WO2023047745A1 - 半導体装置、電子機器、車両 - Google Patents

半導体装置、電子機器、車両 Download PDF

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Publication number
WO2023047745A1
WO2023047745A1 PCT/JP2022/025736 JP2022025736W WO2023047745A1 WO 2023047745 A1 WO2023047745 A1 WO 2023047745A1 JP 2022025736 W JP2022025736 W JP 2022025736W WO 2023047745 A1 WO2023047745 A1 WO 2023047745A1
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WIPO (PCT)
Prior art keywords
gate
voltage
electrode
misfet
circuit
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2022/025736
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English (en)
French (fr)
Japanese (ja)
Inventor
直樹 ▲高▼橋
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Rohm Co Ltd
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Rohm Co Ltd
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Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to DE112022004044.0T priority Critical patent/DE112022004044T5/de
Priority to CN202280065007.4A priority patent/CN118044120A/zh
Priority to JP2023549377A priority patent/JPWO2023047745A1/ja
Publication of WO2023047745A1 publication Critical patent/WO2023047745A1/ja
Priority to US18/614,483 priority patent/US20240235190A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02H—EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS
    • H02H9/00—Emergency protective circuit arrangements for limiting excess current or voltage without disconnection
    • H02H9/04—Emergency protective circuit arrangements for limiting excess current or voltage without disconnection responsive to excess voltage
    • H02H9/045—Emergency protective circuit arrangements for limiting excess current or voltage without disconnection responsive to excess voltage adapted to a particular application and not provided for elsewhere
    • H02H9/046—Emergency protective circuit arrangements for limiting excess current or voltage without disconnection responsive to excess voltage adapted to a particular application and not provided for elsewhere responsive to excess voltage appearing at terminals of integrated circuits
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/08—Modifications for protecting switching circuit against overcurrent or overvoltage
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M1/00—Details of apparatus for conversion
    • H02M1/08—Circuits specially adapted for the generation of control voltages for semiconductor devices incorporated in static converters
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/08—Modifications for protecting switching circuit against overcurrent or overvoltage
    • H03K17/082—Modifications for protecting switching circuit against overcurrent or overvoltage by feedback from the output to the control circuit
    • H03K17/0822—Modifications for protecting switching circuit against overcurrent or overvoltage by feedback from the output to the control circuit in field-effect transistor switches
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K5/00—Manipulating of pulses not covered by one of the other main groups of this subclass
    • H03K2005/00013—Delay, i.e. output pulse is delayed after input pulse and pulse length of output pulse is dependent on pulse length of input pulse
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K5/00—Manipulating of pulses not covered by one of the other main groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66—Vertical DMOS [VDMOS] FETs
    • H10D30/668—Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126—Top-view geometrical layouts of the regions or the junctions
    • H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/111—Field plates
    • H10D64/117—Recessed field plates, e.g. trench field plates or buried field plates

Definitions

  • the invention disclosed in this specification relates to a semiconductor device, and electronic equipment and vehicles using the same.
  • a semiconductor device such as an in-vehicle IPD generally has an active clamp circuit as a means for absorbing the back electromotive force of an inductive load.
  • in-vehicle ICs are required to comply with ISO26262 (international standard for functional safety related to electrical/electronics in automobiles), and it is important to design even higher reliability for in-vehicle IPDs. It's becoming
  • the invention disclosed in the present specification provides a semiconductor device capable of optimizing the active clamp operation in an output short-circuit state, and a semiconductor device using the same.
  • the purpose is to provide electronic equipment and vehicles.
  • the semiconductor device disclosed in this specification includes a gate-split type output transistor configured such that a plurality of channel regions are individually controlled according to a plurality of gate control signals; an active clamp circuit configured to limit the voltage across the output transistor to a predetermined clamp voltage or less after reaching a turn-off logic level; and the voltage across the output transistor being lower than the clamp voltage.
  • a delay circuit configured to give a predetermined delay to an internal signal indicating whether or not it exceeds a predetermined threshold voltage to generate a delayed internal signal; and to increase the on-resistance of the output transistor according to the delayed internal signal.
  • a gate control circuit configured to individually control the plurality of gate control signals.
  • FIG. 1 is a perspective view of a semiconductor device viewed from one direction.
  • FIG. 2 is a block circuit diagram showing the electrical structure of the semiconductor device.
  • FIG. 3 is a circuit diagram for explaining normal operation and active clamp operation of the semiconductor device.
  • FIG. 4 is a waveform diagram of main electrical signals.
  • FIG. 5 is a cross-sectional perspective view of region V shown in FIG.
  • FIG. 6 is a graph obtained by actually measuring the relationship between the active clamping capacity and the area resistivity.
  • FIG. 7 is a cross-sectional perspective view for explaining normal operation of the semiconductor device.
  • FIG. 8 is a cross-sectional perspective view for explaining the active clamping operation of the semiconductor device.
  • FIG. 9 is a block circuit diagram showing the semiconductor device according to the first embodiment.
  • FIG. 10 is an equivalent circuit diagram representing the power MISFET of FIG. 9 as a first MISFET and a second MISFET.
  • 11 is a circuit diagram showing a configuration example of the gate control circuit and the active clamp circuit in FIG. 10.
  • FIG. 12 is a timing chart showing how the first Half-ON control of the power MISFET is performed during the active clamp operation.
  • 13A and 13B are diagrams for explaining the active clamp operation in the output short-circuit state of the semiconductor device according to the first embodiment.
  • FIG. FIG. 14 is a block circuit diagram showing the semiconductor device according to the second embodiment.
  • FIG. 15 is a diagram showing a configuration example of a delay circuit according to the second embodiment.
  • FIG. 16 is a diagram for explaining the active clamping operation of the semiconductor device according to the second embodiment.
  • FIG. 17 is a block circuit diagram showing the semiconductor device according to the third embodiment.
  • FIG. 18 is a diagram showing a configuration example of a delay circuit according to the third embodiment.
  • FIG. 19 is a diagram (without a delay circuit) for explaining the active clamp operation of the semiconductor device according to the third embodiment;
  • FIG. 20 is a diagram (with a delay circuit) for explaining the active clamp operation of the semiconductor device according to the third embodiment;
  • FIG. 21 is an external view showing one configuration example of a vehicle.
  • FIG. 1 is a perspective view of the semiconductor device 1 viewed from one direction.
  • the semiconductor device 1 is not limited to a high-side switching device.
  • the semiconductor device 1 can also be provided as a low-side switching device by adjusting the electrical connections or functions of various structures.
  • semiconductor device 1 includes semiconductor layer 2 .
  • the semiconductor layer 2 contains silicon.
  • the semiconductor layer 2 is formed in the shape of a rectangular parallelepiped chip.
  • the semiconductor layer 2 has a first main surface 3 on one side, a second main surface 4 on the other side, and side surfaces 5A, 5B, 5C, and 5D connecting the first main surface 3 and the second main surface 4. ing.
  • the first main surface 3 and the second main surface 4 are formed in a quadrangular shape when viewed from the normal direction Z (hereinafter simply referred to as "plan view").
  • the side surface 5A and the side surface 5C extend along the first direction X and face each other in a second direction Y intersecting the first direction X.
  • the side surface 5B and the side surface 5D extend along the second direction Y and face each other in the first direction X.
  • the second direction Y is, more specifically, orthogonal to the first direction X. As shown in FIG.
  • An output area 6 and an input area 7 are set in the semiconductor layer 2 .
  • the output area 6 is set in the area on the side of the side surface 5C.
  • the input area 7 is set in the area on the side 5A side.
  • the area SOUT of the output region 6 is greater than or equal to the area SIN of the input region 7 (SIN ⁇ SOUT).
  • the ratio SOUT/SIN of the area SOUT to the area SIN may be 1 or more and 10 or less (1 ⁇ SOUT/SIN ⁇ 10).
  • the ratio SOUT/SIN may be 1 or more and 2 or less, 2 or more and 4 or less, 4 or more and 6 or less, 6 or more and 8 or less, or 8 or more and 10 or less.
  • the planar shape of the input area 7 and the planar shape of the output area 6 are arbitrary and are not limited to specific shapes. Of course, the ratio SOUT/SIN may be greater than 0 and less than 1.
  • Power MISFET 9 includes a gate, drain and source.
  • the power MISFET 9 functions as a high-side switch that conducts/disconnects between the power supply end and the load.
  • the input area 7 includes a control IC (Integrated Circuit) 10 as an example of a control circuit.
  • the control IC 10 includes multiple types of functional circuits that implement various functions.
  • the plurality of types of functional circuits include circuits that generate gate control signals for driving and controlling the power MISFET 9 based on electrical signals from the outside.
  • the control IC 10 forms a so-called IPD (Intelligent Power Device) together with the power MISFET 9 .
  • the IPD is also called an IPM (Intelligent Power Module).
  • the input area 7 is electrically isolated from the output area 6 by the area isolation structure 8 .
  • the region isolation structures 8 are indicated by hatching. Although a detailed description is omitted, the region isolation structure 8 may have a trench isolation structure in which a trench is filled with an insulator.
  • a plurality of (here, six) electrodes 11 , 12 , 13 , 14 , 15 , 16 are formed on the semiconductor layer 2 .
  • a plurality of electrodes 11-16 are indicated by hatching.
  • a plurality of electrodes 11 to 16 are formed as terminal electrodes that are externally connected by conducting wires (eg, bonding wires) or the like.
  • the number, arrangement and planar shape of the plurality of electrodes 11 to 16 are arbitrary, and are not limited to the form shown in FIG.
  • the number, arrangement and planar shape of the plurality of electrodes 11 to 16 are adjusted according to the specifications of the power MISFET 9 or the specifications of the control IC 10.
  • the plurality of electrodes 11-16 includes, in this embodiment, a drain electrode 11 (power supply electrode), a source electrode 12 (output electrode), an input electrode 13, a reference voltage electrode 14, an ENABLE electrode 15 and a SENSE electrode 16.
  • FIG. 11 power supply electrode
  • FIG. 12 power supply electrode
  • the drain electrode 11 is formed on the second main surface 4 of the semiconductor layer 2 . Drain electrode 11 is electrically connected to second main surface 4 of semiconductor layer 2 . The drain electrode 11 transmits the power supply voltage VB to the drain of the power MISFET 9 and various circuits of the control IC 10 .
  • the drain electrode 11 may include at least one of a Ti layer, Ni layer, Au layer, Ag layer and Al layer.
  • the drain electrode 11 may have a single layer structure including a Ti layer, Ni layer, Au layer, Ag layer or Al layer.
  • the drain electrode 11 may have a laminated structure in which at least two of a Ti layer, a Ni layer, an Au layer, an Ag layer, and an Al layer are laminated in an arbitrary manner.
  • the source electrode 12 is formed on the output region 6 on the first main surface 3 .
  • Source electrode 12 is electrically connected to the source of power MISFET 9 .
  • the source electrode 12 transmits an electric signal generated by the power MISFET 9 to the outside.
  • the input electrode 13 , the reference voltage electrode 14 , the ENABLE electrode 15 and the SENSE electrode 16 are each formed on the input region 7 on the first main surface 3 .
  • Input electrode 13 transmits an input voltage for driving control IC 10 .
  • the reference voltage electrode 14 transmits a reference voltage (eg ground voltage) to the control IC 10 .
  • ENABLE electrode 15 transmits an electrical signal for enabling or disabling some or all of the functions of control IC 10 .
  • SENSE electrode 16 transmits an electrical signal for detecting an abnormality in control IC 10 .
  • a gate control wiring 17 as an example of a control wiring is further formed on the semiconductor layer 2 .
  • the gate control wiring 17 is selectively routed to the output region 6 and the input region 7 .
  • the gate control wiring 17 is electrically connected to the gate of the power MISFET 9 in the output region 6 and electrically connected to the control IC 10 in the input region 7 .
  • the gate control wiring 17 transmits the gate control signal generated by the control IC 10 to the gate of the power MISFET 9 .
  • the gate control signals include on-signal Von and off-signal Voff, and control the on-state and off-state of power MISFET 9 .
  • the ON signal Von is higher than the gate threshold voltage Vth of the power MISFET 9 (Vth ⁇ Von).
  • the off signal Voff is lower than the gate threshold voltage Vth of the power MISFET 9 (Voff ⁇ Vth).
  • the off signal Voff may be a reference voltage (eg ground voltage).
  • the gate control wiring 17 includes a first gate control wiring 17A, a second gate control wiring 17B and a third gate control wiring 17C in this form.
  • the first gate control wiring 17A, the second gate control wiring 17B and the third gate control wiring 17C are electrically insulated from each other.
  • two first gate control wirings 17A are routed to different regions. Also, the two second gate control wirings 17B are routed to different regions. Also, the two third gate control wirings 17C are routed to different regions.
  • the first gate control wiring 17A, the second gate control wiring 17B and the third gate control wiring 17C transmit the same or different gate control signals to the gates of the power MISFETs 9.
  • the number, arrangement, shape, etc. of the gate control wiring 17 are arbitrary, and are adjusted according to the transmission distance of the gate control signal or the number of gate control signals to be transmitted.
  • Source electrode 12, input electrode 13, reference voltage electrode 14, ENABLE electrode 15, SENSE electrode 16, and gate control wiring 17 each contain at least one of nickel, palladium, aluminum, copper, an aluminum alloy, and a copper alloy. You can
  • the source electrode 12, the input electrode 13, the reference voltage electrode 14, the ENABLE electrode 15, the SENSE electrode 16 and the gate control wiring 17 are made of Al--Si--Cu (aluminum--silicon--copper) alloy, Al--Si (aluminum--silicon) alloy. , and at least one of an Al—Cu (aluminum-copper) alloy.
  • the source electrode 12, the input electrode 13, the reference voltage electrode 14, the ENABLE electrode 15, the SENSE electrode 16, and the gate control wiring 17 may contain the same type of electrode material, or may contain mutually different electrode materials. .
  • FIG. 2 is a block circuit diagram showing the electrical structure of the semiconductor device 1 shown in FIG. A case where the semiconductor device 1 is mounted on a vehicle will be described below as an example.
  • the semiconductor device 1 includes a drain electrode 11, a source electrode 12, an input electrode 13, a reference voltage electrode 14, an ENABLE electrode 15, a SENSE electrode 16, a gate control wiring 17, a power MISFET 9 and a control IC 10.
  • the power supply voltage VB may be 10 V or more and 20 V or less.
  • the input electrode 13 may be connected to an MCU (Micro Controller Unit), DC/DC converter, LDO (Low Drop Out), or the like. Input electrode 13 provides an input voltage to control IC 10 . The input voltage may be between 1V and 10V.
  • the reference voltage electrode 14 is connected to the reference voltage wiring. Reference voltage electrode 14 provides a reference voltage to power MISFET 9 and control IC 10 .
  • the ENABLE electrode 15 may be connected to the MCU. An electric signal for enabling or disabling some or all of the functions of the control IC 10 is input to the ENABLE electrode 15 .
  • the SENSE electrode 16 may be connected to a resistor.
  • a gate of the power MISFET 9 is connected to a control IC 10 (a gate control circuit 25 to be described later) via a gate control wiring 17 .
  • a drain of the power MISFET 9 is connected to the drain electrode 11 .
  • a source of the power MISFET 9 is connected to a control IC 10 (current detection circuit 27 to be described later) and a source electrode 12 .
  • the control IC 10 includes a sensor MISFET 21, an input circuit 22, a current/voltage control circuit 23, a protection circuit 24, a gate control circuit 25, an active clamp circuit 26, a current detection circuit 27, a power reverse connection protection circuit 28, and an abnormality detection circuit 29. .
  • a gate of the sensor MISFET 21 is connected to the gate control circuit 25 .
  • a drain of the sensor MISFET 21 is connected to the drain electrode 11 .
