WO2022164123A1 - Dispositif et procédé d'alignement de multiples photomasques pour la fabrication d'un masque métallique fin pour un affichage de grande surface - Google Patents

Dispositif et procédé d'alignement de multiples photomasques pour la fabrication d'un masque métallique fin pour un affichage de grande surface Download PDF

Info

Publication number
WO2022164123A1
WO2022164123A1 PCT/KR2022/001003 KR2022001003W WO2022164123A1 WO 2022164123 A1 WO2022164123 A1 WO 2022164123A1 KR 2022001003 W KR2022001003 W KR 2022001003W WO 2022164123 A1 WO2022164123 A1 WO 2022164123A1
Authority
WO
WIPO (PCT)
Prior art keywords
photomask
alignment
photomasks
fine metal
metal mask
Prior art date
Application number
PCT/KR2022/001003
Other languages
English (en)
Korean (ko)
Inventor
유명훈
김재범
한덕기
Original Assignee
풍원정밀㈜
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 풍원정밀㈜ filed Critical 풍원정밀㈜
Priority to CN202280009076.3A priority Critical patent/CN116710848A/zh
Publication of WO2022164123A1 publication Critical patent/WO2022164123A1/fr

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present invention relates to a plurality of photomask alignment apparatus for manufacturing a fine metal mask for a large area display, and more particularly, to easily manufacture a fine metal mask for manufacturing an 8th generation large area display, a plurality of By connecting and using photomask raw materials or a plurality of photomasks, it is possible to manufacture a fine metal mask having an extended effective portion of the 8th generation. Accordingly, it is possible to increase production efficiency in manufacturing a fine metal mask having an effective portion extended in length compared to a fine metal mask for manufacturing a 6.5 generation display, and to utilize the existing exposure equipment for manufacturing a fine metal mask for the 6.5 generation as it is. can
  • a key component for depositing OLED devices on a display panel is a fine metal mask, and it is difficult to keep up with the trend of large-area display panels with the existing 6.5G OLED pixel deposition fine metal mask. is laid Therefore, there is a need to develop a fine metal mask for deposition of 8th generation OLED pixels (hereinafter abbreviated as “8th generation mask”).
  • the fine metal mask is composed of an effective portion, which is an area in which a pattern is formed so that pixels are deposited, and grip portions formed at both ends of the effective portion to perform a mask fixing role in order to seat the fine metal mask on the panel in the process of depositing the pixels.
  • the length of the effective part of the 6.5th generation mask is 1100mm, whereas the length of the effective part of the 8th generation mask is 2200mm.
  • the length of the grip part it is 2600mm, which is a conventional exposure machine that can expose up to a length of 2400mm. There is a problem in that it is difficult to produce a generation mask.
  • the photomask used to manufacture the 8th generation mask is a type of laminating two or more numbers, so the continuity or consistency of alignment between the two photomasks in the process of laminating two pre-processed photomasks, respectively. There is a high possibility that this cannot be ensured, and when continuity or consistency of alignment is not ensured in this way, pixel defects may occur in the process of forming pixels, and the resolution of the display may deteriorate due to the defective pixels. Therefore, the development of a new process technology for manufacturing the 8th generation mask is desired.
  • the present invention has been devised to solve the problems of the prior art, and the present invention aims to manufacture a fine metal mask for manufacturing an 8th generation large-area display having a high degree of alignment by aligning a plurality of photo masks with high accuracy. do it with
  • the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine It serves another purpose to maximize utilization.
  • Another object of the present invention is to manufacture a separate aligner for aligning a plurality of photomasks and to precisely align the plurality of photomasks in a simple manner.
  • a second photomask adsorption hole is reinforced in the photomask bonding frame, and transferred to the exposure machine in the adsorption state for exposure.
  • a photo mask mounting frame a photomask adsorption unit formed on an edge of the photomask mounting frame; At least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned to overlap the alignment mark; and a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks,
  • a plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large area display, wherein the remainder overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask.
  • the photomask alignment device may include: a photomask lifting bar provided to be liftable under the photomask mounting frame; and a support glass for supporting the photomasks at the interface when the plurality of photomasks are laminated.
  • the photographing device is provided as many as the number of the alignment reference points.
  • the photomask may further include a bonding frame for supporting the photomask from an upper portion of the photomask, and a second photomask adsorption unit may be formed on at least a portion of a surface of the bonding frame in contact with the photomask.
  • the present invention is performed by the alignment device, the first step of generating at least one alignment mark on the photo mask; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine; a third step of confirming the positions of the alignment marks between the mounted photomasks; and a fourth step of determining whether the alignment state is completed according to the position of the identified alignment mark, wherein the completion of the alignment state is recognized from whether the alignment mark formed on each photomask matches the alignment reference unit, and the alignment Provided is a method for aligning a plurality of photomasks for manufacturing a fine metal mask for a large area display, wherein the third step is performed again after secondary alignment of the photomasks when the state is not completed.
