WO2022244525A1 - チオエポキシ基及び(メタ)アリル基含有化合物及びその製造方法 - Google Patents
チオエポキシ基及び(メタ)アリル基含有化合物及びその製造方法 Download PDFInfo
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- WO2022244525A1 WO2022244525A1 PCT/JP2022/016405 JP2022016405W WO2022244525A1 WO 2022244525 A1 WO2022244525 A1 WO 2022244525A1 JP 2022016405 W JP2022016405 W JP 2022016405W WO 2022244525 A1 WO2022244525 A1 WO 2022244525A1
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- WIPO (PCT)
- Prior art keywords
- group
- meth
- formula
- thioepoxy
- acid
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 44
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 title claims abstract description 24
- 125000005068 thioepoxy group Chemical group S(O*)* 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 10
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 5
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims description 13
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 9
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 claims description 8
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 claims description 8
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 5
- 239000000463 material Substances 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 150000002430 hydrocarbons Chemical group 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000006116 polymerization reaction Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- LELOWRISYMNNSU-UHFFFAOYSA-N hydrogen cyanide Chemical compound N#C LELOWRISYMNNSU-UHFFFAOYSA-N 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- 229920006015 heat resistant resin Polymers 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- DJHGAFSJWGLOIV-UHFFFAOYSA-N Arsenic acid Chemical compound O[As](O)(O)=O DJHGAFSJWGLOIV-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 229940000488 arsenic acid Drugs 0.000 description 2
- COHDHYZHOPQOFD-UHFFFAOYSA-N arsenic pentoxide Chemical compound O=[As](=O)O[As](=O)=O COHDHYZHOPQOFD-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- ZWWCURLKEXEFQT-UHFFFAOYSA-N dinitrogen pentaoxide Chemical compound [O-][N+](=O)O[N+]([O-])=O ZWWCURLKEXEFQT-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- KOUKXHPPRFNWPP-UHFFFAOYSA-N pyrazine-2,5-dicarboxylic acid;hydrate Chemical compound O.OC(=O)C1=CN=C(C(O)=O)C=N1 KOUKXHPPRFNWPP-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- JSPLKZUTYZBBKA-UHFFFAOYSA-N trioxidane Chemical class OOO JSPLKZUTYZBBKA-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- FUZBYNWONHYNOB-UHFFFAOYSA-N 1-cyclohexylethylcyclohexane Chemical compound C1CCCCC1C(C)C1CCCCC1 FUZBYNWONHYNOB-UHFFFAOYSA-N 0.000 description 1
- CTAURVAUCOLBHF-UHFFFAOYSA-N 1-cyclohexylpropan-2-ylcyclohexane Chemical compound C1CCCCC1C(C)CC1CCCCC1 CTAURVAUCOLBHF-UHFFFAOYSA-N 0.000 description 1
- ROFWOEQFASWFTK-UHFFFAOYSA-N 1-cyclohexylpropylcyclohexane Chemical compound C1CCCCC1C(CC)C1CCCCC1 ROFWOEQFASWFTK-UHFFFAOYSA-N 0.000 description 1
- ZAJYARZMPOEGLK-UHFFFAOYSA-N 1-ethyl-2-propan-2-ylbenzene Chemical compound CCC1=CC=CC=C1C(C)C ZAJYARZMPOEGLK-UHFFFAOYSA-N 0.000 description 1
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- CCXLOQVMDTWRSP-UHFFFAOYSA-N 2-cyclohexylpropan-2-ylcyclohexane Chemical compound C1CCCCC1C(C)(C)C1CCCCC1 CCXLOQVMDTWRSP-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- LIQIPWNPFZCAIQ-UHFFFAOYSA-N 3-cyclohexylpropylcyclohexane Chemical compound C1CCCCC1CCCC1CCCCC1 LIQIPWNPFZCAIQ-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- YHASWHZGWUONAO-UHFFFAOYSA-N butanoyl butanoate Chemical compound CCCC(=O)OC(=O)CCC YHASWHZGWUONAO-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- -1 siloxane compound Chemical class 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Inorganic materials O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 1
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D331/00—Heterocyclic compounds containing rings of less than five members, having one sulfur atom as the only ring hetero atom
- C07D331/02—Three-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/06—Polythioethers from cyclic thioethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
- C08L81/02—Polythioethers; Polythioether-ethers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D181/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur, with or without nitrogen, oxygen, or carbon only; Coating compositions based on polysulfones; Coating compositions based on derivatives of such polymers
- C09D181/02—Polythioethers; Polythioether-ethers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J181/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur, with or without nitrogen, oxygen, or carbon only; Adhesives based on polysulfones; Adhesives based on derivatives of such polymers
- C09J181/02—Polythioethers; Polythioether-ethers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
Definitions
- the present invention relates to a thioepoxy group- and (meth)allyl group-containing compound and a method for producing the same.