  • a source of the sensor MISFET 21 is connected to the current detection circuit 27 .
  • the input circuit 22 is connected to the input electrode 13 and the current/voltage control circuit 23 .
  • Input circuit 22 may include a Schmitt trigger circuit.
  • the input circuit 22 shapes the waveform of the electrical signal applied to the input electrode 13 .
  • a signal generated by the input circuit 22 is input to the current/voltage control circuit 23 .
  • the current/voltage control circuit 23 is connected to a protection circuit 24 , a gate control circuit 25 , a power supply reverse connection protection circuit 28 and an abnormality detection circuit 29 .
  • the current/voltage control circuit 23 may include a logic circuit.
  • the current/voltage control circuit 23 generates various voltages according to the electrical signal from the input circuit 22 and the electrical signal from the protection circuit 24 .
  • the current/voltage control circuit 23 includes a drive voltage generation circuit 30 , a first constant voltage generation circuit 31 , a second constant voltage generation circuit 32 and a reference voltage/reference current generation circuit 33 in this embodiment.
  • the drive voltage generation circuit 30 generates a drive voltage for driving the gate control circuit 25 .
  • the drive voltage may be set to a value obtained by subtracting a predetermined value from the power supply voltage VB.
  • the drive voltage generation circuit 30 may generate a drive voltage of 5 V or more and 15 V or less by subtracting 5 V from the power supply voltage VB.
  • a drive voltage is input to the gate control circuit 25 .
  • the first constant voltage generation circuit 31 generates a first constant voltage for driving the protection circuit 24.
  • the first constant voltage generation circuit 31 may include a Zener diode or a regulator circuit (here, a Zener diode).
  • the first constant voltage may be 1 V or more and 5 V or less.
  • the first constant voltage is input to the protection circuit 24 (more specifically, an open load detection circuit 35 and the like, which will be described later).
  • the second constant voltage generation circuit 32 generates a second constant voltage for driving the protection circuit 24.
  • the second constant voltage generation circuit 32 may include a Zener diode or a regulator circuit (regulator circuit here).
  • the second constant voltage may be 1 V or more and 5 V or less.
  • the second constant voltage is input to the protection circuit 24 (more specifically, an overheat protection circuit 36 and a low-voltage malfunction suppression circuit 37, which will be described later).
  • the reference voltage/reference current generation circuit 33 generates reference voltages and reference currents for various circuits.
  • the reference voltage may be 1 V or more and 5 V or less.
  • the reference current may be 1 mA or more and 1 A or less.
  • the reference voltage and reference current are input to various circuits. If the various circuits include comparators, the reference voltage and reference current may be input to the comparators.
  • the protection circuit 24 is connected to the current/voltage control circuit 23 , the gate control circuit 25 , the abnormality detection circuit 29 , the source of the power MISFET 9 and the source of the sensor MISFET 21 .
  • Protection circuit 24 includes an overcurrent protection circuit 34 , an open load detection circuit 35 , an overheat protection circuit 36 and a low voltage malfunction suppression circuit 37 .
  • the overcurrent protection circuit 34 protects the power MISFET 9 from overcurrent.
  • the overcurrent protection circuit 34 is connected to the source of the gate control circuit 25 and the sensor MISFET21.
  • Overcurrent protection circuit 34 may include a current monitor circuit. A signal generated by the overcurrent protection circuit 34 is input to the gate control circuit 25 (more specifically, a drive signal output circuit 40 described later).
  • the open load detection circuit 35 detects the short state and open state of the power MISFET 9 .
  • the load open detection circuit 35 is connected to the current/voltage control circuit 23 and the source of the power MISFET 9 .
  • a signal generated by the open load detection circuit 35 is input to the current/voltage control circuit 23 .
  • the overheat protection circuit 36 monitors the temperature of the power MISFET 9 and protects the power MISFET 9 from excessive temperature rise.
  • the overheat protection circuit 36 is connected to the current/voltage control circuit 23 .
  • Thermal protection circuit 36 may include a temperature sensitive device such as a temperature sensitive diode or thermistor. A signal generated by the overheat protection circuit 36 is input to the current/voltage control circuit 23 .
  • the low-voltage malfunction suppression circuit 37 suppresses malfunction of the power MISFET 9 when the power supply voltage VB is less than a predetermined value.
  • the low voltage malfunction suppression circuit 37 is connected to the current/voltage control circuit 23 .
  • a signal generated by the low-voltage malfunction suppression circuit 37 is input to the current/voltage control circuit 23 .
  • the gate control circuit 25 controls the ON state and OFF state of the power MISFET 9 and the ON state and OFF state of the sensor MISFET 21 .
  • the gate control circuit 25 is connected to the current/voltage control circuit 23 , the protection circuit 24 , the gate of the power MISFET 9 and the gate of the sensor MISFET 21 .
  • the gate control circuit 25 generates a plurality of gate control signals corresponding to the number of gate control wirings 17 according to the electrical signal from the current/voltage control circuit 23 and the electrical signal from the protection circuit 24 .
  • a plurality of gate control signals are input to the gate of the power MISFET 9 and the gate of the sensor MISFET 21 through the gate control wiring 17, respectively.
  • the gate control circuit 25 collectively controls a plurality of gate control signals in response to an electrical signal (input signal) applied to the input electrode 13 to turn on/off the power MISFET 9, while active clamping is performed. It has a function of individually controlling a plurality of gate control signals so as to raise the on-resistance of the power MISFET 9 when the circuit 26 operates (details will be described later).
  • the gate control circuit 25 more specifically includes an oscillation circuit 38, a charge pump circuit 39 and a drive signal output circuit 40.
  • the oscillator circuit 38 oscillates according to the electrical signal from the current/voltage control circuit 23 and generates a predetermined electrical signal.
  • An electrical signal generated by the oscillator circuit 38 is input to the charge pump circuit 39 .
  • the charge pump circuit 39 boosts the electric signal from the oscillation circuit 38 .
  • the electric signal boosted by the charge pump circuit 39 is input to the drive signal output circuit 40 .
  • the drive signal output circuit 40 generates a plurality of gate control signals according to the electrical signal from the charge pump circuit 39 and the electrical signal from the protection circuit 24 (more specifically, the overcurrent protection circuit 34).
  • a plurality of gate control signals are inputted to the gate of the power MISFET 9 and the gate of the sensor MISFET 21 via the gate control wiring 17 .
  • Sensor MISFET 21 and power MISFET 9 are controlled simultaneously by gate control circuit 25 .
  • the active clamp circuit 26 protects the power MISFET 9 from back electromotive force. Active clamp circuit 26 is connected to drain electrode 11 , the gate of power MISFET 9 and the gate of sensor MISFET 21 . Active clamp circuit 26 may include multiple diodes.
  • the active clamp circuit 26 may include multiple diodes forward-biased to each other. Active clamp circuit 26 may include multiple diodes that are reverse biased together. The active clamp circuit 26 may include multiple diodes forward biased together and multiple diodes reverse biased together.
  • the plurality of diodes may include pn junction diodes, Zener diodes, or pn junction diodes and Zener diodes.
  • Active clamp circuit 26 may include multiple Zener diodes biased together.
  • Active clamp circuit 26 may include a Zener diode and a pn junction diode that are reverse biased together.
  • the current detection circuit 27 detects currents flowing through the power MISFET 9 and the sensor MISFET 21 .
  • the current detection circuit 27 is connected to the protection circuit 24 , the abnormality detection circuit 29 , the source of the power MISFET 9 and the source of the sensor MISFET 21 .
  • Current detection circuit 27 generates a current detection signal according to the electrical signal generated by power MISFET 9 and the electrical signal generated by sensor MISFET 21 .
  • the current detection signal is input to the abnormality detection circuit 29 .
  • the power supply reverse connection protection circuit 28 protects the current/voltage control circuit 23, the power MISFET 9, etc. from the reverse voltage when the power supply is reversely connected.
  • a reverse power connection protection circuit 28 is connected to the reference voltage electrode 14 and the current/voltage control circuit 23 .
  • the abnormality detection circuit 29 monitors the voltage of the protection circuit 24.
  • the abnormality detection circuit 29 is connected to the current/voltage control circuit 23 , the protection circuit 24 and the current detection circuit 27 .
  • an abnormality such as voltage fluctuation
  • the abnormality detection circuit 29 detects the voltage of the protection circuit 24. Generates an abnormality detection signal according to the condition and outputs it to the outside.
  • the abnormality detection circuit 29 more specifically includes a first multiplexer circuit 41 and a second multiplexer circuit 42 .
  • the first multiplexer circuit 41 includes two inputs, one output and one selection control input. The input portion of the first multiplexer circuit 41 is connected to the protection circuit 24 and the current detection circuit 27, respectively.
  • a second multiplexer circuit 42 is connected to the output of the first multiplexer circuit 41 .
  • a current/voltage control circuit 23 is connected to the selection control input section of the first multiplexer circuit 41 .
  • the first multiplexer circuit 41 generates an abnormality detection signal according to the electric signal from the current/voltage control circuit 23, the voltage detection signal from the protection circuit 24, and the current detection signal from the current detection circuit 27.
  • the abnormality detection signal generated by the first multiplexer circuit 41 is input to the second multiplexer circuit 42 .
  • the second multiplexer circuit 42 includes two inputs and one output.
  • the input section of the second multiplexer circuit 42 is connected to the output section of the second multiplexer circuit 42 and the ENABLE electrode 15, respectively.
  • the SENSE electrode 16 is connected to the output of the second multiplexer circuit 42 .
  • an ON signal is input from the MCU to the ENABLE electrode 15 and an abnormality detection signal is taken out from the SENSE electrode 16 .
  • the abnormality detection signal is converted into an electrical signal by a resistor connected to the SENSE electrode 16 .
  • An abnormal state of the semiconductor device 1 is detected based on this electrical signal.
  • FIG. 3 is a circuit diagram for explaining the active clamping operation of the semiconductor device 1 shown in FIG.
  • FIG. 4 is a waveform diagram of main electrical signals in the circuit diagram shown in FIG.
  • inductive load L is connected to the power MISFET 9.
  • devices using windings (coils) such as solenoids, motors, transformers, and relays are exemplified as the inductive load L.
  • Inductive load L is also referred to as L-load.
  • the source of power MISFET 9 is connected to inductive load L.
  • a drain of the power MISFET 9 is electrically connected to the drain electrode 11 .
  • the gate and drain of power MISFET 9 are connected to active clamp circuit 26 .
  • the active clamp circuit 26 includes m (m is a natural number) Zener diodes DZ and n (n is a natural number) pn junction diodes D in this circuit example.
  • the pn junction diode D is reverse biased with respect to the Zener diode DZ.
  • the power MISFET 9 switches from the OFF state to the ON state (normal operation).
  • the ON signal Von has a voltage equal to or higher than the gate threshold voltage Vth (Vth ⁇ Von).
  • the power MISFET 9 is kept on for a predetermined on-time TON.
  • the drain current ID begins to flow from the drain of the power MISFET 9 to the source.
  • the drain current ID increases from zero to a predetermined value and saturates.
  • Inductive load L stores inductive energy due to the increase in drain current ID.
  • the off signal Voff When the off signal Voff is input to the gate of the power MISFET 9, the power MISFET 9 switches from the on state to the off state.
  • the off signal Voff has a voltage less than the gate threshold voltage Vth (Voff ⁇ Vth).
  • the off signal Voff may be a reference voltage (eg ground voltage).
  • the inductive energy of the inductive load L is applied to the power MISFET 9 as back electromotive force.
  • the power MISFET 9 enters an active clamp state (active clamp operation).
  • the source voltage VSS rapidly drops to a negative voltage lower than the reference voltage (ground voltage).
  • the source voltage VSS is limited to a voltage equal to or higher than the voltage obtained by subtracting the limit voltage VL and the clamp-on voltage VCLP from the power supply voltage VB (VSS ⁇ VB ⁇ VL ⁇ VCLP). be.
  • clamp voltage VDSSCL is limited by power MISFET 9 and active clamp circuit 26 to a voltage equal to or lower than the sum of clamp-on voltage VCLP and limit voltage VL (VDS ⁇ VCLP+VL).
  • the clamp-on voltage VCLP is a positive voltage applied between the gate and source of the power MISFET 9 (that is, gate voltage VGS).
  • the clamp-on voltage VCLP is equal to or higher than the gate threshold voltage Vth (Vth ⁇ VCLP). Therefore, power MISFET 9 maintains the ON state in the active clamp state.
  • the power MISFET 9 is destroyed.
  • the power MISFET 9 is designed so that the clamp voltage VDSSCL is equal to or less than the maximum rated drain voltage VDSS (VDSSCL ⁇ VDSS).
  • VDSSCL When the clamp voltage VDSSCL is lower than the maximum rated drain voltage VDSS (VDSSCL ⁇ VDSS), the drain current ID continues to flow from the drain to the source of the power MISFET 9, and the inductive energy of the inductive load L is consumed (absorbed) in the power MISFET 9. be done.
  • the drain current ID decreases from the peak value IAV immediately before the power MISFET 9 is turned off to zero after the active clamp time TAV.
  • the gate voltage VGS becomes the reference voltage (for example, the ground voltage), and the power MISFET 9 is switched from the on state to the off state.
  • the active clamp tolerance Eac of the power MISFET 9 is defined by the tolerance of the power MISFET 9 during active clamp operation. More specifically, the active clamp tolerance Eac is defined by the tolerance of the power MISFET 9 against back electromotive force generated due to the inductive energy of the inductive load L when the power MISFET 9 transitions from the ON state to the OFF state. be.
  • the active clamp tolerance Eac is defined by the tolerance of the power MISFET 9 to energy generated due to the clamp voltage VDSSCL.
  • FIG. 5 is a cross-sectional perspective view of region V shown in FIG.
  • the upper structure of the first main surface 3 (the source electrode 12, the gate control wiring 17, the interlayer insulating layer, etc.) is omitted in this figure.
  • the semiconductor layer 2 has a laminated structure including an n + -type semiconductor substrate 51 and an n-type epitaxial layer 52 in this embodiment.
  • a second main surface 4 of the semiconductor layer 2 is formed by the semiconductor substrate 51 .
  • the epitaxial layer 52 forms the first main surface 3 of the semiconductor layer 2 .
  • Semiconductor substrate 51 and epitaxial layer 52 form side surfaces 5A to 5D of semiconductor layer 2 .
  • the epitaxial layer 52 has an n-type impurity concentration less than the n-type impurity concentration of the semiconductor substrate 51 .
  • the n-type impurity concentration of the semiconductor substrate 51 may be 1 ⁇ 10 18 cm ⁇ 3 or more and 1 ⁇ 10 20 cm ⁇ 3 or less.
  • the n-type impurity concentration of the epitaxial layer 52 may be 1 ⁇ 10 15 cm ⁇ 3 or more and 1 ⁇ 10 18 cm ⁇ 3 or less.
  • the epitaxial layer 52 has a thickness Tepi less than the thickness Tsub of the semiconductor substrate 51 (Tepi ⁇ Tsub).
  • the thickness Tsub may be 50 ⁇ m or more and 450 ⁇ m or less.
  • the thickness Tsub may be 50 ⁇ m to 150 ⁇ m, 150 ⁇ m to 250 ⁇ m, 250 ⁇ m to 350 ⁇ m, or 350 ⁇ m to 450 ⁇ m.
  • the resistance value can be reduced by reducing the thickness Tsub.
  • the thickness Tsub is adjusted by grinding.
  • the second main surface 4 of the semiconductor layer 2 may be a ground surface having grinding marks.
  • the thickness Tepi of the epitaxial layer 52 is preferably 1/10 or less of the thickness Tsub.
  • the thickness Tepi may be 5 ⁇ m or more and 20 ⁇ m or less.