  • the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine The effect is expected to maximize the usability.
  • the present invention is expected to have the effect of precisely aligning the plurality of photomasks in a simple way before performing the exposure process.
  • a second photomask adsorption hole is reinforced in the photomask bonding frame, and transferred to the exposure machine in the adsorption state for exposure.
  • FIG. 1 is a flowchart illustrating a process of laminating two individual photomasks and securing an alignment degree according to an embodiment of the present invention, and shows a case in which a separate alignment device is used.
  • FIG. 2 shows the alignment device of FIG. 1 from the side, and at the same time shows a process for laminating a photomask and confirming an alignment state.
  • FIG. 3 is a view showing a second photomask adsorption unit formed on a photomask bonding frame according to an embodiment of the present invention together with an exposure machine mounting frame.
  • ... unit and “... group” described in the specification mean a unit for processing at least one function or operation.
  • the present invention is to fabricate an 8th generation fine metal mask, and the 8th generation fine metal mask is characterized in that the effective portion is twice as long as that of the existing 6.5 generation fine metal mask.
  • the overall length of the 8th generation fine metal mask is 2600 mm, which is 1100 mm longer than the total length of the 6.5 generation fine metal mask of 1500 mm.
  • the exposure machine for performing the exposure process which is a process for manufacturing a fine metal mask, can expose a target object with a length of up to 2500 mm, one full exposure of the 6.5 generation fine metal mask is possible, but the 8th generation fine metal mask One full exposure of the mask is not possible.
  • FIG. 1 is a flowchart illustrating a process of laminating two individual photomasks and securing an alignment degree according to an embodiment of the present invention, illustrating a case in which a separate alignment device is used
  • FIG. 2 is the alignment device of FIG. is shown from the side and at the same time shows a process for confirming the lamination and alignment of the photomask
  • FIG. 3 is a second photomask adsorption unit formed on the photomask bonding frame according to an embodiment of the present invention together with the exposure machine mounting frame. the drawing shown.
  • FIG. 1 shows the planar shape of the adsorption unit 171 formed on the photomask mounting frame 170 on which the photomasks 130-1 and 130-2 are mounted
  • FIGS. 2 and 3 the bonding frame ( 230 ) and the second photomask adsorption unit 231 are shown in plan view.
  • FIG. 1 and 2 show a photomask alignment apparatus 200 in which a photomask mounting frame 170 is configured separately from an exposure machine, and a lifting bar 173, supporting glass, and the like are provided.
  • the photomask alignment apparatus 200 includes an alignment reference unit 181 and a photographing apparatus, and includes a fixed photomask alignment system 180 , and a photomask It consists of an independent frame structure including a photomask mounting frame 170 that can be mounted thereon.
  • the photomask alignment apparatus 200 includes a photomask mounting frame 170 ; a photomask adsorption unit 171 formed on an edge of the photomask mounting frame 170;
  • the alignment reference point 182 is formed at least two, the alignment reference point 182 is an alignment reference portion 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145, wherein at least one of the alignment reference points 182 is one of a plurality of photomasks. It overlaps the alignment marks 145 formed on the first photomask, and the remainder overlaps the alignment marks 145 formed on the second photomask aligned adjacent to the first photomask.
  • the photomask mounting frame 170 and the photomask adsorption unit 171 of the present embodiment are 1) configured independently from those configured in the exposure machine, and 2) a photomask including the alignment reference unit 181 and the photographing device 183 .
  • the alignment system 180 is fixed to the frame, 3) a leg portion is formed in the lower portion of the frame, 4) a photo mask lifting bar 173 provided to be lifted in the lower portion of the photo mask mounting frame 170; It is provided and ascends and descends to the central portion surrounded by the frame, and serves to support the photomask to be seated on the frame.
  • the supporter 220 supports the photomasks on the boundary surface of the photomask, and serves to maintain the alignment state when the photomask is moved; further includes.
  • the material of the support 220 is not limited, but it is preferable to use a glass material.
  • the photomask mounting frame 170 shown in FIG. 1 is an area on which the photomask is mounted (mounted), the central portion surrounded by the frame is penetrated, and the transparent mounting plate 172 on which the photomask is mounted is positioned. do.
  • the mounting plate 172 mainly adopts a glass plate. This is because the glass plate is suitable for performing the exposure process because it has heat resistance and is transparent. However, an appropriate material other than the glass plate may be adopted as an alternative material.
  • a slit 171 to which a negative pressure is applied is provided on the edge of the frame 170 , so that when the photomask is mounted, the photomask 130 can be seated on the frame by the negative pressure, and thus the photomask 130 is stable. fixation is possible.
  • the upper slit 171 may be replaced by a single hole, and the interstitial space that can use the sound pressure may have any shape.
  • the photomask mounting frame 170 has a size in which two manufactured unit photomasks 130-1 and 130-2 can be mounted.
  • the number of photomasks that can be mounted is not limited to two, and more photomasks may be mounted according to the size of the frame or the length of the mask.
