WO2023035317A1 - 一种显示面板 - Google Patents

一种显示面板 Download PDF

Info

Publication number
WO2023035317A1
WO2023035317A1 PCT/CN2021/119313 CN2021119313W WO2023035317A1 WO 2023035317 A1 WO2023035317 A1 WO 2023035317A1 CN 2021119313 W CN2021119313 W CN 2021119313W WO 2023035317 A1 WO2023035317 A1 WO 2023035317A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
cathode
optical
optical structure
display
Prior art date
Application number
PCT/CN2021/119313
Other languages
English (en)
French (fr)
Inventor
金蒙
Original Assignee
武汉华星光电半导体显示技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 武汉华星光电半导体显示技术有限公司 filed Critical 武汉华星光电半导体显示技术有限公司
Priority to US17/607,855 priority Critical patent/US20240032346A1/en
Publication of WO2023035317A1 publication Critical patent/WO2023035317A1/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/82—Cathodes
    • H10K50/822—Cathodes characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/856—Arrangements for extracting light from the devices comprising reflective means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/875—Arrangements for extracting light from the devices
    • H10K59/878—Arrangements for extracting light from the devices comprising reflective means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/875—Arrangements for extracting light from the devices
    • H10K59/879—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/302—Details of OLEDs of OLED structures
    • H10K2102/3023—Direction of light emission
    • H10K2102/3026—Top emission
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Definitions