  • the thickness Tepi may be between 5 ⁇ m and 10 ⁇ m, between 10 ⁇ m and 15 ⁇ m, or between 15 ⁇ m and 20 ⁇ m.
  • the thickness Tepi is preferably 5 ⁇ m or more and 15 ⁇ m or less.
  • a semiconductor substrate 51 is formed on the second main surface 4 side of the semiconductor layer 2 as a drain region 53 .
  • the epitaxial layer 52 is formed in the surface layer portion of the first main surface 3 of the semiconductor layer 2 as a drift region 54 (drain drift region).
  • the bottom of drift region 54 is formed by the boundary of semiconductor substrate 51 and epitaxial layer 52 .
  • the epitaxial layer 52 is hereinafter referred to as a drift region 54 .
  • a p-type body region 55 is formed in the surface layer portion of the first main surface 3 of the semiconductor layer 2 in the output region 6 .
  • the body region 55 is the base region of the power MISFET 9 .
  • the body region 55 may have a p-type impurity concentration of 1 ⁇ 10 16 cm ⁇ 3 or more and 1 ⁇ 10 18 cm ⁇ 3 or less.
  • the body region 55 is formed on the surface layer of the drift region 54 .
  • the bottom of body region 55 is formed in a region on the first main surface 3 side with respect to the bottom of drift region 54 .
  • the thickness of the body region 55 may be 0.5 ⁇ m or more and 2 ⁇ m or less.
  • the thickness of the body region 55 may be 0.5 ⁇ m or more and 1 ⁇ m or less, 1 ⁇ m or more and 1.5 ⁇ m or less, or 1.5 ⁇ m or more and 2 ⁇ m or less.
  • the power MISFET 9 includes a first MISFET 56 (first transistor) and a second MISFET 57 (second transistor).
  • the first MISFET 56 is electrically isolated from the second MISFET 57 and independently controlled.
  • the second MISFET 57 is electrically isolated from the first MISFET 56 and independently controlled.
  • the power MISFET 9 is configured to be driven when both the first MISFET 56 and the second MISFET 57 are in the ON state (Full-ON control). Also, the power MISFET 9 is configured to be driven while the first MISFET 56 is in the ON state and the second MISFET 57 is in the OFF state (first Half-ON control). Furthermore, the power MISFET 9 is configured to be driven while the first MISFET 56 is in the OFF state and the second MISFET 57 is in the ON state (second Half-ON control).
  • the power MISFET 9 In the case of Full-ON control, the power MISFET 9 is driven with all current paths released. Therefore, the on-resistance in the semiconductor layer 2 is relatively lowered. On the other hand, in the case of the first Half-ON control or the second Half-ON control, the power MISFET 9 is driven with some current paths cut off. Therefore, the on-resistance in the semiconductor layer 2 relatively increases.
  • the first MISFET 56 specifically includes a plurality of first FET (Field Effect Transistor) structures 58 .
  • the plurality of first FET structures 58 are arranged at intervals along the first direction X and extend along the second direction Y in a strip shape, respectively, in plan view.
  • the plurality of first FET structures 58 are formed in a stripe shape as a whole in plan view.
  • the region on the one end side of the first FET structure 58 is illustrated, and the illustration of the region on the other end side of the first FET structure 58 is omitted.
  • the structure of the region on the other end side of the first FET structure 58 is substantially the same as the structure of the region on the one end side of the first FET structure 58 .
  • the structure of the region on the one end side of the first FET structure 58 will be described as an example, and the structure of the region on the other end side of the first FET structure 58 will be omitted.
  • Each first FET structure 58 includes a first trench gate structure 60 in this form.
  • the first width WT1 of the first trench gate structure 60 may be between 0.5 ⁇ m and 5 ⁇ m.
  • the first width WT1 is the width in the direction (first direction X) orthogonal to the direction (second direction Y) in which the first trench gate structure 60 extends.
  • the first width WT1 is 0.5 ⁇ m or more and 1 ⁇ m or less, 1 ⁇ m or more and 1.5 ⁇ m or less, 1.5 ⁇ m or more and 2 ⁇ m or less, 2 ⁇ m or more and 2.5 ⁇ m or less, 2.5 ⁇ m or more and 3 ⁇ m or less, 3 ⁇ m or more and 3.5 ⁇ m or less, It may be 3.5 ⁇ m or more and 4 ⁇ m or less, 4 ⁇ m or more and 4.5 ⁇ m or less, or 4.5 ⁇ m or more and 5 ⁇ m or less.
  • the first width WT1 is preferably 0.8 ⁇ m or more and 1.2 ⁇ m or less.
  • the first trench gate structure 60 penetrates the body region 55 and reaches the drift region 54 .
  • the first depth DT1 of the first trench gate structure 60 may be 1 ⁇ m or more and 10 ⁇ m or less.
  • the first depth DT1 may be 1 ⁇ m or more and 2 ⁇ m or less, 2 ⁇ m or more and 4 ⁇ m or less, 4 ⁇ m or more and 6 ⁇ m or less, 6 ⁇ m or more and 8 ⁇ m or less, or 8 ⁇ m or more and 10 ⁇ m or less.
  • the first depth DT1 is preferably 2 ⁇ m or more and 6 ⁇ m or less.
  • the first trench gate structure 60 includes a first sidewall 61 on one side, a second sidewall 62 on the other side, and a bottom wall 63 connecting the first sidewall 61 and the second sidewall 62 .
  • the 1st side wall 61, the 2nd side wall 62, and the bottom wall 63 may be collectively called an “inner wall” or an “outer wall.”
  • the absolute value of the angle (taper angle) formed between the first side wall 61 and the first main surface 3 in the semiconductor layer 2 may be more than 90° and 95° or less (for example, about 91°).
  • the absolute value of the angle (taper angle) formed between second sidewall 62 and first main surface 3 in semiconductor layer 2 may be more than 90° and 95° or less (for example, about 91°).
  • the first trench gate structure 60 may be formed in a tapered shape (tapered shape) in which the first width WT1 narrows from the first main surface 3 side toward the bottom wall 63 side in a cross-sectional view.
  • the bottom wall 63 of the first trench gate structure 60 is located in a region on the first main surface 3 side with respect to the bottom of the drift region 54 .
  • a bottom wall 63 of the first trench gate structure 60 is formed in a convex curved shape (U-shape) toward the bottom of the drift region 54 .
  • the bottom wall 63 of the first trench gate structure 60 is located in the region on the first main surface 3 side with a first interval IT1 of 1 ⁇ m or more and 10 ⁇ m or less from the bottom of the drift region 54 .
  • the first interval IT1 may be 1 ⁇ m or more and 2 ⁇ m or less, 2 ⁇ m or more and 4 ⁇ m or less, 4 ⁇ m or more and 6 ⁇ m or less, 6 ⁇ m or more and 8 ⁇ m or less, or 8 ⁇ m or more and 10 ⁇ m or less.
  • the first interval IT1 is preferably 1 ⁇ m or more and 5 ⁇ m or less.
  • the second MISFET 57 includes a plurality of second FET structures 68 in this form.
  • the plurality of second FET structures 68 are arranged at intervals along the first direction X and extend along the second direction Y in a strip shape, respectively, in plan view.
  • the multiple second FET structures 68 extend along the same direction as the multiple first FET structures 58 .
  • the plurality of second FET structures 68 are formed in a stripe shape as a whole in plan view.
  • the plurality of second FET structures 68 are alternately arranged with the plurality of first FET structures 58 in a manner that sandwiches one first FET structure 58 in this embodiment.
  • the region on the one end side of the second FET structure 68 is illustrated, and the illustration of the region on the other end side of the second FET structure 68 is omitted.
  • the structure of the region on the other end side of the second FET structure 68 is substantially the same as the structure of the region on the one end side of the second FET structure 68 .
  • the structure of the region on the one end side of the second FET structure 68 will be described as an example, and the structure of the region on the other end side of the second FET structure 68 will be omitted.
  • Each second FET structure 68 includes a second trench gate structure 70 in this form.
  • a second width WT2 of the second trench gate structure 70 may be 0.5 ⁇ m or more and 5 ⁇ m or less.
  • the second width WT2 is the width in the direction (first direction X) orthogonal to the direction (second direction Y) in which the second trench gate structure 70 extends.
  • the second width WT2 is 0.5 ⁇ m or more and 1 ⁇ m or less, 1 ⁇ m or more and 1.5 ⁇ m or less, 1.5 ⁇ m or more and 2 ⁇ m or less, 2 ⁇ m or more and 2.5 ⁇ m or less, 2.5 ⁇ m or more and 3 ⁇ m or less, 3 ⁇ m or more and 3.5 ⁇ m or less, It may be 3.5 ⁇ m or more and 4 ⁇ m or less, 4 ⁇ m or more and 4.5 ⁇ m or less, or 4.5 ⁇ m or more and 5 ⁇ m or less.
  • the second width WT2 is preferably 0.8 ⁇ m or more and 1.2 ⁇ m or less.
  • the second width WT2 of the second trench gate structure 70 may be greater than or equal to the first width WT1 of the first trench gate structure 60 (WT1 ⁇ WT2).
  • the second width WT2 may be less than or equal to the first width WT1 (WT1 ⁇ WT2).
  • the second trench gate structure 70 penetrates the body region 55 and reaches the drift region 54.
  • the second depth DT2 of the second trench gate structure 70 may be 1 ⁇ m or more and 10 ⁇ m or less.
  • the second depth DT2 may be 1 ⁇ m or more and 2 ⁇ m or less, 2 ⁇ m or more and 4 ⁇ m or less, 4 ⁇ m or more and 6 ⁇ m or less, 6 ⁇ m or more and 8 ⁇ m or less, or 8 ⁇ m or more and 10 ⁇ m or less.
  • the second depth DT2 is preferably 2 ⁇ m or more and 6 ⁇ m or less.
  • the second depth DT2 of the second trench gate structure 70 may be greater than or equal to the first depth DT1 of the first trench gate structure 60 (DT1 ⁇ DT2).
  • the second depth DT2 may be less than or equal to the first depth DT1 (DT1 ⁇ DT2).
  • the second trench gate structure 70 includes a first sidewall 71 on one side, a second sidewall 72 on the other side, and a bottom wall 73 connecting the first sidewall 71 and the second sidewall 72 .
  • the 1st side wall 71, the 2nd side wall 72, and the bottom wall 73 may be collectively called an “inner wall” or an “outer wall.”
  • the absolute value of the angle (taper angle) formed between the first sidewall 71 and the first main surface 3 in the semiconductor layer 2 may be more than 90° and 95° or less (for example, about 91°).
  • the absolute value of the angle (taper angle) formed between second side wall 72 and first main surface 3 in semiconductor layer 2 may be more than 90° and 95° or less (for example, about 91°).
  • the second trench gate structure 70 may be formed in a tapered shape (tapered shape) in which the second width WT2 narrows from the first main surface 3 side toward the bottom wall 73 side in a cross-sectional view.
  • the bottom wall 73 of the second trench gate structure 70 is located in a region on the first main surface 3 side with respect to the bottom of the drift region 54 .
  • a bottom wall 73 of the second trench gate structure 70 is formed in a convex curved shape (U-shape) toward the bottom of the drift region 54 .
  • the bottom wall 73 of the second trench gate structure 70 is located in the region on the first main surface 3 side with a second distance IT2 of 1 ⁇ m or more and 10 ⁇ m or less from the bottom of the drift region 54 .
  • the second interval IT2 may be 1 ⁇ m or more and 2 ⁇ m or less, 2 ⁇ m or more and 4 ⁇ m or less, 4 ⁇ m or more and 6 ⁇ m or less, 6 ⁇ m or more and 8 ⁇ m or less, or 8 ⁇ m or more and 10 ⁇ m or less.
  • the second interval IT2 is preferably 1 ⁇ m or more and 5 ⁇ m or less.
  • a cell region 75 is defined in each region between the plurality of first trench gate structures 60 and the plurality of second trench gate structures 70 .
  • the plurality of cell regions 75 are arranged at intervals along the first direction X in a plan view, and each extend in a band shape along the second direction Y. As shown in FIG.
  • a plurality of cell regions 75 extend along the same direction as the first trench gate structure 60 and the second trench gate structure 70 .
  • the plurality of cell regions 75 are formed in a stripe shape as a whole in plan view.
  • a first depletion layer extends into the drift region 54 from the outer wall of the first trench gate structure 60 .
  • the first depletion layer extends from the outer wall of the first trench gate structure 60 in the direction along the first main surface 3 and the normal direction Z.
  • a second depletion layer extends into the drift region 54 from the outer wall of the second trench gate structure 70 .
  • the second depletion layer extends from the outer wall of the second trench gate structure 70 in the direction along the first main surface 3 and the normal direction Z.
  • the second trench gate structure 70 is spaced apart from the first trench gate structure 60 in such a manner that the second depletion layer overlaps the first depletion layer. That is, the second depletion layer overlaps the first depletion layer in the cell region 75 in the region on the first main surface 3 side with respect to the bottom wall 73 of the second trench gate structure 70 . According to such a structure, it is possible to suppress the electric field from concentrating on the first trench gate structure 60 and the second trench gate structure 70, thereby suppressing a decrease in the breakdown voltage.
  • the second depletion layer preferably overlaps the first depletion layer in a region on the bottom side of the drift region 54 with respect to the bottom wall 73 of the second trench gate structure 70 . According to such a structure, concentration of an electric field on the bottom wall 63 of the first trench gate structure 60 and the bottom wall 73 of the second trench gate structure 70 can be suppressed, so that a decrease in breakdown voltage can be suppressed appropriately. .
  • the pitch PS between sidewalls of the first trench gate structure 60 and the second trench gate structure 70 may be 0.2 ⁇ m or more and 2 ⁇ m or less.
  • the pitch PS is between the first sidewall 61 (second sidewall 62) of the first trench gate structure 60 and the second sidewall 72 (first sidewall 71) of the second trench gate structure 70 between the first trench gate structure 60 and It is the distance in the direction (first direction X) orthogonal to the direction (second direction Y) in which the second trench gate structure 70 extends.
  • the pitch PS is 0.2 ⁇ m or more and 0.4 ⁇ m or less, 0.4 ⁇ m or more and 0.6 ⁇ m or less, 0.6 ⁇ m or more and 0.8 ⁇ m or less, 0.8 ⁇ m or more and 1.0 ⁇ m or less, 1.0 ⁇ m or more and 1.2 ⁇ m or less, 1 2 ⁇ m or more and 1.4 ⁇ m or less, 1.4 ⁇ m or more and 1.6 ⁇ m or less, 1.6 ⁇ m or more and 1.8 ⁇ m or less, or 1.8 ⁇ m or more and 2.0 ⁇ m or less.
  • the pitch PS is preferably 0.3 ⁇ m or more and 1.5 ⁇ m or less.
  • the pitch PC between the central portions of the first trench gate structure 60 and the second trench gate structure 70 may be 1 ⁇ m or more and 7 ⁇ m or less.
  • the pitch PC is in the direction in which the first trench gate structure 60 and the second trench gate structure 70 extend (the second direction Y) between the central portion of the first trench gate structure 60 and the central portion of the second trench gate structure 70. It is the distance in the orthogonal direction (first direction X).
  • the pitch PC may be 1 ⁇ m or more and 2 ⁇ m or less, 2 ⁇ m or more and 3 ⁇ m or less, 3 ⁇ m or more and 4 ⁇ m or less, 4 ⁇ m or more and 5 ⁇ m or less, 5 ⁇ m or more and 6 ⁇ m or less, or 6 ⁇ m or more and 7 ⁇ m or less.
  • the pitch PC is preferably 1 ⁇ m or more and 3 ⁇ m or less.
  • the first trench gate structure 60 more specifically includes a first gate trench 81 , a first insulating layer 82 and a first electrode 83 .
