the glass matrix, a crystal nucleus generation step of generating crystal nuclei, and a crystal growth step of growing the generated crystal nuclei.
- the heat treatment temperature in the phase separation step is preferably 400 to 600° C., particularly 480 to 570° C., and the heat treatment time is preferably 10 minutes to 24 hours, particularly 30 minutes to 12 hours.
- the heat treatment temperature in the crystal nucleus generation step is preferably 500 to 700° C., particularly 520 to 650° C., and the heat treatment time is preferably 10 minutes to 24 hours, particularly 30 minutes to 12 hours.
- the heat treatment temperature in the crystal growth step is preferably 730 to 920° C., particularly 750 to 830° C.
- the heat treatment time is preferably 10 minutes to 5 hours, especially 30 minutes to 3 hours.
- the rate of temperature increase is preferably 1°C/min to 30°C/min, more preferably 1°C/min to 10°C/min. If the heat treatment temperature, heat treatment time, and heating rate are outside the above ranges, the crystallite size becomes coarser and the degree of crystallinity is lowered.
- the crystallized glass plate is subjected to ion exchange treatment to form a compressive stress layer on the surface due to ion exchange.
- ion exchange treatment When the ion exchange treatment is performed, a compressive stress layer is formed on the surface, so that the strength can be increased.
- the concentration of components subjected to ion exchange such as alkali metal components, varies in the depth direction of the compressive stress layer.
- Conditions for the ion exchange treatment are not particularly limited, and optimum conditions may be selected in consideration of viscosity characteristics, thickness, internal tensile stress, dimensional change, and the like of the glass.
- the ion-exchange the Na ions in the NaNO3 molten salt or the KNO3 and NaNO3 mixed molten salt with the Li component in the glass is preferable to ion-exchange the Na ions in the NaNO3 molten salt or the KNO3 and NaNO3 mixed molten salt with the Li component in the glass.
- the ion exchange between Na ions and Li components is faster than the ion exchange between K ions and Na components, and the ion exchange treatment can be performed efficiently.
- the ion exchange solution temperature is preferably 380 to 500° C.
- the ion exchange time is preferably 1 to 15 hours, 2 to 10 hours, 3 to 9 hours, and particularly preferably 4 to 8 hours.
- Tables 1 to 6 show the glass compositions of the crystalline glass plates (Sample Nos. 1 to 55) and the noncrystalline glass plate (Sample No. 56).
- R 2 O represents the total amount of Li 2 O, Na 2 O and K 2 O.
- glass raw materials were prepared so as to have the glass compositions shown in Tables 1 to 6, and melted at 1500°C for 8 hours using a platinum pot. Subsequently, the obtained molten glass was poured onto a carbon plate and formed into a flat plate to obtain a glass plate. After the surface of the obtained glass plate was optically polished so as to have a plate thickness of 0.6 mm, various properties were evaluated.
- the obtained crystalline glass plates (Sample Nos. 1 to 55) were subjected to heat treatment in an electric furnace under the heat treatment conditions shown in Tables 7 to 13 to precipitate and grow crystals in the glass matrix. . Then, it was cooled to room temperature to obtain a crystallized glass plate. No particular heat treatment was performed on the amorphous glass plate (Sample No. 56). The following properties of the obtained glass plate were evaluated. The results are shown in Tables 7-13.
- the transmittance is obtained by measuring the linear transmittance in the plate thickness direction using a spectrophotometer (Shimadzu UV-3100).
- each glass plate was subjected to ion exchange treatment under the conditions shown in the table to form a compressive stress layer on the surface to obtain Examples 1 to 67 and Comparative Examples 1 and 2.
- the compressive stress value and stress depth were measured by Orihara Seisakusho's scattered light photoelastic stress meter SLP-2000 or surface stress meter FSM-6000LE.
- the photoelastic constant of Examples 1 to 67 and Comparative Example 1 was 27.0 and the refractive index was 1.55, and the photoelastic constant of Comparative Example 2 was 30.5 and the refractive index was 1.51.
- the scratching strength is measured by first placing a P180 sandpaper on the sample and pressing an iron indenter with a tip of 9mm ⁇ with a load of 100N for 1 second. After that, a 3-point bending test was performed on the injured part of the sample taken out after unloading, and the stress at break was taken as the injured strength.
- Examples 1 to 67 are considered to have high transmittance and impact resistance in addition to high strength.
- the KNO3 molten salt is used for ion exchange, so the depth of stress (DOC) is small, and the Na ion concentration decreases from the surface side to the inside of the glass. It is considered that the impact resistance is not sufficiently high because it does not have a portion. Since Comparative Example 2 is not crystallized, it is considered that the strength is not sufficiently high.
- Example 52 lithium disilicate was precipitated and petalite was not precipitated, so it was found that the compressive stress value of the compressive stress layer was high.