  • the present invention relates to the field of display technology, in particular to a display panel.
  • OLED Organic Light Emitting Diode
  • Organic Light Emitting Diode display technology has attracted the attention of more and more researchers, and is widely used in display fields such as mobile phones, tablets, and TVs. With the rapid development of display devices, users The screen-to-body ratio requirements of display devices are getting higher and higher, making large-size and high-resolution comprehensive display devices a future development direction.
  • optical components such as the front camera and face recognition are usually placed under the screen.
  • the cathode is set on the entire surface. , while the transmittance of the cathode for light is low, so that the optical components arranged under the screen cannot receive sufficient light signals, which affects the normal operation of the optical components.
  • the invention provides a display panel, which can solve the problem that the optical elements arranged under the screen cannot receive sufficient light signals, which affects the normal operation of the optical elements.
  • the present invention provides a display panel, the display panel includes a first display area and a second display area, the second display area surrounds the first display area, and the transmittance of the first display area is greater than that of the first display area
  • the transmittance of the two display areas, the first display area includes:
  • a display substrate the display substrate includes a pixel definition layer and a cathode layer disposed on the pixel definition layer, the pixel definition layer includes a plurality of spaced apart pixel openings and supporting parts between adjacent pixel openings, the The thickness of the cathode layer at the pixel opening is greater than the thickness of the cathode layer on the support portion;
  • An optical film layer is disposed on the side of the cathode layer away from the pixel definition layer, and the optical film layer includes a plurality of first optical structures correspondingly disposed between two adjacent pixel openings;
  • the first optical structure includes a first surface close to the cathode layer, a second surface opposite to the first surface, and a side surface, and the side surface of the first optical structure is a total reflection surface.
  • the optical film layer includes at least two optical sub-film layers with different refractive indices, and at least one of the at least two optical sub-film layers forms the first optical structure.
  • the refractive indices of at least two optical sub-film layers decrease sequentially from a side close to the display substrate to a side away from the display substrate; the first A cross-sectional width of an optical structure away from the display substrate is greater than or equal to a cross-sectional width of the first optical structure close to the display substrate.
  • the optical film layer further includes a plurality of second optical structures corresponding to the pixel openings, the second optical structures are located on the same layer as the first optical structures,
  • the second optical structure includes a first surface close to the cathode layer, a second surface opposite to the first surface, and a side surface, and the side surface of the second optical structure is a total reflection surface.
  • the cross-sectional width of the side of the second optical structure away from the display substrate is greater than or equal to the cross-sectional width of the side of the second optical structure close to the display substrate.
  • the first optical structure and/or the second optical structure include at least two layers of the optical sub-film layers, and the optical sub-film layers on the side away from the display substrate
  • the film layer wraps the optical sub-film layer on the side close to the display substrate, and at least two optical sub-film layers in the first optical structure and/or the second optical structure are perpendicular to the display substrate
  • the cross-sectional shape in the same direction is the same.
  • the cathode layer includes a first cathode portion corresponding to the pixel opening and a second cathode portion corresponding to the support portion, and the thickness of the first cathode portion is greater than that of the first cathode portion.
  • the thickness of the two cathode parts is greater than that of the two cathode parts.
  • the display substrate further includes a plurality of anodes, a first auxiliary layer, an organic light-emitting layer, and a second auxiliary layer, the anodes are arranged opposite to the first cathode,
  • the first auxiliary layer is located on the side of the anode close to the cathode layer
  • the organic light-emitting layer is located on the side of the first auxiliary layer close to the cathode layer
  • the second auxiliary layer is located on the side of the organic
  • the luminescent layer is close to the side of the cathode layer
  • a cathode suppression layer is formed on the support part, the thickness of the cathode suppression layer is smaller than the thickness of the cathode layer, and the distance between the cathode suppression layer and the cathode layer is
  • the adhesive force is smaller than the adhesive force between the cathode layer and the second auxiliary layer, and the cathode suppression layer is made of transparent material.
  • the orthographic projection of the cathode suppression layer on the optical film layer is separated from the orthographic projection of the anode on the optical film layer.
  • the orthographic projection of the first optical structure on the display substrate overlaps with the cathode suppression layer.
  • the side of the first optical structure close to the cathode suppression layer is the bottom, wherein the bottom boundary of the first optical structure and the boundary of the cathode suppression layer Corresponding.
  • the orthographic projection of the second optical structure on the display substrate overlaps with the first cathode portion.
  • the width of the pixel opening is L
  • the height of the pixel opening is H
  • the side surface of the first optical structure and the second optical structure of the first optical structure are The included angle between one side is a first included angle
  • the included angle between the side surface of the second optical structure and the first surface of the second optical structure is a second included angle
  • the first included angle and Angle ranges of the second included angles are greater than a threshold angle and less than or equal to 90°; wherein, the threshold angle is arctan(H/L)*180°/ ⁇ .
  • the first included angle is equal to the second included angle.
  • the bottom boundary of the second optical structure on the side close to the cathode layer is located within a range from the boundary of the pixel opening to a preset distance beyond the boundary of the pixel opening;
  • the preset distance is: the vertical distance from the pixel definition layer to the optical film layer/the tangent of the threshold angle.
  • the refractive indices of at least two optical sub-film layers increase sequentially from a side close to the display substrate to a side away from the display substrate; the first A cross-sectional width of an optical structure away from the display substrate is smaller than or equal to a cross-sectional width of the first optical structure close to the display substrate.
  • the cathode layer includes a first cathode portion corresponding to the pixel opening and a second cathode portion corresponding to the support portion, and the thickness of the first cathode portion is greater than that of the first cathode portion.
  • the thickness of the two cathode parts is greater than that of the two cathode parts.
  • the display substrate further includes a plurality of anodes, a first auxiliary layer, an organic light-emitting layer, and a second auxiliary layer, the anodes are arranged opposite to the first cathode,
  • the first auxiliary layer is located on the side of the anode close to the cathode layer
  • the organic light-emitting layer is located on the side of the first auxiliary layer close to the cathode layer
  • the second auxiliary layer is located on the side of the organic
  • the luminescent layer is close to the side of the cathode layer
  • a cathode suppression layer is formed on the support part, the thickness of the cathode suppression layer is smaller than the thickness of the cathode layer, and the distance between the cathode suppression layer and the cathode layer is
  • the adhesive force is smaller than the adhesive force between the cathode layer and the second auxiliary layer, and the cathode suppression layer is made of transparent material.
  • a light-transmitting area is further provided between two adjacent pixel openings of the first display area.
  • the first optical structure is away from the side of the display substrate,
  • the cross-sectional width of the first optical structure is less than or equal to the cross-sectional width of the side close to the display substrate, the orthographic projection of the first optical structure on the display substrate is located between the pixel opening and the light-transmitting region between.
  • the side of the first optical structure close to the cathode suppression layer is a bottom, wherein, the bottom border of the first optical structure close to the pixel opening and the The boundary of the pixel opening corresponds to the boundary of the bottom of the first optical structure near the light-transmitting region and the boundary of the cathode suppression layer corresponds.
  • the cathode layer is patterned so that the cathode layer between the corresponding two pixel openings is thinner or there is no cathode layer deposition, so as to greatly improve the light transmittance of the first display area; at the same time, the present invention Furthermore, by disposing an optical film layer on the light-emitting surface of the display substrate, the optical film layer includes a first optical structure located between two adjacent pixel openings, and the first optical structure can reflect more external light to the display panel In the first display area of the first display area, the incident light amount of the first display area is further increased, so that the optical elements arranged in the first display area can receive sufficient light signals, so as to improve the performance of the optical elements.
  • FIG. 1 is a schematic plan view of a display panel provided by an embodiment of the present invention.
  • FIG. 2 is a schematic cross-sectional view of a first display area of a display panel provided by Embodiment 1 of the present invention
  • FIG. 3 is a schematic cross-sectional view of a second display area of the display panel provided by Embodiment 1 of the present invention.
  • Fig. 4 is a kind of partial enlargement diagram of area A in Fig. 2;
  • Fig. 5 is another kind of partial enlarged view of area A in Fig. 2;
  • FIG. 6 is a partial schematic diagram of a display panel provided by Embodiment 2 of the present invention.
  • FIG. 7 is a schematic cross-sectional view of a first display area of a display panel provided by Embodiment 3 of the present invention.
  • Fig. 8 is a partially enlarged view of area B in Fig. 7;
  • FIG. 9 is a schematic cross-sectional view of a first display area of a display panel provided by Embodiment 4 of the present invention.
  • FIG. 10 is a schematic cross-sectional view of the first display area of the display panel provided by Embodiment 5 of the present invention.
  • orientation words such as “up” and “down” usually refer to up and down in the actual use or working state of the device, specifically the direction of the drawing in the drawings ; while “inside” and “outside” refer to the outline of the device.
  • the present invention aims at the problem that the optical elements arranged below the display screen cannot receive sufficient light signals, which affects the normal operation of the optical elements, and the following embodiments can solve this defect.
  • the display panel of the present invention includes a first display area 11 and a second display area 12, the second display area 12 surrounds the first display area 11, and the first display area 11 can be arranged on the display panel any position on the .
  • the display panel is a full-screen display panel, a plurality of first sub-pixels 13 are arranged in the first display area 11 , and a plurality of second sub-pixels 14 are arranged in the second display area 12 .
  • the first display area 11 is an area with additional functions, and the first display area 11 can be used to display images, so that the display panel can present a full-screen display effect, and can also be used to install cameras, optical touch components and Optical elements such as fingerprint recognition sensors, thereby improving user experience;
  • the second display area 12 is the main display area, and the second display area 12 is used for displaying images.
  • the light transmittance of the first display area 11 is greater than the light transmittance of the second display area 12 .
  • the light transmittance of the first display area 11 has a great influence on the work of the optical element, and the light transmittance of the first display area 11 is in turn different from that of the first display area 11.
  • the layer structure of the camera is related to the film layer structure. Taking the optical element as a camera as an example, the higher the light transmittance of the first display area 11 is, the better the image quality of the camera will be when the camera is shooting.
  • the first display area 11 of the display panel includes a display substrate 100 and an optical film layer 200, the display substrate 100 has a light-emitting surface, and the optical film layer 200 is located on the light-emitting surface of the display substrate 100. side of the face.
  • the display substrate 100 includes a pixel definition layer 1031 and a cathode layer 1034 disposed on the pixel definition layer 1031, and the pixel definition layer 1031 includes a plurality of spaced apart pixel openings 1001 and supports between adjacent pixel openings 1001 part 1031a, the thickness of the cathode layer 1034 at the pixel opening 1001 is greater than the thickness of the cathode layer 1034 at the supporting part 1031a. Wherein, when the thickness of the cathode layer 1034 on the support portion 1031a is 0, that is, there is no cathode layer deposited between the corresponding two pixel openings 1001 .
  • a light-transmitting area 111 is provided between two adjacent pixel openings 1001 of the first display area 11, and the light-transmitting area 111 is used to allow external light to pass through the display panel to the optical element,
  • the thickness of the cathode layer 1034 in the pixel opening 1001 is greater than the thickness of the cathode layer 1034 in the light-transmitting region 111 .
  • the optical film layer 200 includes a plurality of first optical structures 200 a correspondingly arranged between two adjacent pixel openings 1001 .
  • the first optical structure 200a includes a first surface close to the cathode layer 1034, a second surface opposite to the first surface, and a side surface 200a', and the side surface 200a' of the first optical structure 200a is Totally reflective surface.
  • the cathode layer 1034 of the first display area 11 is patterned, so that the cathode layer 1034 on the support portion 1031a between the corresponding pixel openings 1001 is thinner or no cathode layer is deposited, thereby improving the transparency of the first display area 11. light rate.
  • the present invention also arranges the optical film layer 200 on the light-emitting surface of the display substrate 100.
  • the optical film layer 200 utilizes the light to be totally reflected on the side surface 200a' of the first optical structure 200a, so as to direct the light to the light-transmitting area 111.