  • the first gate trench 81 is formed by digging the first main surface 3 toward the second main surface 4 side.
  • the first gate trench 81 defines a first sidewall 61 , a second sidewall 62 and a bottom wall 63 of the first trench gate structure 60 .
  • the first sidewall 61 , the second sidewall 62 and the bottom wall 63 of the first trench gate structure 60 are hereinafter also referred to as the first sidewall 61 , the second sidewall 62 and the bottom wall 63 of the first gate trench 81 .
  • the first insulating layer 82 is formed like a film along the inner wall of the first gate trench 81 .
  • the first insulating layer 82 defines a recessed space within the first gate trench 81 .
  • a portion of the first insulating layer 82 covering the bottom wall 63 of the first gate trench 81 is formed along the bottom wall 63 of the first gate trench 81 .
  • the first insulating layer 82 defines a U-shaped space recessed in a U-shape in the first gate trench 81 .
  • the first insulating layer 82 is at least one of silicon oxide (SiO 2 ), silicon nitride (SiN), aluminum oxide (Al 2 O 3 ), zirconium oxide (ZrO 2 ), and tantalum oxide (Ta 2 O 3 ). including.
  • the first insulating layer 82 may have a laminated structure including a SiN layer and a SiO 2 layer laminated in this order from the semiconductor layer 2 side.
  • the first insulating layer 82 may have a laminated structure including a SiO 2 layer and a SiN layer laminated in this order from the semiconductor layer 2 side.
  • the first insulating layer 82 may have a single layer structure consisting of a SiO2 layer or a SiN layer.
  • the first insulating layer 82 has a single-layer structure consisting of a SiO 2 layer in this embodiment.
  • the first insulating layer 82 includes a first bottom-side insulating layer 84 and a first opening-side insulating layer 85 formed in this order from the bottom wall 63 side of the first gate trench 81 toward the first main surface 3 side.
  • the first bottom-side insulating layer 84 covers the inner wall of the first gate trench 81 on the bottom wall 63 side. More specifically, the first bottom-side insulating layer 84 covers the inner wall of the first gate trench 81 on the bottom wall 63 side with respect to the bottom of the body region 55 .
  • the first bottom insulating layer 84 defines a U-shaped space on the bottom wall 63 side of the first gate trench 81 .
  • the first bottom insulating layer 84 has a smooth inner wall surface defining a U-shaped space.
  • a first bottom insulating layer 84 contacts the drift region 54 .
  • a portion of the first bottom insulating layer 84 may contact the body region 55 .
  • the first opening side insulating layer 85 covers the inner wall of the first gate trench 81 on the opening side. More specifically, the first opening side insulating layer 85 covers the first sidewall 61 and the second sidewall 62 of the first gate trench 81 in the region on the opening side of the first gate trench 81 with respect to the bottom of the body region 55 . covered. The first opening side insulating layer 85 is in contact with the body region 55 . A portion of the first opening side insulating layer 85 may be in contact with the drift region 54 .
  • the first bottom insulating layer 84 has a first thickness T1.
  • the first opening side insulating layer 85 has a second thickness T2 (T2 ⁇ T1) less than the first thickness T1.
  • the first thickness T1 is the thickness along the normal direction of the inner wall of the first gate trench 81 in the first bottom-side insulating layer 84 .
  • the second thickness T2 is the thickness along the normal direction of the inner wall of the first gate trench 81 in the first opening side insulating layer 85 .
  • the first ratio T1/WT1 of the first thickness T1 to the first width WT1 of the first gate trench 81 may be 0.1 or more and 0.4 or less.
  • the first ratio T1/WT1 is 0.1 or more and 0.15 or less, 0.15 or more and 0.2 or less, 0.2 or more and 0.25 or less, 0.25 or more and 0.3 or less, or 0.3 or more. It may be 0.35 or less, or 0.35 or more and 0.4 or less.
  • the first ratio T1/WT1 is preferably 0.25 or more and 0.35 or less.
  • the first thickness T1 of the first bottom-side insulating layer 84 may be 1500 ⁇ or more and 4000 ⁇ or less.
  • the first thickness T1 may be 1500 ⁇ to 2000 ⁇ , 2000 ⁇ to 2500 ⁇ , 2500 ⁇ to 3000 ⁇ , 3000 ⁇ to 3500 ⁇ , or 3500 ⁇ to 4000 ⁇ .
  • the first thickness T1 is preferably 1800 ⁇ or more and 3500 ⁇ or less.
  • the first thickness T1 may be adjusted to 4000 ⁇ or more and 12000 ⁇ or less according to the first width WT1 of the first gate trench 81 .
  • the first thickness T1 is 4000 ⁇ to 5000 ⁇ , 5000 ⁇ to 6000 ⁇ , 6000 ⁇ to 7000 ⁇ , 7000 ⁇ to 8000 ⁇ , 8000 ⁇ to 9000 ⁇ , 9000 ⁇ to 10000 ⁇ , 10000 ⁇ to 11000 ⁇ , or 11000 ⁇ to 12000 ⁇ .
  • the breakdown voltage of the semiconductor device 1 can be increased by increasing the thickness of the first bottom-side insulating layer 84 .
  • the second thickness T2 of the first opening-side insulating layer 85 may be 1/100 or more and 1/10 or less of the first thickness T1 of the first bottom-side insulating layer 84 .
  • the second thickness T2 may range from 100 ⁇ to 500 ⁇ .
  • the second thickness T2 may be 100 ⁇ to 200 ⁇ , 200 ⁇ to 300 ⁇ , 300 ⁇ to 400 ⁇ , or 400 ⁇ to 500 ⁇ .
  • the second thickness T2 is preferably 200 ⁇ or more and 400 ⁇ or less.
  • the first bottom-side insulating layer 84 has a first thickness T1 from a portion covering the first sidewall 61 and the second sidewall 62 of the first gate trench 81 toward a portion covering the bottom wall 63 of the first gate trench 81 . is formed in a manner of decreasing.
  • the thickness of the portion of the first bottom-side insulating layer 84 covering the bottom wall 63 of the first gate trench 81 is such that the thickness of the first bottom-side insulating layer 84 covers the first side wall 61 and the second side wall 62 of the first gate trench 81 . Less than the thickness of the part to be covered.
  • the width of the opening on the bottom wall side of the U-shaped space partitioned by the first bottom-side insulating layer 84 is expanded by the reduction of the first thickness T1. This suppresses the tapering of the U-shaped space.
  • Such a U-shaped space is formed, for example, by etching the inner wall of the first bottom-side insulating layer 84 (for example, wet etching).
  • the first electrode 83 is embedded in the first gate trench 81 with the first insulating layer 82 interposed therebetween.
  • a first gate control signal (first control signal) including an ON signal Von and an OFF signal Voff is applied to the first electrode 83 .
  • the first electrode 83 in this embodiment has an isolation split electrode structure including a first bottom electrode 86 , a first opening electrode 87 and a first intermediate insulating layer 88 .
  • the first bottom electrode 86 is buried on the bottom wall 63 side of the first gate trench 81 with the first insulating layer 82 interposed therebetween. More specifically, the first bottom-side electrode 86 is buried on the bottom wall 63 side of the first gate trench 81 with the first bottom-side insulating layer 84 interposed therebetween. The first bottom-side electrode 86 faces the drift region 54 with the first bottom-side insulating layer 84 interposed therebetween. A portion of the first bottom electrode 86 may face the body region 55 with the first bottom insulating layer 84 interposed therebetween.
  • the first bottom-side electrode 86 defines a recess having an inverted concave shape in a cross-sectional view between the first bottom-side insulating layer 84 and the first opening-side insulating layer 85 on the opening side of the first gate trench 81 . .
  • local electric field concentration on the first bottom electrode 86 can be suppressed, so that a decrease in breakdown voltage can be suppressed.
  • the first bottom electrode 86 is tapered from the top end to the bottom end. It can be suppressed appropriately. Thereby, local electric field concentration on the lower end portion of the first bottom electrode 86 can be appropriately suppressed.
  • the first bottom electrode 86 may include at least one of conductive polysilicon, tungsten, aluminum, copper, aluminum alloys and copper alloys.
  • First bottom electrode 86 comprises conductive polysilicon in this form.
  • the conductive polysilicon may contain n-type impurities or p-type impurities.
  • the conductive polysilicon preferably contains n-type impurities.
  • the first opening side electrode 87 is embedded in the opening side of the first gate trench 81 with the first insulating layer 82 interposed therebetween. More specifically, the first opening-side electrode 87 is embedded in an inverted concave recess defined on the opening side of the first gate trench 81 with the first opening-side insulating layer 85 interposed therebetween. The first opening-side electrode 87 faces the body region 55 with the first opening-side insulating layer 85 interposed therebetween. A portion of the first opening-side electrode 87 may face the drift region 54 with the first opening-side insulating layer 85 interposed therebetween.
  • the first opening side electrode 87 may contain at least one of conductive polysilicon, tungsten, aluminum, copper, aluminum alloy and copper alloy.
  • the first aperture side electrode 87 preferably comprises the same type of conductive material as the first bottom side electrode 86 .
  • the first opening-side electrode 87 contains conductive polysilicon in this form.
  • the conductive polysilicon may contain n-type impurities or p-type impurities.
  • the conductive polysilicon preferably contains n-type impurities.
  • the first intermediate insulating layer 88 is interposed between the first bottom-side electrode 86 and the first opening-side electrode 87 and electrically insulates the first bottom-side electrode 86 and the first opening-side electrode 87 . More specifically, the first intermediate insulating layer 88 covers the first bottom-side electrode 86 exposed from the first bottom-side insulating layer 84 in the region between the first bottom-side electrode 86 and the first opening-side electrode 87. are doing. A first intermediate insulating layer 88 covers the upper end (more specifically, the protrusion) of the first bottom electrode 86 . The first intermediate insulating layer 88 is continuous with the first insulating layer 82 (the first bottom side insulating layer 84).
  • the first intermediate insulating layer 88 has a third thickness T3.
  • the third thickness T3 is less than the first thickness T1 of the first bottom insulating layer 84 (T3 ⁇ T1).
  • the third thickness T3 may be 1/100 or more and 1/10 or less of the first thickness T1.
  • the third thickness T3 may range from 100 ⁇ to 500 ⁇ .
  • the third thickness T3 may be 100 ⁇ to 200 ⁇ , 200 ⁇ to 300 ⁇ , 300 ⁇ to 400 ⁇ , or 400 ⁇ to 500 ⁇ .
  • the third thickness T3 is preferably 200 ⁇ or more and 400 ⁇ or less.
  • the first intermediate insulating layer 88 is made of at least one of silicon oxide (SiO 2 ), silicon nitride (SiN), aluminum oxide (Al 2 O 3 ), zirconium oxide (ZrO 2 ), and tantalum oxide (Ta 2 O 3 ). Contains seeds.
  • the first intermediate insulating layer 88 has a single layer structure consisting of a SiO 2 layer in this embodiment.
  • the exposed portion of the first opening side electrode 87 exposed from the first gate trench 81 is positioned on the bottom wall 63 side of the first gate trench 81 with respect to the first main surface 3 in this embodiment.
  • the exposed portion of the first opening side electrode 87 is curved toward the bottom wall 63 of the first gate trench 81 .
  • the exposed portion of the first opening side electrode 87 is covered with a first cap insulating layer formed in a film shape.
  • the first cap insulating layer continues to the first insulating layer 82 (first opening side insulating layer 85 ) in the first gate trench 81 .
  • the first cap insulating layer may contain silicon oxide (SiO 2 ).
  • Each first FET structure 58 further includes a p-type first channel region 91 (first channel).
  • the first channel region 91 is formed in a region of the body region 55 facing the first electrode 83 (first opening side electrode 87) with the first insulating layer 82 (first opening side insulating layer 85) interposed therebetween.
  • the first channel region 91 is formed along the first sidewall 61 or the second sidewall 62 or the first sidewall 61 and the second sidewall 62 of the first trench gate structure 60 .
  • the first channel region 91 is formed along the first sidewall 61 and the second sidewall 62 of the first trench gate structure 60 in this configuration.
  • Each first FET structure 58 further includes an n + -type first source region 92 formed in the surface layer of the body region 55 .
  • First source region 92 defines a first channel region 91 in body region 55 with drift region 54 .
  • the n-type impurity concentration of the first source region 92 exceeds the n-type impurity concentration of the drift region 54 .
  • the n-type impurity concentration of the first source region 92 may be 1 ⁇ 10 19 cm ⁇ 3 or more and 1 ⁇ 10 21 cm ⁇ 3 or less.
  • Each first FET structure 58 includes a plurality of first source regions 92 in this form.
  • a plurality of first source regions 92 are formed at intervals along the first trench gate structure 60 in the surface layer portion of the body region 55 . More specifically, the plurality of first source regions 92 are formed along the first sidewall 61 or the second sidewall 62, or the first sidewall 61 and the second sidewall 62 of the first trench gate structure 60. .
  • a plurality of first source regions 92 are spaced along first sidewall 61 and second sidewall 62 of first trench gate structure 60 in this configuration.
  • the bottoms of the plurality of first source regions 92 are located in a region on the first main surface 3 side with respect to the bottoms of the body regions 55 .
  • the plurality of first source regions 92 face the first electrode 83 (first opening side electrode 87) with the first insulating layer 82 (first opening side insulating layer 85) interposed therebetween.
  • the first channel region 91 of the first MISFET 56 is formed in the body region 55 sandwiched between the plurality of first source regions 92 and the drift region 54 .
  • Each first FET structure 58 further includes a p + -type first contact region 93 formed in the surface layer of the body region 55 .
  • the p-type impurity concentration of the first contact region 93 exceeds the p-type impurity concentration of the body region 55 .
  • the p-type impurity concentration of the first contact region 93 may be, for example, 1 ⁇ 10 19 cm ⁇ 3 or more and 1 ⁇ 10 21 cm ⁇ 3 or less.
  • Each first FET structure 58 includes a plurality of first contact regions 93 in this form.
  • a plurality of first contact regions 93 are formed at intervals along the first trench gate structure 60 in the surface layer portion of the body region 55 . More specifically, the plurality of first contact regions 93 are formed along the first sidewall 61 or the second sidewall 62, or the first sidewall 61 and the second sidewall 62 of the first trench gate structure 60. .
  • a plurality of first contact regions 93 are spaced apart along the first sidewall 61 and the second sidewall 62 of the first trench gate structure 60 in this embodiment. More specifically, the multiple first contact regions 93 are formed in the surface layer portion of the body region 55 in an alternate arrangement with respect to the multiple first source regions 92 . The bottoms of the plurality of first contact regions 93 are located in a region on the first main surface 3 side with respect to the bottoms of the body regions 55 .
  • a second trench gate structure 70 includes a second gate trench 101 , a second insulating layer 102 and a second electrode 103 .
  • the second gate trench 101 is formed by digging the first main surface 3 toward the second main surface 4 side.
  • the second gate trench 101 defines a first sidewall 71 , a second sidewall 72 and a bottom wall 73 of the second trench gate structure 70 .
  • the first sidewall 71 , the second sidewall 72 and the bottom wall 73 of the second trench gate structure 70 are hereinafter also referred to as the first sidewall 71 , the second sidewall 72 and the bottom wall 73 of the second gate trench 101 .
  • the second insulating layer 102 is formed like a film along the inner wall of the second gate trench 101 .
  • the second insulating layer 102 defines a recessed space within the second gate trench 101 .
  • a portion of the second insulating layer 102 covering the bottom wall 73 of the second gate trench 101 is formed along the bottom wall 73 of the second gate trench 101 .
  • the second insulating layer 102 defines a U-shaped space recessed in a U-shape inside the second gate trench 101 .