- Patent Document 1 the compound described in Patent Document 1 is known as a compound having a (meth)allyl group and a glycidyl group. Although this compound was excellent in heat resistance, etc., its refractive index was not high, and it was insufficient as a raw material for a high refractive optical material.
- the present invention has been made in view of the above circumstances, and provides a material that is useful as a macromonomer for a heat-resistant resin material, and is also useful as a high-refractive optical material capable of increasing the refractive index of the resulting polymer. With the goal.
- the present invention provides the following thioepoxy group- and (meth)allyl group-containing compounds and methods for producing the same.
- R 1 is a trivalent or tetravalent hydrocarbon group having 2 to 20 carbon atoms
- R 2 is a hydrogen atom or a methyl group
- n is 3 or 4.
- R 1 is a trivalent or tetravalent hydrocarbon group having 2 to 20 carbon atoms
- R 2 is a hydrogen atom or a methyl group
- n is 3 or 4.
- a compound containing a glycidyl group and a (meth)allyl group represented by the following formula (2) is reacted with thiourea or a thiocyanate containing a thioepoxy group and a (meth)allyl group represented by the following formula (1)
- a method for producing a compound In the formula, R 1 is a trivalent or tetravalent hydrocarbon group having 2 to 20 carbon atoms, R 2 is a hydrogen atom or a methyl group, and n is 3 or 4.
- R 1 is a trivalent or tetravalent hydrocarbon group having 2 to 20 carbon atoms, R 2 is a hydrogen atom or a methyl group, and n is 3 or 4.
- the thioepoxy group- and (meth)allyl group-containing compound of the present invention is capable of both polymerization using a (meth)allyl group and polymerization using a thioepoxy ring, and each functional group has 3 Having one or more, the resulting polymer can have a three-dimensional crosslinked structure. Moreover, cross-linking and curing after polymerization using them are possible, and the obtained polymer has good strength, heat resistance, weather resistance and water resistance.
- the thioepoxy group- and (meth)allyl group-containing compound of the present invention is a compound useful as a macromonomer for heat-resistant resin materials.
- the thioepoxy group- and (meth)allyl group-containing compound of the present invention has a thioepoxy group, it is possible to increase the refractive index of the resulting polymer, and it can be expected as a material useful as a high refractive optical material. .
- the thioepoxy group- and (meth)allyl group-containing compound of the present invention is represented by the following formula (1).
- R 1 is a trivalent or tetravalent hydrocarbon group having 2 to 20 carbon atoms.
- R2 is a hydrogen atom or a methyl group.
- n is 3 or 4;
- the trivalent or tetravalent hydrocarbon group having 2 to 20 carbon atoms may be saturated or unsaturated, and may be linear, branched, or cyclic. Specific examples thereof include alkanes such as ethane, propane, butane, pentane, hexane, and structural isomers thereof; Cyclic saturated hydrocarbons such as dicyclohexylethane, 1,1-dicyclohexylpropane, 1,2-dicyclohexylpropane, 1,3-dicyclohexylpropane and 2,2-dicyclohexylpropane; benzene, toluene , xylene, and groups obtained by removing 3 or 4 hydrogen atoms from an aromatic hydrocarbon such as ethylisopropylbenzene.
- alkanes such as ethane, propane, butane, pentane, hexane, and structural isomers thereof
- Cyclic saturated hydrocarbons such as dicycl
- R 1 is preferably a trivalent or tetravalent hydrocarbon group having 2 to 15 carbon atoms, and particularly preferably the groups shown below. (In the formula, the dashed line is a bond.)
- Compounds represented by formula (1) include, but are not limited to, those shown below.
- the compound represented by the formula (1) can be synthesized by reacting a glycidyl group- and (meth)allyl group-containing compound represented by the following formula (2) with thiourea or thiocyanate. (In the formula, R 1 , R 2 and n are the same as above.)
- Compounds represented by formula (2) include, but are not limited to, those shown below.
- the reaction temperature in the reaction between the compound represented by formula (2) and thiocyanate or thiourea is arbitrary, but usually 0 to 100°C, preferably 20 to 70°C.
- the reaction time is not particularly limited as long as the reaction is completed, but 20 hours or less is usually suitable.
- Thiocyanate and thiourea are stoichiometrically used in an amount corresponding to the amount of epoxy groups in the epoxy compound. Lesser amounts may be used, and greater amounts may be used.
- the amount of thiocyanate and thiourea is more than 0 mol and 5 mol or less, more preferably about 0.9 to 5.0 mol, still more preferably 1.0 to 1.0 mol, per 1 mol of the epoxy group of the epoxy compound. About 3.0 mol is used and reacted.