  • External light is reflected into the light-transmitting area 111 through the side surface 200a' of the first optical structure 200a, so as to further increase the amount of incident light in the first display area 11, so that the optical elements arranged in the first display area 11 can receive sufficient light.
  • Optical signal thereby improving the performance of optical components.
  • the first display area 11 of the display panel of this embodiment includes a display substrate 100 and an optical film layer 200 located on the light emitting surface side of the display substrate 100 .
  • the optical film layer 200 includes a first optical sub-film layer 201 and a second optical sub-film layer 202, the second optical sub-film layer 202 is located on the side of the first optical sub-film layer 201 away from the substrate 101 , and the refractive index of the first optical sub-film layer 201 is greater than the refractive index of the second optical sub-film layer 202 .
  • the range of the refractive index of the first optical sub-film layer 201 is 1.5-2, for example, it may be 1.5, 1.7, 1.8, or 2 and so on.
  • the refractive index of the second optical sub-film layer 202 ranges from 1 to 1.4, for example, 1, 1.1, 1.2, 1.3 or 1.4.
  • the first optical structure 200a is formed by the first optical sub-film layer 201
  • the display substrate 100 includes a pixel definition layer 1031 and a cathode layer 1034 disposed on the pixel definition layer 1031
  • the The pixel definition layer 1031 includes a plurality of spaced apart pixel openings 1001 and a support portion 1031a between adjacent pixel openings 1001
  • the first optical structure 200a corresponds to the support portion 1031a disposed between two adjacent pixel openings 1001 superior.
  • the first optical structure 200a may be formed by the second optical sub-film layer 202, at this time, the position of the first optical sub-film layer 201 corresponds to the first optical structure 200a A depression matching the first optical structure 200a needs to be provided, and the first optical structure 200a is embedded in the depression.
  • the optical film layer 200 is a transparent film layer.
  • the second display area 12 of the display panel in this embodiment includes a display substrate 100 and a touch layer 300 , and the touch layer 300 is disposed on the light emitting surface side of the display substrate 100 .
  • the touch layer 300 includes a first insulating layer 301 , a second insulating layer 302 , a third insulating layer 303 , touch electrodes 304 and touch electrode connection lines 305 .
  • the first insulating layer 301 is located on the surface of the display substrate 100, the touch electrode connection line 305 is located on the side of the first insulating layer 301 away from the display substrate 100, and the second insulating layer 302 is located on the The touch electrode connection line 305 is located on a side away from the display substrate 100 , the touch electrode 304 is located on a side of the second insulating layer 302 away from the display substrate 100 , and the third insulating layer 303 is located on a side of the display substrate 100 .
  • the touch electrode 304 is away from the side of the display substrate 100 .
  • the display substrate 100 includes a pixel definition layer 1031 and a cathode layer 1034 disposed on the pixel definition layer 1031, and the pixel definition layer 1031 includes a plurality of spaced apart pixel openings 1001 and between adjacent pixel openings 1001
  • the supporting portion 1031 a of the touch electrode 304 and the touch electrode connection line 305 are correspondingly located between two adjacent pixel openings 1001 .
  • the second insulating layer 302 is provided with a via hole penetrating through the second insulating layer 302 at a position corresponding to the touch electrode connection line 305.
  • the The touch electrode 304 includes a first electrode and a second electrode that can form a mutual capacitance, wherein two adjacent first electrodes or the second electrode are realized through the touch electrode connection line 305 through the via hole. electrical connection.
  • the display substrate 100 of this embodiment includes a substrate 101 , a TFT device layer 102 , an OLED device layer 103 and a thin film encapsulation layer 104 .
  • the substrate 101 can be a flexible substrate, and the material of the flexible substrate can be an organic material such as polyimide; the substrate 101 can also be a rigid substrate, and the material of the rigid substrate can be glass, metal, plastic, etc., for example;
  • the substrate 101 can be a single-layer film structure or a multi-layer film structure.
  • the TFT device layer 102 is located on the substrate 101, and a buffer layer 105 is further included between the TFT device layer 102 and the substrate 101, and the buffer layer 105 is silicon oxide or silicon nitride that blocks water and oxygen.
  • the TFT device layer 102 includes: an active layer 1021, a first gate insulating layer 1022 covering the active layer 1021, and a gate disposed on a side of the first gate insulating layer 1022 away from the substrate 101.
  • the second gate insulating layer 1024 covering the gate 1023, the second gate 1025 disposed on the side of the second gate insulating layer 1024 away from the substrate 101, covering the second gate 1025
  • the OLED device layer 103 is located on the side of the TFT device layer 102 away from the substrate 101 , and the OLED device layer 103 includes a pixel definition layer 1031 , a plurality of anodes 1032 , an organic light emitting layer 1033 and a cathode layer 1034 .
  • the pixel definition layer 1031 defines a pixel opening 1001
  • the organic light emitting layer 1033 is disposed corresponding to the pixel opening 1001
  • the organic light emitting layer 1033 is located between the anode 1032 and the cathode layer 1034
  • the anode 1032 is located on the side of the cathode layer 1034 away from the optical film layer 200 .
  • the thin film encapsulation layer 104 is located on the side of the OLED device layer 103 away from the substrate 101, and the thin film encapsulation layer 104 is used to protect the devices of the display panel from being affected by water and oxygen, thereby extending the length of the display panel. service life.
  • the thin film encapsulation layer 104 includes a first inorganic layer 1041, a first organic layer 1042, and a second inorganic layer 1043 stacked, and the first organic layer 1042 is located between the first inorganic layer 1041 and the second inorganic layer. 1043, the first inorganic layer 1041 is located on the side of the first organic layer 1042 close to the substrate 101, and the second inorganic layer 1043 is located on the side of the first organic layer 1042 away from the substrate 101. side.
  • the difference between the display substrate 100 of the first display area 11 and the display substrate 100 of the second display area 12 is that: the cathode layer 1034 is provided as a whole layer in the second display area 12, and no further steps are required. Patterning, that is, the thickness remains uniform; and in the first display area 11, the cathode layer 1034 is patterned to have different thicknesses, and the cathode layer 1034 includes a first cathode portion 1034a corresponding to the pixel opening 1001 And the second cathode part (not shown) corresponding to the supporting part 1031a, the thickness of the first cathode part 1034a is greater than the thickness of the second cathode part.
  • the cathode layer 1034 in the first display area 11 is patterned into a plurality of first cathode portions 1034a, and the first cathode portions 1034a are arranged corresponding to the pixel openings 1001 .
  • a light-transmitting area 111 is further included between two adjacent pixel openings 1001 in the first display area 11, and the light-transmitting area 111 is used to allow external light to pass through. through the display panel to the optical element.
  • the display substrate 100 further includes a first auxiliary layer (not shown) located between the anode 1032 and the organic light emitting layer 1033, and a first auxiliary layer (not shown) located between the organic light emitting layer 1033 and the first cathode part 1034a A second auxiliary layer (not shown).
  • the first auxiliary layer may be a hole transport layer
  • the second auxiliary layer may be an electron transport layer.
  • the first display area 11 also includes a cathode suppression layer 1035, the cathode suppression layer 1035 is arranged on the support part 1031a, and the positive projection of the cathode suppression layer 1035 on the optical film layer 200 is the same as that of the anode Orthographic projections of 1032 on the optical film layer 200 are separated (that is, do not overlap). Also, the adhesion between the cathode suppression layer 1035 and the cathode layer 1034 is smaller than the adhesion between the cathode layer 1034 and the second auxiliary layer.
  • the material of the cathode layer 1034 can be metal magnesium, and the material of the cathode suppression layer 1035 can be BAlq (bis(2-methyl-8-hydroxyquinoline)-4-(p-phenylphenol) aluminum), TAZ ( At least one of 3-(biphenyl-4-yl)-5-(4-tert-butylphenyl)-4-phenyl-4H-1,2,4-triazole) and OTI (indium oxide) .
  • Metal magnesium has poor adhesion on BAlq, TAZ and OTI materials.
  • the cathode suppression layer 1035 inhibits metal magnesium from forming a film on the cathode suppression layer 1035. Since the cathode suppression layer 1035 is a transparent material, the light transmittance of the first display area 11 can be enhanced.
  • the boundary of the cathode suppression layer 1035 coincides with the boundary of the transparent region 111 .
  • the thickness of the cathode suppression layer 1035 does not exceed the thickness of the cathode layer 1034 .
  • the first angle ⁇ 1 formed between the side surface 200a' of the first optical structure 200a and the first surface of the first optical structure 200a is in the range of 0° to 90° between.
  • the first included angle ⁇ 1 is 15°, 30°, 45°, 60°, 70°, 80° or 90°.
  • the orthographic projection of the first optical structure 200 a on the display substrate 100 overlaps with the cathode suppression layer 1035 .
  • the side of the first optical structure 200 a close to the thin film encapsulation layer 104 is the bottom, and the boundary of the bottom corresponds to the boundary of the cathode suppression layer 1035 .
  • the cross-sectional width w2 of the first optical structure 200 a away from the display substrate 100 is larger than the cross-sectional width of the first optical structure 200 a close to the display substrate 100 w1.
  • the refractive index of the second optical sub-film layer 202 is greater than the refractive index of the first optical structure 200a (that is, the first optical sub-film layer), the first optical structure 200a and the second optical sub-film layer
  • the interface of the layer 202 (that is, the side 200a') is a total reflection surface.
  • the cross-sectional width w2 of the first optical structure 200 a away from the display substrate 100 is equal to the cross-sectional width w1 of the first optical structure 200 a close to the display substrate 100 . Since the external light is natural light, it can still illuminate the side surface 200a' when the first included angle ⁇ 1 is 90°.
  • the light incident on the side surface 200a' will be totally reflected on the inner surface of the side surface 200a', thereby changing the path of the light beam, so that the light beam originally incident on the transparent light
  • External light outside the area 111 can enter into the scope of the light-transmitting area 111 after being totally reflected, so as to increase the incident light amount of the light-transmitting area 111 , thereby increasing the light transmittance of the first display area 11 .
  • the first display area 11 can share the first insulating layer 301, the second insulating layer 302 and the third insulating layer 302 in the second display area 12.
  • Layer 303 that is to say, the second optical sub-film layer 202 may be the same film layer as the third insulating layer 303 .
  • the thickness of the optical film layer 200 ranges from 1 micron to 3.5 microns. Wherein, the thickness of the first optical sub-film layer 201 is 0.2 micron-1.5 micron, and the thickness of the second optical sub-film layer 202 is 1 micron-2 micron.
  • the side surface 200a' of the first optical structure 200a is at least one of an inclined surface or a curved surface.
  • the curvature radius of the curved surface is 1.5 microns-5 microns.
  • the structure of the display panel of this embodiment is similar to that of the above-mentioned embodiment 1, the difference between this embodiment and the above-mentioned embodiment 1 is: the optical film of the display panel of this embodiment
  • the layer 200 includes multiple optical sub-film layers with different refractive indices, at least two of which form the first optical structure 200a.
  • the refractive index of the multiple optical sub-film layers decreases sequentially from a side close to the display substrate 100 to a side far away from the display substrate 100 .
  • the optical sub-film layer on the side away from the display substrate 100 wraps the optical sub-film layer on the side close to the display substrate 100, and at least two layers of the optical sub-film layers in the first optical structure 200a are The cross-sectional shapes in the direction perpendicular to the display substrate 100 are the same.
  • the optical film layer 200 at least includes a first optical sub-film layer 201, a second optical sub-film layer 202 and a third optical sub-film layer 203, and the refractive index of the first optical sub-film layer 201 is greater than that of the second optical sub-film layer 202, the refractive index of the third optical sub-film layer 203 is greater than the refractive index of the second optical sub-film layer 202.
  • the first optical structure 200a is formed by the first optical sub-film layer 201 and the second optical sub-film layer 202, and the third optical sub-film layer 203 covers the first optical structure 200a.
  • the first optical structure 200 a includes two optical sub-film layers, wherein the second optical sub-film layer 202 wraps the first optical sub-film layer 201 .
  • the same type of mask plates with different opening apertures can be used to complete the first optical sub-film layer 201 and the second optical sub-film layer 201.
  • the patterning of the film layer 202 is to form the first optical sub-film layer 201 and the second optical sub-film layer 202 with different sizes but the same shape, which is not limited here.
  • the side close to the cathode suppression layer 1035 is the bottom, and the side away from the cathode suppression layer 1035 is the top.
  • the bottom boundary of the innermost optical sub-film layer (such as the first optical sub-film layer 201 ) in the first optical structure 200a corresponds to the boundary of the cathode suppression layer 1035 (that is, the light-transmitting region 111 ), so
  • the top boundary of an outermost optical sub-film layer (such as the second optical sub-film layer 202 ) in the first optical structure 200 a is correspondingly located between the boundary of the cathode suppression layer 1035 and the boundary of the pixel opening 1001 .
  • the structure of the display substrate in the display panel of the present embodiment is the same as that of the display substrate 100 in the display panel of the first embodiment, and the second display area of the display panel of the present embodiment is the same as the first display area of the display panel of the first embodiment.
  • the structures of the two display areas 12 are the same, and will not be repeated here.
  • each optical sub-film layer in the first optical structure 200a can form a total reflection surface, when the external light enters the first optical structure 200a, it is incident on each optical sub-film layer.
  • the light on the side of the sub-film layer will be totally reflected on the inner surface of the side of the optical sub-film layer, thereby changing the light path, so that the external light originally directed outside the light transmission area 111 can enter the transmission area 111 after total reflection. within the range of the light zone 111 to increase the incident light amount of the light transmission zone 111 . Therefore, in this embodiment, compared with the first embodiment above, the light transmittance of the first display area 11 can be further improved.