  • the second insulating layer 102 is made of at least one of silicon oxide (SiO 2 ), silicon nitride (SiN), aluminum oxide (Al 2 O 3 ), zirconium oxide (ZrO 2 ), and tantalum oxide (Ta 2 O 3 ). including.
  • the second insulating layer 102 may have a laminated structure including a SiN layer and a SiO 2 layer laminated in this order from the semiconductor layer 2 side.
  • the second insulating layer 102 may have a laminated structure including a SiO 2 layer and a SiN layer laminated in this order from the semiconductor layer 2 side.
  • the second insulating layer 102 may have a single layer structure consisting of a SiO2 layer or a SiN layer.
  • the second insulating layer 102 has a single layer structure consisting of a SiO 2 layer in this embodiment.
  • the second insulating layer 102 includes a second bottom side insulating layer 104 and a second opening side insulating layer 105 formed in this order from the bottom wall 73 side of the second gate trench 101 toward the first main surface 3 side.
  • the second bottom-side insulating layer 104 covers the inner wall of the second gate trench 101 on the bottom wall 73 side. More specifically, the second bottom-side insulating layer 104 covers the inner wall of the second gate trench 101 on the bottom wall 73 side with respect to the bottom of the body region 55 .
  • the second bottom-side insulating layer 104 defines a U-shaped space on the bottom wall 73 side of the second gate trench 101 .
  • the second bottom insulating layer 104 has a smooth inner wall surface defining a U-shaped space.
  • a second bottom insulating layer 104 contacts the drift region 54 .
  • a portion of the second bottom insulating layer 104 may contact the body region 55 .
  • the second opening side insulating layer 105 covers the opening side inner wall of the second gate trench 101 . More specifically, the second opening-side insulating layer 105 covers the first sidewall 71 and the second sidewall 72 of the second gate trench 101 in the region on the opening side of the second gate trench 101 with respect to the bottom of the body region 55 . covered. The second opening side insulating layer 105 is in contact with the body region 55 . A portion of the second opening side insulating layer 105 may be in contact with the drift region 54 .
  • the second bottom insulating layer 104 has a fourth thickness T4.
  • the second opening side insulating layer 105 has a fifth thickness T5 (T5 ⁇ T4) less than the fourth thickness T4.
  • the fourth thickness T4 is the thickness along the normal direction of the inner wall of the second gate trench 101 in the second bottom side insulating layer 104 .
  • the fifth thickness T5 is the thickness along the normal direction of the inner wall of the second gate trench 101 in the second opening side insulating layer 105 .
  • a second ratio T4/WT2 of the fourth thickness T4 to the second width WT2 of the second gate trench 101 may be 0.1 or more and 0.4 or less.
  • the second ratio T4/WT2 is 0.1 or more and 0.15 or less, 0.15 or more and 0.2 or less, 0.2 or more and 0.25 or less, 0.25 or more and 0.3 or less, or 0.3 or more. It may be 0.35 or less, or 0.35 or more and 0.4 or less.
  • the second ratio T4/WT2 is preferably 0.25 or more and 0.35 or less.
  • the second ratio T4/WT2 may be less than or equal to the first ratio T1/WT1 (T4/WT2 ⁇ T1/WT1).
  • the second ratio T4/WT2 may be greater than or equal to the first ratio T1/WT1 (T4/WT2 ⁇ T1/WT1).
  • the fourth thickness T4 of the second bottom-side insulating layer 104 may be 1500 ⁇ or more and 4000 ⁇ or less.
  • the fourth thickness T4 may be 1500 ⁇ to 2000 ⁇ , 2000 ⁇ to 2500 ⁇ , 2500 ⁇ to 3000 ⁇ , 3000 ⁇ to 3500 ⁇ , or 3500 ⁇ to 4000 ⁇ .
  • the fourth thickness T4 is preferably 1800 ⁇ or more and 3500 ⁇ or less.
  • the fourth thickness T4 may be 4000 ⁇ or more and 12000 ⁇ or less depending on the second width WT2 of the second gate trench 101 .
  • the fourth thickness T4 is 4000 ⁇ to 5000 ⁇ , 5000 ⁇ to 6000 ⁇ , 6000 ⁇ to 7000 ⁇ , 7000 ⁇ to 8000 ⁇ , 8000 ⁇ to 9000 ⁇ , 9000 ⁇ to 10000 ⁇ , 10000 ⁇ to 11000 ⁇ , or 11000 ⁇ to 12000 ⁇ .
  • the breakdown voltage of the semiconductor device 1 can be increased by thickening the second bottom-side insulating layer 104 .
  • the fourth thickness T4 may be equal to or less than the first thickness T1 (T4 ⁇ T1).
  • the fourth thickness T4 may be greater than or equal to the first thickness T1 (T4 ⁇ T1).
  • the fifth thickness T5 of the second opening-side insulating layer 105 is less than the fourth thickness T4 of the second bottom-side insulating layer 104 (T5 ⁇ T4).
  • the fifth thickness T5 may be 1/100 or more and 1/10 or less of the fourth thickness T4. It may be 100 ⁇ or more and 500 ⁇ or less.
  • the fifth thickness T5 may be 100 ⁇ to 200 ⁇ , 200 ⁇ to 300 ⁇ , 300 ⁇ to 400 ⁇ , or 400 ⁇ to 500 ⁇ .
  • the fifth thickness T5 is preferably 200 ⁇ or more and 400 ⁇ or less.
  • the fifth thickness T5 may be equal to or less than the second thickness T2 (T5 ⁇ T2).
  • the fifth thickness T5 may be greater than or equal to the second thickness T2 (T5 ⁇ T2).
  • Second bottom-side insulating layer 104 has a fourth thickness T4 from a portion covering first sidewall 71 and second sidewall 72 of second gate trench 101 to a portion covering bottom wall 73 of second gate trench 101 . is formed in a manner of decreasing.
  • the thickness of the portion of the second bottom-side insulating layer 104 covering the bottom wall 73 of the second gate trench 101 is such that the thickness of the second bottom-side insulating layer 104 covers the first side wall 71 and the second side wall 72 of the second gate trench 101 . Less than the thickness of the part to be covered.
  • the width of the opening on the bottom wall side of the U-shaped space defined by the second bottom-side insulating layer 104 is expanded by the reduction of the fourth thickness T4. This suppresses the tapering of the U-shaped space.
  • Such a U-shaped space is formed, for example, by etching the inner wall of the second bottom-side insulating layer 104 (for example, wet etching).
  • the second electrode 103 is embedded in the second gate trench 101 with the second insulating layer 102 interposed therebetween.
  • a predetermined second gate control signal (second control signal) including an ON signal Von and an OFF signal Voff is applied to the second electrode 103 .
  • the second electrode 103 has, in this form, an insulation isolation type split electrode structure including a second bottom electrode 106, a second opening side electrode 107 and a second intermediate insulating layer .
  • the second bottom electrode 106 is electrically connected to the first bottom electrode 86 in this configuration.
  • the second aperture-side electrode 107 is electrically insulated from the first aperture-side electrode 87 .
  • the second bottom electrode 106 is buried on the bottom wall 73 side of the second gate trench 101 with the second insulating layer 102 interposed therebetween. More specifically, the second bottom-side electrode 106 is buried on the bottom wall 73 side of the second gate trench 101 with the second bottom-side insulating layer 104 interposed therebetween. The second bottom-side electrode 106 faces the drift region 54 with the second bottom-side insulating layer 104 interposed therebetween. A portion of the second bottom-side electrode 106 may face the body region 55 with the second bottom-side insulating layer 104 interposed therebetween.
  • the second bottom-side electrode 106 defines a recess having an inverted concave shape in a cross-sectional view between the second bottom-side insulating layer 104 and the second opening-side insulating layer 105 on the opening side of the second gate trench 101 . .
  • local electric field concentration on the second bottom-side electrode 106 can be suppressed, so a decrease in breakdown voltage can be suppressed.
  • the second bottom electrode 106 is tapered from the top end to the bottom end. It can be suppressed appropriately. As a result, local electric field concentration on the lower end portion of the second bottom electrode 106 can be appropriately suppressed.
  • the second bottom electrode 106 may include at least one of conductive polysilicon, tungsten, aluminum, copper, aluminum alloys and copper alloys.
  • the second bottom electrode 106 comprises conductive polysilicon in this form.
  • the conductive polysilicon may contain n-type impurities or p-type impurities.
  • the conductive polysilicon preferably contains n-type impurities.
  • the second opening side electrode 107 is embedded in the opening side of the second gate trench 101 with the second insulating layer 102 interposed therebetween. More specifically, the second opening-side electrode 107 is embedded in an inverted concave recess defined on the opening side of the second gate trench 101 with the second opening-side insulating layer 105 interposed therebetween. The second opening-side electrode 107 faces the body region 55 with the second opening-side insulating layer 105 interposed therebetween. A portion of the second opening-side electrode 107 may face the drift region 54 with the second opening-side insulating layer 105 interposed therebetween.
  • the second opening side electrode 107 may contain at least one of conductive polysilicon, tungsten, aluminum, copper, aluminum alloy and copper alloy.
  • the second aperture side electrode 107 preferably comprises the same type of conductive material as the second bottom side electrode 106 .
  • the second opening side electrode 107 contains conductive polysilicon in this form.
  • the conductive polysilicon may contain n-type impurities or p-type impurities.
  • the conductive polysilicon preferably contains n-type impurities.
  • the second intermediate insulating layer 108 is interposed between the second bottom-side electrode 106 and the second opening-side electrode 107 to electrically insulate the second bottom-side electrode 106 and the second opening-side electrode 107 .
  • the second intermediate insulating layer 108 more specifically covers the second bottom side electrode 106 exposed from the second bottom side insulating layer 104 in the region between the second bottom side electrode 106 and the second opening side electrode 107. are doing.
  • a second intermediate insulating layer 108 covers the upper end (more specifically, the protrusion) of the second bottom electrode 106 .
  • the second intermediate insulating layer 108 is continuous with the second insulating layer 102 (second bottom side insulating layer 104).
  • the second intermediate insulating layer 108 has a sixth thickness T6.
  • the sixth thickness T6 is less than the fourth thickness T4 of the second bottom insulating layer 104 (T6 ⁇ T4).
  • the sixth thickness T6 may be 1/100 or more and 1/10 or less of the fourth thickness T4.
  • the sixth thickness T6 may range from 100 ⁇ to 500 ⁇ .
  • the sixth thickness T6 may be 100 ⁇ to 200 ⁇ , 200 ⁇ to 300 ⁇ , 300 ⁇ to 400 ⁇ , or 400 ⁇ to 500 ⁇ .
  • the sixth thickness T6 is preferably 200 ⁇ or more and 400 ⁇ or less.
  • the sixth thickness T6 may be less than or equal to the third thickness T3 (T6 ⁇ T3).
  • the sixth thickness T6 may be greater than or equal to the third thickness T3 (T6 ⁇ T3).
  • the second intermediate insulating layer 108 is at least one of silicon oxide (SiO 2 ), silicon nitride (SiN), aluminum oxide (Al 2 O 3 ), zirconium oxide (ZrO 2 ) and tantalum oxide (Ta 2 O 3 ). Contains seeds. It should be noted that the second intermediate insulating layer 108 has a single layer structure consisting of a SiO 2 layer in this embodiment.
  • the exposed portion of the second opening side electrode 107 exposed from the second gate trench 101 is positioned on the bottom wall 73 side of the second gate trench 101 with respect to the first main surface 3 in this embodiment.
  • the exposed portion of the second opening side electrode 107 is curved toward the bottom wall 73 of the second gate trench 101 .
  • the exposed portion of the second opening side electrode 107 is covered with a second cap insulating layer formed in a film shape.
  • the second cap insulating layer continues to the second insulating layer 102 (second opening side insulating layer 105 ) in the second gate trench 101 .
  • the second cap insulating layer may contain silicon oxide (SiO 2 ).
  • Each second FET structure 68 further includes a p-type second channel region 111 (second channel). More specifically, the second channel region 111 is a region facing the second electrode 103 (second opening side electrode 107) with the second insulating layer 102 (second opening side insulating layer 105) interposed in the body region 55. formed in
  • the second channel region 111 is formed along the first side wall 71 or the second side wall 72 or the first side wall 71 and the second side wall 72 of the second trench gate structure 70 .
  • the second channel region 111 is formed along the first sidewall 71 and the second sidewall 72 of the second trench gate structure 70 in this configuration.
  • Each second FET structure 68 further includes an n + -type second source region 112 formed in the surface layer of the body region 55 .
  • Second source region 112 defines a second channel region 111 in body region 55 with drift region 54 .
  • the n-type impurity concentration of the second source region 112 exceeds the n-type impurity concentration of the drift region 54 .
  • the n-type impurity concentration of the second source region 112 may be 1 ⁇ 10 19 cm ⁇ 3 or more and 1 ⁇ 10 21 cm ⁇ 3 or less.
  • the n-type impurity concentration of the second source region 112 is preferably equal to the n-type impurity concentration of the first source region 92 .
  • Each second FET structure 68 includes a plurality of second source regions 112 in this form.
  • a plurality of second source regions 112 are formed at intervals along the second trench gate structure 70 in the surface layer portion of the body region 55 .
  • the plurality of second source regions 112 are specifically formed along the first sidewall 71 or the second sidewall 72 or the first sidewall 71 and the second sidewall 72 of the second trench gate structure 70 .
  • a plurality of second source regions 112 are spaced along the first sidewall 71 and the second sidewall 72 of the second trench gate structure 70 in this configuration.
  • Each second source region 112 faces each first source region 92 along the first direction X in this embodiment. Also, each second source region 112 is integrated with each first source region 92 . Although FIG. 5 shows the first source region 92 and the second source region 112 separated by a boundary line, the region between the first source region 92 and the second source region 112 actually has a clear boundary. there is no line.
  • Each second source region 112 is formed offset in the second direction Y from each first source region 92 so as not to face part or all of each first source region 92 along the first direction X. good too. That is, the plurality of first source regions 92 and the plurality of second source regions 112 may be arranged in a zigzag pattern in plan view.
  • the bottoms of the plurality of second source regions 112 are located in a region on the first main surface 3 side with respect to the bottoms of the body regions 55 .
  • the plurality of second source regions 112 face the second electrode 103 (second opening side electrode 107) with the second insulating layer 102 (second opening side insulating layer 105) interposed therebetween.
  • the second channel region 111 of the second MISFET 57 is formed in the body region 55 between the plurality of second source regions 112 and the drift region 54 .
  • Each second FET structure 68 further includes a p + -type second contact region 113 formed in the surface layer of the body region 55 .
  • the p-type impurity concentration of the second contact region 113 exceeds the p-type impurity concentration of the body region 55 .
  • the p-type impurity concentration of the second contact region 113 may be 1 ⁇ 10 19 cm ⁇ 3 or more and 1 ⁇ 10 21 cm ⁇ 3 or less.
  • the p-type impurity concentration of the second contact region 113 is preferably equal to the p-type impurity concentration of the first contact region 93 .
  • Each second FET structure 68 includes a plurality of second contact regions 113 in this form.
  • a plurality of second contact regions 113 are formed at intervals along the second trench gate structure 70 in the surface layer portion of the body region 55 . More specifically, the plurality of second contact regions 113 are formed along the first sidewall 71 or the second sidewall 72, or the first sidewall 71 and the second sidewall 72 of the second trench gate structure 70. .
  • the bottoms of the plurality of second contact regions 113 are located in a region on the first main surface 3 side with respect to the bottoms of the body regions 55 .
  • a plurality of second contact regions 113 are spaced apart along the first sidewall 71 and the second sidewall 72 of the second trench gate structure 70 in this embodiment. More specifically, the plurality of second contact regions 113 are formed in the surface layer portion of the body region 55 in an alternate arrangement with respect to the plurality of second source regions 112 .
  • each second contact region 113 faces each first contact region 93 along the first direction X in this embodiment.