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Abstract
Description
(1)モル%で、SiO2 50~80%、Al2O3 0~4.8%、P2O5 0.2~15%、Li2O 1.5~30%、Na2O+K2O 0~3.8%未満、Na2O 0~3.8%未満、K2O 0~3.8%未満、ZrO2 1.5~10%を含有。
(2)モル%で、SiO2 50~80%、Al2O3 0~4.8%、P2O5 0.2~15%、Li2O 1.5~30%、Na2O+K2O 0~3.5%、Na2O 0~2%、K2O 0~1.2%、ZrO2 1.5~10%を含有。
(3)モル%で、SiO2 50~80%、Al2O3 0~4.8%、P2O5 0.2~15%、Li2O 1.5~30%、Na2O+K2O 0~3.8%未満、Na2O 0~3.8%未満、K2O 0~3.8%未満、ZrO2 1.5~10%を含有し、モル比(Na2O+K2O)/(Li2O+Na2O+K2O)が1.20以下である。
Claims (10)
- イオン交換による圧縮応力層を有する結晶化ガラスであって、組成として、モル%で、SiO2 50~80%、Al2O3 0~4.8%、P2O5 0.2~15%、Li2O 1.5~30%、Na2O 0~15%、ZrO2 1.5~10%を含有し、前記結晶化ガラス中に、ガラスの表面側から内部側に向かってNaイオン濃度が減少している部分を有することを特徴とする結晶化ガラス。
- 板形状を有し、圧縮応力層の応力深さが板厚の13%以上である、請求項1に記載の結晶化ガラス。
- リチウムダイシリケート及びリチウムメタシリケートの少なくとも一方が析出している、請求項1又は2に記載の結晶化ガラス。
- X線回折スペクトルの最大ピークにおける半値幅FWHMが0.120°以上である、請求項1又は2に記載の結晶化ガラス。
- 圧縮応力層の圧縮応力値が100MPa以上である、請求項1又は2に記載の結晶化ガラス。
- 板形状を有し、板厚が1.5mm以下である、請求項1又は2に記載の結晶化ガラス。
- イオン交換による圧縮応力層を有する結晶化ガラスであって、リチウムダイシリケート及びリチウムメタシリケートの少なくとも一方が析出しており、ガラスの表面側から内部側に向かってNaイオン濃度が減少している部分を有することを特徴とする結晶化ガラス。
- イオン交換による圧縮応力層を有する結晶化ガラスであって、組成として、モル%で、SiO2 50~80%、Al2O3 0~4.8%、P2O5 0.2~15%、Li2O 1.5~30%、Na2O+K2O 0~3.8%未満、Na2O 0~3.8%未満、K2O 0~3.8%未満、ZrO2 1.5~10%を含有することを特徴とする結晶化ガラス。
- ガラス組成として、モル%で、SiO2 50~80%、Al2O3 0~4.8%、P2O5 0.2~15%、Li2O 1.5~30%、Na2O+K2O 0~3.8%未満、Na2O 0~3.8%未満、K2O 0~3.8%未満、ZrO2 1.5~10%を含有することを特徴とする結晶性ガラス。
- ガラス組成として、モル%でSiO2 50~80%、Al2O3 0~4.8%、P2O5 0.2~15%、Li2O 1.5~30%、Na2O 0~15%、ZrO2 1.5~10%を含有することを特徴とする結晶性ガラス。
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Citations (5)
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JPH10226532A (ja) * | 1995-12-28 | 1998-08-25 | Yamamura Glass Co Ltd | 磁気ディスク基板用ガラス組成物及び磁気ディスク基板 |
JP2001019488A (ja) * | 1999-07-06 | 2001-01-23 | Minolta Co Ltd | ガラス組成 |
WO2013088856A1 (ja) | 2011-12-16 | 2013-06-20 | 旭硝子株式会社 | ディスプレイ用カバーガラス、ディスプレイ用カバーガラスの製造方法 |
JP2017530933A (ja) * | 2014-10-08 | 2017-10-19 | コーニング インコーポレイテッド | ペタライト及びリチウムシリケート構造を有する高強度ガラスセラミック |
WO2019230889A1 (ja) | 2018-06-01 | 2019-12-05 | 日本電気硝子株式会社 | 強化ガラス及び強化用ガラス |
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US8917700B2 (en) | 2010-09-17 | 2014-12-23 | Qualcomm Incorporated | Method and apparatus for interference mitigation in wireless networks |
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Publication number | Priority date | Publication date | Assignee | Title |
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JPH10226532A (ja) * | 1995-12-28 | 1998-08-25 | Yamamura Glass Co Ltd | 磁気ディスク基板用ガラス組成物及び磁気ディスク基板 |
JP2001019488A (ja) * | 1999-07-06 | 2001-01-23 | Minolta Co Ltd | ガラス組成 |
WO2013088856A1 (ja) | 2011-12-16 | 2013-06-20 | 旭硝子株式会社 | ディスプレイ用カバーガラス、ディスプレイ用カバーガラスの製造方法 |
JP2017530933A (ja) * | 2014-10-08 | 2017-10-19 | コーニング インコーポレイテッド | ペタライト及びリチウムシリケート構造を有する高強度ガラスセラミック |
WO2019230889A1 (ja) | 2018-06-01 | 2019-12-05 | 日本電気硝子株式会社 | 強化ガラス及び強化用ガラス |
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