  • the structure of the display panel of this embodiment is similar to that of the above-mentioned embodiment 1/2, and the display substrate 100 in the display panel of this embodiment is the same
  • the structure of the display substrate 100 is the same, and the structure of the second display region 12 of the display panel of this embodiment is the same as that of the display panel of the first embodiment above, and will not be repeated here.
  • the optical film layer 200 further includes a plurality of second optical structures 200b corresponding to the pixel openings 1001, and the first The second optical structure 200b is located on the same layer as the first optical structure 200a, and the second optical structure 200b includes a first surface close to the cathode layer 1034 and a second surface opposite to the first surface, and
  • the side 200b', the angle between the side 200b' of the second optical structure 200b and the first surface of the second optical structure 200b is a second angle ⁇ 2, wherein the second angle ⁇ 2 is between 0° and between 90°.
  • the second included angle ⁇ 2 is 15°, 30°, 45°, 60°, 70°, 80° or 90°.
  • the orthographic projection of the second optical structure 200 b on the display substrate 100 overlaps with the first cathode portion 1034 a.
  • the cross-sectional shape of the second optical structure 200b is the same/similar to the cross-sectional shape of the first optical structure 200a, and the second optical structure 200b is far away from the display substrate 100 in a direction perpendicular to the display substrate 100
  • a cross-sectional width of one side is greater than or equal to a cross-sectional width of a side of the second optical structure 200b close to the display substrate 100 .
  • the side of the second optical structure 200b close to the thin film encapsulation layer 104 is the bottom, and the side away from the thin film encapsulation layer 104 is the top, wherein the second optical structure 200b
  • the bottom boundary corresponds to the boundary of the pixel opening 1001
  • the top boundary of the second optical structure 200 b is located between the boundary of the pixel opening 1001 and the boundary of the light-transmitting region 111 .
  • the second optical structure 200b is spaced apart from the first optical structure 200a.
  • the touch electrodes 304 and the touch electrode connection lines 305 of the touch layer 300 are arranged between two adjacent pixel openings 1001 , and since the touch electrodes 304 and the touch electrode connection lines 305 are conductive metals with reflective properties, the light emitted by the organic light-emitting layer 1033 and emitted between two adjacent pixel openings 1001 will be in the The surfaces of the touch electrodes 304 and the touch electrode connection lines 305 are reflected (as shown by the light path in FIG. It is blocked by the touch electrodes 304 and the touch electrode connection lines 305 .
  • the first display area 11 since the touch electrode 304 and the touch electrode connection line 305 are not provided between two adjacent pixel openings 1001, the first display area 11 in the first display area 11 The light emitted by the sub-pixels and directed between two adjacent pixel openings 1001 will not be blocked. This results in a brightness difference between the first display area 11 and the second display area 12 .
  • a second optical structure 200b is provided at the position corresponding to the pixel opening 1001 in the first display area 11, as shown in FIG. 7 and FIG. 8, because the second optical structure 200b (ie The refractive index of the first optical sub-film layer 201) is greater than the refractive index of the second optical sub-film layer 202, so the interface between the second optical structure 200b and the second optical sub-film layer 202 (that is, the side surface 200b ') is a fully reflective surface.
  • the light incident on the side surface 200b' will be totally reflected on the inner surface of the side surface 200b', changing the light path, so that the original The light emitted to the large viewing angle is totally reflected and shifted toward the direction of the normal viewing angle, thereby increasing the amount of forward light emitted by the first sub-pixel, thereby improving the brightness difference between the first display area 11 and the second display area 12 .
  • the cross-sectional width of the side of the second optical structure 200b away from the display substrate 100 is equal to the cross-sectional width of the side of the second optical structure 200b close to the display substrate 100 .
  • the light incident on the side 200b' will occur on the inner surface of the side 200b'.
  • the minimum value of the second included angle ⁇ 2 is limited by the width and height of the pixel opening 1001 formed by the pixel definition layer 1031 .
  • the width of the pixel opening 1001 is L and the height of the pixel opening 1001 is H
  • the light emitted by the organic light-emitting layer 1033 located in the pixel opening 1001 will have a certain
  • the rays a1 and a2 are set to be the rays with the largest angle emitted by the organic light emitting layer 1033 from the edge of the pixel definition layer 1031 .
  • the second included angle ⁇ 2 is larger than the threshold angle ⁇ formed by the light with the largest angle (such as a1 or a2 ) and the plane where the display substrate 100 is located, the light emitted by the organic light-emitting layer 1033 will illuminate to the side surface 200b' of the second optical structure 200b.
  • the threshold angle ⁇ arctan (H/L)*180°/ ⁇ .
  • the second included angle ⁇ 2 is greater than the threshold angle ⁇ and less than or equal to 90°.
  • the first included angle ⁇ 1 and the second included angle ⁇ 2 are equal. That is, the shape and size of the first optical structure 200a and the second optical structure 200b are consistent.
  • the bottom border of the second optical structure 200b near the cathode layer 1034 is located between the border of the pixel opening 1001 and beyond The boundary of the pixel opening 1001 is within a predetermined distance d.
  • the bottom boundary of the second optical structure 200b is located at the intersection (point A/A') of the ray of maximum angle (such as a1 or a2) and the optical film layer 200, the ray of maximum angle at this time Just enough to irradiate the bottom of the side 200b' of the second optical structure 200b, at this time, the emitted light of the organic light emitting layer 1033 can just irradiate the whole side 200b'.
  • the preset distance (d) the vertical distance (h) from the pixel definition layer to the optical film layer/the tangent of the threshold angle ( ⁇ ).
  • the side surface 200b' of the second optical structure 200b is at least one of an inclined surface or a curved surface.
  • the curvature radius of the curved surface is 1.5 microns-5 microns.
  • the first optical structure 200a and the second optical structure 200b in FIG. 7 are both optical sub-film layers of a single-layer structure. It can be understood that, in other embodiments, both the first optical structure 200a and the second optical structure 200b can use at least two optical sub-film layers with different refractive indices, and the optical film layer 200 The refractive index of the multi-layer optical sub-film layer decreases sequentially from a side close to the display substrate 100 to a side far away from the display substrate 100 .
  • the first optical structure 200a and the second optical structure 200b include at least two layers of the optical sub-film layer, and the optical sub-film layer on the side away from the display substrate 100 is wrapped and close to the display substrate 100.
  • the side optical sub-film layers, and at least two optical sub-film layers in the first optical structure 200 a and the second optical structure 200 b have the same cross-sectional shape in a direction perpendicular to the display substrate 100 .
  • Embodiment 2 and the design of the first optical structure 200 a in FIG. 6 , which will not be repeated here. With this design, the light transmittance of the first display area and the amount of forward light emitted by the first sub-pixel can be further increased.
  • this embodiment has a second optical structure that can increase the forward light emission above the pixel opening. Therefore, this embodiment not only increases the light transmittance of the first display area, but also The forward light output of the first sub-pixel in the first display area can be increased, thereby improving the brightness difference between the first display area and the second display area.
  • the structure of the display panel of this embodiment is similar to that of the display panel of the first embodiment above, and the display substrate 100 in the display panel of this embodiment is the same as that of the display substrate 100 in the display panel of the first embodiment.
  • the structures are the same, and the structure of the second display area 12 of the display panel of this embodiment is the same as that of the display panel of the first embodiment above, and will not be repeated here.
  • the difference between this embodiment and the first embodiment above is:
  • the optical film layer 200 includes a first optical sub-film layer 201 and a second optical sub-film layer 202, the second optical sub-film layer 202 is located on the side of the first optical sub-film layer 201 away from the substrate 101 , and the refractive index of the first optical sub-film layer 201 is smaller than the refractive index of the second optical sub-film layer 202 .
  • the range of the refractive index of the first optical sub-film layer 201 is 1-1.4, such as 1, 1.1, 1.2, 1.3 or 1.4.
  • the range of the refractive index of the second optical sub-film layer 202 is 1.5-2, for example, it may be 1.5, 1.7, 1.8, or 2 and so on.
  • the first optical sub-film layer 201 forms a first optical structure 200a
  • the pixel definition layer 1031 of the display substrate 100 includes a plurality of spaced pixel openings 1001 and a support portion 1031a between two adjacent pixel openings 1001, so The first optical structure 200a is correspondingly disposed on the supporting portion 1031a between two adjacent pixel openings 1001 .
  • a cathode suppression layer 1035 is formed on a surface of the display substrate 100 facing the first optical structure 200a, and the cathode suppression layer 1035 is located on the support portion 1031a between two adjacent pixel openings 1001 .
  • a light-transmitting region 111 is disposed between two adjacent pixel openings 1001
  • the cathode suppression layer 1035 is disposed opposite to the light-transmitting region 111 .
  • the first optical structure 200 a is located between one pixel opening 1001 and one cathode suppression layer 1035 .
  • the cross-sectional width w2 of the first optical structure 200 a away from the display substrate 100 is less than or equal to a side of the first optical structure 200 a close to the display substrate 100 .
  • the orthographic projection of the first optical structure 200 a on the display substrate 100 does not overlap with the cathode suppression layer 1035 .
  • the boundary of the first optical structure 200 a is located between the boundary of the pixel opening 1001 and the boundary of the cathode suppression layer 1035 .
  • the side of the first optical structure 200a close to the cathode suppression layer 1035 is the bottom, and the side away from the cathode suppression layer 1035 is the top, wherein the first optical structure 200a is close to the pixel opening
  • the bottom boundary of 1001 corresponds to the boundary of the pixel opening 1001
  • the bottom boundary of the first optical structure 200 a close to the light-transmitting region 111 corresponds to the boundary of the cathode suppression layer 1035 .
  • the first angle ⁇ 1 formed between the side surface 200a' of the first optical structure 200a and the plane of the display substrate 100 is between 0° and 90°.
  • the first included angle ⁇ 1 is 15°, 30°, 45°, 60°, 70°, 80° or 90°.
  • the first optical structure 200a has the functions of enhancing the light entering the light-transmitting region 111 and enhancing the forward light output of the first sub-pixel.
  • the angle of the first included angle ⁇ 1 is greater than the threshold angle ⁇ and less than or equal to 90°.
  • the refractive index of the second optical sub-film layer 202 is greater than the refractive index of the first optical structure 200a (that is, the first optical sub-film layer), the first optical structure 200a and the first optical sub-film layer
  • the interface of the second optical sub-film layer 202 is a total reflection surface. Total reflection will occur on the outer surface of the side surface 200a', thereby changing the light path, so that the external light originally directed outside the light-transmitting area 111 can enter the scope of the light-transmitting area 111 after total reflection, In order to increase the incident light amount of the light-transmitting region 111 , and further improve the light transmittance of the first display region 11 .
  • the light emitted by the organic light-emitting layer 1033 hits the side 200a' of the second optical structure 200b near the pixel opening 1001, the light will be totally reflected on the outer surface of the side 200b' , change the light path, so that the light that originally radiated to the large viewing angle is totally reflected and then shifted to the direction of the normal viewing angle, thereby increasing the forward light output of the first sub-pixel, thereby improving the first display area 11 and the second display area 12 brightness difference between.
  • this embodiment can not only increase the light transmittance of the first display area, but also increase the forward light output of the first sub-pixel in the first display area, thereby improving the first display.
  • the structure of the display panel of this embodiment is similar to that of the above-mentioned embodiment 4.
  • the optical film layer 200 of the display panel of this embodiment includes Multiple optical sub-film layers with different refractive indices, at least two of the multiple optical sub-film layers form the first optical structure 200a.
  • the refractive index of the multiple optical sub-film layers increases sequentially from a side close to the display substrate 100 to a side far away from the display substrate 100 .
  • the optical sub-film layer on the side away from the display substrate 100 wraps the optical sub-film layer on the side close to the display substrate 100, and at least two layers of the optical sub-film layers in the first optical structure 200a are The cross-sectional shapes in the direction perpendicular to the display substrate 100 are the same.
  • the optical film layer 200 at least includes a first optical sub-film layer 201, a second optical sub-film layer 202 and a third optical sub-film layer 203, and the refractive index of the first optical sub-film layer 201 is smaller than that of the second optical sub-film layer 202 , the refractive index of the second optical sub-film layer 202 is smaller than the refractive index of the third optical sub-film layer 203 .
  • the first optical sub-film layer 201 and the second optical sub-film layer 202 constitute the first optical structure 200a, and the third optical sub-film layer 203 covers the first optical structure 200a.
  • the structure of the display substrate 100 in the display panel of the present embodiment is the same as that of the display substrate 100 in the display panel of the first embodiment
  • the second display area 12 of the display panel of the present embodiment is the same as that of the display panel of the first embodiment above.
  • the structure of the second display area 12 is the same, and will not be repeated here.
  • this embodiment can further increase the first display on the basis of the fourth embodiment above.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