  • Each second contact region 113 is integral with each first contact region 93 .
  • the first contact region 93 and the second contact region 113 are indicated collectively by the symbol “p + ” in order to distinguish them from the first source region 92 and the second source region 112 .
  • Each second contact region 113 is formed offset in the second direction Y from each first contact region 93 so as not to face part or all of each first contact region 93 along the first direction X. good too. That is, the plurality of first contact regions 93 and the plurality of second contact regions 113 may be arranged in a zigzag pattern in plan view.
  • the body region 55 is exposed.
  • the first source region 92 , the first contact region 93 , the second source region 112 and the second contact region 113 form one end of the first trench gate structure 60 and one end of the second trench gate structure 70 on the first main surface 3 . is not formed in the region sandwiched between
  • a body region 55 is exposed.
  • the first source region 92, the first contact region 93, the second source region 112 and the second contact region 113 are sandwiched between the other end of the first trench gate structure 60 and the other end of the second trench gate structure 70. Not formed in the area.
  • a plurality of (here, two) trench contact structures 120 are formed on the first main surface 3 of the semiconductor layer 2 .
  • the plurality of trench contact structures 120 includes trench contact structures 120 on one side and trench contact structures 120 on the other side.
  • the trench contact structure 120 on one side is located in a region on the side of one end of the first trench gate structure 60 and one end of the second trench gate structure 70 .
  • the trench contact structure 120 on the other side is located in a region on the side of the other end of the first trench gate structure 60 and the other end of the second trench gate structure 70 .
  • the trench contact structure 120 on the other side has substantially the same structure as the trench contact structure 120 on the one side.
  • the structure of the trench contact structure 120 on one side will be described as an example, and a detailed description of the structure of the trench contact structure 120 on the other side will be omitted.
  • the trench contact structure 120 is connected to one end of the first trench gate structure 60 and one end of the second trench gate structure 70 .
  • the trench contact structure 120 extends in a strip shape along the first direction X in plan view.
  • the width WTC of the trench contact structure 120 may be 0.5 ⁇ m or more and 5 ⁇ m or less. Width WTC is the width in the direction (second direction Y) orthogonal to the direction (first direction X) in which trench contact structure 120 extends.
  • the width WTC is 0.5 ⁇ m or more and 1 ⁇ m or less, 1 ⁇ m or more and 1.5 ⁇ m or less, 1.5 ⁇ m or more and 2 ⁇ m or less, 2 ⁇ m or more and 2.5 ⁇ m or less, 2.5 ⁇ m or more and 3 ⁇ m or less, 3 ⁇ m or more and 3.5 ⁇ m or less, or 3.5 ⁇ m or more. It may be 4 ⁇ m or less, 4 ⁇ m or more and 4.5 ⁇ m or less, or 4.5 ⁇ m or more and 5 ⁇ m or less.
  • the width WTC is preferably 0.8 ⁇ m or more and 1.2 ⁇ m or less.
  • the trench contact structure 120 penetrates the body region 55 and reaches the drift region 54.
  • the depth DTC of the trench contact structure 120 may be 1 ⁇ m or more and 10 ⁇ m or less.
  • the depth DTC may be 1 ⁇ m to 2 ⁇ m, 2 ⁇ m to 4 ⁇ m, 4 ⁇ m to 6 ⁇ m, 6 ⁇ m to 8 ⁇ m, or 8 ⁇ m to 10 ⁇ m.
  • the depth DTC is preferably 2 ⁇ m or more and 6 ⁇ m or less.
  • the trench contact structure 120 includes a first sidewall 121 on one side, a second sidewall 122 on the other side, and a bottom wall 123 connecting the first sidewall 121 and the second sidewall 122 .
  • the 1st side wall 121, the 2nd side wall 122, and the bottom wall 123 may be collectively called an "inner wall.”
  • the first sidewall 121 is a connecting surface connected to the first trench gate structure 60 and the second trench gate structure 70 .
  • the first sidewall 121 , the second sidewall 122 and the bottom wall 123 are located within the drift region 54 .
  • the first side wall 121 and the second side wall 122 extend along the normal direction Z. As shown in FIG.
  • the first side wall 121 and the second side wall 122 may be formed perpendicular to the first major surface 3 .
  • the absolute value of the angle (taper angle) formed between the first sidewall 121 and the first main surface 3 in the semiconductor layer 2 may be more than 90° and 95° or less (for example, about 91°).
  • the absolute value of the angle (taper angle) formed between second side wall 122 and first main surface 3 in semiconductor layer 2 may be more than 90° and 95° or less (for example, about 91°).
  • the trench contact structure 120 may be formed in a tapered shape (tapered shape) in which the width WTC narrows from the first main surface 3 side of the semiconductor layer 2 toward the bottom wall 123 side in a cross-sectional view.
  • the bottom wall 123 is located in a region on the first main surface 3 side with respect to the bottom of the drift region 54 .
  • Bottom wall 123 is formed in a convex curve toward the bottom of drift region 54 .
  • Bottom wall 123 is located in a region on the first main surface 3 side with an interval ITC of 1 ⁇ m or more and 10 ⁇ m or less from the bottom of drift region 54 .
  • the interval ITC may be 1 ⁇ m to 2 ⁇ m, 2 ⁇ m to 4 ⁇ m, 4 ⁇ m to 6 ⁇ m, 6 ⁇ m to 8 ⁇ m, or 8 ⁇ m to 10 ⁇ m.
  • the interval ITC is preferably 1 ⁇ m or more and 5 ⁇ m or less.
  • the trench contact structure 120 includes contact trenches 131 , contact insulating layers 132 and contact electrodes 133 .
  • the contact trench 131 is formed by digging the first main surface 3 of the semiconductor layer 2 toward the second main surface 4 side.
  • the contact trench 131 defines the first sidewall 121 , the second sidewall 122 and the bottom wall 123 of the trench contact structure 120 .
  • the first sidewall 121 , the second sidewall 122 and the bottom wall 123 of the trench contact structure 120 are hereinafter also referred to as the first sidewall 121 , the second sidewall 122 and the bottom wall 123 of the contact trench 131 .
  • the first side wall 121 of the contact trench 131 communicates with the first side wall 61 and the second side wall 62 of the first gate trench 81 .
  • First sidewall 121 of contact trench 131 communicates with first sidewall 71 and second sidewall 72 of second gate trench 101 .
  • Contact trench 131 forms one trench between first gate trench 81 and second gate trench 101 .
  • the contact insulating layer 132 is formed like a film along the inner wall of the contact trench 131 .
  • the contact insulating layer 132 defines a recessed space within the contact trench 131 .
  • a portion of the contact insulating layer 132 covering the bottom wall 123 of the contact trench 131 is formed along the bottom wall 123 of the contact trench 131 .
  • the contact insulating layer 132 defines a U-shaped recessed space in the contact trench 131 in the same manner as the first bottom insulating layer 84 (second bottom insulating layer 104). That is, the contact insulating layer 132 defines a U-shaped space in which the region of the contact trench 131 on the side of the bottom wall 123 is expanded and tapering is suppressed. Such a U-shaped space is formed, for example, by etching the inner wall of the contact insulating layer 132 (for example, wet etching).
  • the contact insulating layer 132 has a seventh thickness T7.
  • the seventh thickness T7 may range from 1500 ⁇ to 4000 ⁇ .
  • the seventh thickness T7 may be 1500 ⁇ to 2000 ⁇ , 2000 ⁇ to 2500 ⁇ , 2500 ⁇ to 3000 ⁇ , 3000 ⁇ to 3500 ⁇ , or 3500 ⁇ to 4000 ⁇ .
  • the seventh thickness T7 is preferably 1800 ⁇ or more and 3500 ⁇ or less.
  • the seventh thickness T7 may be 4000 ⁇ or more and 12000 ⁇ or less depending on the width WTC of the trench contact structure 120 .
  • the seventh thickness T7 is 4000 ⁇ to 5000 ⁇ , 5000 ⁇ to 6000 ⁇ , 6000 ⁇ to 7000 ⁇ , 7000 ⁇ to 8000 ⁇ , 8000 ⁇ to 9000 ⁇ , 9000 ⁇ to 10000 ⁇ , 10000 ⁇ to 11000 ⁇ , or 11000 ⁇ to 12000 ⁇ .
  • the breakdown voltage of the semiconductor device 1 can be increased by increasing the thickness of the contact insulating layer 132 .
  • the contact insulating layer 132 contains at least one of silicon oxide (SiO 2 ), silicon nitride (SiN), aluminum oxide (Al 2 O 3 ), zirconium oxide (ZrO 2 ), and tantalum oxide (Ta 2 O 3 ). include.
  • the contact insulating layer 132 may have a laminated structure including a SiN layer and a SiO 2 layer laminated in this order from the semiconductor layer 2 side.
  • the contact insulating layer 132 may have a laminated structure including a SiO 2 layer and a SiN layer laminated in this order from the semiconductor layer 2 side.
  • the contact insulating layer 132 may have a single layer structure consisting of a SiO2 layer or a SiN layer.
  • the contact insulating layer 132 has a single-layer structure consisting of a SiO 2 layer in this embodiment.
  • the contact insulating layer 132 is preferably made of the same insulating material as the first insulating layer 82 (second insulating layer 102).
  • the contact insulating layer 132 is integrated with the first insulating layer 82 at the communicating portion between the first gate trench 81 and the contact trench 131 .
  • the contact insulating layer 132 is integrated with the second insulating layer 102 at the communicating portion between the second gate trench 101 and the contact trench 131 .
  • the contact insulating layer 132 has a lead insulating layer 132A led to one end of the first gate trench 81 and one end of the second gate trench 101 in this embodiment.
  • the lead insulating layer 132A covers the inner wall of one end of the first gate trench 81 across the communicating portion.
  • the lead insulating layer 132A covers the inner wall of one end of the second gate trench 101 across the communicating portion.
  • the lead-out insulating layer 132A is integrated with the first bottom-side insulating layer 84 and the first opening-side insulating layer 85 within the first gate trench 81 .
  • the lead-out insulating layer 132A defines a U-shaped space along with the first bottom-side insulating layer 84 on the inner wall of one end of the first gate trench 81 .
  • the lead-out insulating layer 132A is integrated with the second bottom-side insulating layer 104 and the second opening-side insulating layer 105 in the second gate trench 101 .
  • the lead-out insulating layer 132 ⁇ /b>A defines a U-shaped space along with the second bottom-side insulating layer 104 on the inner wall of one end of the second gate trench 101 .
  • the contact electrode 133 is embedded in the contact trench 131 with the contact insulating layer 132 interposed therebetween. Unlike the first electrode 83 and the second electrode 103, the contact electrode 133 is embedded in the contact trench 131 as an integrated body.
  • the contact electrode 133 has an upper end exposed from the contact trench 131 and a lower end in contact with the contact insulating layer 132 .
  • the lower end of the contact electrode 133 is formed in a convex curve toward the bottom wall 123 of the contact trench 131 in the same manner as the first bottom electrode 86 (second bottom electrode 106). More specifically, the lower end of the contact electrode 133 is formed along the bottom wall of the U-shaped space partitioned by the contact insulating layer 132 and is formed in a smooth convex curve toward the bottom wall 123 .
  • the contact electrode 133 is electrically connected to the first bottom electrode 86 at the junction between the first gate trench 81 and the contact trench 131 .
  • Contact electrode 133 is electrically connected to second bottom electrode 106 at the junction between second gate trench 101 and contact trench 131 . Thereby, the second bottom electrode 106 is electrically connected to the first bottom electrode 86 .
  • the contact electrode 133 has a lead-out electrode 133A led out to one end of the first gate trench 81 and one end of the second gate trench 101 .
  • the extraction electrode 133A is positioned in the first gate trench 81 across the communicating portion between the first gate trench 81 and the contact trench 131 .
  • Lead electrode 133A is located in second gate trench 101 across the communication portion between second gate trench 101 and contact trench 131 .
  • the extraction electrode 133A is embedded in a U-shaped space partitioned by the contact insulating layer 132 inside the first gate trench 81 .
  • the extraction electrode 133A is integrated with the first bottom electrode 86 inside the first gate trench 81 .
  • the contact electrode 133 is electrically connected to the first bottom electrode 86 .
  • a first intermediate insulating layer 88 is interposed between the contact electrode 133 and the first opening side electrode 87 in the first gate trench 81 . Thereby, the contact electrode 133 is electrically insulated from the first opening side electrode 87 in the first gate trench 81 .
  • the lead-out electrode 133A is embedded in a U-shaped space partitioned by the contact insulating layer 132 inside the second gate trench 101 .
  • the extraction electrode 133A is integrated with the second bottom electrode 106 inside the second gate trench 101 . Thereby, the contact electrode 133 is electrically connected to the second bottom electrode 106 .
  • a second intermediate insulating layer 108 is interposed between the contact electrode 133 and the second opening side electrode 107 in the second gate trench 101 . Thereby, the contact electrode 133 is electrically insulated from the second opening side electrode 107 in the second gate trench 101 .
  • the contact electrode 133 may contain at least one of conductive polysilicon, tungsten, aluminum, copper, aluminum alloy and copper alloy.
  • Contact electrode 133 includes conductive polysilicon in this form.
  • the conductive polysilicon may contain n-type impurities or p-type impurities.
  • the conductive polysilicon preferably contains n-type impurities.
  • Contact electrode 133 preferably comprises the same conductive material as first bottom electrode 86 and second bottom electrode 106 .
  • the exposed portion of the contact electrode 133 exposed from the contact trench 131 is positioned on the bottom wall 123 side of the contact trench 131 with respect to the first main surface 3 in this embodiment.
  • the exposed portion of the contact electrode 133 is curved toward the bottom wall 123 of the contact trench 131 .
  • the exposed portion of the contact electrode 133 is covered with a third cap insulating layer 139 formed like a film.
  • the third cap insulating layer 139 continues to the contact insulating layer 132 within the contact trench 131 .
  • the third cap insulating layer 139 may contain silicon oxide (SiO 2 ).
  • a gate control signal input from the control IC 10 to the first gate control wiring 17A (not shown) is transmitted to the first opening side electrode 87.
  • a gate control signal input from the control IC 10 to the second gate control wiring 17B (not shown) is transmitted to the second opening-side electrode 107 .
  • a gate control signal input from the control IC 10 to the third gate control line 17C (not shown) is transmitted to the first bottom electrode 86 and the second bottom electrode 106 via the contact electrode 133.
  • both the first MISFET 56 (first trench gate structure 60) and the second MISFET 57 (second trench gate structure 70) are controlled to be turned off, both the first channel region 91 and second channel region 111 are controlled to be turned off. .
  • both the first MISFET 56 and the second MISFET 57 are controlled to be ON, both the first channel region 91 and the second channel region 111 are controlled to be ON (Full-ON control).
  • the first MISFET 56 is controlled to be on and the second MISFET 57 is controlled to be off
  • the first channel region 91 is controlled to be on and the second channel region 111 is controlled to be off (first Half -ON control).
  • the second MISFET 57 is controlled to be ON while the first MISFET 56 is controlled to be OFF, the first channel region 91 is controlled to be OFF and the second channel region 111 is controlled to be ON (second Half -ON control).
  • the power MISFET 9 uses the first MISFET 56 and the second MISFET 57 formed in one output region 6 to perform a plurality of types of control including Full-ON control, first Half-ON control and second Half-ON control. is realized.
  • the ON signal Von When driving the first MISFET 56 (that is, during gate ON control), the ON signal Von may be applied to the first bottom side electrode 86 and the ON signal Von may be applied to the first opening side electrode 87 .
  • the first bottom-side electrode 86 and the first opening-side electrode 87 function as gate electrodes.