- the reaction may be carried out without solvent or in a solvent.
- a solvent it is preferable to use one in which either thiocyanate or thiourea and the compound represented by formula (2) are soluble.
- Specific examples include alcohols such as water, methanol and ethanol; ethers such as diethyl ether, tetrahydrofuran and dioxane; hydroxy ethers such as methyl cellosolve, ethyl cellosolve and butyl cellosolve; aromatic hydrocarbons; halogenated hydrocarbons such as dichloroethane, chloroform and chlorobenzene; Mixed solvents of these solvents may also be used.
- mixed solvents of alcohols and water, ethers, hydroxy ethers, halogenated hydrocarbons or aromatic hydrocarbons and alcohols, etc. can be effective.
- the polymerization inhibitor include acids and acid anhydrides.
- Specific examples of the acids and acid anhydrides include nitric acid, hydrochloric acid, sulfuric acid, fuming sulfuric acid, boric acid, arsenic acid, phosphoric acid, hydrocyanic acid, acetic acid, peracetic acid, thioacetic acid, oxalic acid, tartaric acid, propionic acid, Butyric acid, succinic acid, maleic acid, benzoic acid, nitric anhydride, sulfuric anhydride, boron oxide, arsenic pentoxide, phosphorus pentoxide, chromic anhydride, acetic anhydride, propionic anhydride, butyric anhydride, succinic anhydride, maleic anhydride , benzoic anhydride, phthalic anhydride, silica gel, silica alumina, and aluminum chloride.
- the amount added is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass, based on the total amount of the reaction solution.
- the polymerization inhibitors may be used singly or in combination of two or more.
- the stability of the resulting compound can be improved by washing the reaction product with an acidic aqueous solution.
- acids used in the acidic aqueous solution include nitric acid, hydrochloric acid, sulfuric acid, boric acid, arsenic acid, phosphoric acid, hydrocyanic acid, acetic acid, peracetic acid, thioacetic acid, oxalic acid, tartaric acid, succinic acid, maleic acid, and the like. mentioned. Moreover, these may be used alone or in combination of two or more.
- the acidic aqueous solution usually exhibits its effect at pH 6 or less, and is more effective at pH 1-5.
- the said acid may be used individually by 1 type, and may be used in combination of 2 or more type.
- the thioepoxy group- and (meth)allyl group-containing compound of the present invention is a compound having three or more thioepoxy groups and three or more (meth)allyl groups in one molecule. If a siloxane compound containing —H is subjected to a hydrosilylation reaction to form a polymer, it is possible to obtain a polymeric silicone material having a three-dimensional crosslinked structure with thioepoxy groups. It can also be used as a curable material having a crosslinked structure. After polymerizing using those groups, cross-linking and curing are possible using the remaining functional groups. Therefore, the thioepoxy group- and (meth)allyl group-containing compound of the present invention is a useful compound as a macromonomer for heat-resistant resin materials.
- Example 1 In a 3 L separable flask equipped with a nitrogen gas introduction tube, a thermometer, a Dimroth condenser, a vacuum controller and an aspirator, the following formula (2-1) 297 g (0.5 mol) of the compound represented by the formula, 304 g (4 mol) of thiourea, 10 g of acetic anhydride, and 1,000 g of toluene and 1,000 g of methanol as solvents were charged and reacted at 50° C. for 8 hours.
- the following formula (2-1) 297 g (0.5 mol) of the compound represented by the formula, 304 g (4 mol) of thiourea, 10 g of acetic anhydride, and 1,000 g of toluene and 1,000 g of methanol as solvents were charged and reacted at 50° C. for 8 hours.
- the product was extracted with toluene, washed with a 1% by mass sulfuric acid aqueous solution, washed with water, and the excess solvent was distilled off to obtain 305 g of a product.
- Elemental analysis was performed using a fully automatic elemental analyzer 2400II CHNS/O manufactured by Perkin Elmer, and GC-MS mass spectrometry was performed using 7890A manufactured by Agilent.
- 1 H-NMR analysis was performed using Bruker's AV400M, and FT-IR analysis was performed using Thermo Fisher Scientific's Nicolet 6700. As a result, the product was a compound represented by formula (1-1) (yield 95%).
- Example 2 instead of the compound represented by formula (2-1), the following formula (2-2) 223 g of product was obtained in the same manner as in Example 1, except that 321 g (0.5 mol) of the compound represented by was used. Elemental analysis was performed using a fully automatic elemental analyzer 2400II CHNS/O manufactured by Perkin Elmer, and GC-MS mass spectrometry was performed using 7890A manufactured by Agilent. 1 H-NMR analysis was performed using Bruker's AV400M, and FT-IR analysis was performed using Thermo Fisher Scientific's Nicolet 6700. As a result, the product was a compound represented by formula (1-2) (yield 92%).