一种显示面板，显示面板的第一显示区（11）包括层叠的显示基板（100）和光学膜层（200）。显示基板（100）包括像素定义层（1031）和位于像素定义层（1031）上的阴极层（1034），像素定义层（1031）包括像素开口（1001）和相邻像素开口（1001）之间的支撑部（1031a）。光学膜层（200）包括多个对应支撑部（1031a）的第一光学结构（200a），第一光学结构（200a）包括靠近阴极层（1034）的第一面、与第一面相对的第二面、以及能发生全反射的侧面（200a'）。

Description

一种显示面板 技术领域
本发明涉及显示技术领域，尤其涉及一种显示面板。
 背景技术
OLED（Organic Light Emitting Diode，有机发光二极管）显示技术受到了越来越多科研工作者的关注，并被广泛应用于手机、平板和电视等显示领域，而随着显示设备的快速发展，用户对显示设备的屏占比的要求越来越高，使得大尺寸和高分辨率的全面显示设备成为未来的发展方向。
在现有技术当中，为了尽可能的提升屏占比，通常采用将前置摄像头和面部识别等光学元件设置在屏下，但是，现有的OLED全面显示设备中，阴极采用整面设置的方式，而阴极对于光线的透过率低，从而导致设置在屏下的光学元件无法接收到充足的光信号，影响光学元件的正常工作。
 技术问题
本发明提供一种显示面板，能够解决设置在屏下的光学元件无法接收到充足的光信号，影响光学元件的正常工作的问题。
 技术解决方案
为解决上述问题，本发明提供的技术方案如下：
本发明提供一种显示面板，所述显示面板包括第一显示区和第二显示区，所述第二显示区围绕所述第一显示区，且所述第一显示区的透过率大于第二显示区的透过率，所述第一显示区包括：
显示基板，所述显示基板包括像素定义层和设置在所述像素定义层上的阴极层，所述像素定义层包括多个相间隔的像素开口和相邻像素开口之间的支撑部，所述阴极层在所述像素开口的厚度大于所述阴极层在支撑部上的厚度；
光学膜层，设置于所述阴极层远离所述像素定义层的一侧，所述光学膜层包括多个对应设置于相邻两所述像素开口之间的第一光学结构；
其中，所述第一光学结构包括靠近所述阴极层的第一面及、与所述第一面相对的第二面、以及侧面，且所述第一光学结构的侧面为全反射表面。
可选的，在本发明的一些实施例中，所述光学膜层包括至少两层折射率不同的光学子膜层，至少两层所述光学子膜层中的至少一者形成所述第一光学结构。
可选的，在本发明的一些实施例中，至少两层所述光学子膜层的折射率从靠近所述显示基板的一侧向远离所述显示基板的一侧依次减小；所述第一光学结构远离所述显示基板一侧的截面宽度大于或等于所述第一光学结构靠近所述显示基板一侧的截面宽度。
可选的，在本发明的一些实施例中，所述光学膜层还包括多个对应所述像素开口的第二光学结构，所述第二光学结构与所述第一光学结构位于同一层，所述第二光学结构包括靠近所述阴极层的第一面及、与所述第一面相对的第二面、以及侧面，且所述第二光学结构的侧面为全反射表面。
可选的，在本发明的一些实施例中，所述第二光学结构远离所述显示基板一侧的截面宽度大于或等于所述第二光学结构靠近所述显示基板一侧的截面宽度。
可选的，在本发明的一些实施例中，所述第一光学结构和/或所述第二光学结构中包括至少两层所述光学子膜层，远离所述显示基板一侧的光学子膜层包裹靠近所述显示基板一侧的光学子膜层，且所述第一光学结构和/或所述第二光学结构中的至少两层所述光学子膜层在垂直于所述显示基板的方向上的截面形状相同。
可选的，在本发明的一些实施例中，所述阴极层包括对应所述像素开口的第一阴极部和对应支撑部的第二阴极部，所述第一阴极部的厚度大于所述第二阴极部的厚度。
可选的，在本发明的一些实施例中，所述显示基板还包括多个阳极、第一辅助层、有机发光层以及第二辅助层，所述阳极与所述第一阴极部相对设置，所述第一辅助层位于所述阳极靠近所述阴极层的一侧，所述有机发光层位于所述第一辅助层靠近所述阴极层的一侧，所述第二辅助层位于所述有机发光层靠近所述阴极层的一侧；所述支撑部上形成有阴极抑制层，所述阴极抑制层的厚度小于所述阴极层的厚度，所述阴极抑制层与所述阴极层之间的粘合力小于所述阴极层与所述第二辅助层之间的粘合力，且所述阴极抑制层为透明材质。
可选的，在本发明的一些实施例中，所述阴极抑制层在所述光学膜层上的正投影与所述阳极在所述光学膜层上的正投影相离。
可选的，在本发明的一些实施例中，当所述第一光学结构远离所述显示基板一侧的截面宽度大于或等于所述第一光学结构靠近所述显示基板一侧的截面宽度时，所述第一光学结构在所述显示基板上的正投影与所述阴极抑制层重叠。
可选的，在本发明的一些实施例中，所述第一光学结构靠近所述阴极抑制层的一侧为底部，其中，所述第一光学结构的底部边界与所述阴极抑制层的边界相对应。
可选的，在本发明的一些实施例中，所述第二光学结构在所述显示基板上的正投影与所述第一阴极部重叠。
可选的，在本发明的一些实施例中，所述像素开口的宽度为L，所述像素开口的高度为H，其中，所述第一光学结构的侧面与所述第一光学结构的第一面之间的夹角为第一夹角，所述第二光学结构的侧面与所述第二光学结构的第一面之间的夹角为第二夹角，所述第一夹角和所述第二夹角的角度范围均大于阈值角，且小于或等于90°；其中，所述阈值角为arctan(H/L)*180°/π。
可选的，在本发明的一些实施例中，所述第一夹角与所述第二夹角的角度相等。
可选的，在本发明的一些实施例中，所述第二光学结构靠近所述阴极层一侧的底部边界位于像素开口边界至超出像素开口边界预设距离的范围内；
其中，所述预设距离为：所述像素定义层至所述光学膜层的垂直距离/所述阈值角的正切值。
可选的，在本发明的一些实施例中，至少两层所述光学子膜层的折射率从靠近所述显示基板的一侧向远离所述显示基板的一侧依次增大；所述第一光学结构远离所述显示基板一侧的截面宽度小于或等于所述第一光学结构靠近所述显示基板一侧的截面宽度。
可选的，在本发明的一些实施例中，所述阴极层包括对应所述像素开口的第一阴极部和对应支撑部的第二阴极部，所述第一阴极部的厚度大于所述第二阴极部的厚度。
可选的，在本发明的一些实施例中，所述显示基板还包括多个阳极、第一辅助层、有机发光层以及第二辅助层，所述阳极与所述第一阴极部相对设置，所述第一辅助层位于所述阳极靠近所述阴极层的一侧，所述有机发光层位于所述第一辅助层靠近所述阴极层的一侧，所述第二辅助层位于所述有机发光层靠近所述阴极层的一侧；所述支撑部上形成有阴极抑制层，所述阴极抑制层的厚度小于所述阴极层的厚度，所述阴极抑制层与所述阴极层之间的粘合力小于所述阴极层与所述第二辅助层之间的粘合力，且所述阴极抑制层为透明材质。
可选的，在本发明的一些实施例中，所述第一显示区的相邻两所述像素开口之间还设有透光区，当所述第一光学结构远离所述显示基板一侧的截面宽度小于或等于所述第一光学结构靠近所述显示基板一侧的截面宽度时，所述第一光学结构在所述显示基板上的正投影位于所述像素开口与所述透光区之间。
可选的，在本发明的一些实施例中，所述第一光学结构靠近所述阴极抑制层的一侧为底部，其中，所述第一光学结构靠近所述像素开口的底部边界与所述像素开口的边界相对应，所述第一光学结构靠近所述透光区的底部边界与所述阴极抑制层的边界相对应。
 有益效果
本发明提供的显示面板，通过对阴极层进行图案化，使得对应两像素开口之间的阴极层较薄或没有阴极层沉积，以极大的提升第一显示区的透光率；同时本发明还通过在显示基板的出光面上设置光学膜层，该光学膜层包括位于相邻两像素开口之间的第一光学结构，所述第一光学结构可将更多的外界光反射至显示面板的第一显示区内，从而进一步增加第一显示区的入光量，使得设置在第一显示区的光学元件可以接收到充足的光信号，以提升光学元件的性能。
 附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
图1为本发明实施例提供的显示面板的平面示意图；
图2为本发明实施例一提供的显示面板的第一显示区的截面示意图；
图3为本发明实施例一提供的显示面板的第二显示区的截面示意图；
图4为图2中A区域的一种局部放大图；
图5为图2中A区域的另一种局部放大图；
图6为本发明实施例二提供的显示面板的局部示意图；
图7为本发明实施例三提供的显示面板的第一显示区的截面示意图；
图8为图7中B区域的局部放大图；
图9为本发明实施例四提供的显示面板的第一显示区的截面示意图；
图10为本发明实施例五提供的显示面板的第一显示区的截面示意图。
 本发明的实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。此外，应当理解的是，此处所描述的具体实施方式仅用于说明和解释本发明，并不用于限制本发明。在本发明中，在未作相反说明的情况下，使用的方位词如“上”和“下”通常是指装置实际使用或工作状态下的上和下，具体为附图中的图面方向；而“内”和“外”则是针对装置的轮廓而言的。
本发明可以在不同例子中重复参考数字和/或参考字母，这种重复是为了简化和清楚的目的，其本身不指示所讨论各种实施方式和/或设置之间的关系。
本发明针对目前设置在显示屏下方的光学元件无法接收到充足的光信号，影响光学元件的正常工作的问题，以下实施例能够解决该缺陷。
参阅图1，本发明的显示面板包括第一显示区11和第二显示区12，所述第二显示区12围绕所述第一显示区11，所述第一显示区11可以设置于显示面板上的任意位置。
其中，显示面板为全面屏显示面板，所述第一显示区11中排布有多个第一子像素13，所述第二显示区12中排布有多个第二子像素14。
需要说明的是，第一显示区11为功能附加区，第一显示区11既可以用于显示图像，从而使得显示面板可以呈现全屏显示的效果，又可以用于安装摄像头、光学触控组件以及指纹识别传感器等光学元件，从而提高用户体验；第二显示区12为主显示区，第二显示区12用于显示图像。
在一实施方式中，所述第一显示区11的透光率大于所述第二显示区12的透光率。
可以理解的是，对于光学元件而言，第一显示区11的透光性对光学元件的工作具有极大的影响，而第一显示区11处的透光性又与第一显示区11处的膜层结构相关，以光学元件为摄像头为例，第一显示区11的透光率越高，摄像头进行拍摄工作时，摄像头的成像品质越好。
参阅图2-图10，所述显示面板的第一显示区11包括显示基板100和光学膜层200，所述显示基板100具有出光面，所述光学膜层200位于所述显示基板100的出光面的一侧。
所述显示基板100包括像素定义层1031和设置在所述像素定义层1031上的阴极层1034，所述像素定义层1031包括多个相间隔的像素开口1001和相邻像素开口1001之间的支撑部1031a，所述阴极层1034在所述像素开口1001的厚度大于所述阴极层1034在支撑部1031a上的厚度。其中，当所述阴极层1034在支撑部1031a上的厚度为0时，即对应两像素开口1001之间没有阴极层沉积。
进一步的，所述第一显示区11的相邻两所述像素开口1001之间设有透光区111，所述透光区111用于使外界光线穿过所述显示面板射向光学元件，所述阴极层1034在所述像素开口1001的厚度大于所述阴极层1034在所述透光区111的厚度。
进一步的，所述光学膜层200包括多个对应设置于相邻两所述像素开口1001之间的第一光学结构200a。所述第一光学结构200a包括靠近所述阴极层1034的第一面及、与所述第一面相对的第二面、以及侧面200a’，且所述第一光学结构200a的侧面200a’为全反射表面。
本发明通过对第一显示区11的阴极层1034进行图案化，使得对应像素开口1001之间的支撑部1031a上的阴极层1034较薄或没有阴极层沉积，从而提升第一显示区11的透光率。同时，本发明还通过在显示基板100的出光面上设置光学膜层200，该光学膜层200利用光线能够在第一光学结构200a的侧面200a’发生全反射，从而将射向透光区111之外的外界光通过第一光学结构200a的侧面200a’反射至透光区111内，以进一步增加第一显示区11的入光量，使得设置在第一显示区11的光学元件可以接收到充足的光信号，进而提升光学元件的性能。
具体请参考以下实施例。需说明的是，以下实施例的描述顺序不作为对实施例优选顺序的限定。
实施例一
参阅图2，本实施例的显示面板的第一显示区11包括显示基板100和位于所述显示基板100的出光面一侧的光学膜层200。所述光学膜层200包括第一光学子膜层201和第二光学子膜层202，所述第二光学子膜层202位于所述第一光学子膜层201远离所述基底101的一侧，且所述第一光学子膜层201的折射率大于所述第二光学子膜层202的折射率。