  • the photomask mounting frame 170 may be used in a process of fixing a single photomask and exposing the metal plate 190 using this, and laminating and mounting a plurality of photomasks 130-1 and 130-2. And you can check the alignment status between them. In the case of laminating a plurality of photomasks, since the pattern must be closely aligned, the plurality of photomasks must be precisely aligned, and a means for checking the alignment state must be separately devised.
  • an alignment device equipped with a photomask alignment system 180 is devised, whereby the alignment state of the laminated photomask can be precisely checked, and the laminated photo has an alignment suitable for performing the exposure process.
  • the realization of the mask became possible.
  • the process of manufacturing the photomask may include: a first step of generating at least one alignment mark 145 on the photomask; a second step of first aligning and mounting at least two photomasks on which the alignment marks 145 are generated on a photomask mounting frame 170 of an exposure machine; a third step of confirming the positions of the alignment marks 145 between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark 145; if the alignment state is not completed, the photomasks are secondarily aligned and then performed again from the third step will do
  • the alignment marks 145 generated on the photomask are preferably marked outside the region where the pattern is formed. Therefore, it is preferable that the photomask be installed in the area near the vertex of the rectangular photomask as the most comfortable position.
  • the alignment marks 145 may be formed at all four vertices, or at least at both ends of the long side. That is, it is most preferable that the alignment mark 145 is marked at an appropriate position so that the alignment state of the unit photomask and the adjacent unit photomask can be checked.
  • the alignment marks 145 are formed at the same coordinates of an alignment target photomask having the same standard, so that the alignment state can be checked regularly.
  • the alignment state is confirmed as it is so that it can be connected to the exposure process, which is the next process.
  • Checking the alignment status may be continuously performed until the alignment status is confirmed.
  • the completion of the alignment state may be recognized from whether the alignment mark formed on each photomask matches the alignment reference unit.
  • the alignment reference points 182 include an alignment reference unit 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145 .
  • the alignment reference points 182 overlaps the alignment mark 145 formed on the first photomask among the plurality of photomasks, and the rest are aligned on the second photomask aligned adjacent to the first photomask. superimposed on mark 145 .
  • the illustrated shape shows a shape in which one alignment mark 145 is formed in the vertex regions adjacent to each other of the first photomask and the second photomask.
  • the number of alignment marks 145 is not particularly limited as long as the alignment check can be precisely performed as described above.
  • the alignment reference unit 181 may be formed of a transparent material. For example, by making the transparent reference unit semi-transparent, the effect of light reflection during photographing can be reduced. Accordingly, the overlapping state of the alignment reference point 182 and the alignment mark 145 can be confirmed with the naked eye.
  • the alignment mark 145 is formed on the upper surface or the lower surface of the photomask, and the formation surface of the alignment mark 145 is not limited to any one surface.
  • the photomask alignment apparatus 180 may be located above or below the photomask. That is, since the mounting portion on which the photomask is mounted is made of transparent glass, it is possible to check the alignment state even under the photomask.
  • the photomask is preferably mounted at a reference position on the frame 170 , and the alignment system 180 can check the alignment state of the photomask.
  • the reference point for the mounting position of the photomask and the alignment measurement position of the alignment system 180 must be set so that the alignment state of the photomask 130 can be easily and precisely confirmed and confirmed in a short time.
  • the alignment state is checked by the photographing device 183, and the alignment state photographed by the photographing apparatus 183 is transmitted to a control unit (not shown) by wired/wireless communication means, and after checking the alignment state in the control unit, the alignment state decides whether to confirm or not. As a result of checking the alignment state, if there is a need for realignment, this is transmitted to the alignment device again to perform the corresponding process.
  • the photographing device 183 is preferably provided as many as the number of the alignment reference points 182 , but of course, one movable photographing device 183 may be configured to check the alignment state while moving.
  • FIG. 2 is a view showing the alignment device of FIG. 1 from the side and at the same time showing a process for confirming the lamination and alignment state of the photomask
  • FIG. 3 is a second photo formed in the photomask bonding frame according to an embodiment of the present invention. It is a figure which shows the mask adsorption part together with the exposure machine mounting frame.
  • two photomasks 130-1 and 130-2 are fixed to the bonding frame 230, and the second photomask adsorption unit 231 is configured in the bonding frame 230 to form the photomasks 130-1 and 130-2.
  • 130-2) is strongly adsorbed and fixed while moving to the exposure machine, and the bonding frame 230 is mounted on the exposure machine mounting frame 240 to perform the exposure process. That is, as shown in FIG. 3 , a fine metal mask is manufactured by exposing the photomask 130 , the bonding frame 230 , and the exposure machine mounting frame 240 to a metal plate as a set. Since the manufacturing process of the fine metal mask is a known technique, a detailed description thereof will be omitted.
  • One feature of the present invention is that the plurality of photomasks 130 can maintain a determined alignment state due to the second photomask adsorption unit 231 configured in the bonding frame 230 .