  • the voltage drop between the first bottom electrode 86 and the first aperture electrode 87 can be suppressed, so that the electric field concentration between the first bottom electrode 86 and the first aperture electrode 87 can be suppressed.
  • the on-resistance of the semiconductor layer 2 can be lowered, power consumption can be reduced.
  • the first MISFET 56 that is, during gate ON control
  • Voff for example, reference voltage
  • the first bottom electrode 86 functions as a field electrode
  • the first aperture electrode 87 functions as a gate electrode.
  • the ON signal Von When driving the second MISFET 57 (that is, during gate ON control), the ON signal Von may be applied to the second bottom side electrode 106 and the ON signal Von may be applied to the second opening side electrode 107 .
  • the second bottom-side electrode 106 and the second opening-side electrode 107 function as gate electrodes.
  • the voltage drop between the second bottom electrode 106 and the second aperture electrode 107 can be suppressed, so that the electric field concentration between the second bottom electrode 106 and the second aperture electrode 107 can be suppressed.
  • the on-resistance of the semiconductor layer 2 can be lowered, power consumption can be reduced.
  • the OFF signal Voff reference voltage
  • the ON signal Von may be applied to the second opening side electrode 107.
  • the second bottom-side electrode 106 functions as a field electrode
  • the second opening-side electrode 107 functions as a gate electrode.
  • the first channel region 91 is formed in each cell region 75 with the first channel area S1.
  • a first channel area S1 is defined by the total planar area of the plurality of first source regions 92 formed in each cell region 75 .
  • the first channel region 91 is formed in each cell region 75 at a first channel ratio R1 (first ratio).
  • the first channel ratio R1 is the ratio of the first channel area S1 in each cell region 75 when the plane area of each cell region 75 is 100%.
  • the first channel ratio R1 is adjusted within a range of 0% or more and 50% or less.
  • the first channel ratio R1 is 0% or more and 5% or less, 5% or more and 10% or less, 10% or more and 15% or less, 15% or more and 20% or less, 20% or more and 25% or less, 25% or more and 30% or less, 30 % or more and 35% or less, 35% or more and 40% or less, 40% or more and 45% or less, or 45% or more and 50% or less.
  • the first channel ratio R1 is preferably 10% or more and 35% or less.
  • the first source region 92 is formed on substantially the entire first side wall 61 and second side wall 62 of the first trench gate structure 60 .
  • the first contact regions 93 are not formed on the first sidewalls 61 and the second sidewalls 62 of the first trench gate structure 60 .
  • the first channel ratio R1 is preferably less than 50%.
  • the first channel ratio R1 When the first channel ratio R1 is 0%, the first source regions 92 are not formed on the first sidewalls 61 and the second sidewalls 62 of the first trench gate structure 60 . In this case, only body region 55 and/or first contact region 93 are formed on first sidewall 61 and second sidewall 62 of first trench gate structure 60 .
  • the first channel ratio R1 preferably exceeds 0%. This form shows an example in which the first channel ratio R1 is 25%.
  • the second channel region 111 is formed with the second channel area S2 in each cell region 75 .
  • a second channel area S2 is defined by the total planar area of the plurality of second source regions 112 formed in each cell region 75 .
  • the second channel region 111 is formed at a second channel ratio R2 (second ratio) in each cell region 75 .
  • the second channel ratio R2 is the ratio of the second channel area S2 in each cell region 75 when the plane area of each cell region 75 is 100%.
  • the second channel ratio R2 is adjusted within a range of 0% or more and 50% or less.
  • the second channel ratio R2 is 0% or more and 5% or less, 5% or more and 10% or less, 10% or more and 15% or less, 15% or more and 20% or less, 20% or more and 25% or less, 25% or more and 30% or less, 30 % or more and 35% or less, 35% or more and 40% or less, 40% or more and 45% or less, or 45% or more and 50% or less.
  • the second channel ratio R2 is preferably 10% or more and 35% or less.
  • the second source region 112 is formed on substantially the entire first side wall 71 and the second side wall 72 of the second trench gate structure 70 .
  • the second contact regions 113 are not formed on the first sidewalls 71 and the second sidewalls 72 of the second trench gate structure 70 .
  • the second channel ratio R2 is preferably less than 50%.
  • the second channel ratio R2 When the second channel ratio R2 is 0%, the second source regions 112 are not formed on the first sidewalls 71 and the second sidewalls 72 of the second trench gate structure 70. In this case, only body region 55 and/or second contact region 113 are formed on first sidewall 71 and second sidewall 72 of second trench gate structure 70 .
  • the second channel ratio R2 preferably exceeds 0%. This form shows an example in which the second channel ratio R2 is 25%.
  • the total channel ratio RT in each cell region 75 is 50% in this form. In this configuration, all total channel ratios RT are set equal. Therefore, the average channel ratio RAV in the output area 6 (unit area) is 50%.
  • the average channel fraction RAV is the sum of all total channel fractions RT divided by the total number of total channel fractions RT.
  • Total channel ratio RT may be adjusted for each cell region 75 . That is, multiple total channel ratios RT each having a different value may be applied to each cell region 75 .
  • Total channel ratio RT is related to the temperature rise of semiconductor layer 2 . For example, increasing the total channel ratio RT makes it easier for the temperature of the semiconductor layer 2 to rise. On the other hand, when the total channel ratio RT is decreased, the temperature of the semiconductor layer 2 becomes difficult to rise.
  • the total channel ratio RT may be adjusted according to the temperature distribution of the semiconductor layer 2. For example, the total channel ratio RT may be made relatively small in regions where the temperature is likely to rise in the semiconductor layer 2, and the total channel ratio RT may be made relatively large in regions where the temperature is difficult to rise in the semiconductor layer 2.
  • FIG. 1 the total channel ratio RT may be adjusted according to the temperature distribution of the semiconductor layer 2.
  • the central portion of the output region 6 can be exemplified as a region in the semiconductor layer 2 where the temperature tends to rise.
  • a peripheral portion of the output region 6 can be exemplified as a region in which the temperature of the semiconductor layer 2 is difficult to rise.
  • the average channel ratio RAV may be adjusted while adjusting the total channel ratio RT according to the temperature distribution of the semiconductor layer 2 .
  • a plurality of cell regions 75 having a total channel ratio RT of 20% or more and 40% or less (eg, 25%) may be aggregated in a region (eg, central portion) where the temperature tends to rise.
  • a plurality of cell regions 75 having a total channel ratio RT of 60% or more and 80% or less (for example, 75%) may be aggregated in a region (for example, peripheral portion) where the temperature is less likely to rise.
  • a plurality of cell regions 75 having a total channel ratio RT of more than 40% and less than 60% (for example, 50%) may be aggregated in a region between a region where the temperature is likely to rise and a region where the temperature is difficult to rise.
  • the total channel ratio RT of 20% or more and 40% or less, the total channel ratio RT of 40% or more and 60% or less, and the total channel ratio RT of 60% or more and 80% or less are arranged in a regular array in a plurality of cell regions 75 may be applied to
  • three total channel ratios RT that repeat in the order of 25% (low) ⁇ 50% (middle) ⁇ 75% (high) may be applied to multiple cell areas 75 .
  • the average channel fraction RAV may be adjusted to 50%.
  • FIG. 6 is a graph obtained by examining the relationship between the active clamping capacity Eac and the area resistivity Ron ⁇ A by actual measurement.
  • the graph of FIG. 6 shows the characteristics when the first MISFET 56 and the second MISFET 57 are simultaneously controlled to the ON state and the OFF state.
  • the vertical axis indicates the active clamping capacity Eac [mJ/mm 2 ], and the horizontal axis indicates the area resistivity Ron ⁇ A [m ⁇ mm 2 ].
  • the active clamp tolerance Eac is the tolerance to the back electromotive force, as described with reference to FIG.
  • the area resistivity Ron ⁇ A represents the on-resistance in the semiconductor layer 2 during normal operation.
  • FIG. 6 shows a first plotted point P1, a second plotted point P2, a third plotted point P3 and a fourth plotted point P4.
  • the first plotted point P1, the second plotted point P2, the third plotted point P3, and the fourth plotted point P4 have an average channel ratio RAV (that is, a total channel ratio RT in each cell region 75) of 66%, 50%, The characteristics are shown when adjusted to 33% and 25%, respectively.
  • RAV that is, a total channel ratio RT in each cell region 75
  • the average channel ratio RAV is preferably 33% or more (more specifically, 33% or more and less than 100%).
  • the average channel ratio RAV is preferably less than 33% (more specifically, more than 0% and less than 33%).
  • FIG. 7 is a cross-sectional perspective view for explaining normal operation of the semiconductor device 1 shown in FIG.
  • FIG. 8 is a cross-sectional perspective view for explaining the active clamping operation of the semiconductor device 1 shown in FIG. 7 and 8, for convenience of explanation, the structure on the first main surface 3 is omitted and the gate control wiring 17 is simplified.
  • first on-signal Von1 is input to first gate control wiring 17A
  • second on-signal Von2 is input to second gate control wiring 17B
  • third gate A third ON signal Von3 is input to the control wiring 17C.
  • the first on-signal Von1, the second on-signal Von2 and the third on-signal Von3 are input from the control IC 10 respectively.
  • the first on-signal Von1, the second on-signal Von2, and the third on-signal Von3 each have a voltage equal to or higher than the gate threshold voltage Vth.
  • the first on-signal Von1, the second on-signal Von2 and the third on-signal Von3 may each have the same voltage.
  • the first opening-side electrode 87, the second opening-side electrode 107, the first bottom-side electrode 86, and the second bottom-side electrode 106 are turned on. That is, the first opening-side electrode 87, the second opening-side electrode 107, the first bottom-side electrode 86, and the second bottom-side electrode 106 function as gate electrodes.
  • both the first channel region 91 and the second channel region 111 are controlled to be on.
  • the ON-state first channel region 91 and second channel region 111 are indicated by dotted hatching.
  • the channel utilization rate RU during normal operation is 100%.
  • the characteristic channel ratio RC during normal operation is 50%.
  • the channel utilization rate RU is the ratio of the first channel region 91 and the second channel region 111 that are controlled to be in the ON state among the first channel region 91 and the second channel region 111 .
  • the characteristics of the power MISFET 9 are determined based on the characteristic channel ratio RC.
  • the sheet resistivity Ron ⁇ A approaches the sheet resistivity Ron ⁇ A indicated by the second plotted point P2 in the graph of FIG.
  • off signal Voff is input to first gate control wiring 17A
  • first clamp on signal VCon1 is input to second gate control wiring 17B
  • a second clamp-on signal VCon2 is input to the third gate control wiring 17C.
  • the off signal Voff, the first clamp-on signal VCon1 and the second clamp-on signal VCon2 are input from the control IC 10 respectively.
  • the off signal Voff has a voltage (eg, reference voltage) less than the gate threshold voltage Vth.
  • the first clamp-on signal VCon1 and the second clamp-on signal VCon2 each have a voltage equal to or higher than the gate threshold voltage Vth.
  • the first clamp-on signal VCon1 and the second clamp-on signal VCon2 may each have the same voltage.
  • the first clamp-on signal VCon1 and the second clamp-on signal VCon2 may have voltages below or below the voltage during normal operation.
  • the first opening side electrode 87 is turned off, and the first bottom side electrode 86, the second bottom side electrode 106 and the second opening side electrode 107 are each turned on.
  • the first channel region 91 is controlled to be off and the second channel region 111 is controlled to be on.
  • the off-state first channel region 91 is indicated by solid hatching, and the on-state second channel region 111 is indicated by dotted hatching.
  • the first MISFET 56 is controlled to be off, while the second MISFET 57 is controlled to be on (second Half-ON control).
  • the channel utilization rate RU during active clamp operation exceeds zero and becomes less than the channel utilization rate RU during normal operation.
  • the channel utilization rate RU during active clamp operation is 50%. Also, the characteristic channel ratio RC during the active clamp operation is 25%. As a result, the active clamp tolerance Eac approaches the active clamp tolerance Eac indicated by the fourth plotted point P4 in the graph of FIG.
  • control IC 10 controls the first MISFET 56 and the second MISFET 57 so that different characteristic channel ratios RC (channel areas) are applied during normal operation and during active clamp operation. More specifically, the control IC 10 controls the first MISFET 56 and the second MISFET 57 so that the channel utilization factor RU during active clamp operation exceeds zero and is less than the channel utilization factor RU during normal operation.
  • control IC 10 controls the first MISFET 56 and the second MISFET 57 to the ON state during normal operation, and controls the first MISFET 56 to the OFF state and the second MISFET 57 to the ON state during the active clamp operation.
  • the characteristic channel ratio RC relatively increases. That is, during normal operation, current can flow using the first MISFET 56 and the second MISFET 57 . As a result, the number of current paths is relatively increased, so that the area resistivity Ron ⁇ A (on-resistance) can be reduced.
  • the characteristic channel ratio RC relatively decreases. That is, since current can flow using the second MISFET 57 while the first MISFET 56 is stopped, the back electromotive force can be consumed (absorbed) by the second MISFET 57 . As a result, it is possible to suppress a rapid temperature rise caused by the back electromotive force, so that the active clamping resistance Eac can be improved.
  • the second Half-ON control is applied during the active clamp operation.
  • the first Half-ON control may be applied during the active clamp operation.
  • symbol as before is attached
  • the semiconductor device 1 basically includes the semiconductor device 1 described above (see FIG. 2). It can be understood that it contains the same components as
  • the independently controlled first MISFET 56 and second MISFET 57 are integrally formed as a single gate division element, the power MISFET 9 .
  • the active clamp circuit 26 is connected between the drain and gate of the first MISFET 56, and after the external control signal IN (and thus the enable signal EN) becomes low level, the output voltage VOUT of the source electrode 12 becomes a negative voltage.
  • the active clamp circuit 26 is not connected between its drain and gate.
  • FIG. 11 is a circuit diagram showing one configuration example of the gate control circuit 25 and the active clamp circuit 26 in FIG.
  • the anode of Zener diode string 261 is connected to the anode of diode string 262 .
  • a cathode of the diode string 262 is connected to a gate of the MISFET 263 .
  • an inductive load L such as a coil or a solenoid can be connected to the source electrode 12 as shown in FIGS. 9 and 10 above.
  • the current source 252 is connected between the application end of the boosted voltage VG and the gate of the second MISFET 57, and generates a source current IH2.
  • a current source 254 is connected between the gate of the second MISFET 57 and the application end of the output voltage VOUT, and generates a sink current IL2.
  • sink currents IL1 and IL2 are drawn from the gates of the first MISFET 56 and the second MISFET 57, respectively.
  • the MISFET 256 is connected between the gate and source of the second MISFET 57 and turned on/off according to the internal node voltage Vx of the active clamp circuit 26 .
  • the internal node voltage Vx for example, it is desirable to input the gate voltage of the MISFET 263 as shown in this figure.
  • the internal node voltage Vx is not limited to this, and for example, the anode voltage of any one of the n stages of diodes forming the diode string 262 may be used as the internal node voltage Vx.
  • the semiconductor device 1 is provided with Zener diodes ZD1 to ZD3, diodes D1 and D2, and a transistor DN1 (for example, a depletion N-channel MISFET) as electrostatic breakdown protection elements. I will briefly describe each connection relationship.
  • the cathodes of the Zener diodes ZD1 and ZD2 are connected to the gates of the first MISFET 56 and the second MISFET 57, respectively.
  • the anodes of Zener diodes ZD1 and ZD2 are connected to the anodes of diodes D1 and D2.
  • Both the cathode of the Zener diode ZD3 and the drain of the transistor DN1 are connected to the gate of the MISFET263.
  • the cathodes of the diodes D1 and D2, the anode of the Zener diode ZD3, and the source, gate and backgate of the transistor DN1 are connected to the application end of the output voltage VOUT.