示例性的，所述第一光学子膜层201的折射率的范围为1.5-2，例如可以为1.5、1.7、1.8、或者2等。所述第二光学子膜层202的折射率的范围为1-1.4，例如可以为1、1.1、1.2、1.3或者1.4等。
在本实施例中，由所述第一光学子膜层201形成第一光学结构200a，所述显示基板100包括像素定义层1031和设置在所述像素定义层1031上的阴极层1034，所述像素定义层1031包括多个相间隔的像素开口1001和相邻像素开口1001之间的支撑部1031a，所述第一光学结构200a对应设置于相邻两所述像素开口1001之间的支撑部1031a上。
当然，在其他实施例中，可以由所述第二光学子膜层202形成所述第一光学结构200a，此时，所述第一光学子膜层201对应所述第一光学结构200a的位置需要设置与第一光学结构200a相匹配的凹陷，所述第一光学结构200a嵌设于所述凹陷内。
在一种实施例中，所述光学膜层200为透明膜层。
参阅图3，本实施例的显示面板的第二显示区12包括显示基板100和触控层300，所述触控层300设置于所述显示基板100的出光面一侧。所述触控层300包括第一绝缘层301、第二绝缘层302、第三绝缘层303、触控电极304以及触控电极连接线305。所述第一绝缘层301位于所述显示基板100的表面，所述触控电极连接线305位于所述第一绝缘层301远离所述显示基板100的一侧，所述第二绝缘层302位于所述触控电极连接线305远离所述显示基板100的一侧，所述触控电极304位于所述第二绝缘层302远离所述显示基板100的一侧，所述第三绝缘层303位于所述触控电极304远离所述显示基板100的一侧。
其中，所述显示基板100包括像素定义层1031和设置在所述像素定义层1031上的阴极层1034，所述像素定义层1031包括多个相间隔的像素开口1001和相邻像素开口1001之间的支撑部1031a，所述触控电极304以及所述触控电极连接线305对应位于相邻两像素开口1001之间。所述第二绝缘层302在对应所述触控电极连接线305的位置设有贯穿所述第二绝缘层302的过孔，当所述触控层300为互容式触控时，所述触控电极304中包括可以形成互电容的第一电极和第二电极，其中，相邻两所述第一电极或所述第二电极通过所述触控电极连接线305经由所述过孔实现电连接。
结合图2和图3所示，本实施例的显示基板100包括基底101、TFT器件层102、OLED器件层103以及薄膜封装层104。
其中，所述基底101可以是柔性基底，柔性基底的材料可以是聚酰亚胺等有机材料；所述基底101也可以是刚性基底，刚性基底的材料例如可以为玻璃、金属、塑料等；所述基底101可以为单层膜层结构或多层膜层结构。
所述TFT器件层102位于所述基底101上，所述TFT器件层102与所述基底101之间还包括缓冲层105，所述缓冲层105为具有阻隔水氧的氧化硅或氮化硅。所述TFT器件层102包括：有源层1021、覆盖所述有源层1021的第一栅极绝缘层1022、设置于所述第一栅极绝缘层1022远离所述基底101一侧的栅极1023、覆盖所述栅极1023的第二栅极绝缘层1024、设置于所述第二栅极绝缘层1024远离所述基底101一侧的第二栅极1025、覆盖所述第二栅极1025的层间介电层1026、设置于所述层间介电层1026远离所述基底101一侧的源/漏极1027，以及，覆盖所述源/漏极1027的平坦层1028。
所述OLED器件层103位于所述TFT器件层102远离所述基底101的一侧，所述OLED器件层103包括像素定义层1031、多个阳极1032、有机发光层1033以及阴极层1034。所述像素定义层1031定义出像素开口1001，所述有机发光层1033对应所述像素开口1001设置，且所述有机发光层1033位于所述阳极1032和所述阴极层1034之间，所述阳极1032位于所述阴极层1034远离所述光学膜层200的一侧。
所述薄膜封装层104位于所述OLED器件层103远离所述基底101的一侧，所述薄膜封装层104用以保护所述显示面板的器件不受水氧影响，进而可以延长所述显示面板的使用寿命。所述薄膜封装层104包括层叠设置的第一无机层1041、第一有机层1042以及第二无机层1043，所述第一有机层1042位于所述第一无机层1041与所述第二无机层1043之间，所述第一无机层1041位于所述第一有机层1042靠近所述基底101的一侧，所述第二无机层1043位于所述第一有机层1042远离所述基底101的一侧。
其中，所述第一显示区11的显示基板100和所述第二显示区12的显示基板100的区别在于：所述阴极层1034在所述第二显示区12内为整层设置，无需进行图案化，即厚度保持均一；而在所述第一显示区11内，所述阴极层1034被图案化成具有不同的厚度，所述阴极层1034包括对应所述像素开口1001的第一阴极部1034a和对应支撑部1031a的第二阴极部（未图示），所述第一阴极部1034a的厚度大于所述第二阴极部的厚度。
在本实施例中，所述第一显示区11内的所述阴极层1034被图案化成多个第一阴极部1034a，所述第一阴极部1034a对应所述像素开口1001设置。
如图2所示，在本实施例中，所述第一显示区11内的相邻两所述像素开口1001之间还包括透光区111，所述透光区111用于使外界光线穿过所述显示面板射向光学元件。
所述显示基板100还包括位于所述阳极1032与所述有机发光层1033之间的第一辅助层（未图示），以及位于所述有机发光层1033与所述第一阴极部1034a之间的第二辅助层（未图示）。其中，所述第一辅助层可以为空穴传输层，所述第二辅助层可以为电子传输层。
所述第一显示区11还包括阴极抑制层1035，所述阴极抑制层1035设置于所述支撑部1031a上，所述阴极抑制层1035在所述光学膜层200上的正投影与所述阳极1032在所述光学膜层200上的正投影相离（即不交叠）。并且，所述阴极抑制层1035与所述阴极层1034之间的粘合力小于所述阴极层1034与所述第二辅助层之间的粘合力。
所述阴极层1034的材料可以为金属镁，阴极抑制层1035的材料可以为BAlq(双(2-甲基-8-羟基喹啉)-4-(对苯基苯酚)合铝)、TAZ(3-(联苯-4-基)-5-(4-叔丁基苯基)-4-苯基-4H-1,2,4-三唑)及OTI（氧化铟）中的至少一种。金属镁在BAlq、TAZ和OTI材料上的附着力较差，在蒸镀金属镁形成阴极层1034时，阴极抑制层1035抑制金属镁在阴极抑制层1035上成膜。由于所述阴极抑制层1035为透明材料，因此可增强第一显示区11的透光率。
进一步的，所述阴极抑制层1035的边界与所述透光区111的边界重合。
在一种实施例中，所述阴极抑制层1035的厚度不超过所述阴极层1034的厚度。
结合图2、图4和图5所示，所述第一光学结构200a的侧面200a’与所述第一光学结构200a的第一面之间形成的第一夹角α1在0°至90°之间。示例性的，所述第一夹角α1为15°、30°、45°、60°、70°、80°或90°。
如图4所示，所述第一光学结构200a在所述显示基板100上的正投影与所述阴极抑制层1035交叠。具体地，所述第一光学结构200a靠近所述薄膜封装层104的一侧为底部，所述底部的边界与所述阴极抑制层1035的边界相对应。在垂直于所述显示基板100的方向上，所述第一光学结构200a远离所述显示基板100一侧的截面宽度w2大于所述第一光学结构200a靠近所述显示基板100一侧的截面宽度w1。由于所述第二光学子膜层202的折射率大于所述第一光学结构200a（即第一光学子膜层）的折射率，因此所述第一光学结构200a与所述第二光学子膜层202的交界面（即侧面200a’）为全反射表面，当外界光线进入所述第一光学结构200a时，其中射向所述侧面200a’的光线会在所述侧面200a’的内表面发生全反射，从而改变光线路径，使原本射向所述透光区111之外的外界光经全反射后可以进入所述透光区111的范围内，以增加透光区111的入光量，进而提高所述第一显示区11的透光率。
如图5所示，当所述第一光学结构200a的侧面200a’与所述第一光学结构200a的第一面之间形成的第一夹角α1为90°时，在垂直于所述显示基板100的方向上，所述第一光学结构200a远离所述显示基板100一侧的截面宽度w2等于所述第一光学结构200a靠近所述显示基板100一侧的截面宽度w1。由于外界光为自然光，因此，当第一夹角α1为90°时仍然可以照射至所述侧面200a’。当外界光线进入所述第一光学结构200a时，其中射向所述侧面200a’的光线会在所述侧面200a’的内表面发生全反射，从而改变光线路径，使原本射向所述透光区111之外的外界光经全反射后可以进入所述透光区111的范围内，以增加透光区111的入光量，进而提高所述第一显示区11的透光率。
结合图2-图5，为了方便制作，所述第一显示区11可以共用所述第二显示区12内的所述第一绝缘层301、所述第二绝缘层302和所述第三绝缘层303，也就是说，所述第二光学子膜层202可以与所述第三绝缘层303为同一个膜层。
在一种实施例中，所述光学膜层200的厚度范围为1微米至3.5微米之间。其中，所述第一光学子膜层201的厚度为0.2微米-1.5微米，所述第二光学子膜层202的厚度为1微米-2微米。
在一种实施例中，所述第一光学结构200a的侧面200a’为斜面或曲面中的至少一种。
进一步的，当所述第一光学结构200a的侧面200a’为曲面时，所述曲面的曲率半径为1.5微米-5微米。
实施例二
请参阅图2、图3和图6，本实施例的显示面板与上述实施例一的显示面板的结构相似，本实施例与上述实施例一的区别在于：本实施例的显示面板的光学膜层200包括多层折射率不同的光学子膜层，多层所述光学子膜层中的至少两者形成第一光学结构200a。其中，多层所述光学子膜层的折射率从靠近所述显示基板100的一侧向远离所述显示基板100的一侧依次减小。其中，远离所述显示基板100一侧的光学子膜层包裹靠近所述显示基板100一侧的光学子膜层，且所述第一光学结构200a中的至少两层所述光学子膜层在垂直于所述显示基板100的方向上的截面形状相同。
具体请参照图6，图6中所示的区域相当于图2中的A区域。为了方便说明，图6中的仅示意了三层光学子膜层。其中，光学膜层200至少包括第一光学子膜层201、第二光学子膜层202以及第三光学子膜层203，且第一光学子膜层201的折射率大于第二光学子膜层202的折射率，第三光学子膜层203的折射率大于第二光学子膜层202的折射率。由第一光学子膜层201和第二光学子膜层202构成第一光学结构200a，第三光学子膜层203覆盖第一光学结构200a。
所述第一光学结构200a中包括两层光学子膜层，其中，所述第二光学子膜层202包裹所述第一光学子膜层201。其中，为了方便制作，在制作第一光学子膜层201和第二光学子膜层202时，可采用不同开口孔径的相同类型的掩膜板完成第一光学子膜层201和第二光学子膜层202的图案化，以形成尺寸不同但形状相同的第一光学子膜层201和第二光学子膜层202，此处不做限制。
可以理解的是，所述第一光学结构200a中的每一个光学子膜层，其靠近所述阴极抑制层1035的一侧为底部，远离所述阴极抑制层1035的一侧为顶部。其中，所述第一光学结构200a中最内层的一个光学子膜层（如第一光学子膜层201）的底部边界对应所述阴极抑制层1035（即透光区111）的边界，所述第一光学结构200a中最外层的一个光学子膜层（如第二光学子膜层202）的顶部边界对应位于所述阴极抑制层1035的边界与所述像素开口1001的边界之间。
其中，本实施例的显示面板中的显示基板与实施例一的显示面板中的显示基板100的结构相同，以及本实施例的显示面板的第二显示区与上述实施例一的显示面板的第二显示区12的结构相同，此处不再赘述。
在本实施例中，由于所述第一光学结构200a中的每个光学子膜层的侧面都可以形成全反射表面，当外界光线进入所述第一光学结构200a时，其中射向每个光学子膜层侧面的光会在该光学子膜层侧面的内表面发生全反射，从而改变光线路径，使原本射向所述透光区111之外的外界光经全反射后可以进入所述透光区111的范围内，以增加透光区111的入光量。因此，本实施例相较于上述实施例一可以进一步提高所述第一显示区11的透光率。
实施例三