- Example 3 instead of the compound represented by formula (2-1), the following formula (2-3) 455 g of product was obtained in the same manner as in Example 1, except that 457 g (0.5 mol) of the compound represented by was used. Elemental analysis was performed using a Perkin Elmer fully automated elemental analyzer 2400II CHNS/O, 1 H-NMR analysis was performed using a Bruker AV400M, and FT-IR analysis was performed using a Thermo Fisher Scientific Nicolet 6700. As a result, the product was confirmed to be the compound represented by formula (1-3) (yield 93%).
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Abstract
Description
で表されるグリシジル基及び(メタ)アリル基含有化合物と、チオ尿素又はチオシアン酸塩とを反応させることで、下記式(1)
で表される、チオエポキシ基と(メタ)アリル基を1分子内にそれぞれ3つ以上有する化合物が得られることを知見し、本発明をなすに至った。
1.下記式(1)で表されるチオエポキシ基及び(メタ)アリル基含有化合物。
2.R1が、炭素数2~15の3価又は4価の炭化水素基である1のチオエポキシ基及び(メタ)アリル基含有化合物。
3.下記式(2)で表されるグリシジル基及び(メタ)アリル基含有化合物と、チオ尿素又はチオシアン酸塩とを反応させる、下記式(1)で表されるチオエポキシ基及び(メタ)アリル基含有化合物の製造方法。
窒素ガス導入管、温度計、ジムロート型コンデンサー、バキュームコントローラー及びアスピレーターを備えた3Lのセパラブルフラスコに、下記式(2-1)
式(2-1)で表される化合物のかわりに、下記式(2-2)
式(2-1)で表される化合物のかわりに、下記式(2-3)
Claims (3)
- R1が、炭素数2~15の3価又は4価の炭化水素基である請求項1記載のチオエポキシ基及び(メタ)アリル基含有化合物。
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CN202280035454.5A CN117295723A (zh) | 2021-05-21 | 2022-03-31 | 含有硫代环氧基和(甲基)烯丙基的化合物及其制造方法 |
KR1020237043314A KR20240012447A (ko) | 2021-05-21 | 2022-03-31 | 티오에폭시기 및 (메타)알릴기 함유 화합물 및 그 제조 방법 |
EP22804441.8A EP4342888A1 (en) | 2021-05-21 | 2022-03-31 | Thioepoxy group- and (meth)allyl group-containing compound, and method for producing same |
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JP2021-085967 | 2021-05-21 | ||
JP2021085967A JP2022178868A (ja) | 2021-05-21 | 2021-05-21 | チオエポキシ基及び(メタ)アリル基含有化合物及びその製造方法 |
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EP (1) | EP4342888A1 (ja) |
JP (1) | JP2022178868A (ja) |
KR (1) | KR20240012447A (ja) |
CN (1) | CN117295723A (ja) |
TW (1) | TW202313583A (ja) |
WO (1) | WO2022244525A1 (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3378522A (en) * | 1961-11-29 | 1968-04-16 | Shell Oil Co | Epithio compounds, their preparation and polymers |
JP2001181276A (ja) * | 1999-12-27 | 2001-07-03 | Nippon Steel Chem Co Ltd | 新規な芳香族エピスルフィド化合物、これを含有する組成物及び硬化物 |
JP2017125008A (ja) | 2016-01-07 | 2017-07-20 | 信越化学工業株式会社 | アリール化合物及びその製造方法 |
-
2021
- 2021-05-21 JP JP2021085967A patent/JP2022178868A/ja active Pending
-
2022
- 2022-03-31 WO PCT/JP2022/016405 patent/WO2022244525A1/ja active Application Filing
- 2022-03-31 CN CN202280035454.5A patent/CN117295723A/zh active Pending
- 2022-03-31 KR KR1020237043314A patent/KR20240012447A/ko unknown
- 2022-03-31 EP EP22804441.8A patent/EP4342888A1/en active Pending
- 2022-05-19 TW TW111118629A patent/TW202313583A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3378522A (en) * | 1961-11-29 | 1968-04-16 | Shell Oil Co | Epithio compounds, their preparation and polymers |
JP2001181276A (ja) * | 1999-12-27 | 2001-07-03 | Nippon Steel Chem Co Ltd | 新規な芳香族エピスルフィド化合物、これを含有する組成物及び硬化物 |
JP2017125008A (ja) | 2016-01-07 | 2017-07-20 | 信越化学工業株式会社 | アリール化合物及びその製造方法 |
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TW202313583A (zh) | 2023-04-01 |
EP4342888A1 (en) | 2024-03-27 |
CN117295723A (zh) | 2023-12-26 |
KR20240012447A (ko) | 2024-01-29 |
JP2022178868A (ja) | 2022-12-02 |
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