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

La présente invention concerne un dispositif et un procédé d'alignement de multiples photomasques pour la fabrication d'un masque métallique fin pour un affichage de grande surface, et, plus particulièrement, elle concerne un dispositif d'alignement de multiples photomasques pour la fabrication d'un masque métallique fin pour un affichage de grande surface qui comprend : un cadre de montage de photomasque ; une partie d'adsorption de photomasque formée sur un bord du cadre de montage de photomasque ; une partie de référence d'alignement qui comporte au moins deux points de référence d'alignement formés à l'intérieur de celle-ci, les points de référence d'alignement étant positionnés de façon à chevaucher un repère d'alignement ; et un dispositif d'imagerie monté au niveau d'une position où l'état de chevauchement de la partie de référence d'alignement et du repère d'alignement peut être capturé, au moins l'un des points de référence d'alignement chevauchant le repère d'alignement formé sur le premier photomasque parmi les multiples photomasques, et les autres chevauchant les repères d'alignement formés sur le deuxième photomasque aligné de manière à être adjacent au premier photomasque.
PCT/KR2022/001003 2021-02-01 2022-01-19 Dispositif et procédé d'alignement de multiples photomasques pour la fabrication d'un masque métallique fin pour un affichage de grande surface WO2022164123A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202280009076.3A CN116710848A (zh) 2021-02-01 2022-01-19 用于制造大面积显示器用精细金属掩模的多个光掩模对准装置及对准方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2021-0014413 2021-02-01
KR1020210014413A KR102295228B1 (ko) 2021-02-01 2021-02-01 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법

Publications (1)

Publication Number Publication Date
WO2022164123A1 true WO2022164123A1 (fr) 2022-08-04

Family

ID=77489300

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2022/001003 WO2022164123A1 (fr) 2021-02-01 2022-01-19 Dispositif et procédé d'alignement de multiples photomasques pour la fabrication d'un masque métallique fin pour un affichage de grande surface

Country Status (3)