  • the gate-source voltage of the first MISFET 56 is Vgs1
  • the gate-source voltage of the MISFET 263 is Vgs2
  • the gate-source voltage of the MISFET 256 is Vgs3
  • the breakdown voltage of the Zener diode string 261 is mVZ
  • the diode string Assuming that the forward voltage drop of 262 is nVF, the first half-ON control of the power MISFET 9 during the active clamp operation will be described.
  • the inductive load L continues to flow the output current IOUT until the energy stored during the ON period of the power MISFET 9 is released.
  • the output voltage VOUT abruptly drops to a negative voltage lower than the ground voltage GND.
  • the active clamp circuit 26 operates to cause the first MISFET 56 to Since it is turned on (not fully turned off), the output current IOUT is discharged through the first MISFET 56 . Therefore, the output voltage VOUT is limited to the lower limit voltage VB- ⁇ or higher.
  • ⁇ mVZ+nVF+Vgs3
  • the second MISFET 57 is completely stopped before the active clamp circuit 26 operates (before time t4) due to the action of the MISFET 256.
  • This state corresponds to the first Half-ON state of the power MISFET 9 .
  • the semiconductor device 1 that achieves both excellent sheet resistivity Ron ⁇ A and excellent active clamping capability Eac separately from the trade-off relationship shown in FIG.
  • the active clamping capability Eac is one of the important characteristics for driving a larger inductive load L.
  • the semiconductor device 1 marketed as an IPD has the active clamp circuit 26 as means for absorbing the back electromotive force of the inductive load L.
  • FIG. 1 an active clamp tolerance Eac is set for each model, and when a load exceeding this active clamp tolerance Eac is connected, it is necessary to protect the semiconductor device 1 using an external component. be.
  • a wire harness generally has an inductance component.
  • FIG. 13 is a diagram for explaining the active clamp operation in the output short-circuit state of the semiconductor device 1 according to the first embodiment. (dashed line) and G2 (dashed line) and the output current IOUT are depicted.
  • FIG. 14 is a block circuit diagram showing the semiconductor device 1 according to the second embodiment.
  • the semiconductor device 1 according to the second embodiment is based on the first embodiment (FIG. 11) and further includes a delay circuit DLY1.
  • the gate control circuit 25 individually controls the gate control signals G1 and G2 so as to raise the ON resistance of the power MISFET 9 according to the delayed internal node voltage VxD.
  • FIG. 15 is a diagram showing a configuration example of the delay circuit DLY1.
  • the delay circuit DLY1 of this configuration example includes a capacitor C1 and a charging current generator IcGNR.
  • the charging current generator IcGNR is a circuit block that generates a charging current Ic for the capacitor C1 according to the internal node voltage Vx, and includes transistors P1 to P5 (all P-channel MISFETs) and transistors N1 to N4 (all N channel-type MISFET), transistors DN2 and DN3 (both depletion N-channel MISFETs), and Zener diode ZD4.
  • the gates of the transistors P1 to P3 are all connected to the drain of the transistor P1.
  • Transistors P1-P3 connected in this manner mirror the reference current I1 input to the drain of transistor P1, thereby generating mirrored currents I2 and I3 (where I2 ⁇ I1 and I3 ⁇ It functions as a current mirror CM1 that outputs I1).
  • the drain of transistor P2 is connected to the drains of transistors N1 and DN3, the gate of transistor N2, and the cathode of Zener diode ZD4. Both the gate of the transistor N1 and the drain of the transistor DN2 are connected to the input terminal of the internal node voltage Vx. The drain of transistor N2 is connected to the output of delayed internal node voltage VxD.
  • the drains of the transistors N3 and N4 are both connected to the application end of the output voltage VOUT.
  • the gates of transistors N3 and N4 are both connected to the drain of transistor N3.
  • the drain of transistor N3 is connected to the drain of transistor P3.
  • the transistors N3 and N4 connected in this manner serve as a current mirror CM2 that outputs a mirror current I4 (where I4 ⁇ I3) from the drain of the transistor N4 by mirroring the mirror current I3 input to the drain of the transistor N3. Function.
  • the sources of the transistors P4 and P5 are both connected to the application end of the internal node voltage Vx.
  • the gates of transistors P4 and P5 are both connected to the drain of transistor P4.
  • the drain of transistor P4 is connected to the drain of transistor N4.
  • the transistors P4 and P5 connected in this manner serve as a current mirror CM3 that outputs a mirror current I5 (where I5 ⁇ I4) from the drain of the transistor P5 by mirroring the mirror current I4 input to the drain of the transistor P4. Function.
  • the drain of the transistor P5 and the first end of the capacitor C1 are both connected to the application end of the delayed internal node voltage VxD.
  • a second end of the capacitor C1 is connected to the application end of the output voltage VOUT.
  • Capacitor C1 connected in this manner is charged by mirror current I5 (corresponding to charging current Ic) output from the drain of transistor P5, and the charging voltage of capacitor C1 is output as delayed internal node voltage VxD.
  • the transistor N1 when the internal node voltage Vx is lower than the ON threshold voltage of the transistor N1, the transistor N1 is turned off. Therefore, since the gate voltage Vy of the transistor N2 becomes high level ( ⁇ VB), the transistor N2 is turned on. As a result, both ends of the capacitor C1 are short-circuited, so that the capacitor C1 is discharged.
  • transistors DN2 and DN3 function as gate logic fixed elements of the transistors N1 and N2, respectively.
  • Zener diode ZD4 functions as a gate-source protection element for transistor N2.
  • the transistors N1 and N2, the transistors DN2 and DN3, and the Zener diode ZD4 form a discharge switch section DSW that switches whether to discharge the capacitor C1 according to the internal node voltage Vx.
  • the current mirror CM3 can be understood as an output stage of the charging current Ic.
  • a driving voltage for driving this current mirror CM3 it is desirable to receive supply of the internal node voltage Vx as shown in the figure. With such a configuration, delayed internal node voltage VxD can be generated without any problem even after charge pump circuit 39 stops operating.
  • FIG. 16 is a diagram for explaining the active clamping operation of the semiconductor device 1 according to the second embodiment. G2 (dashed line) and output current IOUT are depicted.
  • switching to the first Half-ON state is on standby from time t13 to time t14 when a predetermined delay time td elapses, as shown in the figure. That is, the timing of invalidating the unclamped gate of the power MISFET 9 is delayed by the delay time td as compared with the first embodiment (FIG. 13).
  • the delay time td should be set to a length that can absorb (clamp) an instantaneous large current. Referring to this figure, the delay time td is set so that the switching to the first Half-ON state is performed immediately after the output voltage VOUT is clamped to the lower limit voltage VB- ⁇ .
  • the delay time td is sufficiently short with respect to the active clamp time TAV (for example, several ms). Therefore, there is no need to worry about a decrease in the active clamp tolerance Eac.
  • FIG. 17 is a block circuit diagram showing the semiconductor device according to the third embodiment.
  • the semiconductor device 1' according to the third embodiment is based on the semiconductor device 1 according to the second embodiment (FIG. 14), but the target of application is changed from the high side switch IC to the low side switch IC.
  • the delay circuit DLY1 is replaced with the delay circuit DLY2 as the target of application is changed from the high-side switch IC to the low-side switch IC.
  • FIG. 18 is a diagram showing a configuration example of the delay circuit DLY2.
  • the delay circuit DLY2 of this configuration example is based on the previously described FIG. 15, but the voltage applied to each part is changed.
  • the drains of the transistors P1 to P3 are all connected to the application terminal of the external control signal IN. That is, in the semiconductor device 1' functioning as a low-side switch IC, the external control signal IN is supplied as the drive voltage for the delay circuit DLY2.
  • the drains of the transistors N1 to N4, the drains of the transistors DN3 and DN4, the anode of the Zener diode ZD4, and the second end of the capacitor C1 are all connected to the ground electrode GND.
  • FIG. 19 and 20 are diagrams for explaining the active clamping operation of the semiconductor device 1' according to the third embodiment. From the top, enable signal EN, output voltage VOUT (solid line), gate control signal G1 (dashed line) and G2 (dashed line) and the output current IOUT are depicted. 19 shows the behavior when the delay circuit DLY2 is not provided, and FIG. 20 shows the behavior when the delay circuit DLY2 is provided.
  • the delay circuit DLY2 is not provided (FIG. 19)
  • the output voltage VOUT reaches the channel switching voltage at time t23.
  • the power MISFET 9 is switched to the first Half-ON state at the point when the voltage rises to GND+ ⁇ ( ⁇ GND+ ⁇ ).
  • the delay time td should be set to a length that can absorb (clamp) an instantaneous large current. Referring to this figure, the delay time td is set so that switching to the first Half-ON state is performed immediately after the output voltage VOUT is clamped to the upper limit voltage GND+ ⁇ .
  • the delay time td is sufficiently short with respect to the active clamp time TAV (for example, several ms). Therefore, there is no need to worry about a decrease in the active clamp tolerance Eac. This point is the same as in the second embodiment.
  • the input electrode IN and the gate of the power MISFET 9 are connected with a resistor, but the connection between the input electrode IN and the gate of the power MISFET 9 can be cut off with an analog switch. . Therefore, it is possible to raise the gate control signals G1 and G2 of the power MISFET 9 by active clamping.
  • the delay circuit DLY2 (particularly the current mirror CM1) becomes uncontrollable. Therefore, the delay circuit DLY2 needs to be supplied with the internal node voltage Vx instead of the external control signal IN to operate. There is no problem with the above configuration as long as it is a low-side switch IC that operates by receiving power supplied from an external power supply.
  • FIG. 21 is an external view showing one configuration example of the vehicle X.
  • a vehicle X of this configuration example is equipped with a battery (not shown in the drawing) and various electronic devices X11 to X18 that operate with power supplied from the battery.
  • vehicle X includes electric vehicles (BEV [battery electric vehicle], HEV [hybrid electric vehicle], PHEV/PHV (plug-in hybrid electric vehicle/plug-in hybrid vehicle), or FCEV/FCV (xEV such as fuel cell electric vehicle/fuel cell vehicle]) is also included.
  • BEV battery electric vehicle
  • HEV hybrid electric vehicle
  • PHEV/PHV plug-in hybrid electric vehicle/plug-in hybrid vehicle
  • FCEV/FCV xEV such as fuel cell electric vehicle/fuel cell vehicle
  • the electronic device X11 performs engine-related control (injection control, electronic throttle control, idling control, oxygen sensor heater control, auto-cruise control, etc.) or motor-related control (torque control, power regeneration control, etc.). It is an electronic control unit that performs
  • the electronic device X12 is a lamp control unit that controls lighting and extinguishing of HID [high intensity discharged lamp] and DRL [daytime running lamp].
  • the electronic device X13 is a transmission control unit that performs controls related to the transmission.
  • the electronic device X14 is a braking unit that performs control related to the movement of the vehicle X (ABS [anti-lock brake system] control, EPS [electric power steering] control, electronic suspension control, etc.).
  • ABS anti-lock brake system
  • EPS electric power steering
  • electronic suspension control etc.
  • the electronic device X15 is a security control unit that controls the driving of door locks and security alarms.
  • Electronic device X16 is an electronic device built into vehicle X at the factory shipment stage as a standard equipment or manufacturer's option, such as a wiper, an electric door mirror, a power window, a damper (shock absorber), an electric sunroof, and an electric seat. is.
  • the electronic device X17 is an electronic device that is arbitrarily attached to the vehicle X as a user option, such as an in-vehicle A/V [audio/visual] device, a car navigation system, and an ETC [electronic toll collection system].
  • the electronic device X18 is an electronic device equipped with a high withstand voltage motor, such as an in-vehicle blower, oil pump, water pump, and battery cooling fan.
  • a high withstand voltage motor such as an in-vehicle blower, oil pump, water pump, and battery cooling fan.
  • the semiconductor device 1 described above can be incorporated in any of the electronic devices X11 to X18.
  • the semiconductor device disclosed in this specification includes a gate-split type output transistor configured such that a plurality of channel regions are individually controlled according to a plurality of gate control signals; an active clamp circuit configured to limit the voltage across the output transistor to a predetermined clamp voltage or less after reaching a turn-off logic level; and the voltage across the output transistor being lower than the clamp voltage.
  • a delay circuit configured to give a predetermined delay to an internal signal indicating whether or not it exceeds a predetermined threshold voltage to generate a delayed internal signal; and to increase the on-resistance of the output transistor according to the delayed internal signal.
  • a gate control circuit configured to individually control the plurality of gate control signals (first configuration).
  • the delay circuit includes a capacitor and a charging current generating section configured to generate a charging current for the capacitor according to the internal signal, and the capacitor may be configured to output the charging voltage of as the delayed internal signal (second configuration).
  • the charging current generator includes a current mirror configured to generate the charging current according to a reference current, and discharges the capacitor according to the internal signal. and a discharge switch unit configured to switch whether or not to discharge (third configuration).
  • the current mirror may receive the supply of the internal signal as a driving voltage for driving the charging current output stage (fourth configuration).
  • the active clamp circuit includes a transistor configured to be connected between the drain and gate of the output transistor and a cathode connected to the drain of the transistor. at least one Zener diode configured to be connected; and at least one diode configured to have an anode connected to the anode of the Zener diode and a cathode connected to the gate of the transistor. (Fifth configuration).
  • the internal signal may be the internal node voltage of the active clamp circuit (sixth configuration).
  • the output transistor includes a non-clamped gate to which the active clamp circuit is not connected, and the gate control circuit controls the non-clamped gate according to the delay internal signal.
  • a configuration (seventh configuration) in which the clamp gate is disabled may be employed.
  • the output transistor is a high-side switch that conducts/disconnects between a power supply terminal and a load, or conducts/disconnects between a load and a ground terminal.
  • a configuration (eighth configuration) that functions as a low-side switch may be employed.
  • an electronic device disclosed in this specification includes a semiconductor device according to any one of the first to eighth configurations and a load connected to the semiconductor device (ninth configuration). It is said that
  • the vehicle disclosed in this specification is configured to include the electronic device according to the ninth configuration (tenth configuration).
  • an automotive high-side switch IC and an automotive low-side switch IC are exemplified, but the scope of application of the invention disclosed herein is not limited to these.
  • an automotive IPD [intelligent power device] vehicle power supply IC, etc. used for other purposes, and a wide range of other semiconductor devices having power transistors.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
PCT/JP2022/025736 2021-09-27 2022-06-28 半導体装置、電子機器、車両 Ceased WO2023047745A1 (ja)

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DE112022004044.0T DE112022004044T5 (de) 2021-09-27 2022-06-28 Halbleiterbauteil, elektronisches gerät, und fahrzeug
CN202280065007.4A CN118044120A (zh) 2021-09-27 2022-06-28 半导体装置、电子设备、车辆
JP2023549377A JPWO2023047745A1 (https=) 2021-09-27 2022-06-28
US18/614,483 US20240235190A1 (en) 2021-09-27 2024-03-22 Semiconductor device, electronic device, and vehicle

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DE102023105115A1 (de) * 2023-03-01 2024-09-05 Lisa Dräxlmaier GmbH Elektronische schaltung zum abschalten von halbleiterschaltern bei kritischen strömen
US20240351570A1 (en) * 2023-04-19 2024-10-24 Sumitomo Wiring Systems, Ltd. Power Supply System Having A Shut-Off Circuit

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WO2021024813A1 (ja) * 2019-08-02 2021-02-11 ローム株式会社 半導体装置

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CN109698614B (zh) * 2017-10-20 2021-02-26 台达电子企业管理（上海）有限公司 功率半导体开关的有源钳位电路及使用其的功率变流器
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WO2020130141A1 (ja) * 2018-12-21 2020-06-25 ローム株式会社 半導体装置
WO2021024813A1 (ja) * 2019-08-02 2021-02-11 ローム株式会社 半導体装置

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