请参阅图3、图6-图8，本实施例的显示面板与上述实施例一/二的显示面板的结构相似，本实施例的显示面板中的显示基板100与实施例一的显示面板中的显示基板100的结构相同，以及本实施例的显示面板的第二显示区12与上述实施例一的显示面板的第二显示区12的结构相同，此处不再赘述。本实施例与上述实施例一/二的区别在于：在所述第一显示区11中，所述光学膜层200还包括多个对应所述像素开口1001的第二光学结构200b，所述第二光学结构200b与所述第一光学结构200a位于同一层，且所述第二光学结构200b包括靠近所述阴极层1034的第一面及、与所述第一面相对的第二面、以及侧面200b’，所述第二光学结构200b的侧面200b’与所述第二光学结构200b的第一面之间的夹角为第二夹角α2，其中，第二夹角α2在0°至90°之间。
示例性的，所述第二夹角α2为15°、30°、45°、60°、70°、80°或90°。
如图7所示，所述第二光学结构200b在所述显示基板100上的正投影与所述第一阴极部1034a存在重叠。所述第二光学结构200b的截面形状与所述第一光学结构200a的截面形状相同/相似，在垂直于所述显示基板100的方向上，所述第二光学结构200b远离所述显示基板100一侧的截面宽度大于或等于所述第二光学结构200b靠近所述显示基板100一侧的截面宽度。
在一种实施例中，所述第二光学结构200b靠近所述薄膜封装层104的一侧为底部，远离所述薄膜封装层104的一侧为顶部，其中，所述第二光学结构200b的底部边界与所述像素开口1001的边界相对应，所述第二光学结构200b的顶部边界位于所述像素开口1001的边界与透光区111的边界之间。进一步的，所述第二光学结构200b与所述第一光学结构200a相间隔。
请结合图2和图3所示，在显示面板的第二显示区12内，通常触控层300的触控电极304以及触控电极连接线305设置于相邻两所述像素开口1001之间，又由于所述触控电极304以及所述触控电极连接线305为具有反射特性的导电金属，因此，有机发光层1033发出的射向相邻两像素开口1001之间的光会在所述触控电极304以及所述触控电极连接线305的表面被反射（如图3中的光线路径所示），也就是说，第二显示区12内的第二子像素射向大视角的光被所述触控电极304以及所述触控电极连接线305所遮挡。然而，在第一显示区11内，由于相邻两所述像素开口1001之间不设置所述触控电极304以及所述触控电极连接线305，因此，第一显示区11内的第一子像素发出的射向相邻两像素开口1001之间的光不会被遮挡。这就导致了第一显示区11和第二显示区12之间存在亮度差异。
针对该技术问题，本实施例在所述第一显示区11对应所述像素开口1001的位置设置第二光学结构200b，如图7和图8所示，由于所述第二光学结构200b（即第一光学子膜层201）的折射率大于所述第二光学子膜层202的折射率，因此所述第二光学结构200b与所述第二光学子膜层202的交界面（即侧面200b’）为全反射表面。当所述有机发光层1033发出的光进入所述第二光学结构200b时，其中射向所述侧面200b’的光会在所述侧面200b’的内表面发生全反射，改变光线路径，使原本射向大视角的光经全反射后向正视角的方向偏移，从而增加第一子像素的正向出光量，进而改善第一显示区11和第二显示区12之间的亮度差异。
在一种实施例中，当所述第二光学结构200b的侧面200b’与所述显示基板100所在平面之间形成的第二夹角α2为90°时，在垂直于所述显示基板100的方向上，所述第二光学结构200b远离所述显示基板100一侧的截面宽度等于所述第二光学结构200b靠近所述显示基板100一侧的截面宽度。与实施例一中的图5相似，当所述第一子像素发出的光进入所述第二光学结构200b时，其中射向所述侧面200b’的光线会在该侧面200b’的内表面发生全反射，改变光线路径，使原本射向大视角的光经全反射后向正视角的方向偏移，从而增加第一子像素的正向出光量，进而改善第一显示区11和第二显示区12之间的亮度差异。
如图8所示，在理论上，所述第二夹角α2的最小值受到所述像素定义层1031形成的像素开口1001的宽度和高度的限制。设定所述像素开口1001的宽度为L，所述像素开口1001的高度为H，位于所述像素开口1001内的所述有机发光层1033发出的光射出所述像素开口1001后会存在一定的视角范围，设定光线a1和a2为所述有机发光层1033从像素定义层1031边沿射出的最大角度的光线。可以理解的是，当所述第二夹角α2大于最大角度的光线（如a1或a2）与所述显示基板100所在平面形成的阈值角α时，所述有机发光层1033发出的光会照射至所述第二光学结构200b的侧面200b’上。
其中，所述阈值角α = arctan (H/L)*180°/π。
在一种实施例中，所述第二夹角α2的角度大于所述阈值角α，且小于或等于90°。
在一种实施例中，为了简化制程，所述第一夹角α1和所述第二夹角α2相等。即所述第一光学结构200a和所述第二光学结构200b的形状、大小保持一致。
在一种实施例中，为了使所述第二光学结构200b得到最大的利用率，所述第二光学结构200b靠近所述阴极层1034一侧的底部边界位于所述像素开口1001的边界至超出所述像素开口1001边界预设距离d的范围内。其中，当所述第二光学结构200b的底部边界位于最大角度的光线（如a1或a2）与所述光学膜层200的交汇处（A点/A’点）时，此时最大角度的光线刚好能照射到所述第二光学结构200b的侧面200b’的底部，此时所述有机发光层1033的出射光刚好可以射向整个侧面200b’。
其中，预设距离(d) = 像素定义层至光学膜层的垂直距离(h) /阈值角(α)的正切值。
在一种实施例中，所述第二光学结构200b的侧面200b’为斜面或曲面中的至少一种。
进一步的，当所述第二光学结构200b的侧面200b’为曲面时，所述曲面的曲率半径为1.5微米-5微米。
其中，图7中的第一光学结构200a和第二光学结构200b均为单层结构的光学子膜层。可以理解的是，在其他实施例中，所述第一光学结构200a和所述第二光学结构200b均可采用至少两层不同折射率的光学子膜层，且所述光学膜层200中的多层光学子膜层的折率从靠近所述显示基板100的一侧向远离所述显示基板100的一侧依次减小。例如，所述第一光学结构200a和所述第二光学结构200b中包括至少两层所述光学子膜层，远离所述显示基板100一侧的光学子膜层包裹靠近所述显示基板100一侧的光学子膜层，且所述第一光学结构200a和所述第二光学结构200b中的至少两层所述光学子膜层在垂直于所述显示基板100的方向上的截面形状相同。具体可参照实施例二以及图6中的第一光学结构200a的设计，此处不再赘述。采用这种设计，可以进一步增加第一显示区的透光率以及第一子像素的正向出光量。
本实施例相较于上述实施例一/二，由于在像素开口上方设置了可以增加正向出光的第二光学结构，因此，本实施例在增加第一显示区的透光率的同时，还可以增加第一显示区中第一子像素的正向出光量，进而改善第一显示区和第二显示区之间的亮度差异。
实施例四
请参阅图3和图9，本实施例的显示面板与上述实施例一的显示面板的结构相似，本实施例的显示面板中的显示基板100与实施例一的显示面板中的显示基板100的结构相同，以及本实施例的显示面板的第二显示区12与上述实施例一的显示面板的第二显示区12的结构相同，此处不再赘述。本实施例与上述实施例一的区别在于：
所述光学膜层200包括第一光学子膜层201和第二光学子膜层202，所述第二光学子膜层202位于所述第一光学子膜层201远离所述基底101的一侧，且所述第一光学子膜层201的折射率小于所述第二光学子膜层202的折射率。
示例性的，所述第一光学子膜层201的折射率的范围为1-1.4，例如可以为1、1.1、1.2、1.3或者1.4等。所述第二光学子膜层202的折射率的范围为1.5-2，例如可以为1.5、1.7、1.8、或者2等。
所述第一光学子膜层201形成第一光学结构200a，所述显示基板100的像素定义层1031包括多个相间隔的像素开口1001和相邻两像素开口1001之间的支撑部1031a，所述第一光学结构200a对应设置于相邻两所述像素开口1001之间的支撑部1031a上。其中，所述显示基板100的面向所述第一光学结构200a的一表面上形成有阴极抑制层1035，所述阴极抑制层1035位于相邻两个所述像素开口1001之间的支撑部1031a上。其中，相邻两个所述像素开口1001之间设置有透光区111，所述阴极抑制层1035正对所述透光区111设置。
进一步的，所述第一光学结构200a位于一个所述像素开口1001及一个所述阴极抑制层1035之间。并且，在垂直于所述显示基板100的方向上，所述第一光学结构200a远离所述显示基板100一侧的截面宽度w2小于或等于所述第一光学结构200a靠近所述显示基板100一侧的截面宽度w1。
在一种实施例中，所述第一光学结构200a在所述显示基板100上的正投影不与所述阴极抑制层1035交叠。
在一种实施例中，所述第一光学结构200a的边界位于所述像素开口1001的边界与所述阴极抑制层1035的边界之间。
进一步的，所述第一光学结构200a靠近所述阴极抑制层1035的一侧为底部，远离所述阴极抑制层1035的一侧为顶部，其中，所述第一光学结构200a靠近所述像素开口1001的底部边界与所述像素开口1001的边界相对应，所述第一光学结构200a靠近所述透光区111的底部边界与所述阴极抑制层1035的边界相对应。
其中，所述第一光学结构200a的侧面200a’与所述显示基板100所在平面之间形成的第一夹角α1在0°至90°之间。示例性的，所述第一夹角α1为15°、30°、45°、60°、70°、80°或90°。
在本实施例中，所述第一光学结构200a同时具备增强透光区111入光以及增强第一子像素正向出光的作用。综合考虑，所述第一夹角α1的角度大于所述阈值角α，且小于或等于90°。
在本实施例中，由于所述第二光学子膜层202的折射率大于所述第一光学结构200a（即第一光学子膜层）的折射率，因此所述第一光学结构200a与所述第二光学子膜层202的交界面（即侧面200a’）为全反射表面，当外界光线射向所述第一光学结构200a靠近所述透光区111一侧的侧面200a’时，光线会在所述侧面200a’的外表面发生全反射，从而改变光线路径，使原本射向所述透光区111之外的外界光经全反射后可以进入所述透光区111的范围内，以增加透光区111的入光量，进而提高所述第一显示区11的透光率。
进一步的，当所述有机发光层1033发出的光射向所述第二光学结构200b靠近所述像素开口1001一侧的侧面200a’时，光会在所述侧面200b’的外表面发生全反射，改变光线路径，使原本射向大视角的光经全反射后向正视角的方向偏移，从而增加第一子像素的正向出光量，进而改善第一显示区11和第二显示区12之间的亮度差异。
因此，本实施例相较于上述实施例一，能够在增加第一显示区的透光率的同时，还可以增加第一显示区中第一子像素的正向出光量，进而改善第一显示区和第二显示区之间的亮度差异。
实施例五
请参阅图3和图10，本实施例的显示面板与上述实施例四的显示面板的结构相似，本实施例与上述实施例四的区别在于：本实施例的显示面板的光学膜层200包括多层折射率不同的光学子膜层，多层所述光学子膜层中的至少两者形成第一光学结构200a。其中，多层所述光学子膜层的折射率从靠近所述显示基板100的一侧向远离所述显示基板100的一侧依次增大。其中，远离所述显示基板100一侧的光学子膜层包裹靠近所述显示基板100一侧的光学子膜层，且所述第一光学结构200a中的至少两层所述光学子膜层在垂直于所述显示基板100的方向上的截面形状相同。
具体请参照图10，为了方便说明，图10中的仅示意了三层光学子膜层。其中，光学膜层200至少包括第一光学子膜层201、第二光学子膜层202以及第三光学子膜层203，且第一光学子膜层201的折射率小于第二光学子膜层202的折射率，第二光学子膜层202的折射率小于第三光学子膜层203的折射率。第一光学子膜层201和第二光学子膜层202构成第一光学结构200a，第三光学子膜层203覆盖第一光学结构200a。
其中，本实施例的显示面板中的显示基板100与实施例一的显示面板中的显示基板100的结构相同，以及本实施例的显示面板的第二显示区12与上述实施例一的显示面板的第二显示区12的结构相同，此处不再赘述。
在本实施例中，由于所述第一光学结构200a中的每个光学子膜层的侧面都可以形成全反射表面，因此，本实施例在上述实施例四的基础上可以进一步增加第一显示区的透光率和第一子像素的正向出光量。
以上对本发明进行了详细介绍，本文中应用了具体个例对本发明的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本发明的方法及其核心思想；同时，对于本领域的技术人员，依据本发明的思想，在具体实施方式及应用范围上均会有改变之处，综上所述，本说明书内容不应理解为对本发明的限制。