Country Link
KR (1) KR102295228B1 (fr)
CN (1) CN116710848A (fr)
WO (1) WO2022164123A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102295228B1 (ko) * 2021-02-01 2021-08-31 풍원정밀(주) 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR960024644A (ko) * 1994-12-29 1996-07-20 윤종용 노광기용 마스크 정렬장치
KR970076093A (ko) * 1996-05-06 1997-12-10 김광호 포토 마스크의 정합 마크 배치 및 이를 이용한 노광 방법
US20050012914A1 (en) * 2002-01-28 2005-01-20 Lin Burn J. Multiple mask step and scan aligner
US20160334674A1 (en) * 2015-05-15 2016-11-17 Boe Technology Group Co., Ltd. Alignment Exposure Method and Method of Fabricating Display Substrate
KR102295228B1 (ko) * 2021-02-01 2021-08-31 풍원정밀(주) 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104503203A (zh) * 2015-01-15 2015-04-08 京东方科技集团股份有限公司 掩膜板及其制备方法和显示面板中封框胶的固化方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR960024644A (ko) * 1994-12-29 1996-07-20 윤종용 노광기용 마스크 정렬장치
KR970076093A (ko) * 1996-05-06 1997-12-10 김광호 포토 마스크의 정합 마크 배치 및 이를 이용한 노광 방법
US20050012914A1 (en) * 2002-01-28 2005-01-20 Lin Burn J. Multiple mask step and scan aligner
US20160334674A1 (en) * 2015-05-15 2016-11-17 Boe Technology Group Co., Ltd. Alignment Exposure Method and Method of Fabricating Display Substrate
KR102295228B1 (ko) * 2021-02-01 2021-08-31 풍원정밀(주) 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법

Also Published As

Publication number Publication date
KR102295228B1 (ko) 2021-08-31
CN116710848A (zh) 2023-09-05

Similar Documents

Publication Publication Date Title
WO2022164123A1 (fr) Dispositif et procédé d'alignement de multiples photomasques pour la fabrication d'un masque métallique fin pour un affichage de grande surface
CN108251796B (zh) 一种精细金属掩膜板及其制备方法、掩膜集成框架
WO2022164113A1 (fr) Appareil et procédé pour aligner une pluralité de photomasques pour fabriquer un masque métallique fin pour un grand écran
CN104297989B (zh) 基板、掩膜板及液晶显示装置
WO2015043219A1 (fr) Substrat de film couleur, dispositif d'affichage à commande tactile et procédé de fabrication d'un substrat de film couleur
US20210011333A1 (en) Method for manufacturing display panel and display panel thereof
CN101900933A (zh) 使用掩模板曝光工艺的基板及其对位方法
WO2019019427A1 (fr) Plaque à mailles métalliques et dispositif de masque de dépôt
WO2017185438A1 (fr) Masque et procédé de préparation pour substrat de filtre coloré
WO2022158687A1 (fr) Masque métallique fin pour affichage de grande surface et son procédé de fabrication
US6576378B2 (en) Photomask and exposure method for large scaled LCD device
CN104865729A (zh) 彩膜基板及其制作方法、隔垫物的制作方法及显示装置
WO2017031771A1 (fr) Filtre coloré et son procédé de fabrication
JP3363308B2 (ja) 基板組立方法及び液晶表示セルの製造方法
KR20030019030A (ko) 액정 표시 장치 제조용 노광 마스크와 이를 이용한 액정표시 장치 제조에서의 기판의 노광 방법
CN103389533A (zh) 一种制造彩色滤光片的方法和彩色滤光片
JP2001235877A (ja) 露光方法
WO2011078627A2 (fr) Rouleau d'application de motif et dispositif d'impression le comprenant
JPS61219901A (ja) 多色カラ−表示素子の製造方法
CN109839799A (zh) 掩膜组件及其曝光方法
JP3714946B2 (ja) アライメントマーク付きカラーフィルター
JPH0426191A (ja) 多層プリント基板の製造方法
CN108776406A (zh) 一种彩色滤光片的制备基板及彩色滤光片基板的制造方法
WO2023179434A9 (fr) Substrat de réseau et écran à cristaux liquides
CN109212908A (zh) 曝光机的挡板位置确定方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 22746150

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 202280009076.3

Country of ref document: CN

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 22746150

Country of ref document: EP

Kind code of ref document: A1