Claims (20)

  1. 一种显示面板，其中，所述显示面板包括第一显示区和第二显示区，所述第二显示区围绕所述第一显示区，且所述第一显示区的透过率大于第二显示区的透过率，所述第一显示区包括：
    显示基板，所述显示基板包括像素定义层和设置在所述像素定义层上的阴极层，所述像素定义层包括多个相间隔的像素开口和相邻像素开口之间的支撑部，所述阴极层在所述像素开口的厚度大于所述阴极层在支撑部上的厚度；
    光学膜层，设置于所述阴极层远离所述像素定义层的一侧，所述光学膜层包括多个对应设置于相邻两所述像素开口之间的第一光学结构；
    其中，所述第一光学结构包括靠近所述阴极层的第一面及、与所述第一面相对的第二面、以及侧面，且所述第一光学结构的侧面为全反射表面。
  2. 根据权利要求1所述的显示面板，其中，所述光学膜层包括至少两层折射率不同的光学子膜层，至少两层所述光学子膜层中的至少一者形成所述第一光学结构。
  3. 根据权利要求2所述的显示面板，其中，至少两层所述光学子膜层的折射率从靠近所述显示基板的一侧向远离所述显示基板的一侧依次减小；所述第一光学结构远离所述显示基板一侧的截面宽度大于或等于所述第一光学结构靠近所述显示基板一侧的截面宽度。
  4. 根据权利要求3所述的显示面板，其中，所述光学膜层还包括多个对应所述像素开口的第二光学结构，所述第二光学结构与所述第一光学结构位于同一层，所述第二光学结构包括靠近所述阴极层的第一面及、与所述第一面相对的第二面、以及侧面，且所述第二光学结构的侧面为全反射表面。
  5. 根据权利要求4所述的显示面板，其中，所述第二光学结构远离所述显示基板一侧的截面宽度大于或等于所述第二光学结构靠近所述显示基板一侧的截面宽度。
  6. 根据权利要求5所述的显示面板，其中，所述第一光学结构和/或所述第二光学结构中包括至少两层所述光学子膜层，远离所述显示基板一侧的光学子膜层包裹靠近所述显示基板一侧的光学子膜层，且所述第一光学结构和/或所述第二光学结构中的至少两层所述光学子膜层在垂直于所述显示基板的方向上的截面形状相同。
  7. 根据权利要求5所述的显示面板，其中，所述阴极层包括对应所述像素开口的第一阴极部和对应支撑部的第二阴极部，所述第一阴极部的厚度大于所述第二阴极部的厚度。
  8. 根据权利要求7所述的显示面板，其中，所述显示基板还包括多个阳极、第一辅助层、有机发光层以及第二辅助层，所述阳极与所述第一阴极部相对设置，所述第一辅助层位于所述阳极靠近所述阴极层的一侧，所述有机发光层位于所述第一辅助层靠近所述阴极层的一侧，所述第二辅助层位于所述有机发光层靠近所述阴极层的一侧；所述支撑部上形成有阴极抑制层，所述阴极抑制层的厚度小于所述阴极层的厚度，所述阴极抑制层与所述阴极层之间的粘合力小于所述阴极层与所述第二辅助层之间的粘合力，且所述阴极抑制层为透明材质。
  9. 根据权利要求8所述的显示面板，其中，所述阴极抑制层在所述光学膜层上的正投影与所述阳极在所述光学膜层上的正投影相离。
  10. 根据权利要求8所述的显示面板，其中，当所述第一光学结构远离所述显示基板一侧的截面宽度大于或等于所述第一光学结构靠近所述显示基板一侧的截面宽度时，所述第一光学结构在所述显示基板上的正投影与所述阴极抑制层重叠。
  11. 根据权利要求10所述的显示面板，其中，所述第一光学结构靠近所述阴极抑制层的一侧为底部，其中，所述第一光学结构的底部边界与所述阴极抑制层的边界相对应。
  12. 根据权利要求7所述的显示面板，其中，所述第二光学结构在所述显示基板上的正投影与所述第一阴极部重叠。
  13. 根据权利要求7所述的显示面板，其中，所述像素开口的宽度为L，所述像素开口的高度为H，其中，所述第一光学结构的侧面与所述第一光学结构的第一面之间的夹角为第一夹角，所述第二光学结构的侧面与所述第二光学结构的第一面之间的夹角为第二夹角，所述第一夹角和所述第二夹角的角度范围均大于阈值角，且小于或等于90°；其中，所述阈值角为arctan(H/L)*180°/π。
  14. 根据权利要求13所述的显示面板，其特征在于，所述第一夹角与所述第二夹角的角度相等。
  15. 根据权利要求13所述的显示面板，其中，所述第二光学结构靠近所述阴极层一侧的底部边界位于像素开口边界至超出像素开口边界预设距离的范围内；
    其中，所述预设距离为：所述像素定义层至所述光学膜层的垂直距离/所述阈值角的正切值。
  16. 根据权利要求2所述的显示面板，其中，至少两层所述光学子膜层的折射率从靠近所述显示基板的一侧向远离所述显示基板的一侧依次增大；所述第一光学结构远离所述显示基板一侧的截面宽度小于或等于所述第一光学结构靠近所述显示基板一侧的截面宽度。
  17. 根据权利要求16所述的显示面板，其中，所述阴极层包括对应所述像素开口的第一阴极部和对应支撑部的第二阴极部，所述第一阴极部的厚度大于所述第二阴极部的厚度。
  18. 根据权利要求17所述的显示面板，其中，所述显示基板还包括多个阳极、第一辅助层、有机发光层以及第二辅助层，所述阳极与所述第一阴极部相对设置，所述第一辅助层位于所述阳极靠近所述阴极层的一侧，所述有机发光层位于所述第一辅助层靠近所述阴极层的一侧，所述第二辅助层位于所述有机发光层靠近所述阴极层的一侧；所述支撑部上形成有阴极抑制层，所述阴极抑制层的厚度小于所述阴极层的厚度，所述阴极抑制层与所述阴极层之间的粘合力小于所述阴极层与所述第二辅助层之间的粘合力，且所述阴极抑制层为透明材质。
  19. 根据权利要求18所述的显示面板，其中，所述第一显示区的相邻两所述像素开口之间还设有透光区，当所述第一光学结构远离所述显示基板一侧的截面宽度小于或等于所述第一光学结构靠近所述显示基板一侧的截面宽度时，所述第一光学结构在所述显示基板上的正投影位于所述像素开口与所述透光区之间。
  20. 根据权利要求19所述的显示面板，其中，所述第一光学结构靠近所述阴极抑制层的一侧为底部，其中，所述第一光学结构靠近所述像素开口的底部边界与所述像素开口的边界相对应，所述第一光学结构靠近所述透光区的底部边界与所述阴极抑制层的边界相对应。
PCT/CN2021/119313 2021-09-08 2021-09-18 一种显示面板 WO2023035317A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US17/607,855 US20240032346A1 (en) 2021-09-08 2021-09-18 Display panel

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202111049374.9A CN113745433B (zh) 2021-09-08 2021-09-08 一种显示面板
CN202111049374.9 2021-09-08

Publications (1)

Publication Number Publication Date
WO2023035317A1 true WO2023035317A1 (zh) 2023-03-16

Family

ID=78736982

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2021/119313 WO2023035317A1 (zh) 2021-09-08 2021-09-18 一种显示面板

Country Status (3)

Country Link
US (1) US20240032346A1 (zh)
CN (1) CN113745433B (zh)
WO (1) WO2023035317A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230116914A (ko) 2020-12-07 2023-08-04 오티아이 루미오닉스 인크. 핵 생성 억제 코팅 및 하부 금속 코팅을 사용한 전도성 증착 층의 패턴화
CN114823807A (zh) * 2022-02-07 2022-07-29 武汉华星光电半导体显示技术有限公司 显示面板

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109216581A (zh) * 2017-07-04 2019-01-15 三星显示有限公司 具有低折射率层和高折射率层的显示装置
CN111063720A (zh) * 2019-12-30 2020-04-24 厦门天马微电子有限公司 显示面板和显示装置
CN113054134A (zh) * 2021-03-09 2021-06-29 武汉华星光电半导体显示技术有限公司 显示面板
CN113054136A (zh) * 2021-03-11 2021-06-29 武汉华星光电半导体显示技术有限公司 有机发光显示面板及显示装置
CN113054133A (zh) * 2021-03-09 2021-06-29 武汉华星光电半导体显示技术有限公司 显示面板及其制备方法
CN113178530A (zh) * 2021-04-09 2021-07-27 武汉华星光电半导体显示技术有限公司 显示面板与显示装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9362345B2 (en) * 2013-05-31 2016-06-07 Samsung Display Co., Ltd. Organic light emitting display apparatus and method of manufacturing the same
KR20200089379A (ko) * 2019-01-16 2020-07-27 삼성디스플레이 주식회사 유기발광표시장치
CN113130613B (zh) * 2021-04-13 2023-08-18 京东方科技集团股份有限公司 显示基板、装置及其制备方法
CN113629208B (zh) * 2021-07-20 2023-04-07 武汉华星光电半导体显示技术有限公司 显示面板及显示装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109216581A (zh) * 2017-07-04 2019-01-15 三星显示有限公司 具有低折射率层和高折射率层的显示装置
CN111063720A (zh) * 2019-12-30 2020-04-24 厦门天马微电子有限公司 显示面板和显示装置
CN113054134A (zh) * 2021-03-09 2021-06-29 武汉华星光电半导体显示技术有限公司 显示面板
CN113054133A (zh) * 2021-03-09 2021-06-29 武汉华星光电半导体显示技术有限公司 显示面板及其制备方法
CN113054136A (zh) * 2021-03-11 2021-06-29 武汉华星光电半导体显示技术有限公司 有机发光显示面板及显示装置
CN113178530A (zh) * 2021-04-09 2021-07-27 武汉华星光电半导体显示技术有限公司 显示面板与显示装置

Also Published As

Publication number Publication date
US20240032346A1 (en) 2024-01-25
CN113745433B (zh) 2023-06-02
CN113745433A (zh) 2021-12-03

Similar Documents

Publication Publication Date Title
US20220165993A1 (en) Display panel with a display function layer and display device
WO2019223456A1 (zh) 显示面板及其制备方法、显示装置
US20240196645A1 (en) Display panel and display device
CN113629208B (zh) 显示面板及显示装置
WO2020186932A1 (zh) 发光器件及其制造方法、显示装置
JP4642823B2 (ja) 照明装置及び液晶表示装置
WO2020211206A1 (zh) 显示面板和电子设备
WO2021244173A1 (zh) 终端设备、柔性屏及柔性显示基板
WO2020186898A1 (en) Display panel, display apparatus, and methods for making the same
US20070145890A1 (en) Organic light-emitting diode and method of fabricating the same
WO2019041899A1 (zh) 显示面板、显示装置及显示面板制作方法
WO2006035811A1 (ja) 有機エレクトロルミネッセンス表示装置
JP2018081815A (ja) 表示装置
WO2023035317A1 (zh) 一种显示面板
WO2020056865A1 (zh) 显示面板及显示装置
US20240049575A1 (en) Display panel and mobile terminal
WO2021068337A1 (zh) 显示面板及显示装置
JP2007324113A (ja) バックライトユニット及びこれを備えた液晶表示装置
WO2018119784A1 (zh) 底发光型oled显示单元及其制作方法
JP2023179634A (ja) 画素構造、表示装置及び画素構造の製造方法
WO2023015952A1 (zh) 显示面板及显示装置
WO2022247180A1 (zh) 显示面板及显示装置
WO2024017343A1 (zh) 显示面板及其制作方法、显示装置
JP7348075B2 (ja) 画素構造、表示装置及び画素構造の製造方法
WO2024000995A1 (zh) 显示面板及其制备方法和显示装置

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 17607855

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE